Oxford Instruments, a leading provider of advanced plasma processing solutions, today announced a plasma equipment supply agreement with Applied Optoelectronics Inc. (AOI) (Nasdaq: AAOI), a leading provider of advanced optical and hybrid fibre-coaxial networking products that power the internet, for several etch and deposition cluster systems at their facility in Sugar Land, Texas.

The agreement will support AOI’s transformative expansion and technological advancements in indium phosphide (InP) for optoelectronic device manufacturing, as the company rapidly scales to increase production capacity within the U.S.

As AOI undergoes a significant growth phase, the company is upgrading its production capabilities to meet increasing demand for high-performance InP optoelectronic devices. Oxford Instruments’ advanced plasma etch and deposition processing systems will play a key role in this transformation by supporting AOI with fully automated 3-4-6-inch capable production systems for InP processes.

“AOI is expanding its U.S. manufacturing capacity in Texas to support demand for our optical transceivers in AI datacentres, and key suppliers like Oxford Instruments will help us continue to upgrade our fully automated production line,” said Fred Chang, Senior Vice President and North American General Manager at AOI. “With our combined technology, we can speed the processing of multiple wafer sizes, ranging from 3 to 6 inches, while improving overall quality and reducing costs.”

“AOI has been a valued long-term partner, and we are thrilled to have earned their trust as the chosen supplier for their production expansion and technology upgrades. Our unique high-temperature Electrostatic Chuck (ESC) design, which enables advanced processing capabilities, was a key factor in their decision. AOI also conducted an extensive vendor qualification process, including a visit to our brand-new purpose-built manufacturing facility in Bristol, UK, where we received high praise for our technology and production capabilities,” said Emiel Thijssen, Vice President of Sales and Business Development USA, Oxford Instruments Plasma Technology. “We are also investing significantly to ensure we continue to deliver world-class service capability in the Texas region, focusing on the availability of spares and expanding our field service and process engineering teams, to support the rapid expansion of leading manufacturers in the region such as AOI.”

###

 
For media enquiries, please contact:
Grant Baldwin, Head of Marketing
Oxford Instruments Plasma Technology
E: [email protected]
About Oxford Instruments plc
Oxford Instruments provides academic and commercial organisations worldwide with market-leading scientific technology and expertise across its key market segments: Materials Analysis, Healthcare & Life Science and Semiconductors. Innovation is the driving force behind Oxford Instruments' growth and success, supporting its core purpose to accelerate the breakthroughs that create a brighter future for our world. The vigorous search for new ways to make our world greener, healthier and more productive is driving unprecedented levels of R&D investment in new materials and techniques to support productivity and decarbonisation worldwide, creating a significant opportunity for Oxford Instruments to grow.

Oxford Instruments holds a unique position to anticipate global drivers and connect academic researchers with commercial applications engineers, acting as a catalyst that powers real world progress. Founded in 1959 as the first technology business to be spun out from Oxford University, Oxford Instruments is now a global company listed on the FTSE250 index of the London Stock Exchange (OXIG).

For more information, visit www.oxinst.com

About AOI 
Applied Optoelectronics, Inc. (AOI) is a leading developer and manufacturer of advanced optical and HFC networking products that are the building blocks for AI datacentres, CATV and broadband fibre access networks around the world. AOI supplies this critical infrastructure to tier-one customers across cloud computing, CATV broadband, telecom, and FTTH markets. The company has R&D facilities in Atlanta, GA, and engineering and manufacturing facilities at its corporate headquarters in Sugar Land, TX, as well as in Taipei, Taiwan and Ningbo, China. For additional information, visit www.ao-inc.com. 

• Read more about OXFORD INSTRUMENTS TEAMS WITH AOI TO BOOST ITS OPTOELECTRONIC DEVICE MANUFACTURING WITH NEXT-GEN INDIUM PHOSPHIDE

Advancing Thermal Scanning Probe Lithography

Zurich, Switzerland — Following the successful introduction of the modular NanoFrazor nanolithography system in 2024, Heidelberg Instruments is proud to announce the installation of the newest NanoFrazor. The system is equipped with the recent modules, enabling parallelized thermal scanning probe lithography (t-SPL). The beta site is hosted by the research partner EPFL, the Swiss Federal Institute of Technology in Lausanne, Switzerland. The installation marks a significant step forward in joint efforts to bring next-generation nanofabrication technologies into practice, promising advances in nanoscale research and applications.

