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China

Essential Tool Offers Reliable Wafer Plating Results for R&D and Low Volume Production

Cranston, RI, USA – Technic’s SEMCON 1000 is not new to the market, but its evolution over the past decade has made it the essential tool for wafer deposition evaluation and application performance testing.

The SEMCON 1000 has been designed and developed specifically for research and low volume applications testing and production. The tool features a single plating cell along with a dragout rinse cell, to enable plating/electroforming of wafers or discrete parts when used with a customized holder. The SEMCON 1000 is capable of processing several different plating applications on a variety of substrates including Si, GaAs, InP, and more.

The SEMCON 1000 is modeled after Technic’s highly successful SEMCON 2000 series of manual wafer wet bench tools. The process cell and chassis are designed for easy and effective maintenance and process changeovers. The SEMCON 1000 is self-contained, constructed of white polypropylene with a clear PVC process cover designed to meet class 1000 cleanroom specifications. Plating cell components include a heating source, temperature control, low-level safety sensor, pump and filter, DC power supply, and a plating rack.

About Technic
Technic is a global, full-service provider, with a complete line of proprietary plating solutions and processes for wafer-level packaging as well as analytical services and support.

REGISTRATION

China 1

Traffic Reminder

Venue: Ramada Plaza Hangzhou Riverside, No.3399 Jiangnan Avenue, Binjiang District, Hangzhou City, Zhejiang Province, China.

  • Hotel to Hangzhou Railway Station 10 miles, 20 minutes’ drive.
  • Hotel to Hangzhoudong Railway Station 18 miles, 40 minutes’ drive.
Highlighted content

Hangzhou
China

1:30 pm - 1:40 pm

Welcome Remark

1:40 pm - 2:05 pm
徐伟智
Weizhi Xu 徐伟智
CTO & Deputy General Manager for Crystal silicon Manufacturing Technology R&D and Product Management/晶硅制造事业部副总经理&CTO
ZHEJIANG CHINT NEW ENERGY DEVELOPMENT CO. LTD./浙江正泰新能源开发有限公司

高效电池组件技术

2:05 pm - 2:30 pm
杨德仁
Deren Yang 杨德仁
Professor of Zhejiang University/浙江大学教授
Academician of CAS/中国科学院院士

铸造单晶硅的缺陷控制

2:30 pm - 2:55 pm
张跃火
Fire 张跃火
Deputy General Manager System Solution Center PV & Energy Storage Division/光储事业部解决方案中心副总经理
SUNGROW POWER SUPPLY CO., LTD/阳光电源股份有限公司

智能光伏逆变器

2:55 pm - 3:20 pm
戴骏
David Dai 戴骏
Vice President/副总经理
SHANGHAI CHINT POWER SYSTEMS CO. LTD./上海正泰电源系统有限公司

Smart PV Plus ESS Solutio/智能光储方案

3:20 pm - 3:45 pm
李梦媛
Mengyuan Li 李梦媛
Director of Asia Pacific/亚太商务总监
Array Technologies Inc

Advanced Tracking Technology for Intelligent Solar Plant Applications/先进跟踪支架技术在智能光伏项目中的应用

3:45 pm - 4:10 pm
史伟
Wei Shi 史伟
Vice President/副院长
The IT Electronics EIeventh Design & Research Institute Scientific and Technological Engineering Corporation Limited/信息产业电子第十一设计研究院科技工程股份有限公司

Optimal Design Of Photovoltaic(PV) Power Station/光伏电站优化设计

4:10 pm - 4:35 pm
陈圣金
Shengjin Chen 陈圣金
Technical Quality Director/技术质量总监
CHINT Astronergy Eleectric Power System Enegineering(ZHE JIANG)CO.,LTD./浙江正泰安能电力系统工程有限公司

Optimized Design for Residential PV System/户用光伏系统优化设计

Standards

SEMI International Standards Program
Intelligent PV Power Station Technology Seminar
Thursday, November 12, 2020
13:30-17:00
Hangzhou, China

Standards Contact information:
Isadora Jin
Senior Specialist, SEMI China
Email: [email protected]
Phone: 86.21.6027.8578

1:30 pm - 5:00 pm Off Add to Calendar 2020-11-12 13:30:00 2020-11-12 17:00:00 Intelligent PV Power Station Technology Seminar SEMI International Standards Program Intelligent PV Power Station Technology Seminar Thursday, November 12, 2020 13:30-17:00 Hangzhou, China Standards Contact information: Isadora Jin Senior Specialist, SEMI China Email: [email protected] Phone: 86.21.6027.8578 Hangzhou China SEMI.org [email protected] America/Los_Angeles public

REGISTRATION

If you are SEMI Standards program member, please register here.

