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YES (Yield Engineering Systems, Inc.), a leading manufacturer of process equipment for semiconductor advanced packaging, life sciences and “More-than-Moore” applications, today announced that it has purchased the semiconductor equipment business of Swedish heating technology provider Kanthal.

Under the terms of the agreement, which was signed on October 6, YES will take ownership of Kanthal’s semiconductor-related capital equipment portfolio, system-related upgrades, and service needs. The acquisition will add Kanthal’s high-temperature (>800°C) furnace technology as well as Low Pressure Chemical Vapor Deposition (LPCVD) processes to YES’s growing capabilities in the thermal processing area.

“We aim to be the semiconductor industry’s provider of choice for surface modification, material enhancement, and high-quality deposition,” said Rezwan Lateef, President of YES. “With this acquisition of equipment and technical expertise from a leader in industrial heating, we look forward to supporting our global customer base with new high-temperature annealing and bonding systems that leverage Kanthal heating equipment. In addition, we feel that the Kanthal LPCVD technology has potential to open exciting deposition opportunities for YES beyond our current monolayer coating systems, particularly in the areas of optical, power and microLED.”

About YES
YES (Yield Engineering Systems, Inc.) is a preferred provider of high-tech, cost-effective equipment for transforming surfaces, materials and interfaces. The company’s product lines include vacuum cure ovens, chemical vapor deposition (CVD) systems, and plasma etching tools used for precise surface modification and thin-film coating of semiconductor wafers, semiconductor and MEMS devices, and biodevices. With YES, customers ranging from startups to Fortune 100 companies can create and volume-produce products in a wide range of markets, including Advanced Packaging, MEMS, Augmented Reality/Virtual Reality and Life Sciences. YES is headquartered in Fremont, California, with a growing global presence. For more information, please visit www.yieldengineering.com.

SANTA ROSA, Calif. – September 28, 2021 – PNI Sensor, the world’s foremost expert in precision location, motion tracking, and fusion of sensor systems into real-world applications, today announced that its proprietary magneto-inductive sensor technology is now integrated into MagCanica’s torque sensor systems for high-performance FORMULA 1 race cars. PNI’s sensor technology is used in MagCanica’s innovative driveshaft, clutch shaft, and MGUK shaft torque sensor systems to accurately measure both steady-state and transient torque levels, helping race teams optimize powertrain performance and driveability.

MagCanica designs, develops, and manufactures wireless torque sensor systems and rate-of-change-of-torque (ROC) sensor systems for high performance applications such as automotive racing powertrains, turboshaft engines and associated rotorcraft transmissions, and high speed couplings for gas compression trains and power generation trains for the energy sector.

“The team at PNI worked closely with our engineers to customize their high-performance magnetic sensors to our exacting specifications,” said Sami Bitar, President and co-founder of MagCanica. “This close collaboration supports our mission to deliver the most lightweight, compact and accurate systems for our FORMULA 1 race team customers.”

“Our team of highly experienced engineers takes a holistic approach and supports our customers’ system accuracy and long-term reliability requirements,” said Robin Stoecker, director of marketing at PNI Sensor. “We’re proud that MagCanica is using our expertise and field-tested sensor hardware and applying it to a highly specialized and demanding application like automotive racing systems.”

About PNI Sensor
With over 30 years of experience, PNI is the world’s foremost expert in precision location, motion tracking, and fusion of sensor systems into real-world applications. PNI’s sensors and algorithms serve as the cornerstone of successful IoT projects and mission-critical applications where pinpoint location, accuracy, and low power consumption are essential. Building on decades of patented sensor and algorithm development, PNI offers the industry’s highest-performance geomagnetic sensor in its class, location and motion coprocessors, high-performance modules, sensor fusion algorithms, and complete sensor systems. To learn more, please visit www.pnicorp.com.

The F1 logo, F1 FORMULA 1 logo, FORMULA 1, F1, FIA FORMULA ONE WORLD CHAMPIONSHIP, GRAND PRIX, PADDOCK CLUB and related marks are trademarks of Formula One Licensing BV, a Formula 1 company. All rights reserved. Use of the Formula 1 trademark does not imply any affiliation with, or endorsement by, FORMULA 1.

