Accelerate the Artificial Intelligence Revolution

The SEMI Smart Data-AI Initiative's facilitation of the project with Cornell University showcased a practical example of applying AI / ML techniques to the challenging problem of predicting the physical structures on the wafer based on the lithography mask pattern. The project illustrated how such techniques can reduce the cycles of learning to counter growth in process complexity with each technology node.

The SEMI Smart Data-AI Initiative provides a framework where different functions within a fab come together to enable a higher level of manufacturing control and build an integrated feedback loop in real time. Using real-time data gathered through in-process analytical measurements, coupled with simultaneous decision-making made through AI algorithms, will better enable manufacturers to maintain high yielding process. DuPont is eager to incorporate these feedback loops in the development of production-worthy products and processes.