Designed for high-resolution lithography down to 20 nm, with application flexibility and increased throughput, the system features parallelized t-SPL with ten heated tips writing simultaneously, Direct Laser Sublimation (DLS), and advanced automation. “Parallelizing t-SPL was the logical next step in advancing thermal nanolithography. The implementation, however, was far from trivial.” states Dr. Emine Cagin, CTO of Heidelberg Instruments Nano AG. “Parallelization required a decade of development, culminating in a new and scalable framework for electronics and software that now powers the new NanoFrazor.”

The new module, named the Decapede, increases the throughput up to tenfold, without compromising on high-resolution capabilities. “With improved throughput, we are considering upscaling grayscale nano surfaces that enable deterministic and localized strain engineering of 2D materials from chip-level to wafer-scale for potential industrial integration”, says Berke Erbas, Postdoctoral Researcher in the Microsystems Laboratory at EPFL. “We also aim to upscale grayscale nanoimprint lithography stamps fabricated through t-SPL and dry-etching approaches.”

EPFL — A Hub for Innovation
EPFL’s expertise in t-SPL and broad nanofabrication capabilities make it an ideal beta site and mark the continuation of a long-standing, trusted partnership with Heidelberg Instruments. The consortium of research groups involved brings together a combination of deep knowledge in t-SPL and diverse nanofabrication techniques, along with fresh ideas and challenging applications. The generous commitment to providing continuous feedback will help Heidelberg Instruments further validate the system performance and refine user interfaces.

From Nanoelectronics to Quantum Devices, a Look Ahead
The EPFL beta site is not only a testing and validation site for the system’s capabilities but first and foremost a catalyst for innovation in nanolithography. Applications at the EPFL beta site span nanoelectronics, plasmonics, quantum devices, and bio-nano-sensors. Jürgen Brugger, Professor in Microengineering and Materials Science at EPFL, highlights: “t-SPL has proven to be an excellent tool for educating junior researchers due to its capabilities for fast prototyping with a low threshold to create nano-patterns in short time scales. We are excited to expand towards parallel writing capabilities.” For example, the Laboratory of Nanoscience for Energy Technologies (LNET), Professor Giulia Tagliabue, is exploring the use of its gray-scale functionalities for realizing advanced metasurfaces that can strongly confine light at nanoscale dimensions for energy conversion and probing of interfacial processes.

We are looking forward to seeing how the beta site will accelerate discoveries and enable new possibilities in nanoscale science, both in research and educational use of the NanoFrazor system.

Further information: https://heidelberg-instruments.com/product/nanofrazor/

• Read more about Heidelberg Instruments — Beta Site Installation of NanoFrazor with Parallelization Capabilities at EPFL

Gütenbach, Germany – December 16, 2025 – RENA Technologies is proud to be a key industrial partner in a new 1.3 million Euro Government-funded project led by the National Physical Laboratory (NPL) and supported by the Department for Science, Innovation and Technology (DSIT). The initiative will establish critical new metrology capabilities to strengthen the UK’s semiconductor innovation infrastructure and accelerate the development and adoption of next-generation semiconductor materials and processes.

This strategic investment underlines the UK’s commitment to maintaining global competitiveness in semiconductors, helping to attract private investment, strengthen supply chains, and support long-term economic growth. As advanced semiconductor materials become central to technologies such as electric vehicles, renewable energy, 5G communications and advanced electronics, robust measurement, verification and standards are increasingly essential.

The project brings together a broad consortium spanning industry and academia. Together, the partners cover the full innovation landscape, from materials research and process development to device fabrication and performance verification.

“At RENA, we develop advanced wet processing and surface treatment solutions that are critical in manufacturing of compound semiconductors and emerging materials. Through this collaboration, RENA will contribute industrial insight and process expertise to ensure that new measurement and testing capabilities are closely aligned with real manufacturing challenges.” States Peter Schneidewind, CEO of RENA Technologies.