YES (Yield Engineering Systems, Inc.), a leading manufacturer of process equipment for semiconductor advanced packaging, life sciences and “More-than-Moore” applications, today announced that Kimihiko Matsubara has joined its senior management team and will lead its sales efforts in the Japan market, supporting the rapidly evolving semiconductor and advanced organic substrate market segments in the region.

“We welcome Matsubara-san warmly to the YES senior team. His proven management and relationship-building skills, strong record of sales growth, and deep knowledge of the country’s precision machinery and semiconductor industries will be highly valuable to YES as we build our local presence in Japan,” said Rezwan Lateef, President of YES.

Kimihiko Matsubara started his career with process equipment manufacturer Hakuto, spending three decades there in positions of increasing managerial responsibility. He subsequently held business development and senior sales management roles at TASMIT (a subsidiary of Toray, specializing in semiconductor inspection and metrology) and Faro Japan, a maker of 3D metrology and visualization systems. He earned his bachelor’s degree in Mathematics from Meijo University in Nagoya, Japan.

About YES
YES (Yield Engineering Systems, Inc.) is a preferred provider of high-tech, cost-effective equipment for transforming surfaces, materials and interfaces. The company’s product lines include vacuum cure ovens, chemical vapor deposition (CVD) systems, and plasma etching tools used for precise surface modification and thin-film coating of semiconductor wafers, semiconductor and MEMS devices, and biodevices. With YES, customers ranging from startups to Fortune 100 companies can create and volume-produce products in a wide range of markets, including Advanced Packaging, MEMS, Augmented Reality/Virtual Reality and Life Sciences. YES is headquartered in Fremont, California, with a growing global presence.

For more information, please visit www.yieldengineering.com.

BURGESS HILL, West Sussex, UK, 15th September 2021 – Edwards, the leading supplier of vacuum and abatement services and solutions to the global semiconductor industry, today opened its new flagship Service Technology Centre (STC) in Blanchardstown, Dublin. The new site and associated field service operations have so far employed a diverse workforce of around 100 people, 90% of whom are technicians or engineers, and this is expected to rise to around 120 by the end of the year. The STC, which will help support the semiconductor manufacturing industry in Ireland, represents an investment in the region of US$7.5 million.

Semiconductor manufacturing is essential to supporting developments in the technology, electronics, transport, scientific and healthcare sectors – all of which have been classed as critical industries during the Covid-19 pandemic. Edwards is the world leader in supplying the vacuum and abatement technology, along with the equipment and services, necessary to support the efficient and environmentally sustainable production of semiconductors.

The new 4,000m2 facility uses advanced automation and data solutions to disassemble, clean, inspect, repair, replace and reassemble vacuum pumps and abatement equipment. Together with on-site manufacturing, this will improve responsiveness to customers’ needs.
State-of-the-art technology deployed in the new smart facility brings together innovations developed by the expertise of our STCs around the world, which enables Edwards to autonomously track products through the STC and provides insights to both customers and our teams to improve planning. These new technologies significantly remove the amount of paper needed and thus reduce the facility’s carbon footprint.

Edwards is supported by IDA Ireland through the Department of Enterprise, Trade and Employment. Tánaiste and Minister for Enterprise, Trade and Employment Leo Varadkar TD said, “Today is a big day for Edwards and I’d like to congratulate all staff on the opening of this flagship centre. I’m sure you will all find a very warm home in Blanchardstown. Today’s opening reaffirms Ireland’s position as a global leader in the semiconductor industry. I wish Edwards every success in the future.”

Troy Metcalf, President of Edwards’ Semiconductor Service division formally opened the new facility and welcomed the new employees. Troy commented, “I am delighted to be opening our new Dublin Service Technology Centre, the latest in our global network of STCs that enables us to best support our customers in the safe, productive and environmentally sustainable manufacturing of semiconductors in Ireland and across Europe. I want to extend my sincere gratitude to everyone involved in helping to facilitate the new site for their enthusiasm and hard work, despite the significant challenges posed during the pandemic.

