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San Diego, CA[Date] ElevATE Semiconductor, a leading provider of advanced pin electronics (PE) and device power supply (DPS/PMU/VI) IC solutions for the semiconductor test market, proudly announces the appointment of Heather Kirkby as Chairwoman of its Board of Directors.  

Heather Kirkby, who has served on ElevATE’s board since 2024, brings more than 25 years of leadership experience across technology, life sciences, and semiconductor industries. Most recently, she was the Chief People Officer at Recursion Pharmaceuticals, where she helped scale the company through IPO and global growth. Prior to Recursion, Ms. Kirkby spent over 15 years at Intuit, where she held senior leadership roles in product management, marketing, and talent development, driving innovation and organizational transformation. She has also held leadership positions at Siebel (acquired by Oracle) and Schlumberger in her early career. 

Ms. Kirkby’s leadership has earned industry recognition, including Intuit’s CEO Leadership Award in 2017 and being named a finalist for the Women Tech Council Leadership Award in 2020. She also earned her MBA from Harvard Business School.   

“I am honored to step into the role of Chairwoman at ElevATE,” said Heather Kirkby. “Having served on the Board over the past year, I’ve seen firsthand the company’s commitment to innovation and excellence in the semiconductor test market. I look forward to working with the leadership team to continue building on this momentum and driving ElevATE’s long-term growth.” 

Ms. Kirkby succeeds Chris Puscasiu, Managing Partner of Presidio Investors, who helped guide ElevATE through a period of rapid growth and innovation.  

“It has been a privilege to serve as Chairman of ElevATE since 2018," said Chris Puscasiu. "After guiding the company’s growth for the past six years, I am ready to give the reins to Heather. She has already made a meaningful impact on the Board, and I am confident her leadership will further strengthen ElevATE’s position in the semiconductor test market.” 

Since its founding in 2012, ElevATE Semiconductor has established itself as a leader in innovation in the Test and ATE markets. The appointment of Heather Kirkby as the new Chairwoman marks a crucial step in the company’s evolution, reflecting its dedication to scaling its impact and shaping the future of semiconductor testing. 

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A digital twin is a computer representation of the structure, context, and behavior of physical systems, which are critical components in the optimization of computational systems, accurately representing physical systems and processes. A Digital Twin can be used to reduce or eliminate iterative physical experiments needed for optimization, thereby enhancing yield, saving time, and resources. Semiconductor manufacturing involves numerous complex steps, where accurate control of each step is crucial to achieving the overall manufacturing yield and minimizing variations in device characteristics. The complexity of the manufacturing processes' flows limits flexibility for testing novel approaches. Unit processes can be based on first-principal models (physics-based), data-based models, or hybrid models combining both approaches when possible. Fabrication processes in the cleanroom and on printed electronics tools are often a function of time-varying parameters, including those of the equipment, environment, and materials. The parameters often have co-dependencies across different process steps and tool sets. 

This course will cover the necessary material to create DNN-based Digital twins for nanofabrication processes in cleanrooms. The course will include experimental details for data preparation, data processing, training models, and use case demonstrations. Nanofabrication process equipment can inherently have millions of internal variables and can learn from datasets, providing a robust and complementary approach to traditional feedback control and process stabilization methods. The included Digital Twin modes are developed using images (CD-SEMs, optical images), time history data (Optical Emission Spectroscopy), and textual process information (recipes and materials). The course will include: (1) Approaches to preprocess image data and create learning-based models, (2) using DNN-based domain translation for learning to predict the DUV nanolithography and ICP Plasma Etch, (3) virtual metrology methods for quantification of learning outcomes, and (4) developing a new class of process-aware DNN-based digital twins. 

ABOUT THE SPEAKERS

Benyamin Davaji, PhD
Benyamin Davaji is an Assistant Professor in the Electrical and Computer Engineering Department at Northeastern University. His research focuses on integrated microsystems with an emphasis on sensing and computation using mechanical waves, acoustic/ultrasound transducers, bio-interfaces, and microcalorimetry. He also applies data-guided methods to nanofabrication process development and semiconductor manufacturing. Dr. Davaji earned his PhD in Electrical and Computer Engineering from Marquette University in 2016 and later served as a post-doctoral associate at Cornell University’s School of Electrical and Computer Engineering.

Peter Doerschuk, PhD

Peter Doerschuk, Professor at Cornell University since 2006, previously served on the Purdue faculty in Electrical and Computer Engineering and Biomedical Engineering. He earned B.S., M.S., and Ph.D. degrees in Electrical Engineering from MIT, an M.D. from Harvard Medical School, and completed training at Brigham and Women’s Hospital and a postdoc at MIT. His research applies computational nonlinear stochastic systems to biology and medicine, spanning viral 3-D structure determination using electron microscopy and x-ray scattering, to nonlinear models of ethanol pharmacokinetics that enable sensor processing, pattern recognition, and individualized physiological analysis.

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Ben Davaji, PhD
Assistant Professor
Northeastern University
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Peter Doerschuk, PhD
Professor
Cornell Engineering
Gity Samadi
Moderator
Gity Samadi, PhD
Sr. Director, R&D Programs
SEMI
NBMC Smart MedTech FlexTech

Join us for this engaging Master Class with Benyamin Davaji, PhD, Assistant Professor of Electrical and Computer Engineering at Northeastern University and Peter Doerschuk, Professor of Electrical and Computer Engineering and Biomedical Engineering at Cornell University, as they explore the role of digital twin models in advancing semiconductor manufacturing. The masterclass will highlight how data-guided methods and computational modeling are transforming unit process development, driving efficiency and innovation across the semiconductor industry. With expertise spanning microsystems, acoustic transducers, and nanofabrication, the speakers will provide insights into how digital twins can bridge research and production to accelerate breakthroughs in semiconductor technology.

10:00 am - 12:00 pm Off Add to Calendar 2025-11-05 10:00:00 2025-11-05 12:00:00 FEMC#27 Digital Twin Models for Semiconductor Manufacturing Unit Process Join us for this engaging Master Class with Benyamin Davaji, PhD, Assistant Professor of Electrical and Computer Engineering at Northeastern University and Peter Doerschuk, Professor of Electrical and Computer Engineering and Biomedical Engineering at Cornell University, as they explore the role of digital twin models in advancing semiconductor manufacturing. The masterclass will highlight how data-guided methods and computational modeling are transforming unit process development, driving efficiency and innovation across the semiconductor industry. With expertise spanning microsystems, acoustic transducers, and nanofabrication, the speakers will provide insights into how digital twins can bridge research and production to accelerate breakthroughs in semiconductor technology. United States SEMI.org [email protected] America/Los_Angeles public America/Los_Angeles Watch On-Demand
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Lam Research Introduces VECTOR® TEOS 3D to Address Critical Advanced Packaging Challenges in Chipmaking 

Inter-Die Gapfill Tool Expands Industry-Leading Portfolio of Solutions for 3D Integration and Chiplet Technologies; Paves Way for New, AI-Accelerating Architectures 

FREMONT, Calif., Sept. 9, 2025 -- Lam Research Corp. (Nasdaq: LRCX) today unveiled VECTOR® TEOS 3D, a breakthrough deposition tool engineered specifically for the advanced packaging of next-generation chips required for artificial intelligence (AI) and high-performance computing (HPC) applications. TEOS 3D is purpose-built to solve critical challenges in 3D stacking and high-density heterogeneous integration. It provides ultra-thick, uniform, inter-die gapfill, leveraging a proprietary bowed wafer handling approach, innovations in dielectric deposition, and enhanced monitoring by Lam Equipment Intelligence® technology. TEOS 3D is installed at leading logic and memory fabs around the world. 