While silicon remains the foundation of much of today’s semiconductor industry, many high-growth applications increasingly depend on advanced materials such as gallium arsenide (GaAs), gallium nitride (GaN), silicon carbide (SiC), and indium phosphide (InP). These materials offer superior performance in high-power, high-frequency and optoelectronic applications, but they also introduce new complexities in processing, characterization and quality assurance. Reliable standards and independent measurement methods are therefore essential to derisk innovation and support scale-up.

Through this project, consortium partners will work with NPL to:
• Develop new UK measurement and test capabilities for advanced semiconductor materials by combining academic research excellence with world-leading metrology expertise.
• Apply these capabilities to critical industry challenges, including assessing material integrity, verifying RF performance, and testing device reliability under demanding operating conditions.
• Share the resulting capabilities openly with industry, helping to build national consensus and strengthen the UK’s influence in international standards development for novel semiconductor technologies.

Following extensive consultation the consortium has identified three priority application areas where the UK can have the greatest global impact: power electronics, RF-communications, and optoelectronics. These areas align closely with RENA’s customer base and technology roadmap, particularly in power and compound semiconductor manufacturing.
By participating in this program, RENA reinforces its commitment to supporting the UK semiconductor ecosystem with industrially relevant innovation, enabling customers to adopt advanced materials with confidence, and helping position the UK as a global leader in next-generation semiconductor technologies.

About NPL
The National Physical Laboratory (NPL) is the UK's National Metrology Institute (NMI), developing and maintaining the national primary measurement standards, as well as collaborating with other NMIs to maintain the international system of measurement. As a public sector research establishment, it delivers extraordinary impact by providing the measurement capability that underpins the UK's prosperity and quality of life. NPL develops the metrology required to ensure the timely and successful deployment of new technologies and work with organizations as they develop and test new products and processes.

About RENA Technologies GmbH
RENA Technologies is a leading global supplier of production machines for wet chemical surface preparation. RENA products are used in path-breaking application fields such as semiconductors, MedTech, renewable energies, and the glass industry. RENA equipment is used to treat or modify surfaces of, for example, semiconductor wafers, solar cells, glass, optical substrates or other high-tech products using wet chemical processes. RENA offers proven standard machines as well as customer-specific solutions and process support.

• Read more about RENA joins UK Government-funded consortium to strengthen national semiconductor metrology capabilities

Tirana, November 2025 – Atronix Sh.p.k., Albania’s pioneering Electronics Manufacturing Services company, officially inaugurated in November its new production facility at Tirana Industrial Park. The event marks a historic moment for Albania’s industrial landscape, establishing the country’s first advanced EMS factory with capacity to serve European and North American markets.

Equipped with the latest generation of JUKI SMT Production line with advanced AOI/X-ray inspection ERSA selective and wave soldering, and fully integrated traceability systems, Atronix introduces advanced technological capabilities. 

The inauguration ceremony brought together distinguished guests, including leading figures from the European electronics industry Mr. Dieter Weiss, EBRD representatives. Ms. Ekaterina Solovova, Ms. Egla Ballta, JUKI Europe Mr. Kenji Hirohata, Mr. Rui Vidal and Mr. Davor Jakulin international and national business partners, representatives from the Albanian Government, Academia and Universities, etc. 

“Our vision from the beginning was clear: to build a factory that stands at the same level with Europe’s most advanced EMS providers,” said Ms. Enkeleda Kuka, Founder & CEO of Atronix. “Today, we are proud to show that Albania can compete in high-precision electronics manufacturing.” During the ceremony, Atronix extended appreciation to its international collaborators, including JUKI Europe, Kurtz-Ersa, and several global clients and advisors who have contributed to the company’s rapid development. 

“In this challenging business climate, it is very good to see a new EMS company being opened in Albania. Eastern Europe will see a strong growth of electronic production in the future and Atronix will participate in this development.” said Mr. Dieter G. Weiss, European EMS industry expert and longstanding supporter of the project. 

