Standards meetings are open to all, but you must be a SEMI Standards Program Member to attend.
If you are not a Member, please register for the International SEMI Standards Program and start making a big contribution to the industry’s progress, complete an application form today!
Questions? Contact your local staff coordinator: Click here
2:30 pm - 4:30 pm
Off
Add to Calendar2022-02-04 14:30:002022-02-04 16:30:00FPD M&C Japan TC Chapter MeetingFPD M&C Japan TC Chapter Meeting
Date: Friday, February 4, 2022
Time: 14:30-16:30[JST]
via Web Conference
AGENDA
Standards Contact Information:
Keigo Nakajima
Coordinator, SEMI Japan
Email: [email protected]
Phone: 81.3.3222.5863
NOTE:
Standards meetings are open to all, but you must be a SEMI Standards Program Member to attend.
If you are not a Member, please register for the International SEMI Standards Program and start making a big contribution to the industry’s progress, complete an application form today!
Questions? Contact your local staff coordinator: Click hereSEMI Japan Office 千代田区 九段南4-7-15 Tokyo 1020074 JapanSEMI.org[email protected]Asia/Tokyopublic
Asia/Tokyo
SEMI International Standards Meetings @ SEMICON West
Note: Some Technical Committees + Task Forces may meet virtually prior to SEMICON West 2021.
You must be a SEMI Standards Program Member to participate in the meetings.
Membership is FREE.
Fill out the Application Form today to join the Standards Program.
Kevin Nguyen
Manager, International Standards Operations
Email: [email protected]
Phone: 408.943.7997
NOTE:
Standards meetings are open to all, but you must be a SEMI Standards Program Member to attend.
If you are not a Member, please register for the International SEMI Standards Program and start making a big contribution to the industry’s progress, complete an application form today!
Questions? Contact your local staff coordinator: Click here
11:00 am - 1:00 pm
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Add to Calendar2021-11-17 11:00:002021-11-17 13:00:00Compound Semiconductor Materials Europe TC Chapter Meeting Compound Semiconductor Materials Europe TC Chapter Meeting
Date: Wednesday, November 17, 2021
Time: 11:00 AM-1:00 PM CET
via Web Conference
AGENDA
(subject to change)
Last updated: Oct 15, 2021
Standards Contact Information:
Kevin Nguyen
Manager, International Standards Operations
Email: [email protected]
Phone: 408.943.7997
NOTE:
Standards meetings are open to all, but you must be a SEMI Standards Program Member to attend.
If you are not a Member, please register for the International SEMI Standards Program and start making a big contribution to the industry’s progress, complete an application form today!
Questions? Contact your local staff coordinator: Click hereOnline, Central European Time (CET) GermanySEMI.org[email protected]America/Los_Angelespublic
Information and Control China TC Chapter Kickoff Meeting
1st floor, 4th Building of LEED INTERNATIONAL, Yangtze River Delta Capital Service Base
No. 1158 Zhangdong Road, Shanghai
» Venue to Shanghai Pudong International Airport 27 miles, 25 minutes’ drive.
» Venue to Shanghai Hongqiao International Airport 40 miles, 55 minutes’ drive.
» Venue to Shanghai Hongqiao Railway Station 40 miles, 55 minutes’ drive.
» Venue to metro Line 2 Guanglan Road Station 3 miles, 8 minutes’ drive.
Standards Contact information:
Isadora Jin
SEMI China
Email: [email protected]
Phone: 86.21.6027.8578
Information and Control China TC Chapter Kickoff Meeting
9:00 am - 12:10 pm
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Add to Calendar2021-11-17 09:00:002021-11-17 12:10:00Information and Control China TC Chapter Kickoff MeetingSEMI International Standards Program
Information and Control China TC Chapter Kickoff Meeting
Wednesday, November 17, 2021
9:30-12:10
Shanghai, China
08:30 – 09:00 Registration
09:00 – 09:20 Welcome
09:20 – 10:15 Procedural Training & SEMI Standards Regulation
10:15 – 11:20 Prepare for 1st TC Chapter Meeting Agenda
11:20 – 11:50 Official Virtual TC Chapter Meeting (OVTCCM) Simulation
11:50 – 12:05 1st TC Meeting Date & Locale
12:05 – 12:15 Group Photo
Web Meeting link：Click here
Standards Contact information:
Isadora Jin
SEMI China
Email: [email protected]
Phone: 86.21.6027.8578Shanghai ChinaSEMI.org[email protected]America/Los_Angelespublic
PV and PV Materials China Joint TC Chapter Fall Meeting 2021
1st floor, 4th Building of LEED INTERNATIONAL, Yangtze River Delta Capital Service Base
No. 1158 Zhangdong Road, Shanghai
» Venue to Shanghai Pudong International Airport 27 miles, 25 minutes’ drive.