"VECTOR TEOS 3D deposits the industry's thickest, void-free, inter-die gapfill films, customized to meet the challenging requirements of advanced die stacking integration schemes, even on ultra-stressed, high-bow wafers," said Sesha Varadarajan, senior vice president of the Global Products Group at Lam Research. "It's another powerful addition to our best-in-class advanced packaging portfolio, which delivers the differentiated, atomic-level innovations chipmakers need to scale beyond Moore's Law and into the AI era."

Addresses Manufacturing Pain Points

The explosive growth of AI is driving the need for new devices that can support increasingly data-intensive workloads. Chipmakers are turning to 3D advanced packaging to integrate multiple dies into chiplet architectures to enable AI compute. By bringing memory and processing closer together to optimize electrical pathways, chiplet designs can improve processing speed, and pack more power into smaller form factors. However, as chiplets scale taller and become more complex, they present a range of new manufacturing hurdles, from stress during processing that can distort or bow a wafer's shape, to cracks and voids in films that cause defects and lower yield. 

TEOS 3D conquers a range of critical advanced packaging production challenges, excelling at handling bulky, high-bow wafers precisely and reliably. With nanoscale precision, it deposits specialized dielectric films of up to 60 microns thick between dies, with scalability to deposit films greater than 100 microns. The films provide essential structural, thermal and mechanical support to prevent common packaging failures such as delamination. TEOS 3D also features Lam's novel clamping technology and an optimal pedestal design that provides exceptional stability when processing thick wafers, enabling uniform film deposition even when dealing with extreme wafer bow. 

Other highlights include: 

  • The first solution for single-pass processing of crack-free films more than 30 microns thick, significantly enhancing yield and process time.
  • Unique quad station module (QSM) architecture to boost productivity: Lam's proven QSM architecture features four distinct stations to enable parallel processing and reduce bottlenecks. The modular design helps deliver nearly 70%1 faster throughput and up to 20% improvement in cost of ownership compared to Lam's previous generation of gapfill solutions.
  • Lam Equipment Intelligence® technology for process repeatability: Built into TEOS 3D, Equipment Intelligence solutions boost equipment performance and reliability, and drive yield improvement by using smart technology to monitor processes, fix issues faster, and automate routine tasks.
  • Enhanced energy efficiency: Integrated high-efficiency RF generators and ECO Mode peripheral control reduce energy consumption while improving process precision. 

Joins an Industry-Leading Suite of Advanced Packaging Solutions 

Leveraging the company's 15 years of leadership in advanced packaging and decades of expertise in dielectric films, TEOS 3D builds on Lam's existing VECTOR® Core and TEOS product families, representing continuous innovation in materials and processes for integrated packaging. It is part of a comprehensive product portfolio of industry-leading solutions that addresses critical challenges and drives innovation and productivity across the advanced packaging workflow. 

Media Resources 

About Lam Research 

Lam Research Corporation is a global supplier of innovative wafer fabrication equipment and services to the semiconductor industry. Lam's equipment and services allow customers to build smaller and better performing devices. In fact, today, nearly every advanced chip is built with Lam technology. We combine superior systems engineering, technology leadership, and a strong values-based culture, with an unwavering commitment to our customers. Lam Research (Nasdaq: LRCX) is a FORTUNE 500® company headquartered in Fremont, Calif., with operations around the globe. Learn more at www.lamresearch.com

1 – Based on internal testing; 68%. 

Caution Regarding Forward-Looking Statements 

Statements made in this press release that are not of historical fact are forward-looking statements and are subject to the safe harbor provisions of the Private Securities Litigation Reform Act of 1995. Such forward-looking statements relate to, but are not limited to: industry trends, demands, expectations and requirements; the requirements of our customers; and the capabilities and performance of our products. Some factors that may affect these forward-looking statements include: business, economic, political and/or regulatory conditions in the consumer electronics industry, the semiconductor industry and the overall economy may deteriorate or change; the actions of our customers and competitors may be inconsistent with our expectations; trade regulations, export controls, tariffs, trade disputes, and other geopolitical tensions may inhibit our ability to sell our products; supply chain cost increases, tariffs and other inflationary pressures have impacted and may continue to impact our profitability; supply chain disruptions or manufacturing capacity constraints may limit our ability to manufacture and sell our products; and natural and human-caused disasters, disease outbreaks, war, terrorism, political or governmental unrest or instability, or other events beyond our control may impact our operations and revenue in affected areas; as well as the other risks and uncertainties that are described in the documents filed or furnished by us with the Securities and Exchange Commission, including specifically the Risk Factors described in our annual report on Form 10-K for the fiscal year ended June 29, 2025. These uncertainties and changes could materially affect the forward-looking statements and cause actual results to vary from expectations in a material way. The Company undertakes no obligation to update the information or statements made in this press release. 

Company Contacts: 

Allison L. Parker 

Media Relations 

(510) 572-9324 

[email protected] 

Ram Ganesh 

Investor Relations 

(510) 572-1615 

[email protected] 

Source: Lam Research Corporation, (Nasdaq: LRCX)

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Cancellations received on or before April 26, 2026 will be refunded, less a $30 cancellation fee.

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Program Manager, Programs & Committees, SEMI
[email protected]

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The Surface Preparation and Cleaning Conference (SPCC) is a premier technical forum dedicated to advancing surface preparation, cleaning technologies, and wet processes essential to semiconductor manufacturing. Formerly presented by Linx Consulting, SPCC continues its legacy of delivering high-quality technical content through invited presentations, peer-reviewed sessions, and poster presentations covering all aspects of cleaning science, process integration, materials, equipment, and metrology.

SPCC will feature invited business-focused presentations that examine macroeconomic, market, and structural trends shaping the global semiconductor industry that were formerly included in the Business Interface Conference (BIC). These sessions will provide attendees with valuable context on industry dynamics, supply chain, and strategic outlooks that complement the technical discussions at SPCC.

Now a unified conference, SPCC unites both business and technical aspects of industry into a comprehensive program that bridges technology development and business strategy, offering attendees enhanced opportunities for cross-disciplinary learning, collaboration, and networking with industry leaders, researchers, and decision-makers across the semiconductor ecosystem.