This factory sets a new standard for high-value manufacturing in the country and demonstrates how it can transform Albania's industrial landscape. EBRD has supported Atronix through our Advice for Small Business program and looks forward to the future successes of Atronix" said Ms Ekaterina Solovova, Head of Albania, EBRD.

With its inaugural production lines now operational, Atronix is preparing for a strong expansion phase, targeting new partnerships in Electronic Manufacturing and broader industrial integration across Europe and North America. 

“Atronix symbolizes what the next chapter of Albanian industry can look like,” added Ms. Kuka. “We are committed not only to manufacturing high-quality electronics, but also to building trust, reliability, and long-term value for every client who chooses Albania as their production base. 

www.atronix.al; [email protected]; Tirana Industrial Park 48, Kashar, Tirana,  Albania

• Read more about Atronix Inaugurates Albania’s First Advanced Electronics Manufacturing Factory

Second-generation platform delivers advanced control, in-cycle annealing, and high-throughput performance for Wide Bandgap power and RF device manufacturing

Espoo, Finland, November 24, 2025 – Beneq introduces the Beneq Transform® XP, a second-generation ALD platform developed to meet the performance demands of Wide Bandgap (WBG) power and RF device technology development and manufacturing. Building on the proven Beneq Transform® platform, the new system adds advanced ALD control, faster cycle times, and greater process capabilities in a high-throughput format.

The Beneq Transform® XP features a second-generation, flow-optimized 25-wafer mini-batch thermal ALD reactor that achieves breakthrough deposition rates with single-digit-second cycle times for common ALD oxides and nitrides. Refined flow and pressure dynamics ensure exceptional within-wafer and wafer-to-wafer uniformity – even at a few nm film thicknesses – while precise dwell-time control delivers excellent conformality on high-aspect-ratio structures.

Transform® XP also introduces advanced PEALD process control to precisely manage low-energy ions. This enables optimized plasma pre-cleaning and deposition, resulting in improved interface quality, tunable passivation, and enhanced device performance and reliability. The system integrates in-cycle annealing, a proprietary step that densifies and purifies films to achieve stoichiometric, low-impurity materials and crystalline alignment, such as AlN lattice orientation.

“Transform® XP is our response to the next wave of device challenges in power and RF manufacturing,” said Dr. Mikko Söderlund, Head of Sales, Semiconductor ALD at Beneq. “Customers value the original Transform® for its versatility and reliability. With XP, we introduce capabilities they specifically asked for – improved ion control, faster cycles, and in-cycle film densification – all in a versatile platform.”

With over a dozen Beneq Transform® clusters installed globally for WBG pilot and production use, and more than 100 process modules shipped, Beneq continues to support leading IDMs, foundries, and RTOs advancing More-than-Moore technologies.

About Beneq

Beneq pioneered industrial production of Atomic Layer Deposition (ALD) with the introduction of the first commercial ALD equipment in 1984. Today, Beneq advances ALD adoption and validation with a portfolio that includes the Beneq Transform®, Transform XP, Transform 300, Transmute™, and Prodigy™ for specialty semiconductor device fabrication; TFS 200 and TFS 500 for R&D; the P400A, P800, and P1500 batch systems for coating critical semiconductor chamber components and complex part geometries; and spatial ALD platforms such as the C2R™ and Genesis for roll-to-roll processing. Headquartered in Espoo, Finland, Beneq enables ALD integration from lab to fab for semiconductors, optics, and functional coatings.

Press Contact
Charlotte Bärlund
Event and Communications Lead
[email protected]

• Read more about Beneq Launches Beneq Transform® XP – Redefining Atomic Control in ALD

Breker Verification Systems today confirmed its RISC-V functional verification solutions were pivotal for verification of the NOEL-V, one of Frontgrade Gaisler’s fault-tolerant RISC-V processor IP cores.

“The development of Frontgrade Gaisler’s IP cores is guided by a philosophy that does not tolerate design issues,” notes Jan Andersson, Director of Engineering at Frontgrade Gaisler. “This demands the most robust verification environment, something Breker’s verification solution has contributed to improve, with its broad range of tests and in-depth corner case coverage.”