“I would also like to thank IDA Ireland on behalf of Edwards for the continued valuable support they have provided us in this exciting new venture.”

Congratulating Edwards on its official opening, Martin Shanahan, CEO, IDA Ireland said “Despite the challenge of this past year, Edwards has already onboarded 100 new members of staff and opened its new flagship Service Technology Centre (STC) in Dublin. This is a very welcome investment and I wish Edwards continued support and ongoing success with this operation.”

Edwards is continuing to recruit for the new Dublin facility. Learn more about the company and emerging roles, or send your details to [email protected]. For a confidential discussion, please contact one of the dedicated consultants at Collins McNicholas, Edwards’ selected recruitment partner, on (01) 662 0088.

About Edwards
Edwards is the leading developer and manufacturer of sophisticated vacuum products, exhaust management systems and related value-added services. These are integral to manufacturing processes for semiconductors, flat panel displays, LEDs and solar cells; are used within an increasingly diverse range of industrial processes including power, glass and other coating applications, steel and other metallurgy, pharmaceutical and chemical; and for both scientific instruments and a wide range of R&D applications.

Edwards has around 6,000 employees worldwide engaged in the design, manufacture and support of high technology vacuum and exhaust management equipment and has state-of-the-art manufacturing facilities in Europe, Asia and North America.

Edwards is part of the Atlas Copco Group (NASDAQ OMX Stockholm: ATCO A, ATCO B), a Sweden-based provider of industrial productivity solutions.

Further information about Edwards can be found at www.edwardsvacuum.com

Registration

Registration is free for SEMI Members.  Use your company email when registering for the system to recognize you as a member.  

Non-Member fee = $49

Contact Paul Trio at [email protected] with any questions.

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Do you sometimes feel like you are operating in the dark when dealing with the new challenges and opportunities in process and design?  These continue to emerge in parallel to ever shrinking semiconductor device geometries.

While Moore’s law and beyond are driving scale reduction, the industry is facing increased process sensitivity and complexity, and is redefining on-wafer defect tolerance in terms of size and complexity.  

To detect, identify, understand the source and eliminate yield limiter defectivity are key for total wafer environment contamination characterization and control and are essential for yield enhancement to ensure the success of the latest technology nodes. 

It is more imperative than ever that the semiconductor industry works together to enable improved defect detection, speciation/characterization metrology, and as needed, hybrid analytical technology for upcoming HVM readiness.

Join us for this session for speakers and discussion on tackling some of these industry challenges.

Virtual
United States

7:30 am - 7:35 am
Paul Trio
Paul Trio
Senior Manager, Strategic Initiatives
SEMI

Welcome

7:35 am - 7:55 am
Archita Sangupta
Archita Sengupta
Sr. Technologist
Intel

IDM Perspective of Defectivity with regard to Next-Gen Metrology and Analysis Tools

Intel logo
7:55 am - 7:58 am
Robert McIntosh
Moderator
Robert McIntosh
Consultant
Enviro-Energy Solutions

Introduction to the Presentations

7:58 am - 8:13 am
Hiroyuki_Hamada_Daikin
Hiroyuki Hamada
Senior Scientist
Daikin - Chemicals Division

Contamination Control for PFA

Ashwin_Rao_Daikin
Ashwin Rao
Semiconductor Marketing Manager
Daikin - Chemicals Division

8:13 am - 8:14 am

Introduction: Ashutosh Bhabhe

8:14 am - 8:29 am
Ashutosh_Bhabhe_Entegris
Ashutosh Bhabhe
Wet Etch & Cleans Applications Manager
Entegris

Metrology: (Ideally) Enabling the What, When, How, and Where of Unknown Contamination Detection and Control

8:29 am - 8:30 am

Introduction: Fuhe Li

8:30 am - 8:45 am
Fuhe Li - Air Liquide / Balazs
Fuhe Li
Director, Advanced Materials, Thin Films and Nanoparticles
Air Liquide - Balazs

Challenges in detecting nanoparticle, NVR, native oxide, and trace metals for 5 nm and beyond processes

8:45 am - 8:46 am

Introduction: Hugh Gotts

8:46 am - 9:01 am
Hugh_Gotts_Balazs
Hugh Gotts
International Fellow, Director R&D
Air Liquide - Balazs

HMW Organic Contaminants: What, Where, How?