China PV China春2020

Traffic Reminder

Venue:Ramada Plaza Hangzhou Riverside, No.3399 Jiangnan Avenue, Binjiang District, Hangzhou City, Zhejiang Province, China.

  • Hotel to Hangzhou Railway Station 10 miles, 20 minutes’ drive.
  • Hotel to Hangzhoudong Railway Station 18 miles, 40 minutes’ drive.
Highlighted content

Hangzhou
China

Standards

SEMI International Standards Program
PV&PV Materials China TC Chapter Fall Meeting 2020
Friday, November 13, 2020
09:00-17:00
Hangzhou, China

 

Agenda as below:

08:30 – 09:00 Registration

09:00 – 09:20 Welcome

09:20 – 09:25 Review and Approval of Previous Meeting Minutes

09:25 – 09:30 SEMI Staff Report

09:30 – 09:50 Liaison Reports

09:50 – 10:00 Other Standards Development Organization Update /

10:00 – 10:40 Task Forces Reports

10:40 – 11:40 Ballots Cycle 6-2020 Review

 

13:30 – 15:00 Ballots Cycle 6-2020 Review

15:00 – 15:30 Ballots Cycle 7-2020 Review

15:30 – 16:40 Five-Year Review

16:40 – 16:45 New Action Items

16:45 – 17:00 Next Meeting Date & Locale

 

Standards Contact information:
Isadora Jin
Senior Specialist, SEMI China
Email: [email protected]
Phone: 86.21.6027.8578

9:00 am - 5:00 pm Off Add to Calendar 2020-11-13 09:00:00 2020-11-13 17:00:00 PV&PV Materials China Joint TC Chapter Fall Meeting SEMI International Standards Program PV&PV Materials China TC Chapter Fall Meeting 2020 Friday, November 13, 2020 09:00-17:00 Hangzhou, China   Agenda as below: 08:30 – 09:00 Registration 09:00 – 09:20 Welcome 09:20 – 09:25 Review and Approval of Previous Meeting Minutes 09:25 – 09:30 SEMI Staff Report 09:30 – 09:50 Liaison Reports 09:50 – 10:00 Other Standards Development Organization Update / 10:00 – 10:40 Task Forces Reports 10:40 – 11:40 Ballots Cycle 6-2020 Review   13:30 – 15:00 Ballots Cycle 6-2020 Review 15:00 – 15:30 Ballots Cycle 7-2020 Review 15:30 – 16:40 Five-Year Review 16:40 – 16:45 New Action Items 16:45 – 17:00 Next Meeting Date & Locale   Standards Contact information: Isadora Jin Senior Specialist, SEMI China Email: [email protected] Phone: 86.21.6027.8578 Hangzhou China SEMI.org [email protected] America/Los_Angeles public

ESPOO, Finland, 19th October 2020 – The Chairman of the Board and founder of Picosun Group, Mr. Kustaa Poutiainen, has been awarded as Finland’s Entrepreneur of the Year 2020. Mr. Poutiainen received the National Entrepreneur Award in the annual meeting of the Federation of Finnish Enterprises in Jyväskylä on 17th October. The award is given every year to four Finnish entrepreneurs as a recognition of exceptional entrepreneurship.

Picosun provides ALD (Atomic Layer Deposition) thin film coating solutions to global microelectronics and other industries. ALD was invented in Finland in 1974 by Picosun Board Member Dr. Tuomo Suntola, who in 2018 received the Millennium Technology Prize in recognition of his invention. ALD is a mature, key enabling technology in today’s semiconductor manufacturing, realizing the development of modern microelectronics according to the Moore’s Law. ALD is expanding rapidly to other fields of industry as well, and it is expected to bring a fundamental disruption especially to healthcare technologies, where Picosun’s PicoMEDICAL™ solutions have already enabled several new innovations.

“Even if we had great premises to start manufacturing ALD equipment, not everyone believed in us in the beginning. Our personnel did and showed what they are capable of. It has taken us to a path of excellent growth,” says Poutiainen.

Picosun’s first customers, when the company entered the ALD business in 2004, were universities and research institutes. Now, the world’s leading electronics manufacturers and other companies turn to Picosun when they need the most advanced thin film coating technology to stay spearheading their own industries. Even in the middle of the global pandemic, Picosun’s turnover is expected to grow 50%, which is remarkably higher than the market’s average of 15%.