The ultra-high verification coverage afforded by Breker’s RISC-V SystemVIP and Test Suite Synthesis products make it a key technology in Frontgrade Gaisler’s development program. Breker provides test suites for the complete verification of RISC-V cores and SoCs from detailed microarchitectural analysis to advanced system integrity validation.

The NOEL-V processor by Frontgrade Gaisler, targets high-reliability applications, with its high-performance and fault-tolerant design. Built on the RISC-V architecture, NOEL-V offers customization options, allowing SoC designers to create solutions tailored to their specific needs. The processor is at the heart of the GR765, Frontgrade’s next-generation radiation-hardened space microprocessor.

“We are delighted to work with Frontgrade Gaisler to achieve their extreme coverage goals and eliminate unpredictable corner cases, both of which are necessary given the extreme environments in which their devices are deployed,” says David Kelf, Breker’s CEO. “Our RISC-V test suites have become an essential component in the development flows of over 20 commercial entities and other organizations, providing us with unique experience with the numerous unusual verification issues inherent in these processors.”

Breker extended testing to target advanced, system-level integrity, in addition to its existing test suites and generators focused on instruction set architecture testing, included in its RISC-V SystemVIP. It provides coverage by driving cross functional stress verification and unpredictable corner case discovery with its test suite synthesis technology applied across the verification flow from simulation, through emulation and prototyping to post silicon validation.

About Frontgrade Gaisler
Frontgrade Gaisler, a Frontgrade company, is a leading provider of radiation-hardened microprocessors and IP cores for critical applications, particularly in the space industry. The company’s processors are ideal for any space mission or other high-reliability application due to their reliability, fault tolerance, and radiation tolerance. Frontgrade Gaisler microprocessors can be found all over the solar system, from Mercury to Neptune. www.gaisler.com

About Breker Verification Systems
Breker Verification Systems solves complex semiconductor challenges across the functional verification process from streamlining UVM-based testbench composition to execution for IP block verification, significantly enhancing SoC integration and firmware verification with automated solutions that provide test content portability and reuse. Breker’s solutions include a SystemVIP library of scenarios for RISC-V and Arm, core and SoC testing, coherency, security and other critical areas. Breker solutions easily layer into existing environments and operate across simulation, emulation, prototyping, and post-silicon execution platforms. Its Trek family is production-proven at leading semiconductor companies worldwide and enables design managers and verification engineers to realize measurable productivity gains, speed coverage closure and easy verification knowledge reuse. As a leader in the development of the Accellera Portable Stimulus Standard (PSS), privately held Breker has a reputation for dramatically reducing verification schedules in advanced development environments. Case studies that feature Analog Devices, Broadcom, IBM and other companies leveraging Breker’s solutions are available on the Breker website.

Engage with Breker at:
Website: www.brekersystems.com
Twitter: @BrekerSystems
LinkedIn: https://www.linkedin.com/company/breker-verification-systems/

• Read more about Breker Verification Systems and Frontgrade Gaisler Collaborate on High-Reliability RISC-V Fault-Tolerant Processor Core

New platform delivers ALD film quality at production throughput for Wide Bandgap and other specialty device manufacturing

Espoo, Finland, November 19, 2025 – Beneq, a global leader in Atomic Layer Deposition (ALD) equipment and solutions, today announced Beneq Transmute™, a next-generation ALD platform designed for high-volume semiconductor manufacturing. Engineered for high volume production of Wide Bandgap (WBG) power electronics, advanced RF devices, μLED and other specialty devices, Beneq Transmute™ combines performance, scalability, and cost efficiency in one system.

Atomic precision at manufacturing speed

Beneq Transmute™ extends the performance of the Beneq Transform® XP platform into production environments with Beneq’s proprietary 3-step ALD architecture. By combining plasma pre-treatment, plasma-enhanced ALD (PEALD), and thermal batch ALD, the platform delivers conformal, high-performance dielectric stacks with atomic-level interface control – now at high throughput.

Its flow-uniform 25-wafer chambers, paired with advanced precursor dosing technology, enable rapid cycle times, optimized wafer coverage, and reduced precursor waste – resulting in a low cost of ownership across a broad range of semiconductor applications.