» Venue to Shanghai Hongqiao International Airport 40 miles, 55 minutes’ drive.
» Venue to Shanghai Hongqiao Railway Station 40 miles, 55 minutes’ drive.
» Venue to metro Line 2 Guanglan Road Station 3 miles, 8 minutes’ drive.
SEMI International Standards Program
PV and PV Materials China Joint TC Chapter Fall Meeting 2021
Wednesday, November 17, 2021
13:30-17:00
Shanghai, China
13:00 – 13:30 Registration
13:30 – 13:50 Welcome
13:50 – 13:55 Review and Approval of Previous Meeting Minutes
13:55 – 14:00 SEMI Staff Report
14:00 – 14:15 Liaison Reports
14:15 – 15:00 Task Forces Reports
15:00 – 16:00 Request for Global Ballots Cycle
16:00 – 16:30 5-Year-Review SNARF
16:30 – 16:45 New Action Items Review
16:45 – 16:50 Next Meeting Date & Locale
Standards meetings are open to all, but you must be a SEMI Standards Program Member to attend.
If you are not a Member, please register for the International SEMI Standards Program and start making a big contribution to the industry’s progress, complete an application form today!
Questions? Contact your local staff coordinator: Click here
Off
Add to Calendar2021-11-17 00:00:002021-11-17 00:00:00Traceability North America TC Chapter Fall Meeting 2021Traceability North America TC Chapter
Fall Meeting 2021
Date: Wednesday, November 17, 2021
Time: 8:00 AM-1:00 PM Pacific
Online via Virtual Meeting
AGENDA
(subject to change)
Last updated: November 15, 2021
NOTE:
Standards meetings are open to all, but you must be a SEMI Standards Program Member to attend.
If you are not a Member, please register for the International SEMI Standards Program and start making a big contribution to the industry’s progress, complete an application form today!
Questions? Contact your local staff coordinator: Click here Online, Pacific Time United StatesSEMI.org[email protected]America/Los_Angelespublic
9:00 am - 5:30 pm
Off
Add to Calendar2021-09-28 09:00:002021-09-28 17:30:00BIPV TASK FORCE MEETINGBIPV TASK FORCE MEETING
光伏建筑一体化（BIPV）屋顶抗风揭试验方法标准交流会ChinaSEMI.org[email protected]America/Los_Angelespublic
10:00 am - 11:30 am
Off
Add to Calendar2021-09-17 10:00:002021-09-17 11:30:004H-SiC Homoepitaxial Wafer Task Force Meeting 会议邀请：4H-SiC同质外延片工作组线上会议
4H-SiC Homoepitaxial Wafer Task Force Meeting
Meeting：Link
Friday, September 17, 2021
10:00-11:30ChinaSEMI.org[email protected]America/Los_Angelespublic
Do you sometimes feel like you are operating in the dark when dealing with the new challenges and opportunities in process and design? These continue to emerge in parallel to ever shrinking semiconductor device geometries.
While Moore’s law and beyond are driving scale reduction, the industry is facing increased process sensitivity and complexity, and is redefining on-wafer defect tolerance in terms of size and complexity.
To detect, identify, understand the source and eliminate yield limiter defectivity are key for total wafer environment contamination characterization and control and are essential for yield enhancement to ensure the success of the latest technology nodes.
It is more imperative than ever that the semiconductor industry works together to enable improved defect detection, speciation/characterization metrology, and as needed, hybrid analytical technology for upcoming HVM readiness.
Join us for this session for speakers and discussion on tackling some of these industry challenges.
Virtual United States
7:30 am
-
7:35 am
Paul Trio
Senior Manager, Strategic Initiatives
SEMI
Welcome
7:35 am
-
7:55 am
Archita Sengupta
Sr. Technologist
Intel
IDM Perspective of Defectivity with regard to Next-Gen Metrology and Analysis Tools
New challenges and opportunities in process and design continue to emerge in parallel to ever shrinking semiconductor device geometries. While Moore’s law and beyond are driving scale reduction, the industry is facing increased process sensitivity and complexity, and is redefining on-wafer defect tolerance in terms of size and complexity.
Join us for this webinar-like session to discuss best-known methods from industry leaders
Challenges in Metrology & Analysis for Next Gen Semiconductor Industry
7:30 am - 10:00 am
Off
Add to Calendar Disabled
America/Los_Angeles
