June 19, 2024
Sponsored by the Electronics business of Merck KGaA, Darmstadt, Germany
Time
4:00 pm - 5:00 pm CEST
Location
Germany
Sustainable Solutions for PFAS Replacements in Semiconductor Photolithography
This webinar is the 7th webinar in a series of webinars to explore trending topics on materials and semiconductor development, co-hosted with the Electronics business of Merck KGaA, Darmstadt, Germany.
Per- and poly-fluoroalkyl substances (PFAS) have come under increased scrutiny because all members of this class of compounds exhibit very high environmental persistence (vP), and it is highly probable that they will be subject to significant regulatory restrictions in the near future. At the same time, PFAS are crucial components of many process materials used in semiconductor photolithography, to the extent that the manufacture of advanced chips is currently not possible without them.
This interactive webinar will define the scope of the problem by outlining the areas of PFAS use in semiconductor photolithography and providing a mass balance for all PFAS used for it worldwide, followed by reports on the status of our company’s development of non-PFAS replacements for photoacid generators (PAGs) and top antireflective coatings (TARCs). It will conclude by examining the level of reduction of PFAS releases to wastewater that may be achieved by such replacements.
Why Attend?
Our Semiconductor Materials Series attracts professionals, business and technology leaders, researchers, academics, and industry analysts from across the electronics supply chain around the world.
Who Should Attend?
- Semiconductor Manufacturing: Engineers, researchers, and professionals involved in semiconductor manufacturing processes.
- Environmental Regulation and Compliance: Individuals responsible for ensuring environmental compliance and sustainability within the semiconductor industry.
- Chemical Engineering and Materials Science: Researchers and professionals with expertise in chemical engineering, materials science, and photolithography processes.
- Academic and Industry Researchers: Scholars, scientists, and industry researchers with an interest in advanced materials and sustainable semiconductor technologies.
Register today to access exclusive content during an interactive session.
You will be able to apply innovative techniques and best practices to solve your unique challenges.
Live Q&A will follow.
Attendees are invited to submit questions ahead of time at [email protected].
Agenda
Welcome Remarks
Presentations
Biography
Ralph R. Dammel (*April 29, 1954) received a Ph.D. in Chemistry from the J.W. Goethe University in Frankfurt/FRG in 1986. He has worked for Merck KGaA, Darmstadt, Germany, in Germany, the US, Hong Kong, and Thailand since then, and is currently employed as Technology Fellow in the CTO Office of the Electronics business.
Dr. Dammel is the author of over 200 scientific papers in chemistry and microlithography and is an inventor on over 470 patents in 100 patent families in the field. His monograph “Diazonaphthoquinone-based Resists” is generally recognized as the definitive book on the subject. In spring 2009, Dr. Dammel was elected as SPIE Fellow. He received the Photopolymer Science and Technology Outstanding Achievement Award in June 2011, SPIE’s Frits Zernicke Award for Microlithography in February 2015, and Merck KGaA’s Science Award in 2020.
Biography
Daniela Carja joined the Electronics business of Merck KGaA, Darmstadt, Germany in August 2021, following the completion of a postdoctoral program at King Abdullah University of Science and Technology (KAUST) in Saudi Arabia. She earned her PhD in Chemistry from the Petru Poni Institute in Romania.
Throughout her career, Daniela has co-authored over 30 papers in esteemed scientific journals, including Science and Nature Materials. She is a passionate researcher in the semiconductor industry, with the primary focus on making a positive impact and creating a sustainable future. Her motivation stems from solving complex problems with a long-term perspective.
Daniela thrives in collaborative, interdisciplinary, and international environments, where she can engage in cross-functional, innovative, and challenging topics that push the boundaries of what is possible. Her commitment and outstanding contributions were recognized when she and her Project Team were awarded the prestigious Merck Science Award in 2022.
Biography
Elizaveta (Liza) Kossoy joined Merck, KGaA, Darmstadt, Germany in 2017 at the Jerusalem site, and since then has been developing materials for Display and Semiconductor Industries. In her current role as a team leader, she is responsible for the development of sustainable solutions for Merck, KGaA, Darmstadt, Germany's top antireflective coating (TARC) products.
Liza did her PhD studies in Israel at the Weizmann Institute of Science in Organometallic Chemistry with Prof. D. Milstein. She joined Merck, KGaA, Darmstadt, Germany after coming back from her post-doctoral studies at the University of Zurich.
Live Q&A and Conclusions
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