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Registration

Conference Pricing

Member: $1,555

Non-Member: $1,865

Krish Raghunath
Program Manager, Programs & Committees, SEMI
[email protected]

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Travel

ESGS Hyatt Regency Phoenix

Hyatt Regency Phoenix—Book your room!  

122 North Second Street, Phoenix, Arizona, 85004

Service and Benefits 
  • $219/night
  • No resort fee
  • Standard high-speed wireless Internet access
  • Shuttle Transportation (Phoenix Premium Outlets, Aji Spa & Whirlwind Golf Club) 

 

 

ESGS Hyatt Regency Phoenix

Thank You to Our ESGS 2026 Sponsors

Platinum

Entegris

Gold

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Silver

Bronze

Become a Sponsor

View the 2026 ESGS Sponsorship Brochure

Sponsoring will associate your company with the industry's most respected senior executives. Sponsorship opportunities can be tailored to meet your specific branding and marketing objectives.

Contact Tim Janes at +1.720.939.4992 or [email protected]

Exhibitor Floorplan | View the Companies You Will Meet

 

The Electronic Specialty Gases & Systems Conference (ESGS) provides a forum of engagement and learning around the market, technology trends, and market drivers for electronic gases. The conference includes sections focusing on developments in the bulk, rare and specialty gas markets that are critical to the continued growth of the electronics industry.

The conference is designed for executives, buyers, product managers, and strategic planners from the electronic gases value chain including end-users, producers, and equipment suppliers. The conference features knowledgeable experts in the industry, who understand the key developments and challenges unique to this market.

Hyatt Regency Phoenix
122 N 2nd St
Phoenix, AZ 85004
United States

TUESDAY, NOVEMBER 10, 2026

7:00 am - 8:00 am

Breakfast

8:00 am - 8:10 am
Mike Corbett
Mike Corbett
Managing Partner
Linx Consulting

Opening Day Remarks

8:10 am - 8:30 am
Joe Stockunas, SEMI Americas
Joe Stockunas
President
SEMI Americas

Opening Keynote

8:30 am - 9:15 am
Bruce Gall, Google
Bruce Gall
Strategic Partnerships
Google

Featured Presentation

9:15 am - 9:45 am

U.S. Semiconductor Public Policy Update

9:45 am - 10:15 am
Berc Kalanyan
Research Chemical Engineer
NIST

Measuring the Future: CHIPS Metrology Program Updates

10:15 am - 11:00 am

Networking Break

11:00 am - 11:30 am
Gustavo Albuquerque, Intel
Gustavo Albuquerque
PTD Gas Systems Engineer
Intel

Gas Systems Challenges as Moore’s Law Advances

11:30 am - 12:00 pm
Mark O'Neill, Entegris
Mark O'Neill
Vice President, R&D and Engineering,
Entegris

12:00 pm - 1:15 pm

Lunch

Vapor Phase Materials and Electronics Specialty Gases

1:15 pm - 1:20 pm
Venkat Pallam
Venkat Pallam
Deputy CTO & Technology Director, Thin Film Processing
Air Liquide

Opening Session Remarks

1:20 pm - 1:50 pm
David Mandia_LAM
David Mandia, PhD
Staff Process Engineer
Lam Research

Large Grain Molybdenum Deposition

1:50 pm - 2:20 pm
Feng Li, Air Liquide Advanced Materials
Feng Li
Senior R&D Manager
Air Liquide Advanced Materials

Solid Precursor Delivery: Challenges and Solutions

2:20 pm - 2:50 pm
Rachel Potter EMD
Rachel Potter
VP, Specialty Gases
EMD Electronics

Tungsten Powder Supply Chain Issues & Impacts

2:50 pm - 3:35 pm

Networking Break

Contamination Control and Yield

3:35 pm - 3:40 pm
Sarah Vogt
Sarah Vogt
Director, E/R&D Gas Purification
Entegris