Join our premier technical forum with topics including—                                                                                                          

  • Cleaning Science
  • Equipment
  • Industry Dynamics
  • Materials
  • Metrology
  • Process Integration
  • Strategic Outlook
  • Supply Chain

Wild Horse Pass
5040 Wild Horse Pass Blvd
Chandler, AZ , AZ 85226
United States

MONDAY, MAY 18, 2026

Session 1

8:00 am - 9:00 am

Breakfast

9:00 am - 9:20 am
Mark Thirsk
Mark Thirsk
Managing Partner
Linx Consulting
Dave Maloney
David Maloney
SPCC Technical Committee Chair
Linx Consulting

Opening Remarks

9:20 am - 9:50 am
Joe Stockunas, SEMI Americas
Joe Stockunas
President
SEMI Americas

KEYNOTE—Semiconductor Industry Update

9:50 am - 10:10 am
Alma Vela Ramirez_IBM
Alma Vela Ramirez
Unit Process Engineer
IBM

Dummy Gate Poly Wet Etch Studies in GAA Nanosheet Flow

10:10 am - 10:30 am
Adara Yang
Shihui (Adara) Yang
Member of Technical Specialist
Micron

Enabling Novel Innovation in Containers Profile Sculpting for Cell Structure Improvement

10:30 am - 11:00 am

Networking Break

11:00 am - 11:20 am
Gary Van Schooneveld
Gary Van Schooneveld
President
CT Associates

Particle Precursors and On-Wafer Defectivity: IRDS Collaborative Research Progress and Future Directions

11:20 am - 11:40 am
Tomoki Nara
Tomoki Nara
Research Scientist
Mitsubishi Chemical Corporation

Si/SiGe Selective Wet Etchant for BSPDN Application: Maximization of Selectivity in Single Wafer Spin Wet Processing

11:40 am - 12:00 pm
Deepak Kumar
Deepak Kumar
Technical Program Director
ACM Research

Optimization of Particle and Atmosphere Control in the SPM Process via Nozzle Cover

12:00 pm - 12:20 pm
Daiki Morimoto
Daiki Morimoto
Process Engineer
TEL

New Surface Preparation System; Batch-Single Hybrid Equipment

12:20 pm - 1:50 pm

Lunch

Session 2

1:50 pm - 2:20 pm
Duncan Meldrum, Hilltop Economics
Duncan Meldrum
Chief Economist
Hilltop Economics

Market Outlook

2:20 pm - 2:40 pm
Hsin-Yu Hsu
Hsin-Yu Hsu
R&D Engineer
Interuniversity Microelectronics Centre (IMEC)

Wet Cleaning Approaches to Remove Post-Etching AlOx Residues in Al/AlOx/Al Stacks

2:40 pm - 3:00 pm
Chun-Ren (Jack) Ke
Chun-Ren (Jack) Ke
R&D Manager
Qnity Electronics

Silicon-Germanium Etchants with Excellent Silicon and Silicon Oxide Compatibility for Advanced Semiconductor Devices

3:00 pm - 3:30 pm

Networking Break

3:30 pm - 3:50 pm
Nawaphorn Kuhakongkiat
Nawaphorn Kuhakongkiat
Researcher
Hiroshima University

Crystallographic Orientation-Dependent on Native Oxide Evolution for Advanced CMOS Surface Control

3:50 pm - 4:10 pm
Soonmin Lee
Soonmin Lee
Master's Student
Hanyang University

An Innovative Low-Azole Metal Hard Mask Etchant with an Environmentally Sustainable Cu/Co Integration Scheme

4:10 pm - 4:30 pm
Wei-Shang Lo
Wei-Shang Lo
Advisory Scientist
IBM Research

Impact of Wet Bevel Etching on WDC Films and Advanced Interconnect Structures

4:30 pm - 4:50 pm
Ryotaro Maeda
Ryotaro Maeda
Engineer
Tokyo Electron Kyushu

Approaches to Further Enhance Cut Accuracy

4:50 pm - 5:10 pm
Hiroki Uoyama
Hiroki Uoyama
Manager
Micron Memory Japan, K.K

Advancements in Wafer Backside cleaning for DRAM Manufacturing

TUESDAY, MAY 19, 2026

Session 3

8:00 am - 9:00 am

Breakfast

9:00 am - 9:10 am
Dave Maloney
David Maloney
SPCC Technical Committee Chair
Linx Consulting

Day 2 Opening Remarks

9:10 am - 9:50 am
Inna Skvortsova
Inna Skvortsova
Market Research Manager
SEMI

Day 2 Keynote—Navigating the AI-driven Cycle: Fab Investments and Materials Dynamics in a Fragmented World

9:50 am - 10:10 am
Srini Raghavan, ProSys Headshot
Srini Raghavan
Director of New Process Development
ProSys

Megasonic Removal of Flux Entrained in Narrow Gaps in Packaging Structures

10:10 am - 10:30 am
Amir Taghavi
Amir Taghavi
Research Scientist
TEL

Molecular Dynamics Simulation of Megasonic Cavitation in Ammonia Peroxide Solution and its Impact on Silicon Surface

10:30 am - 11:00 am

Networking Break

11:00 am - 11:20 am
Tyler Duncan
Tyler Duncan
Research Scientist
TEL

Ab Initio Study of Confined HF Etching Mechanism on SiO2

11:20 am - 11:40 pm
Shih Chih lin
Shih-Chih Lin
PhD Candidate
University of Washington

WSDL: AI-Enabled Wafer Surface Defect Localization for Cleaning Process Optimization

11:40 am - 12:00 pm
Moeka Ajiki
Moeka Ajiki
Engineer
Fujimi

Challenges and Solution of Post Ceria CMP Clean

12:00 pm - 1:30 pm

Lunch

Session 4

1:30 pm - 2:00 pm
JC Yang
Ji Chul Yang, Ph.D.
Chief of Technology Executive
EBARA Precision Machinery

Advanced Topography Correction Planarization Technology for Yield Enhancement

2:00 pm - 2:20 pm
Gyeongwon Lee
Gyeongwon Lee
Graduate Student
Hanyang University

Controlling the Molybdenum Dissolution and Oxidation During Post-CMP Cleaning

2:20 pm - 2:40 pm
Mona Moukrati
Mona Moukrati
PhD Student
STMicroelectronics

Controlled Cracking-Induced Delamination for Polymer-Based Cleaning

2:40 pm - 3:00 pm
Shogo Onishi
Shogo Onishi
RD Technical Manager
Fujimi

Design of the Buffing Cleaning Solution for Chemical Mechanical Cleaning on Advanced Technology Node

3:00 pm - 3:30 pm

Networking Break

3:30 pm - 3:50 pm
Suhas Ketkar
Suhas Ketkar
Marketing Leader
Elemental Scientific

Impact of Supply Chain Conditions on IPA Product Quality

3:50 pm - 4:10 pm
Dana Shoken
Dr. Dana Shoken
R&D Manager
CI-SEMI

Trace Water Measurement in Organic Solvent Systems for Semiconductor Manufacturing

4:10 pm - 4:30 pm
Allen Chan
Allen Chan, PhD
R&D Scientist, Balazs™ NanoAnalysis
Air Liquide