“Beneq Transmute™ represents a major leap forward in making ALD a truly high-volume manufacturing solution,” said Lucas Monteiro, Head of Product at Beneq. “By combining the precision of ALD with throughput and scalability that match production demands, we are giving our customers the ability to produce next-generation Wide Bandgap and RF devices at high throughput and low cost of ownership – with the uncompromised film quality that Beneq is known for.”

Designed for dedicated production requirements

Beneq Transmute™ supports both thermal and plasma-enhanced ALD within a modular cluster architecture that enables dedicated configurations. With up to two transfer chambers and eleven process module slots – including PEALD, Thermal, Buffer, and Preheater – each system can be tailored to match specific customer applications and fab roadmaps while ensuring long-term scalability.

Enabling the next wave of electronics

Beneq Transmute™ directly supports key semiconductor market trends – including the electrification of transport, adoption of renewable energy, 5G and RF communications, data centers and next-generation displays. Its combination of atomic precision and production throughput positions Beneq as a technology enabler for a more efficient, connected, and sustainable future.

About Beneq

Beneq pioneered industrial Atomic Layer Deposition (ALD) with the introduction of the first commercial ALD equipment in 1984. Today, Beneq advances ALD technology adoption and validation with a portfolio that includes Transform®, Transform® 300, and Prodigy™ for specialty semiconductor device fabrication; TFS 200 and TFS 500 for R&D; and innovative spatial ALD platforms such as the C2R™ and Genesis for rolltoroll processing. Beneq’s systems support process innovation from lab to fab, enabling integration of ALD in advanced manufacturing. Headquartered in Espoo, Finland, Beneq operates globally to help customers scale ALD solutions for the future of semiconductors, optics, and functional coatings.

Press Contact:
Charlotte Bärlund
Event and Communications Lead
[email protected]

• Read more about Beneq Unveils Beneq Transmute™ – High-Throughput ALD for Power, RF, and μLED Device Production

New SECS-II library helps fabs and OEMs integrate semiconductor tools with the MES in hybrid manufacturing sites, ensuring faster time to market and limiting integration costs

MUNICH, November 18, 2025 – Agileo Automation, a leading provider of control and connectivity solutions for global semiconductor manufacturing, today unveils Agil’SECS-II at Booth #C2518 at SEMICON Europa 2025. This new SECS-II library, featuring built-in SEMI standard communication, enables a manufacturing execution system (MES) to accelerate the integration and validation of hybrid semiconductor and traditional manufacturing tools on production lines, ensuring faster time to market, lower integration costs, and reduced deployment risks. With this connection gateway, users can send and receive any SEMI SECS-II-compliant message as host or equipment for full GEM and GEM300 equipment integration and validation. This product can prove valuable for a variety of customers:

• Pure semiconductor original equipment manufacturers (OEMs) that need a practical way to develop an MES simulator and exercise their equipment under fab-like conditions. For small production lines or multi-tool set-ups exchanging data through SECS/GEM, Agil’SECS-II allows OEMs to design, test, and validate their equipment efficiently before shipping it to fabs.

• Customized, multi-industry, or low-volume production sites that use an MES system to integrate both traditional production machines and semiconductor tools. Agil’SECS-II simplifies integration in mixed equipment environments, especially where the MES cannot use SECS/GEM because most tools rely on protocols such as OPC UA, Modbus, or MQTT, yet semiconductor equipment using SECS/GEM must be integrated within the same MES.

• Laboratories and pilot lines without a full-featured MES that require a driver to collect data from various types of manufacturing equipment, including process, inspection, and metrology tools, to ensure quality and process control as well as complete traceability.

“With Agil’SECS-II, we wanted to provide a flexible tool that can serve multiple types of customers who can benefit from a proven software foundation built on more than 15 years of deployment experience in semiconductor fabs worldwide,” explains Marc Engel, chief executive officer of Agileo Automation. “Our SECS-II driver is especially useful for validating the processes of hybrid fabs that combine semiconductor and non-semiconductor manufacturing equipment, such as silicon carbide (SiC) wafer production lines or advanced packaging lines. It enables product and process traceability with legacy MES and helps OEMs developing equipment for these lines create MES simulators to verify information flow between tools using heterogeneous communication protocols.”