Opening Session Remarks

3:40 pm - 4:10 pm
Photo Coming Soon
Vindhya Kunduru
Supply Chain Engineer
Intel

IRDS Update

Latif Ahmed, Intel
Latif Ahmed
Senior Microcontamination Engineer
Intel
4:10 pm - 4:40 pm
Rocky Gipson, Entegris
Rocky Gibson, PhD
Senior Research & Development Manager
Entegris

Defining and Solving Contamination Challenges of Hydrogen Halides

4:40 pm - 5:10 pm
Photo Coming Soon
Steve Bovair
Sales Manager
deutraMed

Deuterium Supply Chain & Purity Considerations

5:10 pm - 5:20 pm
Mike Corbett
Mike Corbett
Managing Partner
Linx Consulting

Closing Remarks

WEDNESDAY, NOVEMBER 11, 2026

7:00 am - 8:00 am

Breakfast

New Technology Advancements

8:30 am - 8:40 am
Mike Corbett
Mike Corbett
Managing Partner
Linx Consulting

Opening Day Remarks

8:40 am - 8:45 am
Ashwini Sinha
Linde

Opening Session Remarks

8:45 am - 9:15 am
Heejeong Kim, Samsung
Heejeong Kim
Staff Engineer
Samsung Electronics

Isotropic Dry-Cleaning Technology for Next-Generation Semiconductor Devices

9:15 am - 9:45 am
Stefano Marani, ASP Isotopes
Stefano Marani
President
ASP

Advanced Isotopes in SEMI

9:45 am - 10:15 am
Elizaveta Kossoy
Elizaveta Kossoy
Principal Scientist
EMD Electronics

Tailoring New Etch Gases to Challenging Applications

10:15 am - 11:00 am

Break

11:00 am - 11:30 am
Calvin Chen, Qnity
Calvin Chen
Senior Engineer
Qnity Electronics

Sealing in Advanced Semiconductor Gas Delivery: Permeation, Contamination, and Reliability Tradeoffs

11:30 am - 12:00 pm
Jake Armstrong, Micron
Jake Armstrong
Principal Chemical Engineer
Micron

AI Applications in Automated Gas Handling/Cylinder Changeout

Jonathan Graham
Johnathen Graham
Senior Sales Engineer
Wonik Holdings USA
12:00 pm - 12:30 pm
Kris Chupka, Nippon Sanso Matheson
Kris Chupka
Director of R&D, Gas Analysis
Nippon Sanso Matheson

Point of Use NANOCHEM Purifiers for Ultra-High Purity Inert Purge Gas Delivery in EUV Lithography Tools

Facilities and Infrastructure

12:00 pm - 1:30 pm

Lunch

1:30 pm - 1:35 pm
Kurtis Fairley
Kurtis Fairley
Director, Technical Programs North America
Edwards Vacuum

Opening Session Remarks

1:35 pm - 2:05 pm
Kassey Rydberg, NY CREATES
Kassey Rydberg
Director of Environmental, Health, and Safety
NY Creates

Advancing Sustainable Semiconductor Innovation: NY Creates' High NA EUV Lithography Center

2:05 pm - 2:35 pm
Ilya Zabelinsky, ISRL
Ilya Zabelinsky
CTO
ISRL

Industry Collaboration, Roadmaps, and Pre-Competitive Action in Sub Fab

2:35 pm - 3:05 pm
Kim Fjeldsted
Sr. Applications Specialist
Ceres

Integrated Molecule Delivery Solutions for Semiconductor Manufacturing

3:05 pm - 3:50 pm

Break

Sustainability

3:50 pm - 3:55 pm
Peilun Sun headshot
Peilun Sun
Consortium Manager, SCC
SEMI

Opening Session Remarks

4:25 pm - 4:55 pm
Chris Jones
Chris Jones
Environment and Sustainability Manager
Edwards Vacuum

Abatement Update / Catalytic

4:55 pm - 5:25 pm
Blake Ericson, Onterris
Blake Ericson
Business Manager
Onterris

Bridging the Measurement Gap: Enhancing Sustainability Compliance via Emissions Monitoring

