Challenges and Benefits of Using 2-in-1 Filtration Solutions for Contamination Control in Semiconductor Deionized Water (Diw) Applications
ABSTACT
Ultrapure deionized water (DIW) is essential in semiconductor fabs, demanding strict contamination control. At the point-of-use, cartridge filters act as the final defense against impurities. Traditionally, either particle-only filters targeting different types of particulate contaminants or purification-only solutions targeting metallic ion contaminants are used. Using filter and purifier devices in series is effective but impractical due to space and cost constraints. Contamination solutions combining particle removal and purification targets these different contaminants within a single device. Existing 2-in-1 filtration solutions address these contaminants but come with a significant flow penalty, creating a challenging paradigm for advanced nodes.
BIOGRAPHY
Juili Parab is a Senior Engineer in Solutions Engineering at Entegris Inc., where she works on the development and evaluation of advanced liquid filtration solutions for next‑generation semiconductor manufacturing. Her role includes leading experimental investigations, building fundamental product understanding, coordinating with global cross‑functional teams, and supporting product qualification and customer adoption. Juili holds a PhD in Chemical Engineering from the University of Massachusetts Amherst, where her research focused on catalysis.