Thermal Vacuum Analysis and Identification of Contaminant Outgassing from Polymer Seals

4:30 pm - 4:50 pm
Sina Kaabipour
Sina Kaabipour
Postdoctoral Researcher
imec-USA

Verifying PFAS Abatement in Fab-Relevant Waste Matrices Using Complementary Analytical Characterization Techniques

4:50 pm - 5:10 pm
Padraic O'Reilly
Padraic O'Reilly
Applications Scientist
Molecular Vista

IR-PiFM: Molecular Detection and Identification of Nanoscale Surface Contamination

6:30 pm - 8:00 pm

Networking & Poster Session Reception

WEDNESDAY, MAY 20, 2026

Session 5

8:00 am - 9:00 am

Breakfast

9:00 am - 9:10 am
Dave Maloney
David Maloney
SPCC Technical Committee Chair
Linx Consulting

Day 3 Opening Remarks

9:10 am - 9:40 am
Ian Brown
Ian J. Brown, Ph.D.
President
SCREEN Advanced Technology Center of America

Wet Etching and Cleaning Trends: Scaling x 3D Integration

9:40 am - 10:00 am
Ashutosh Bhabhe
Ashutosh Bhabhe
CEO
14Si Solutions

Characterization of Particle Filtration Solutions in a Weak Acid

Siddarth Sampath
Siddarth Sampath
Director, Global WEC Filtration Applications
Entegris
10:00 am - 10:30 am

Networking Break

10:30 am - 11:00 am
Steven Kraft Entegris
Steven Kraft, Ph. D., PMP
Director of SG&E R&D Materials Solutions
Entegris

Wet-Etch Solutions Development for Advanced Node Devices

11:00 am - 11:20 am
Arim Woo
Arim Woo
Master's Student
Hanyang University

Improved Cu Recess Control via Surfactant-Modulated Electrochemical Kinetics in Post-CMP Cleaning

11:20 am - 11:40 am
Sangita Kumari
Sangita Kumari
Principal Process Engineer
TEL Technology Center, America

Wet Cleaning of Sulfur Residues Post RIE for Advanced BEOL Integration

11:40 am - 12:00 pm
Hui Zhou
Hui Zhou
Principal Scientist
Huntsman USA

Selective Surface Modification Using Amine Chemistry for Enhanced Semiconductor Cleaning Performance

12:00 pm - 1:30 pm

Lunch

Session 6

1:30 pm - 2:10 pm
Rebecca Routson
Rebecca Routson
Principal Director for CHIPS Test & Metrology
NIST

Day 3 Keynote—Measuring the Future: CHIPS Metrology Program Updates

2:10 pm - 2:30 pm
Diane Bijou
Diane Bijou
Researcher in Chemistry
Technic France

High Loading Capacity Solvent Blend for a Safe and Efficient Alternative to NMP and Amine-Based Strippers

2:30 pm - 2:50 pm
Jim De Boer
Jim De Boer
Director, US Product and Operations
Trymax NexGen

TTV Optimization in Wet Chemical Thinning Using Integrated Metrology

2:50 pm - 3:20 pm

Networking Break

3:20 pm - 3:40 pm
Koji Nakata
Koji Nakata
Senior Researcher
Kurita Industries

Improvement of Hybrid Bonding By Controlling Surface with Copper Pads Using Functional Water

3:40 pm - 4:00 pm
Chihiro Kobata
Chihiro Kobata
Engineer
JSR

Eco-Conscious, High Etch Rate, and Metal/Non-Metal Compatibility Stripper for Advanced Packaging Photo Resist and SOG

4:00 pm - 4:10 pm
Dave Maloney
David Maloney
SPCC Technical Committee Chair
Linx Consulting

Closing Remarks

-

Surface Preparation and Cleaning Conference (SPCC), formerly presented by Linx Consulting, brings together key business insights, IC manufacturers, equipment makers, materials and chemical providers, metrology experts, process technologists to address critical challenges, and innovations in surface preparation and cleaning.

Held at the Wild Horse Pass Resort in Chandler, Arizona, SPCC 2026 will feature technical sessions, poster presentations, and business-focused programming, creating a unique forum where technology and industry strategy converge.

Off Add to Calendar 2026-05-18 00:00:00 2026-05-20 00:00:00 SPCC 2026—Surface Preparation & Cleaning Conference Surface Preparation and Cleaning Conference (SPCC), formerly presented by Linx Consulting, brings together key business insights, IC manufacturers, equipment makers, materials and chemical providers, metrology experts, process technologists to address critical challenges, and innovations in surface preparation and cleaning.Held at the Wild Horse Pass Resort in Chandler, Arizona, SPCC 2026 will feature technical sessions, poster presentations, and business-focused programming, creating a unique forum where technology and industry strategy converge. Wild Horse Pass 5040 Wild Horse Pass Blvd Chandler, AZ , AZ 85226 United States SEMI.org [email protected] America/Phoenix public America/Phoenix
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Join us for an insightful webinar as we present the findings from the 2025 Semiconductor Supply Chain Survey, a collaborative effort between the SEMI Supply Chain Management initiative and McKinsey & Company.

The annual survey aims to establish benchmarks for operational agility metrics, covering the entire value chain from material suppliers to OEMs, offering a comprehensive view of the landscape. New this year are additional insights on trends in LTAs and organizational supply chain management capabilities

During this webinar, we will share results from the survey uncovering key trends, challenges, and opportunities within the semiconductor supply chain. By attending, you'll gain valuable insights to benchmark your organization against peers, identify areas for improvement, and course-correct more effectively. Please contact us if you like to learn about how your company can participate in the SCM initiative.

United States

SCM

Join us for a webinar highlighting the 2025 Semiconductor Supply Chain Survey results, conducted by SEMI SCM initiative and McKinsey & Company. Gain fresh insights into operational agility, LTAs, and SCM capabilities across the value chain. Discover key trends, challenges, and opportunities to benchmark your organization and strengthen supply chain resilience.

Choose your session:

9:00 am - 10:00 am Off Add to Calendar 2025-09-23 09:00:00 2025-09-23 10:00:00 2025 Semiconductor Supply Chain survey: Insights for strategy and capabilities Join us for a webinar highlighting the 2025 Semiconductor Supply Chain Survey results, conducted by SEMI SCM initiative and McKinsey & Company. Gain fresh insights into operational agility, LTAs, and SCM capabilities across the value chain. Discover key trends, challenges, and opportunities to benchmark your organization and strengthen supply chain resilience.Choose your session:US/EU: 9:00 AM – 10:00 AM PT [ Register Now ]Asia/US: 5:00 PM – 6:00 PM PT [ Register Now ] United States SEMI.org [email protected] America/Los_Angeles public America/Los_Angeles

Speakers

 

Henry Marcil

Partner

McKinsey & Company

Bio: Leader in McKinsey’s Advanced Industries Practice, focused on semiconductors n and key end markets (e.g., high tech)

Leads McKinsey’s Resiliency and Geopolitics service line in Semiconductor

 

Kushal Jolapara

Engagement Manager

McKinsey & Company

Bio: Manager in McKinsey's Operations practice, with a focus on product development and procurement service lines

Leads Supply Chain studies for Advanced Industries clients including Aerospace, Auto and Semiconductors

Dan Peacock

Engagement Manager

McKinsey & Company

Bio: Manager in McKinsey’s Operations Practice, focused on procurement and capital projects

Leads Operations projects at Foundries, IDMs, and equipment clients

 

Event Contact:

Krish Dharma

[email protected]

Agenda

•    Lead times throughout the semiconductor value chain
•    Landscape and trends in purchasing agreements and LTAs
•    Demand forecasts, backlogs, and end markets
•    Market outlook, opportunities, and threats
•    New for 2025: Organizational capabilities in supply chain management

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Registration for the Global Executive Summit is closed.  Please contact Heidi Hoffman at [email protected] with any questions.  