5:25 pm - 5:30 pm
Mike Corbett
Mike Corbett
Managing Partner
Linx Consulting

Closing Remarks

6:00 pm - 8:00 pm

Networking & Poster Session Reception

THURSDAY, NOVEMBER 12, 2026

7:00 am - 8:00 am

Breakfast

Gas Metrology

8:00 am - 8:10 am
Nithin Yathapu
Senior Director, Yield Strategy
Intel

Opening Session Remarks

8:10 am - 8:40 am
Berc Kalanyan
Research Chemical Engineer
NIST

Stability of MoCl5 in Heated Canisters and During Delivery

8:40 am - 9:10 am
Chad Nelson
Product Manager
Process Insights

Fast Impurity Measurements in Electronic-Grade Rare Gases

9:10 am - 9:40 am
Tony Kou, Thermo Fisher Scientific
Tony Kuo
Senior Applications Specialist
Thermo Fisher Scientific

Real-Time PPT Impurity Detection in Ultra-High Purity Gases for Semiconductor Fabs

9:40 am - 9:50 am
Mike Corbett
Mike Corbett
Managing Partner
Linx Consulting

Closing Remarks

Market Review and Updates

10:20 am - 10:30 am
Mark Thirsk
Mark Thirsk
Managing Partner
Linx Consulting

Opening Session Remarks

10:30 am - 11:00 am
Duncan Meldrum, Headshot
Duncan Meldrum
Chief Economist and Founder
Hilltop Economics

Does the Global Economy Matter for Semiconductors?

11:00 am - 11:30 am
 Inna Skvortsova
Inna Skvortsova
Research Manager, Market Intelligence
SEMI

SEMI Fab Capacity and Equipment Update

11:30 am - 12:00 pm
Phil Kornbluth
Phil Kornbluth
Founder & President
Kornbluth Helium Consulting

Helium Market Overview, Outlook & Trends

12:00 pm - 12:30 pm
Andy Tuan, Linx Consulting
Andy Tuan
Managing Director, Asia
Linx Consulting

Specialty Gas Market Update

-

Driving Innovation Across the Electronic Gases Ecosystem

ESGS 2026 will take place at a new venue—the Hyatt Regency Phoenix—from November 10–12, building on the overwhelming success and momentum of last year’s event.

Off Add to Calendar 2026-11-10 00:00:00 2026-11-12 00:00:00 ESGS 2026—Electronic Specialty Gases & Systems Conference Driving Innovation Across the Electronic Gases EcosystemESGS 2026 will take place at a new venue—the Hyatt Regency Phoenix—from November 10–12, building on the overwhelming success and momentum of last year’s event. Hyatt Regency Phoenix 122 N 2nd St Phoenix, AZ 85004 United States SEMI.org [email protected] America/Phoenix public America/Phoenix 1

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SEMI U Course

Monday, November 9, 2025 | 8:00am-5:00pm

Enhance your ESGS Conference experience with this exclusive SEMI U training course led by Jean-Pierre (JP) Deluca, a leak detection expert with more than 40 years of experience across the semiconductor, aerospace, automotive, medical, pharmaceutical, and refrigeration industries.

Fundamentals of Vacuum Technology and Helium Leak Detection is a comprehensive course designed to provide attendees with a practical understanding of vacuum systems, leak formation, leak measurement, and helium leak detection techniques used in semiconductor, aerospace, research, manufacturing, and high-technology industries. Participants will learn the principles of vacuum generation, gas flow, outgassing, permeation, conductance, pumping technologies, and helium mass spectrometer leak detection. The course also covers leak rate determination, industry standards, troubleshooting techniques, and real-world leak detection applications to help improve equipment reliability, product quality, and process performance.