9:01 am - 9:02 am

Introduction: Gary Van Schooneveld

9:02 am - 9:17 am
Gary_Van_Schooneveld_CTAssociates
Gary Van Schooneveld
President
CT Associates

Advance Metrology for Particle Sizing and Identification in Ultrapure Liquids

9:17 am - 9:18 am

Introduction: Ali O Altun

9:18 am - 9:35 am
Ali_O_Altun_Unisers
Ali O Altun
Co-Founder & CEO
Unisers

On-wafer detection and characterization of organic defects with Unisers

9:35 am - 10:00 am

Open Discussion

CAST FOA SCIS Standards

New challenges and opportunities in process and design continue to emerge in parallel to ever shrinking semiconductor device geometries. While Moore’s law and beyond are driving scale reduction, the industry is facing increased process sensitivity and complexity, and is redefining on-wafer defect tolerance in terms of size and complexity.  

Join us for this webinar-like session to discuss best-known methods from industry leaders

7:30 am - 10:00 am Off Add to Calendar Disabled America/Los_Angeles

The Electronic System Design Alliance, a SEMI Technology Community, welcomes Aselta Nanographics, of Grenoble, France, provider of advanced software solutions for wafer and mask patterning based on e-beam technology, as its newest member.

“Joining the ESD Alliance is a great opportunity to stay connected with the EDA community and take an active part in the discussions driving the future of semiconductor manufacturing,” remarks Yorick Trouiller, Aselta Nanographics’ CEO.

“Aselta Nanographics is making its mark in the semiconductor industry, and we are pleased it is joining as a member of the ESD Alliance,” comments Bob Smith, its executive director. “Companies like Aselta are helping manage increased complexity of mask data preparation due to technology improvements such as multi-beam mask writers and EUV lithography, and the ability to measure/inspect the effects both on reticle and on wafer.”

A spin-off of CEA-Leti, Aselta Nanographics maintains strong links with cutting-edge fundamental research and applies it to deliver advanced industrial solutions to customers in the U.S., Europe and Asia. It initially developed e-beam proximity effect correction software and now offers a portfolio of products that includes mask data preparation and metrology.

As a member of the ESD Alliance, Aselta Nanographics is also a member of SEMI, the global industry association representing the worldwide electronic product design and manufacturing supply chain.

About Aselta Nanographics
Aselta Nanographics of Grenoble, France, develops software tools to improve the quality process of chip production. It operates in the IC manufacturing world providing advanced software solutions for wafer and mask patterning based on e-beam technology as well as solutions for contour-based metrology. Aselta is currently developing cutting-edge software solutions for improving wafer fab and maskshop production yield for next generation nodes. For more information, see: www.aselta.com

About the SEMI Electronic System Design Alliance
The Electronic System Design (ESD) Alliance, a SEMI Technology Community representing members in the electronic system and semiconductor design ecosystem, is a community that addresses technical, marketing, economic and legislative issues affecting the entire industry. It acts as the central voice to communicate and promote the value of the semiconductor design ecosystem as a vital component of the global electronics industry.

Follow SEMI ESD Alliance
www.esd-alliance.org
ESD Alliance Bridging the Frontier blog
Twitter: @ESDAlliance
LinkedIn
Facebook

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CAST EMG ESD Alliance FlexTech FOA ITL MSIG SCIS SE&A SiPAT Standards Workforce Development Off Add to Calendar 2021-09-24 00:00:00 2021-09-24 00:00:00 SEMI China Smart Mobility Webinar China SEMI.org [email protected] America/Los_Angeles public
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ESPOO, Finland, 7th of September 2021 – Picosun Group has taken into use new facilities at its production laboratory in Kirkkonummi, Finland. The Picosun Innovation Lab will be used for the company’s own research and development projects, for demo purposes and most importantly for serving the company’s global semiconductor customers operating in the 300 mm market.