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SEMI Japan has included the Okura Hotel and 3 other hotels convenient to the Okura in the Hotel Block for SEMICON Japan - taking place December 17-19 at Tokyo Big Sight.  View the hotels and rates HERE.

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Building on the foundational work of the SEMI Sustainability Climate Consortium and the 2025 Global Climate Summit Workshops (GCSW), this closed-door summit is designed to shift our industry from alignment to action. We are convening a select group of key Executive decision makers & senior leaders from fabs, fabless companies, hyperscalers, and key suppliers and energy partners to: 

  • Showcase and accelerate progress on priority climate initiatives: Abatement, Gas Substitution, Green Materials, and Energy
  • Define clear deliverables and next-phase commitments that unlock scale and momentum
  • Strengthen executive collaboration to remove barriers, share ownership, and drive measurable results

This Summit is not about what we could do — it’s about what we will do, and who will lead.

Click here for the Executive Briefing outlining the event objectives, and the action pathways and methods of engagement for all attendees.  Plan ahead on how presence can shape outcomes that accelerate our industry's decarbonization.

Okura Hotel
Tokyo
Japan

Monday, December 15, 2025

9:00 am - 9:20 am

Coffee & Registration

9:25 am - 9:30 am
 Masahiko (Jim) Hamajima - President, SEMI Japan
Jim Hamajima
President
SEMI Japan

9:30 am - 9:45 am
Ajit Manocha, SEMI
Ajit Manocha
CEO & President
SEMI
Carolin Seward, Google
Carolin Seward
VP of Custom Silicon Sourcing and Operations
Google

GES Opening

9:45 am - 10:25 am
Carolin Seward, Google
Moderator
Carolin Seward
Google
Jinman Han
Jinman Han
President
Samsung Foundry
Jens Liebermann
Jens Liebermann
Senior VP of Global Business
BASF
Sundeep Bajikar
Sundeep Bajikar
Corp. VP Head of Corp Strategy
Applied Materials
Sam Naffziger
Sam Naffziger
SVP & Fellow of Product Technology Architecture
AMD

Fireside Chat: Bending the Curve of Emissions Through Industry Collaboration

Join senior executives from Apple, Samsung Foundry, BASF and Applied Materials, for a discussion on the partnerships required to meaningfully bend the curve towards decarbonization. In an industry already operating under tremendous constraints, what are the lower hanging fruits that are ripe for intentional, precompetitive collaboration? And what can be solved independently?

10:25 am - 10:40 am
Sam Naffziger
Sam Naffziger
SVP & Fellow of Product Technology Architecture
AMD

Spotlight: AMD on the role of Silicon Design for Energy Efficiency

Discover how fabless leaders are driving decarbonization through innovations in energy-efficient product architecture and the critical role of silicon design in minimizing "Use Phase" emissions, the largest contributor to a chip's carbon footprint.

10:40 am - 11:10 am
Anne Meegan
Moderator
Anna Meegan
Director of Sustainability
Google Platforms & Devices
Angela Baker
Angela Baker
VP Sustainability
Qualcomm
Dharmesh Jani
Dharmesh Jani
Director, AI Infra Ecosystem & Partnerships
Meta
Cooper Elsworth
Cooper Elsworth
Sr. TPM, Advanced Energy Labs
Google

End-User Panel: The Decarbonization Imperative

Hear from technology leaders at AMD, Qualcomm, Meta, and Google on why accelerated decarbonization is a business imperative. This panel explores how end-users are (1) acting with a sense of urgency, (2) engaging and enabling their supply chains, (3) driving energy efficient design to drive innovation to accelerate collective progress.

11:10 am - 11:25 am

Break

11:25 am - 11:30 am
Bruce Gall Google
Bruce Gall
Strategic Partnerships
Google

Overview of Priority Initiatives

Priority Initiative: Fab Upstream Materials

11:30 am - 11:40 am
Saifi Usmani, EMD Electronics
Saifi Usmani
VP Global Sustainability
SEMI

Opening Remarks

From Fragmentation to Focus: Outlining a strategy to activate the fab supply chain with a unified customer voice and collaborative support.

11:40 am - 12:10 pm
Bessima
Bessma Aljarbou
Head of Strategy of Environment & Supply Chain Innovation
Apple, Inc.

Keynote: Apple's Supply Chain Engagement

Hear from Apple senior leadership on supply chain engagement and decarbonization, using commercial levers and the power of support and collaboration.

12:10 pm - 12:40 pm
Handy Ko TSMC
Handy Ko
Director, Materials Management
TSMC

From Ambition to Action: A Fab's Role in Upstream Decarbonization

Hear about TSMC's upstream scope 3 (supply chain) decarbonization leadership and recognition of the business imperative, which have been embedded into their core supplier engagement program.

12:40 pm - 12:55 pm
Andrea Jorissen
Andrea Jorissen
Supplier Carbon Solutions
Apple, Inc.

Solutions Enablement & Calls-to-Action

Highlighting clean energy advanced procurement academies and demand aggregation case studies. Announce renewed ambitions and goals for fab upstream scope 3 decarbonization.

12:55 pm - 1:55 pm

Networking & Lunch

Priority Initiative: Clean Electricity

1:55 pm - 2:05 pm
Rebecca Green
Rebecca Green
Partner
ERM
Ken Haig
Ken Haig
Senior Director Government Affairs
Microsoft

Opening Remarks

Setting the stage for collective action on clean electricity in Asia.

2:05 pm - 2:30 pm
Patrick Tan
Patrick Tan
Head of Wider Asia, APAC
Aurora Energy Research

From Visibility to Viability: Developer Insights on Building a Net Zero Future

Hear a market outlook on Clean Electricity in Korea, Japan, and Taiwan, examining current barriers to renewable expansion and the major opportunities driving investment and clean energy growth through 2030.

2:30 pm - 2:55 pm
William Hudson
Will Hudson
Director, Energy & Sustainability Policy
Microsoft

Keynote: Clean Electricity Policy Action & Urgency

Accelerating Clean Electricity expansion requires clear, coordinated policy action. By uniting around shared advocacy priorities, industry and government can remove barriers, unlock renewable supply, and strengthen cost competitiveness across Korea, Japan, and Taiwan.