What Attendees Will Learn

Upon completion of this course, attendees will be able to:

  • Define leaks, leak flow, virtual leaks, and their impact on vacuum systems and product quality.
  • Understand contaminant sizes, equivalent leak hole sizes, and leak-related defects.
  • Explain vacuum fundamentals, including pressure measurement, gas density, vacuum scales, and temperature effects.
  • Identify sources of gas loads, outgassing, permeation, and virtual leaks, and apply methods to minimize their impact.
  • Understand vacuum flow regimes, conductance, and how they influence pumping performance.
  • Compare rough vacuum and high-vacuum pumping technologies, including rotary vane, scroll, Roots, and turbomolecular pumps.
  • Understand the operation and capabilities of helium mass spectrometer leak detectors.
  • Explain helium properties, sources, applications, and why helium is the preferred tracer gas for leak testing.
  • Select and apply appropriate helium leak testing methods, including sniffing, accumulation, hard vacuum, bombing, and split-flow techniques.
  • Interpret leak detector response times, background helium levels, and published leak detector specifications.
  • Establish leak rate acceptance criteria and understand common leak rate units and conversions.
  • Troubleshoot high helium background conditions and improve leak detection sensitivity.
  • Apply leak detection principles to real-world vacuum systems and large vacuum chamber testing applications.
Who Should Attend

This course is intended for:

  • Semiconductor equipment engineers and technicians
  • Vacuum system engineers and maintenance personnel
  • Manufacturing, process, and reliability engineers
  • Field service engineers and installation specialists
  • Quality, test, and validation engineers
  • Research and development personnel
  • Aerospace and defense manufacturing personnel
  • Leak detection and vacuum equipment users
  • Facilities and equipment support personnel
  • Individuals new to vacuum technology or helium leak detection who require a practical, industry-focused foundation

Recommended Experience: No prior leak detection experience is required. A basic understanding of manufacturing, engineering, or technical equipment operation is helpful but not necessary.

Already attending the ESGS Conference? Add this SEMI U course to your registration for just $695 and gain valuable technical knowledge from one of the industry's most experienced instructors.

Interested in the course only? You can register for the SEMI U Course Only Pass for $795, making this training accessible even if you are not attending the full ESGS Conference.

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Kitchener, Ontario, July 15, 2025 – PEER Group®, the largest supplier of innovative factory automation software products for the semiconductor industry has launched a new service offering to help OEMs comply with the SEMI® Cybersecurity Standard E187: Specification for Cybersecurity of Fab Equipment.

“PEER Group’s new PEER® E187 Compliance Assessment is a comprehensive third-party service for OEMs that provides the essential training, assessment, documentation, and guidance to help their equipment comply with SEMI E187,” says Doug Suerich, PEER Group’s Director of Marketing.

Released in 2022, SEMI E187 provides a baseline level of security for new equipment being shipped to factories. It applies specifically to computing devices installed on fab equipment that run Microsoft Windows or Linux. Already mandatory at some factories, SEMI E187 is being increasingly adopted as part of factory acceptance requirements.

“PEER Group is uniquely positioned to assist with E187 compliance thanks our leadership in SEMI’s Semiconductor Manufacturing Cybersecurity Consortium (SMCC), participation in SEMI Standards development, and our decades of experience working with both OEMs and factories to meet fab specification requirements and achieve SEMI Standards compliance,” shares Suerich, who also serves as an SMCC Governing Council member.

To help educate OEMs on how to comply with SEMI E187, PEER Group is hosting a free webinar on July 24, 2025. For more information, including how to register, visit: https://attendee.gotowebinar.com/register/7410295402908186710?source=se…

About PEER Group
PEER Group® is the leading global supplier of innovative factory and tool automation and connectivity software for the semiconductor industry. Since our founding in 1992, we have been committed to developing best-in-class solutions that help OEMs and factories reduce their time to market, risk, and costs by solving their most challenging automation, connectivity, and SEMI Standards compliance problems. Follow PEER Group on. Follow PEER Group on LinkedIn.

This cutting-edge panel-level wet processing demo tool handles large 510 × 515 mm substrates, delivering world class, high density Through Glass Vias (TGV) formation and ultra-small taper angles essential for advanced packaging in high performance computing.