“Since day one, our vision was to be the best in the world. We have already achieved this with our R&D ALD tools, and now we are heading further. We invest a significant amount of our turnover in development of our ALD solutions and our personnel so that we can always exceed the expectations of our customers. It is an honor to receive the National Entrepreneurship Award of Finland, and it is an honor to be a part in steering Picosun towards the future, which looks very bright indeed,” continues Poutiainen.

“The whole Picosun team wants to congratulate our Chairman, Kustaa Poutiainen, on this prestigious award. We are very proud of his significant contributions and role in enabling the international breakthrough of Finnish originated ALD technology. I am sure that the entire global ALD community appreciates his efforts and joins our congratulations,” summarizes Mr. Jussi Rautee, CEO of Picosun Group.

More information:
Mr. Jussi Rautee
CEO, Picosun Group
Tel: +358 50 345 4457
Email: [email protected]
Web: www.picosun.com

ESPOO, Finland, 6th October 2020 – Picosun Group, the leading supplier of AGILE ALD® (Atomic Layer Deposition) thin film coating solutions for global industries, strengthens its position in power electronics market with several cluster ALD system sales to prominent manufacturers in Europe, USA and Asia.

“Power electronics is an important, fast growing market for Picosun. ALD has potential to solve various challenges manufacturers are facing in this field, and our solutions have enabled our customers to create significant added value in terms of device quality and throughput. At Picosun, we have developed several turn-key production ALD solutions specifically for 4-8 inch wafer markets such as power devices. Especially our cluster ALD systems, such as the PICOSUN® Morpher which we launched last year, have been extremely well received by our customers,” says Juhana Kostamo, Head of Customer Solutions/Deputy CEO of Picosun.

Power components are crucial in a wide range of applications from consumer electronics to transportation, energy production and distribution, including renewables such as wind and solar power generation. These components are typically manufactured on 4-8 inch compound semiconductor wafers such as GaN and SiC. These materials provide various benefits compared to pure silicon, for example higher electron mobility, higher threshold voltage, and ability to operate at higher temperatures. Challenges do exist, however, as GaN and SiC power devices are prone to high interface trap density (leading to parasitic currents and reduced electron mobility) and gate leakage current, and poor threshold voltage stability.

Interface trap density can be reduced by combining pre-cleaning methods with high permittivity, large bandgap insulators. High quality, defect-free high-k dielectric layers such as Al2O3, AlN or ZrO2 etc. are key in reducing power devices’ gate leakage current and to improve electron mobility and threshold voltage stability. A good example here are GaN-based HEMTs (high electron mobility transistors), which are important in various large scale practical applications, and which require efficient gate insulation and surface passivation to achieve optimal functionality.

ALD stands as a superior deposition method here compared to other thin film coating technologies such as PECVD, as ALD produces the most conformal, uniform, and defect-free films with accurate, digitally repeatable thickness control and sharp interfaces. With the right selection of ALD deposition equipment, even multilayer processing is possible i.e. various functional material layers and/or stacked films/nanolaminates can be manufactured in one process run.

PICOSUN® Morpher is a disruptive ALD production platform designed for up to 8 inch wafer industries such as power electronics, MEMS, sensors, LEDs, lasers, optics, and 5G components. Morpher’s operational agility makes the system adaptable to various and changing manufacturing needs, on all business verticals from corporate internal R&D to production and foundry manufacturing, where both the end products and/or customers’ requirements may change rapidly. Morpher can handle several substrate materials, batch and substrate sizes, and ALD materials with leading process quality. Multilayer deposition is possible, and cluster design allows integration of also other processing units such as pre-clean, RIE etc. for fully automated, high throughput continuous vacuum operation.

“In its versatility and transformability, Morpher is the epitome of our principle ‘Agile ALD’. Innovation, constant development and improvement of our ALD solutions to enable our customers’ success is our driving force at Picosun. This applies also to Morpher platform and we have some truly exciting additions to this product family coming in the near future,” summarizes Kostamo.

About Picosun
Picosun provides the most advanced AGILE ALD® (Atomic Layer Deposition) thin film coating solutions for global industries. Picosun’s ALD solutions enable technological leap into the future, with turn-key production processes and unmatched, pioneering expertise in the field – dating back to the invention of the technology itself. Today, PICOSUN® ALD equipment are in daily manufacturing use in numerous leading industries around the world. Picosun is based in Finland, with subsidiaries in Germany, USA, Singapore, Taiwan, China, Korea and Japan, offices in India and France, and a world-wide sales and support network. Visit www.picosun.com.

More information:
Juhana Kostamo
Head of Customer Solutions/Deputy CEO, Picosun Group
Tel: +358 50 3699 565
Email: [email protected]
Web: www.picosun.com