2:55 pm - 3:25 pm
YS Kim SK HYNIX
Yong Sung Kim
Head of Clean Energy
SK Hynix

Deep Dive: A Clean Semiconductor Partnership in Korea

Explore the proposed Clean Semiconductor Partnership (CSP), SEMI’s flagship initiative to accelerate Clean Electricity development in Korea by aligning industry, government, and utilities on policy reform and procurement innovation, creating a model for collaborative clean energy expansion across Asia.

3:25 pm - 3:40 pm
William Hudson
Will Hudson
Director, Energy & Sustainability Policy, Asia Pacific
Microsoft

Calls to Action

From discussion to action, secure collective advocacy priorities, resource commitments, and endorsement of the Clean Semiconductor Partnership as the pilot for accelerating Clean Electricity expansion across the region.

3:40 pm - 4:10 pm

Break

4:10 pm - 4:50 pm
Rebecca Green
Moderator
Rebecca Green
ERM
Josh Seidenfeld
Josh Seidenfeld
Supply Chain Clean Energy Lead
Google
Chikako Matsumoto
Chikako Matsumoto
Director, Managing Executive Officer
Sumitomo Mitsui Trust Group
Rei Ushikubo
Rei Ushikubo
Director and Head of the Carbon-Free Solutions Division
Shizen Energy
Daisuke Tsujimoto
Daisuke Tsujimoto
Executive Officer, CSO
Renova Inc.

Day 1 Closing Panel: Accelerating Affordability: Scaling Clean Energy Through Collaboration.

How banks, fabs, and retailers can work together to lower renewable energy prices and spread risk, while examining how AI and digital innovation can accelerate price reductions across the supply chain, grid integration, and project development.

4:50 pm - 5:00 pm
Saifi Usmani, EMD Electronics
Saifi Usmani
Vice President, Sustainability
SEMI

Day 1 Closing Remarks and Look Ahead

Reflect on the day's takeaways and action items.

5:00 pm - 6:00 pm

Member-to-Member Meetings / Break

6:00 pm - 6:30 pm

Networking Reception

Join us for Networking in the Orchard Foyer

6:30 pm - 8:30 pm
Alison Drury
Alison Drury
Global Technology Industry Lead
ERM

Dinner with Fireside Chat: “2030 in Focus: Choices That Will Define a Decade”

A forward-looking conversation on how the semiconductor industry can navigate the convergence of climate action, geopolitics, and AI to define its leadership in 2030.

Tuesday, December 16, 2025

8:30 am - 9:15 am

Coffee & Networking

9:15 am - 10:00 am
Saifi Usmani, EMD Electronics
Saifi Usmani
VP Global Sustainability
SEMI

Day 2 Opening

Opening remarks will summarize Day 1 and preview Day 2.

9:30 am - 10:00 am
Lora Ho
Lora Ho
SVP Strategy & ESG
TSMC

TSMC Keynote

Hear from industry leader TSMC on their strategy for decarbonizing advanced semiconductor manufacturing and how it connects to the four GES Priority Initiatives including a new, collaborative path to scale low-GWP gas substitutions from R&D to high-volume manufacturing.

10:00 am - 10:15 am

Break

Priority Initiative: Gas Substitution

10:15 am - 10:25 am
Bruce Gall Google
Bruce Gall
Strategic Partnerships
Google

Opening Remarks

Current efforts to pursue low Global Warming Potential (GWP) gas substitutions in etch and chamber clean applications remain fragmented, resulting in high material costs for HVM application. While promising gas substitutions exist, the traditional paths of small scale or single customer adoption are typically too expensive due to cost scaling limitations. So how do we enable low GWP gas substitutions that also meet cost (as well as performance) expectations? By coordinating a fab-led, industry wide approach to
1) Prioritize a single, low GWP target gas for replacement
2) Co-create and execute a phased experimental plan

10:25 am - 10:45 am
Vahid Vahedi, PhD
Vahid Vahedi
CTO
Lam Research

Equipment Perspective: Scaling Low-GWP Gas Substitution

Hear from a top equipment leader on the process innovations and industry collaboration required to scale low-GWP gas substitution from R&D to high-volume manufacturing

10:45 am - 11:05 am
Steven Scheer
Steve Scheer
SVP Compute System Scaling
imec

imec’s Gas Assessment Platform for Sustainability (GAPS) 

Learn about imec’s Gas Assessment Platform for Sustainability (GAPS) project and how it can be leveraged as an industry test bed for low GWP gas substitution

11:05 am - 11:35 am
Bruce Gall Google
Moderator
Bruce Gall
Google
Rachel Potter EMD
Rachel Potter
VP of Specialty Gas
EMD / Merck
Vahid Vahedi, PhD
Vahid Vahedi
CTO
Lam Research
Steven Scheer
Steve Scheer
SVP Compute System Scaling
imec

It Takes an Ecosystem: A Value Chain Panel on Accelerating Low-GWP Adoption

Hear perspectives from leaders in electronic design automation (EDA), materials, and equipment OEMs on the challenges and opportunities in driving industry adoption of low GWP gases

11:35 am - 11:45 am
Bruce Gall Google
Bruce Gall
Strategic Partnerships
Google

Calls to Action

From Commitment to Action: Outlining the roadmap and action plan for the Gas Substitution Initiative.

11:45 am - 12:45 pm

Networking Lunch

Priority Initiative: Abatement

12:45 pm - 1:10 pm
Beth Elroy
Elizabeth Elroy
VP Sustainability
Micron

Opening Remarks & Keynote

Industry-wide collaboration is critical to accelerate technology innovation and unlock scalable, cost-effective abatement solutions to ease abatement deployment challenges on cost, facilities, space, utilities and operational complexity. Micron will deliver a keynote sharing the abatement journey and the state of current efforts in emission measurement.

1:10 pm - 1:50 pm
Josh Robbins
Moderator
Josh Robbins
Google
Phil Kester
Phil Kester, PhD
Senior Chemical Engineer
Guild Associates
HK KIM KIMM
Dr. Hak-Joon Kim
Korea Institute of Machinery & Materials

F-GHG Catalyst Development & Funding Vehicles

Catalytic abatement remains an important technology, but further research and efforts are needed to identify new catalytic materials, scale performance, and improve their recyclability. Hear from a leading fab and a leading catalyst developer and learn about a promising funding opportunity lead by the Korean government.

1:50 pm - 2:20 pm
Yong Keong Goh
Moderator
Yong Keong Goh
Senior Manager
Micron
Martin Tollner
Martin Tollner
President, Semiconductor Division
Edwards
Morihara Kanken
Atsushi Morihara
Chief Technical Officer
Kanken
Rene Reichardt
Rene Reichardt
CEO
DAS EE
Jong Pil Yoon
Jong Pil Yoon
President
EcoEnergen

F-GHG and Nitrous Oxide Abatement Technology Panel

Abatement technologies are advancing rapidly, and new breakthroughs are on the horizon. Engage with leading abatement suppliers on their outlook on technology roadmaps, strategic priorities and collaborative opportunities.