Gütenbach, Germany – July 15, 2025 – RENA Technologies, a leading manufacturer of wet processing equipment for semiconductor and advanced packaging production, today announced the ramp-up of its dedicated glass core substrates facility in Germany. This new line, designed for substrates up to 510 × 515 mm, immediately opens for customer test lots, underscoring RENA's proven expertise in glass processing and creating new opportunities for process development and customer sample production. “As experts in precision wet processing, we can now offer large panel demo services for high aspect ratio through glass via (TGV) formation on various glass types,” said Dr. Holger H. Kuehnlein, SVP Technology at RENA. “Our alkaline based TGV process delivers extremely small taper angles, low sidewall roughness, and exceptional dimensional control at panel scale, enabling high density via applications. Customers can begin validating these capabilities today.”

Why Glass, and Why Wet Processing?
Glass substrates offer significant advantages for advanced electronics, including ultra-flat surfaces, low dielectric loss, and superior thermal stability. However, realizing these benefits at scale requires defect free surface preparation and the formation of uniform, high density TGVs with minimal taper angles. RENA's wet processing systems are specifically designed to address both challenges:
1. Surface Engineering – Our systems ensure precise cleaning and stress relief across 600 x 600mm panels with submicron total thickness variation (TTV).
2. Chemically Formed TGVs – Following initial laser modifications performed by our specialist partners, RENA’s proprietary chemistries form, enlarge and shape each via to exact specifications. This process consistently delivers very small taper angles and smooth sidewalls, ideal for subsequent metallization.

By collaborating with leading German and international laser partners, RENA offers customers the flexibility to choose their preferred laser vendor while ensuring all downstream wet processing steps are handled by our advanced equipment.

Key Highlights of the New Facility
Panel Size: Focus on 510 x 515mm and up to 600 × 600mm, smaller possible
Tool Set: Alkaline TGV etching, advanced rinse/dry, optical inspection & metrology
Field-Proven Recipes: Process conditions migrated from high volume tools
On-Demand Access: Customers may run demo substrates, qualify custom chemistries, or request full process flows
Sustainability: Low temperature chemistries and closed loop water reclamation reduce energy and ultrapure water (UPW) consumption

Market Impact
High-Performance Computing (HPC) as well as 5G/6G RF modules increasingly require new package designs, including panel-level fan-out and trend towards more complex chiplet architectures. Glass substrates, long considered the “holy grail” for core and interposer material, effectively eliminate the limitations imposed by warpage and dielectric loss in organic substrates. By combining laser modification from our vetted partners with RENA's chemistry driven via shaping, designers can now validate glass packaging concepts on the lab-platform proven at 600x600mm dimensions.
“With this lab-tool, we've created a great opportunity for semiconductor manufacturers to perform demos on panel level glass substrates,” added Peter Schneidewind, CEO of RENA. “From surface preparation to via formation, our wet process flow is ready for customers substrates to support TGV technology breakthroughs. This is world class made in Black Forest.”

Availability & Engagement Model
• Testing available now
• Flexible collaboration: Bring your own laser modified substrates, or leverage RENA’s ecosystem partners to benefit from joint process development support, and metrology services for process validation.

About RENA Technologies GmbH
RENA Technologies is a leading global supplier of production machines for wet chemical surface preparation. RENA products are used in path-breaking application fields such as semiconductors, MedTech, renewable energies, the glass industry and additive manufacturing. RENA equipment is used to treat or modify surfaces of, for example, semiconductor wafers, solar cells, glass, optical substrates, 3D-printed metal components or other high-tech products using wet chemical processes. RENA offers proven standard machines as well as customer-specific solutions and process support.

CONTACT
Sales:
Felix Fink
Phone: +49 7723 9313-403
E-Mail: [email protected]

Press:
Dirk Hensel
Phone:+49 7723 9313-914
E-Mail: [email protected]
www.rena.com

Espoo, Finland, July 14, 2025 – Beneq, a global leader in Atomic Layer Deposition (ALD) technology, is proud to announce significant progress in the microLED display market, underscored by repeat orders from industry-leading technology innovators. MicroLED technology is revolutionizing the future of displays across sectors including consumer electronics, augmented and virtual reality (AR/VR), and the automotive industry. With unparalleled brightness, contrast, energy efficiency, and durability, microLED represents a paradigm shift in how displays are designed and manufactured – enabling ultra-fine pixel resolution, seamless scalability, and longer device lifetimes. As demand for next-generation display solutions accelerates, microLED is poised to become the backbone of future visual interfaces.