The Innovation Lab hosts Picosun’s new generation tools PICOSUN® Morpher and PICOSUN® Sprinter. Morpher was launched in 2019 and it started a completely new era in Picosun products. Its adaptive and versatile nature makes it an ideal ALD solution for to the changing needs of different business verticals in the up to 200 mm wafer industries. Sprinter was launched late 2020 for the 300 mm wafer markets to meet the ever-increasing demands of semiconductor, display and IoT component manufacturing lines. It has brought single wafer film quality and uniformity for fast batch processing and met the challenges in high volume ALD manufacturing.

The Innovation Lab increases the laboratory capacity Picosun currently has on its premises significantly. The new facilities will have the ability to host tens of ALD tool modules. The facilities also support a variety of process gases including for example N2, O2, O3, Ar, H2, NH3 and NF3. Furthermore, special attention has also been paid for the best-in-class building management and safety systems.

“The opening of the new Innovation Lab reflects our role in being the pioneer in ALD and continuing the daily work in setting the standards for future innovations in the ALD sphere. The Innovation Lab has been a big investment for the company, but we see this as an essential investment to our and our customers’ future”, says Jussi Rautee, CEO of Picosun Group.

Watch the video on Picosun Innovation Lab: https://press.picosun.com/picosun-invests-in-future-with-its-innovation…

More information:
Jussi Rautee
CEO, Picosun Group
Tel: +358 50 345 4457
Email: [email protected]
www.picosun.com

About Picosun
Picosun provides the most advanced AGILE ALD® (Atomic Layer Deposition) thin film coating solutions for global industries. Picosun’s ALD solutions enable technological leap into the future, with turn-key production processes and unmatched, pioneering expertise in the field – dating back to the invention of the technology itself. Today, PICOSUN® ALD equipment are in daily manufacturing use in numerous leading industries around the world. Picosun is based in Finland, with subsidiaries in Germany, USA, Singapore, Japan, South Korea, China mainland and Taiwan, offices in India and France, and a world-wide sales and support network. Visit www.picosun.com.

ESPOO, Finland, 31st of August 2021 – Picosun Group strengthens its position in the 300 mm semiconductor market with its new generation ALD tool PICOSUN® Sprinter.

PICOSUN® Sprinter was first launched in December 2020 as a stand-alone module. Now also customer deliveries and installations of PICOSUN® Sprinter clusters have started.

“A Sprinter cluster consist of two Sprinter modules and a central vacuum wafer-handling robot utilizing 5 wafers handling. The set-up enables a throughput of more than 100 wafers an hour with 10nm aluminium oxide target film thickness”, explains Juhana Kostamo, VP, Industrial Business Area of Picosun Group.

“The throughput capability combined with the unique design of the tool’s reaction chamber, the record-breaking batch film quality and the fact that the tool can be fully integrated with the customers’ production line, makes PICOSUN® Sprinter the tool of choice for semiconductor, display and IoT component industries who need a future-proof tool with single wafer film quality and uniformity in fast batch processing”, Kostamo concludes.

Read more about PICOSUN® Sprinter and watch the video:
https://www.picosun.com/products/300mm-wafers/picosun-sprinter/

More information:
Juhana Kostamo
Vice President, Industrial Business Area, Picosun Group
Tel: +358 50 369 9565
Email: [email protected]
www.picosun.com

About Picosun
Picosun provides the most advanced AGILE ALD® (Atomic Layer Deposition) thin film coating solutions for global industries. Picosun’s ALD solutions enable technological leap into the future, with turn-key production processes and unmatched, pioneering expertise in the field – dating back to the invention of the technology itself. Today, PICOSUN® ALD equipment are in daily manufacturing use in numerous leading industries around the world. Picosun is based in Finland, with subsidiaries in Germany, USA, Singapore, Japan, South Korea, China mainland and Taiwan, offices in India and France, and a world-wide sales and support network. Visit www.picosun.com.

