About the Speaker: Robert MacDonald is a MEMS engineer at GE’s Research. His research is focused on high performance inertial sensors. He has over 20 years of experience in the MEMS and semiconductor industries. His work has covered the product life cycle of chemical, inertial and optical sensors from design through market introduction and manufacturing.
Join us for this first webinar in the MSIG series on foundries, dicing, and packaging considerations in MEMS fabrication.
In this first in the series, GE Research will present their new MEMS process suitable for bulk silicon motion sensors. The process aims to deliver many features of complex MEMS flows, such as wafer level packaging with through silicon vias (TSVs), with a short cycle times and low mask counts. This webinar will introduce the Polaris process within the GE Research foundry and explain how to design the process, and our model for delivering new designs.
Designing MEMS with GE’s Polaris Process for Motion Sensor Fabrication
8:00 am - 9:00 am
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Add to Calendar2022-03-02 08:00:002022-03-02 09:00:00MSIG Webinar GE Polaris ProcessJoin us for this first webinar in the MSIG series on foundries, dicing, and packaging considerations in MEMS fabrication.
In this first in the series, GE Research will present their new MEMS process suitable for bulk silicon motion sensors. The process aims to deliver many features of complex MEMS flows, such as wafer level packaging with through silicon vias (TSVs), with a short cycle times and low mask counts. This webinar will introduce the Polaris process within the GE Research foundry and explain how to design the process, and our model for delivering new designs.United StatesSEMI.org[email protected]America/Los_Angelespublic
America/Los_Angeles
Moore’s Law continues to evolve - dramatically changing the Field Effect Transistor (FET). As FinFETs reach their performance limits, attention is turning to Gate All Around (GAA) architectures based on Horizontal Nanosheet technology. Such a fundamental shift in transistor architecture will create new challenges to processes and materials, presenting opportunities for companies well-positioned for this shift.
In this webinar, SEMI EMG brings experts to explain the technology trends driving the industry adoption of Gate All Around, how the major players are approaching this transition, and the implications this will have on the material supply chain
Gate All Around Transistors - Opportunities Abound
Position yourself for the next chapter of Moore's Law
10:00 am - 11:00 am
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America/Los_Angeles
SEMI is pleased to once again partner with the HIR Symposium for this 5th Annual Symposium. See the full Agenda.
Don't miss the plenary talk by SEMI President and CEO, Ajit Manocha at 7:40 am PST!
7:30 am - 12:30 pm
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Add to Calendar2022-02-23 07:30:002022-02-24 12:30:00Fifth Annual Symposium on Heterogeneous IntegrationSEMI is pleased to once again partner with the HIR Symposium for this 5th Annual Symposium. See the full Agenda.
Don't miss the plenary talk by SEMI President and CEO, Ajit Manocha at 7:40 am PST!Virtual, Online United StatesSEMI.org[email protected]America/Los_Angelespublic
America/Los_Angeles
Fifth Annual Symposium on Heterogeneous Integration
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CASTStandards
7:30 am - 12:30 pm
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Add to Calendar2022-02-23 07:30:002022-02-24 12:30:00Fifth Annual Symposium on Heterogeneous IntegrationVirtual, Online United StatesSEMI.org[email protected]America/Los_Angelespublic
America/Los_Angeles
SEMI Compound Semiconductor Materials Technology Forum