- ends -

About Agileo Automation
Agileo Automation is a trusted partner for equipment manufacturers, helping them build smarter, automated, and more connected machines that integrate seamlessly into advanced semiconductor fabs. Founded in 2010 in Poitiers, France, Agileo Automation helps OEMs optimize control, communication, data acquisition, and testing across their tools through proven software frameworks, applications, and expert support. Its flagship A²ECF-SEMI framework provides a solid foundation for developing equipment controllers fully aligned with SEMI SECS/GEM, GEM300, and EDA standards. As an active member of SEMI and the OPC Foundation, Agileo Automation contributes directly to shaping the standards that drive Industry 4.0 manufacturing. For more information, please visit our website or follow us on LinkedIn.

• Read more about Agileo Automation Launches Agil’SECS-II to Enable Semiconductor OEMs, Multi-Industry Fabs, and Labs to Accelerate Equipment Integration on Production Lines

RENA Technologies marks a new milestone in the semiconductor industry with the launch of Vanguard, a state-of-the-art, fully automated single-wafer platform designed for wet chemical cleaning, etching, and drying of 200mm and 300mm wafers. Engineered for performance, efficiency, and scalability, Vanguard offers new possibilities for advanced semiconductor manufacturing.

Broaden the Possibilities in Wafer Wet Processing

Vanguard is purpose-built to address the rising demands of next-generation semiconductor substrates and materials. Supporting 4 to 8 independent processing chambers within a compact footprint, the system delivers high throughput without compromising cleanroom space. Its advanced chemical cleaning and double-sided processing—handling up to five distinct chemistries—minimizes contamination, substrate damage, and defects, ensuring wafers meet the stringent yield and quality requirements of cutting-edge chip manufacturing.

"With the launch of our new semiconductor wet processing platform, we are entering a new aera in precision, efficiency, and reliability for advanced chip manufacturing. This machine embodies our commitment to innovation—delivering not only superior process control but also the flexibility our customers need to stay ahead in a rapidly evolving industry. It represents a decisive step in enabling the next generation of semiconductor technologies for both high-volume manufacturing lines and R&D fabs." Emphasizes Peter Schneidewind, CEO of RENA Technologies.

Scalable, Modular Design 

Vanguard’s modular architecture grows with customer needs. Fabs can easily adjust chamber count and process configurations to match evolving requirements, from R&D to high-volume production.
The platform integrates internal chemistry preparation for precise formulation control, ensuring consistent process delivery and minimizing chemical consumption. This reduces operating costs and environmental impact—key considerations for sustainable fabs.

Serviceability is also built-in: each chamber operates independently, allowing maintenance without halting production. Combined with AI-assisted process control, and the digital service platform RENA Connect Hub, customers gain maximum uptime and efficiency.

Next-Level Automation and Compatibility

With its digital twin simulation, customers can model system integration, test interfaces, and even simulate throughput with real process data—well before installation. Training and upgrades can be conducted seamlessly during live production.

Fully GEM300 compatible, Vanguard is integration-ready from day one. Operating within a Class 1 mini environment, it guarantees ultra-clean wafer handling, while its advanced drying ensures residue-free, pristine surfaces for downstream processing.

Key Features at a Glance

• Fully automated wet processing for 200mm / 300mm wafers
• Scalable from 4 to 8 single-wafer chambers
• Double-sided cleaning with up to 5 chemicals
• Internal chemistry preparation system
• AI-assisted software with predictive maintenance
• Advanced drying technology
• Class 1 mini environment for ultra-clean operation
• Compact footprint with high-throughput capability
• GEM300 factory-integration ready
• Low chemical usage for reduced cost and environmental impact 

Availability

Vanguard is officially available as of today. Semiconductor fabs and foundries seeking to modernize their wet processing capabilities now have access to a solution that combines performance, scalability, and sustainability—delivered today for the challenges of tomorrow.

• Read more about Introducing Vanguard: The New Single-Wafer Cleaning and Etching Tool from RENA Technologies