Brooks Instrument, a leader in precision fluid measurement and control technology, has released the new GP200 Series, the first fully pressure-insensitive pressure-based mass flow controller (P-MFC) designed specifically for etch and chemical vapor deposition (CVD) processes in semiconductor manufacturing.

Mass flow controllers (MFCs) are the most important component in the gas delivery systems used to produce silicon wafers. MFCs must precisely deliver inert, corrosive and reactive gases to the process chamber, even when operating at very low vapor pressures.

The GP200 Series P-MFC operates well in high-vacuum conditions and above atmospheric pressure conditions that are intrinsic to etch and CVD processes. In comparison, conventional discrete P-MFCs can operate under high-vacuum conditions but degrade in performance and control range as the outlet pressures increase. By offering a greater operating range than conventional P-MFCs, the GP200 Series can improve etch process performance and expand the application scope to include CVD processes.

“Historically, thermal MFCs have been more heavily used in semiconductor manufacturing gas delivery systems; however, pressure-based MFCs are growing in popularity, as they provide significant advantages,” said Dr. Mohamed Saleem, Chief Technology Officer at Brooks Instrument. “We specifically designed our pressure-insensitive GP200 Series to optimize etch and CVD processes with highly precise, repeatable gas delivery.”

The GP200 Series unit features a patented architecture that overcomes the limitations of conventional P-MFCs to provide the most precise process gas delivery even when delivering low vapor pressure process gases. It includes several unique design aspects, including:
Integrated Differential Pressure Sensor: The GP200 Series uses an integrated differential pressure sensor paired with an absolute pressure sensor to compute pressure drop, instead of using two discrete pressure sensors, typically found in conventional P-MFCs. This combination reduces measurement uncertainty from calibration issues and improves the accuracy, repeatability and drift performance in semiconductor processes.

Laminar Flow Element: The GP200 Series also features a laminar flow element designed for low pressure drop, with a differential pressure sensor that is optimally ranged. This design makes it possible to accurately measure the flow of challenging low vapor pressure process gases used in etch processes, including silicon tetrachloride, boron trichloride and hexafluorobutadiene. Whereas conventional P-MFCs require high inlet pressures to operate, the high accuracy and repeatability of the GP200 Series in all operating conditions make it suitable for both standard pressure and critical low vapor pressure gases.

Downstream Valve Architecture: By positioning the control valve downstream of the flow restrictor, the GP200 Series is essentially immune to downstream pressure fluctuations as well as upstream pressure fluctuations This enables flow delivery into pressures as high as 1200 Torr.

Ultra-Fast, Highly Repeatable Transient Response: This downstream valve architecture also enables rapid shutdown and switching of recipe set points for pulsed gas delivery. Fast response times enable tighter process control, providing precise, highly repeatable gas flow delivery with matched transient response.

As the GP200 Series supports such a broad range of process conditions, it can be used as a drop-in replacement and upgrade for many traditional P-MFCs and thermal MFCs. It reduces the complexity and cost of ownership of the gas delivery system because it eliminates the need for components such as pressure regulators and transducers.

Visit experience.brooksinstrument.com/pressure-based-mass-flow-controller-gp200 to access a data sheet, explanatory videos and a white paper detailing how the GP200 Series improves accuracy and repeatability compared to discrete pressure sensors.

About Brooks Instrument
Since 1946, Brooks Instrument has been a leader in precision fluid measurement and control technology. Providing instrumentation for flow, pressure and vapor delivery, the company serves customers in the semiconductor, pharmaceutical and biopharmaceutical, fiber optics, thin film manufacturing, solar cells, LED, alternative energy, oil and gas, chemical and petrochemical industries.

With manufacturing, sales and service locations in the Americas, Europe and Asia, Brooks Instrument has the world’s largest installed base of mass flow controllers. Its broad family of products includes brands such as UNIT Instruments, Tylan, Key Instruments and Celerity.

For more information, please visit www.BrooksInstrument.com. The company is also on LinkedIn (www.linkedin.com/company/Brooks-Instrument) and YouTube (www.youtube.com/user/Brooks407).
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