2:20 pm - 2:30 pm
Kongyeong Goh
YongKeong Goh
Micron
Josh Robbins
Joshua Robbins
Google

Closing Remarks: Abatement

Call-to-actions for commitment to drive high efficiency and low-fuel abatement solutions to accelerate carbon footprint reduction and commercialization, and advance emission measurement technologies to simplify performance verification.

2:30 pm - 2:45 pm
Saifi Usmani, EMD Electronics
Saifi Usmani
VP Global Sustainability
SEMI

Calls to Action Summary & Closing

Hear the takeaways from the Summit and actions for moving forward in our decarbonization journey.

- Sustainability

Semiconductor value-chain executives will gather to align on key initiatives and calls to action, based on our shared decarbonization ambitions, insights and progress thus far.  Together, we will forge an actionable plan for global industry collaboration in three focus areas:  direct emissions, energy-related emissions, and reporting.  This invite-only event will be conducive to accelerating the decarbonization across the industry.

9:00 am - 5:00 pm Off Add to Calendar 2025-12-15 09:00:00 2025-12-16 17:00:00 Global Executive Summit Tokyo 2025 Semiconductor value-chain executives will gather to align on key initiatives and calls to action, based on our shared decarbonization ambitions, insights and progress thus far.  Together, we will forge an actionable plan for global industry collaboration in three focus areas:  direct emissions, energy-related emissions, and reporting.  This invite-only event will be conducive to accelerating the decarbonization across the industry. Okura Hotel Tokyo Japan SEMI.org [email protected] Asia/Tokyo public Asia/Tokyo
Event format
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This event is over. Contact Laura Nguyen for additional information.

To access the recording, when available it will be posted here: https://www.semi.org/en/products-services/standards/step

United States standards watch banner image dec 2019 upw Business Technical

Overview

The IRDS Roadmap has identified near-term challenges related to measurements of particles, trace metals and organics in liquid chemicals at levels required to meet the needs of the industry.  The identified challenges are measurement of 10 nm and smaller particles, sub ppt measurement of metallic impurities, measurement of particle precursors and trace organics and online speciation of trace organics.  The focus of the workshop will be on recent advances in analytical methodology and instrumentation that will enable the industry to meet these challenges. 

In-Person—Mountain Time
Phoenix Convention Center
North Building, 200 Level, Room 229B
Phoenix, AZ
United States

9:00 am
PT
Paul Trio
Director, Standards
SEMI

Welcome

Suhas Ketkar headshot
Moderator
Suhas Ketkar
Elemental Scientific
9:05 am - 9:15 am
don hadder
Don Hadder
OTF Planar Staff IC
Intel

Chemical Quality and Consistency Requirements for the Semiconductor Industry

9:15 am - 9:45 am
Aaron_Hineman
Aaron Hineman
Inorganic Product Line Leader, Americas
PerkinElmer

Analysis of Challenging Semiconductor Chemicals by ICP-MS

9:45 am - 10:15 am
Daniel Wiederin headshot
Daniel Wiederin
President
Elemental Scientific

Addressing IRDS Yield Enhancement Challenges in Liquid Chemical Metrology

10:15 am - 11:00 am
Gary Van Schooneveld headshot
Gary Van Schooneveld
President
CT Associates, Inc.
Derek Oberreit headshot
Derek Oberreit
Chief Technology Officer
Kanomax Holdings
Marie Tripp Headshot
Dr. Marie Tripp
VP of Customer Relations
UNISERS AG

Metrology for Detection of Particle Precursor and Sub-10 nm Particles In Liquids and On-Wafer

11:00 am - 11:30 am
Larry Zazzera headshot
Larry Zazzera, Ph.D.
Corporate Scientist
CT Associates, Inc.
Greg Haugstad headshot png
Greg Haugstad, Ph.D.
Principal Researcher and Technical Director, CharFac
Dept. of Chemical Engineering, University of Minnesota

Identification of Organic Particle Precursors using FTIR-ATR, SERS and AFM-IR

11:30 am
Suhas Ketkar headshot
Suhas Ketkar
Elemental Scientific

Closing Remarks

Standards

SEMI Analytical Workshop

9:00 am - 11:30 am Off Add to Calendar 2025-10-08 09:00:00 2025-10-08 11:30:00 SEMI Liquid Chemicals Analytical Workshop SEMI Analytical Workshop In-Person—Mountain Time Phoenix Convention Center North Building, 200 Level, Room 229B Phoenix, AZ United States SEMI.org [email protected] America/Los_Angeles public

Contact

For any questions about the event, please contact:

Laura Nguyen
[email protected]

Event format
Promote in calendar
Off

This event is over. Contact Laura Nguyen for additional information.

To access the recording, when available it will be posted here: https://www.semi.org/en/products-services/standards/step

United States F47 Ad Business Technical

Overview

Since 2018, the SEMI Voltage Sag Task Force—comprising Fabs, Utilities, OEMs, Tool Suppliers, and EPRI—has collaborated to address a persistent challenge: why do tools remain vulnerable to voltage sags despite the implementation of SEMI F47?

Over seven years, the task force has investigated the power quality environment, tool susceptibility, testing methodologies, and mitigation strategies. This deep dive has led to actionable recommendations for strengthening the SEMI F47 standard and improving tool resilience in future builds.

What to Expect

Join us for a comprehensive workshop that will:

  • Review the task force’s findings and collaborative efforts
  • Share insights from key stakeholders
  • Present proposed revisions to the SEMI F47 standard
  • Discuss how these updates can enhance tool performance and reliability

In-Person—Mountain Time
Phoenix Convention Center
North Building, 200 Level, Room 229B
Phoenix, AZ
United States

2:30 pm
PT
Paul Trio
Director, Standards
SEMI

Welcome Remarks

2:35 pm
Mark Stephens EPRI
Task Force Leader
Mark Stephens
Program Manager
EPRI

SEMI F47 Background & Voltage Sag Immunity Task Force Review

Biography
Mark will present the background of the 7-year effort, the findings from the work , proposed updates and pathways towards improvements and will close out with a summary and next steps.

2:50 pm

Baselining PQ Data from Semiconductor Fabs

3:05 pm
Zack Pike
Zachary Pike
SMTS Facilities Electrical Engineer
GlobalFoundries

Insights from Global Foundries

Biography
Zack will present on Global Foundries experiences with semiconductor tool shutdowns, efforts toward improvement and the types of voltage sags that are still causing tool downtime.

2:20 pm
Clay Burns
Clayton Burns
Principal Engineer, Transmission Planning & Asset Management
National Grid

Experiences from National Grid

Biography
Clay will discuss the power quality environment, relay concepts such as area of vulnerability, and the need for including some level of three-phase voltage sag testing.