According to Yole Group, global microLED display shipments are projected to grow at a compound annual growth rate (CAGR) of 180.6% from 2022, reaching 42.4 million units by 2029. Despite its promise, microLED development presents formidable challenges, particularly in scaling down pixel sizes to below 10 micrometers while maintaining uniformity, stability, and manufacturability. As pixels shrink, precise material control and surface passivation become critical to device performance. Atomic Layer Deposition offers a unique solution, enabling ultra-thin, conformal coatings with atomic-level precision. ALD addresses key barriers in microLED production, such as surface defect passivation, sidewall protection, transparent conductive oxides and final passivation, thereby improving both device efficiency and long-term reliability.

“Our top-tier customers rely on ALD technology to advance monolithic integration of microLEDs and driver electronics on a single chip. This integration paves the way for a new class of smaller, more powerful display products – delivering faster data transfer, lower power consumption, and a significantly more compact footprint,” says Mikko Söderlund, Head of Semiconductor ALD Sales.

“These repeat orders validate Beneq’s solution and demonstrate the company’s commitment to support customers through both the demanding development phase and the critical transition to volume manufacturing.”

Beneq’s Transform® ALD cluster platform stands at the forefront of this technological evolution. Designed for high-throughput production and advanced technology development, the Beneq Transform combines modularity, flexibility, and productivity, making it an ideal tool for microLED manufacturers. Its multi-chamber architecture supports a wide range of materials and processes, enabling customers to fine-tune optical and electrical properties while seamlessly scaling from lab to fab. By equipping microLED pioneers with the tools needed to overcome manufacturing barriers, the Beneq Transform is helping accelerate the commercialization of microLED displays – paving the way for brighter, smarter, and more sustainable electronic experiences.

About Beneq

Beneq pioneered industrial Atomic Layer Deposition (ALD) with the introduction of the first commercial ALD equipment in 1984. Today, Beneq advances ALD technology adoption and validation with a portfolio that includes Transform®, Transform® 300, and Prodigy™ for specialty semiconductor device fabrication; TFS 200 and TFS 500 for R&D; innovative spatial ALD platforms such as the C2R™, and Genesis for roll-to-roll processing. Beneq’s products support process innovation from lab to fab, enabling integration of ALD in high volume manufacturing. Headquartered in Espoo, Finland, Beneq operates globally to help customers scale ALD solutions for the future of semiconductors, optics, and functional coatings.

Press Contact

Charlotte Bärlund
Event and Communications Lead
[email protected]

Lie Luo
Head of Marketing
[email protected]

Kitchener, Ontario, July 8, 2025 – PEER Group®, the largest supplier of innovative factory automation software products for the semiconductor industry, is hosting a webinar that will provide critical information to help equipment suppliers comply with the new SEMI® Cybersecurity Standard E187: Specification for Cybersecurity of Fab Equipment.

“SEMI E187 is one of a growing group of cybersecurity standards that have been developed to help secure the semiconductor manufacturing supply chain and build resilience in the face of an increasing threat of cyberattacks,” says Doug Suerich, PEER Group’s Director of Marketing and Governing Council member of the Semiconductor Manufacturing Cybersecurity Consortium (SMCC), “this webinar will provide OEMs with a crash course on the new cybersecurity standards and detail best practices on how to comply with E187.”

A popular speaker at a variety of industry conferences and tradeshows, Suerich will be the main speaker during the webinar, titled SEMI Cybersecurity Standard E187: Are you ready? During the 45-minute presentation, Suerich will delve into the history, development, and industry-wide collaboration that has resulted in the publication of SEMI’s new cybersecurity standards. This will be followed by an in-depth break down of SEMI E187, with Suerich explaining what equipment makers must do to achieve compliance and meet the factory specification.

