Development of Highly Sensitive Detection for Impurities and Nanoparticles in Liquid Chemicals Using Aerosol Technology
ABSTRACT
In semiconductor manufacturing, a wide variety of chemical solutions are used throughout the process flow. As wafer fabrication has advanced to the nanometer scale, manufacturing yield has become increasingly sensitive to contamination introduced at individual processing steps. Accordingly, stringent quality control of chemical solutions is essential, requiring reliable and highly sensitive techniques for impurity monitoring.
In this study, we present an analytical instrument utilized aerosol measurement technology for the detection of non-volatile impurities in chemical solutions. The system covers advanced sensor technologies and provides high precision size resolution, achieving a particle detection limit down to 3 nm. The applicability of the instrument is demonstrated across a broad range of samples, including organic solvents (e.g., IPA, PGMEA, and PGME), acidic solutions (e.g., HCl, H₂O₂, and H₂SO₄), alkaline solutions (e.g., NH₄OH), and slurries.
BIOGRAPHY
Hello, I am an R&D Manager at Innovative Nanotech, Taiwan. I am responsible for the development and application of measurement systems for semiconductor process chemicals. Our solutions utilize aerosol measurement technology to detect non-volatile impurities with size resolution down to 3 nm, and are applicable to materials such as IPA, acidic and alkaline solutions, and slurries.