Showing 301 - 312 of 11338
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SPCC 2026 Bio - Shumei Fu
BIOGRAPHY Shumei Fu is a Staff Engineer in Wet Process Engineering at Micron Technology, Inc., with extensive experience in advanced semiconductor manufacturing. Her work focuses on wet and dry...
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SPCC 2026 Bio - Nicole Williams
Does Pressure Drop Correlate with Filter Lifetime of Sub-50NM Filtration Solutions?ABSTRACTContamination control in semiconductor unit processes relies on various filtration solutions. These...
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SPCC 2026 Bio - Naoko Kuwabara
Wafer-level Validation of Si Trimming Process by Wet Etching in 3D DRAM ApplicationsABTRACTThree-dimensional DRAM (3D DRAM) architectures require highly uniform isotropic silicon etching within...
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SPCC 2026 Bio - Kusum Maharjan
Reducing CFET wet clean process defectivity with advanced liquid filtration solutions ABSTRACTControlling contamination in the advanced semiconductor manufacturing process continues to grow in...
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The Evolving Path for Waste in Semiconductor Manufacturing
An Alchemist's Dream of Turning Waste to Revenue
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SPCC 2026 Bio - Ka Cheong "Tim" Lau
Use of Silicon-Based Additives and Their Mechanistic Role in Enhancing the Selectivity of Wet Etching Process on Sige over Si/SioABSTACTSelective etching is a critical enabler for nascent advanced...
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SPCC 2026 Abstract & Bio - Juili Parab
Challenges and Benefits of Using 2-in-1 Filtration Solutions for Contamination Control in Semiconductor Deionized Water (Diw) ApplicationsABSTACTUltrapure deionized water (DIW) is essential in...
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SPCC 2026 Bio - Jay Henderson
NMP Free Positive Photo Resist Stripping with E-GRADE® MEOXABSTACTHuntsman is committed to delivering solutions that support a more sustainable future. Our technologies help address critical...
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SPCC 2026 Bio - Huang-Di Lin
Development of Highly Sensitive Detection for Impurities and Nanoparticles in Liquid Chemicals Using Aerosol TechnologyABSTRACTIn semiconductor manufacturing, a wide variety of chemical solutions are...
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SPCC 2026 Bio - Harman Sangha
Atmospheric Plasma–Based Surface Cleaning Solutions for Advanced Electronics ManufacturingABSTRACTSThe continuous scaling and increasing complexity of electronic devices demand advanced surface...
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SPCC 2026 Bio - Greg Heiland
The Critical Role of Pre-Saturated Cleanroom Wipers in Contamination Control for Advanced Semiconductor ManufacturingABSTRACTAs semiconductor feature sizes continue to shrink and yield requirements...
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SPCC 2026 Bio - Emmanuel Anim-Danso
Low Stiction PFR FFKM and Related Test Method ABSTRACTPerfluoroelastomers (FFKMs) are key raw materials for producing seal elements for applications in semiconductor manufacturing. Beside the...