Mike Barrett, Vice President, Global Sales at PEER Group will host the webinar. “As a software supplier to both semiconductor OEMs and fabs, we have deep knowledge and experience helping our customers meet the strict requirements outlined in factory specifications,” shares Barrett, while noting: “One thing we’re starting to see is that factories are beginning to require SEMI Cybersecurity Standards compliance as part of the factory purchase specification. Considering the risk and financial damages that come with a cyberattack, we expect to only see this requirement increase.”

The webinar is free to attend but requires registration. It will take place live on July 24, 2025, at 1:00 p.m. EDT.

To learn more, and to register, visit: https://attendee.gotowebinar.com/register/7410295402908186710?source=se…

About PEER Group
PEER Group® is the leading global supplier of innovative factory and tool automation and connectivity software for the semiconductor industry. Since our founding in 1992, we have been committed to developing best-in-class solutions that help OEMs and factories reduce their time to market, risk, and costs by solving their most challenging automation, connectivity, and SEMI Standards compliance problems. Follow PEER Group on. Follow PEER Group on LinkedIn.

United States Image Training

Course Description

This course introduces key cybersecurity principles, practices, and strategies tailored for semiconductor manufacturing environments. Participants will explore foundational concepts in cybersecurity, risk management, and best practices to secure semiconductor manufacturing systems and data.

Who Should Attend

This course is designed for:

  • Engineers and technicians in semiconductor manufacturing
  • IT professionals managing manufacturing systems
  • System administrators responsible for securing semiconductor equipment and networks
  • Individuals tasked with implementing cybersecurity strategies in industrial settings

Prerequisites

  • Basic understanding of semiconductor manufacturing processes
  • Familiarity with IT infrastructure (networks, computers, and systems)

Learning Objectives

By the end of the course, participants will: 

  • Understand the basic principles of cybersecurity and their importance in a manufacturing environment. 

  • Be able to assess and manage cybersecurity risks within semiconductor manufacturing systems. 

  • Learn practical strategies to implement cybersecurity measures for protecting critical infrastructure, devices, and data. 

  • Gain insights into responding to and recovering from cybersecurity incidents. 

  • Be prepared to develop and promote a strong security culture within their organization. 

     

Instructor

Jim Montgomery

Jim Montgomery

Instructor Bio

 

Important Information

Note that only the person who registered will receive a certificate of completion. This virtual training will not be recorded. Attendees must be present to access course knowledge. 

Can't find the training link day of? After you register, you will receive the link to the live training via the email address you provided. In addition, you will receive email reminders about 24 hours in an advance and an hour before with the same link. Please keep these emails on hand to access the trainings on time. If you do not see any confirmation emails, please check your junk/spam folders before contacting SEMI U for support.

United States

SEMI U Standards

Unlock the secrets to safeguarding semiconductor manufacturing systems with this comprehensive cybersecurity course. Learn essential principles, risk management strategies, and best practices to protect critical infrastructure and data from cyber threats. Equip yourself with the knowledge to implement robust security measures and respond effectively to incidents in industrial environments.

Pricing
  • Members: $299
  • Non-Members: $325

* For group orders with 10+ attendees, and for Students/Veterans discounted pricing, please contact [email protected]. 

4:00 pm - 8:00 pm Off Add to Calendar 2025-11-05 16:00:00 2025-11-05 20:00:00 Implementing Basic Cybersecurity Principles in Semiconductor Manufacturing (Virtual Training - Americas & Asia) Unlock the secrets to safeguarding semiconductor manufacturing systems with this comprehensive cybersecurity course. Learn essential principles, risk management strategies, and best practices to protect critical infrastructure and data from cyber threats. Equip yourself with the knowledge to implement robust security measures and respond effectively to incidents in industrial environments.PricingMembers: $299Non-Members: $325* For group orders with 10+ attendees, and for Students/Veterans discounted pricing, please contact [email protected].  United States SEMI.org [email protected] America/Los_Angeles public America/Los_Angeles Cancelled
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Prudential Cleanroom Services is proud to announce our newest cleanroom laundry processing facility in Heath, OH (located in the greater Columbus / Central Ohio market area). The Ohio market is important to Prudential, so we can best serve our customers expansion requirements in the region. This will be Prudential’s eighth ISO Class 3 cleanroom laundry processing facility in the United States. This extends the greatest throughput capacity from any company in our industry. The new state of the art Cleanroom Laundry Processing Plant is approximately 67,000 square-feet and sits on over nine (9) acres. The NEW projected investment is projected to be $35 million. The site will employ up to eighty (80) full time employees or more. This Plant will be the industry’s most modern, newest and amongst the largest cleanroom processing Plants in the United States and possibly the world! Prudential is excited to bring this customer centric facility to Ohio that will provide direct services throughout the Midwest! https://www.prudentialuniforms.com/event/heath-ribbon-cutting-ceremony/