3:35 pm
Mark Stephens EPRI
Task Force Leader
Mark Stephen
Program Manager
EPRI

Key Findings from Research and Testing

3:50 pm

Proposed Updates to the SEMI F47 Standard from Task Force Work

4:05 pm

Facilities Korea TC Chapter Input

4:15 pm

Voltage Sag Generator Readiness

4:25 pm - 4:30 pm

Summary and Next Steps

Standards

Enhancing Voltage Sag Immunity: SEMI F47 Standard Updates & Insights Workshop

This is a must-attend session for professionals involved in semiconductor manufacturing, power quality engineering, and equipment design.

2:30 pm - 4:30 pm Off Add to Calendar 2025-10-08 14:30:00 2025-10-08 16:30:00 Enhancing Voltage Sag Immunity: SEMI F47 Standard Updates & Insights Workshop Enhancing Voltage Sag Immunity: SEMI F47 Standard Updates & Insights WorkshopThis is a must-attend session for professionals involved in semiconductor manufacturing, power quality engineering, and equipment design. In-Person—Mountain Time Phoenix Convention Center North Building, 200 Level, Room 229B Phoenix, AZ United States SEMI.org [email protected] America/Los_Angeles public

Contact

For any questions about the event, please contact:

Laura Nguyen
[email protected]

Event format
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FOR IMMEDIATE RELEASE
Busch Group Expands US Footprint with nearly 60,000 sqft. Service Center in Tempe, Arizona

Tempe, AZ – August 14, 2025 – Busch Vacuum Solutions, part of the Busch Group, a global leader in vacuum and overpressure technology, is proud to announce the development of its newest U.S. facility: almost 60,000-square-foot Arizona Service Center located in Tempe. This strategic expansion underscores Busch’s continued investment in innovation, customer service, and regional growth across North America. The state-of-the-art facility is scheduled to open in October 2025.

The new Tempe facility will serve as a key regional hub specializing in the repair, service, and overhaul of vacuum pumps, vacuum systems, and overpressure equipment including turbo molecular pumps, leak detectors, valves and accessories etc. - supporting all major brands. This expanded capability brings greater flexibility, technical expertise, and responsiveness to customers across the semiconductor, industrial, medical, and environmental sectors. Designed to meet the growing demands of the region, the Tempe Service Center will provide faster turnaround times, expert support, and more efficient service delivery tailored to the unique operational needs of customers not just in the Southwest but across the US.

"This investment represents more than just added square footage. It’s about proximity, partnership, and performance," said Turgay Ozan, President & CEO, Busch Group USA. "With the launch of our Tempe location, we’re better positioned to deliver unmatched value to customers who rely on advanced vacuum technologies in high-performance environments."

“We’re excited to welcome Busch Vacuum Solutions, a global leader in advanced manufacturing, to Tempe. Their decision to invest here speaks to the strength of Arizona’s semiconductor ecosystem, diversity of thriving industries located here, and the spirit of innovation that defines our community. The new Tempe Service Center will create skilled employment opportunities, strengthen business partnerships, and keep Tempe at the forefront of high-tech growth and excellence. We are grateful to Busch Group for selecting Tempe as the location for its Southwest service hub and look forward to supporting their continued success.” said Corey Woods, Mayor of Tempe, AZ.

With more than 8,000 employees globally and over 1,200 in the United States, Busch continues to expand its network of facilities to support mission-critical operations across a diverse range of industries. In addition to semiconductor and industrial markets, Busch's vacuum technology supports automotive, food and beverage, packaging, metallurgy, pharmaceuticals, plastics, and large-scale distribution. These capabilities enable more localized production and increase operational resilience across essential supply chains.

The new Tempe facility reinforces the Busch Group’s ongoing mission to drive industry forward through cutting-edge vacuum solutions and service excellence.

Busch Group USA’s newest facility in Tempe, Arizona – a state-of-the-art service center designed to expand capabilities, enhance customer support, and strengthen the company’s national presence.

About the Busch Group
The Busch Group is one of the world’s largest manufacturers of vacuum pumps, vacuum systems, blowers, compressors and gas abatement systems. Under its umbrella, the group houses two well-known brands: Busch Vacuum Solutions and Pfeiffer Vacuum+Fab Solutions. The gas abatement systems previously offered by centrotherm clean solutions – a former Busch Group brand – are now part of the Pfeiffer portfolio.

The extensive product and service offer includes solutions for vacuum, overpressure and abatement applications in all industries, such as food, semiconductors, analytics, chemicals, plastics, and aerospace. This also includes the design and construction of tailor-made vacuum systems and a worldwide service network.

The Busch Group is a family business that is managed by the Busch family. More than 8,000 employees in 44 countries worldwide work for the group. Busch is headquartered in Maulburg, Baden-Württemberg, in the tri-country region of Germany, France and Switzerland.

The Busch Group manufactures in its 23 own production plants in China, the Czech Republic, France, Germany, India, Romania, South Korea, Switzerland, the United Kingdom, the USA and Vietnam. The Busch Group has an annual consolidated revenue of close to 2 billion Euro.

Media Contact:
Jake Young
Marketing Business Partner
Busch Group USA
[email protected]
+1-800-872-7867
www.buschgroup.com

Test Research, Inc. (TRI), the leading test and inspection systems provider for the electronics manufacturing industry, will join SEMICON Taiwan held at Taipei Nangang Exhibition Center, Hall 1 – 1F from September 10 - 12, 2025. Visit TRI's Booth No. K3070 to learn more about the latest Advanced WLP/PLP and SEMI Back-End Package Inspection and metrology solutions.

TRI's Inspection and Metrology Applications include: Chiplet & Chip-on-Wafer (CoW), System-in-Package (SiP), Advanced WLP, TSV Metrology, μBump, Cu Pillar, Surface Topology, Profiling, Thin Film Thickness, Patterned Wafer, Inner Crack / Chipping, After Sawing Defects, Die Underfill, Glue, Epoxy & Flux, Wafer Bumping and Die / Wire Bonding.

TRI will showcase the Wafer Inspection and metrology Platform, TR7950Q SII, capable of wafer macroscopic 3D inspection and micro measurement metrology. The TR7950Q SII has applications in Advanced WLP, Wafer Frame, Patterned Wafer, Wafer Bumping, WLCSP, Through Silicon Via (TSV), thin film, and more.

TRI will also exhibit the back-end inspection solutions, the TR7007Q SII-S for C4 bumps (~100 μm Ø), Mini-LED, and 008004 paste inspection applications, and the TR7900Q SII-R TRI's Reject Station with A-Powered 3D Inspection that can inspect die, wire diameters of up to 15 μm (0.6 mil), SiP, underfill, bumps, and more. The lineup will also include an X-ray Inspection Demo Station. TRI's SEMI AXI solutions can inspect C4 bumps and Cu pillars.

Visit TRI's Booth No. K3070 at SEMICON Taiwan 2025 to explore TRI's SEMI solutions.

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About TRI
Test Research, Inc. (TRI) offers the most robust product portfolio in the industry for Automatic Test and Inspection solutions. TRI provides the most cost-effective solutions to meet a comprehensive range of manufacturing Test and Inspection requirements. Learn more at http://www.tri.com.tw. For sales and service information, please write to us at [email protected] or call +886-2-2832 8918.