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United States

- Standards

Liquid Chemicals North America TC Chapter

July Meeting

Date: Tuesday, July 29 - Wednesday, July 30

Time: 09:00-12:00 Noon Pacific Time

via Virtual Meeting

 

AGENDA

(subject to change) 

Last updated: July 23, 2025

9:00 am - 12:00 pm Off Add to Calendar 2025-07-29 09:00:00 2025-07-30 12:00:00 Liquid Chemicals North America TC Chapter July Meeting Liquid Chemicals North America TC ChapterJuly MeetingDate: Tuesday, July 29 - Wednesday, July 30Time: 09:00-12:00 Noon Pacific Timevia Virtual Meeting AGENDA(subject to change) Last updated: July 23, 2025 United States SEMI.org [email protected] America/Los_Angeles public America/Los_Angeles

Voting Instructions

To Vote During TC Chapter Meetings

  1. Open a separate Web browser and go to:  https://svm.semi.org/
  2. Click “Login”
  3. Enter your Standards Membership username and password (same login you use for voting on ballots)
  4. Find the meeting room you wish to attend under “Room Name”
  5. Click “Go” to enter the meeting room.

 

NOTE: You must be a registered SEMI Standards Program Member to gain access. Reach out to your staff contact if you are unable to log on, or if your "voting interest" is incorrect or shows "NONE".

 

Next Meetings

Save the Date!

SEMICON West Standards Meetings
October 6-9, 2025 @ Phoenix, Arizona, California

 

Contact

Please email staff contact below for virtual information:

Laura Nguyen
Sr. Coordinator, International Standards
 

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Martinez, CA—EUV Tech (EUVT), a global leader in designing and manufacturing at-wavelength EUV metrology equipment, is excited to announce the release of the FALCON Photoresist Flood Exposure Tool. As our next-generation EUV resist characterization and diagnostics tool, FALCON allows photoresist manufacturers to rapidly and accurately test EUV resist sensitivity, as well as providing patterning materials developers critical insights into exposure mechanisms.

Built upon EUV Tech’s proven resist tool technology, FALCON is a fully automated tool that supports high-throughput contrast curves on EUV-patterning materials and radiation chemistry diagnostics by integrating a wide variety of optional add-on analysis and processing modules.

Enhancing FALCON’s platform is an array of in-situ analysis and process modules, including Fourier Transform Infrared (FTIR) Spectroscopy, Atomic Mass Spectrometry, Total Electron Yield (TEY), Photo-Electron Spectroscopy (PES), environmental and vacuum bake module with additional diagnostics, and a scanner-environment exposure module.

Key to FALCON’s effectiveness is its highly uniform exposure spot size of 6 mm, supporting high-sensitivity chemical analysis and over 1,000 exposures for a 300 mm wafer in a single recipe run. Built-in data visualization tools make it possible to analyze this rich data. Combining uniformity, high configurability, and deep data collection and analysis makes FALCON a highly efficient, cost-effective tool for advanced photoresist development.

For more information on the enhanced FALCON Flood Exposure Tool or any of EUV Tech’s at-wavelength metrology tools, please visit euvtech.com.

About EUV Tech
EUV Tech enables technology advancement in the frontiers of semiconductor manufacturing and material science through the development of world-leading EUV and soft-x-ray instrumentation and techniques.

For further information, contact:
EUV Tech, Inc.
[email protected]
+1 (925) 229-4388