Lansdale, PA – Greene Tweed, a global leader in advanced materials and high-performance solutions, is supporting customers who have ambitions to transition away from per- and polyfluoroalkyl substances (PFAS) with a robust portfolio of high-performance materials for critical applications. This expanding portfolio reinforces Greene Tweed’s commitment to its role as a material innovator and trusted partner in helping customers navigate the use of PFAS-free products.

As companies look to reduce PFAS throughout their operations, Greene Tweed's extensive portfolio of PFAS-free and/or non-fluorosurfactant (NFS) polymer-based products, including elastomers, thermoplastics, and composites, delivers exceptional performance and reliability. Key product lines such as Arlon®, Xycomp DLF®, Orthtek®, WR®, Fusion®, and Seal Connect® are designed to support challenging applications across industries ranging from aerospace and energy to semiconductor manufacturing.

"With the fluoropolymer industry at a critical juncture, we are seeing the demand for PFAS-free products grow significantly,” said Bret Neese, PhD, Director of Advanced Technology at Greene Tweed. "Our role is clear: Greene Tweed is an innovative solutions provider and collaborative partner for customers navigating this complex transition. By using PFAS-free and NFS polymers in our products, where possible, we’re helping our customers meet their PFAS reduction goals.”

Greene Tweed takes a holistic approach to PFAS-free innovation, grounded in regulatory readiness, supplier collaboration and diversification, and industry education. The company collaborates with customers to design surfactant-free and NFS polymer-based engineered solutions that offer exceptional durability, chemical resistance, and performance in extreme conditions. Its forward-looking technical roadmap ensures customers can use PFAS-free and/or NFS solutions without sacrificing quality or performance.

To further support customers, Greene Tweed is hosting a webinar, Innovating Beyond PFAS: High-Performance Solutions in the Evolving Fluoropolymers Landscape, on March 5, 2026. The presentation will provide insights into how the company is tackling PFAS changes through supplier collaboration, product diversification, and portfolio innovation.

For over 160 years, Greene Tweed has built a legacy of delivering high-performance solutions that empower customers to thrive in the most challenging environments. The introduction of its PFAS-free portfolio is another step forward in its mission to drive innovation for a better tomorrow. For a full list of Greene Tweed’s PFAS-free solutions, please visit the PFAS-Free Portfolio.

About Greene Tweed
Greene Tweed is a leading global manufacturer of high-performance thermoplastics, composites, seals, and engineered components. For 160 years, we have served clients in semiconductor, oil and gas, aerospace, defense, chemical and pharmaceutical processing, and other industries where failure is not an option. Greene Tweed products are sold and distributed worldwide. For additional information, call +1.215.256.9521, or visit our website at https://www.gtweed.com.

Media Contact
Sofia Doss
Communications & Public Relations Manager
Greene Tweed
[email protected]

Priya Sharma
Senior Account Manager
BCM Public Relations Ltd.
+44 (0) 20 3965 7415
[email protected]

• Read more about Greene Tweed Highlights Dedicated PFAS-Free Product Portfolio for the Evolving Fluoropolymers Landscape

Ball Wave Inc., a pioneer in advanced chemical sensing technology, today announced that its FT-450WT online trace moisture analyzer has received full certification from Taiwan's most advanced semiconductor manufacturer following rigorous validation testing. This milestone validates Ball Wave's proprietary ball SAW sensor technology and establishes the company as a strategic supplier in the critical semiconductor manufacturing equipment sector. The certification comes at a pivotal time as semiconductor manufacturers worldwide face increasing pressure to improve yield rates and reduce contamination in advanced node production. Ball Wave's technology addresses a critical pain point in fab operations, where even parts-per-billion levels of moisture can compromise chip quality and manufacturing efficiency. The successful certification demonstrates the analyzer's reliability in the most demanding production environments and opens significant commercial opportunities for specialty gas manufacturers who are the key players plagued with trace moisture contamination. 

Ball Wave President Shingo Akao stated, "This certification validates our core technology platform and demonstrates our ability to meet the stringent requirements of the world's most sophisticated semiconductor fabs to help them avoid unplanned shutdowns due to trace moisture contamination. Ball Wave's patented ball SAW sensor represents a fundamental breakthrough in trace moisture detection, offering speed and precision unmatched by legacy technologies. With proven performance in production environments and a robust IP portfolio, we are well-positioned to capture significant market share in the rapidly growing semiconductor manufacturing equipment sector, which is projected to exceed $156 billion by 2027¹."

Business Impact: For advanced semiconductor fabs operating at 3nm and below, moisture contamination can cost $5-10 million per incident² in scrapped wafers and production delays. Industry data shows that facilities with inadequate moisture monitoring experience maintenance ratios below 1.0, where unplanned repairs consume over 50% of total downtime. Ball Wave's real-time detection capability enables preventive action before contamination reaches critical levels, helping customers avoid these costly failures and maintain the operational stability (M-ratio >4.0) essential for profitable advanced node production. This value proposition has resonated strongly with leading fabs, creating a clear path to rapid customer adoption.

About the FT-450WT and Ball Wave's Technology Platform: The FalconTrace ultra-trace moisture meter uses a proprietary ball SAW sensor to quantitatively measure the trace amounts of water molecules contained in industrial gases and natural gases. Its extremely fast response time allows for real-time monitoring of changes in moisture content, and it is also capable of measuring both moisture content and background gas composition. It can accurately measure moisture concentrations in gases down to the 1 ppbv (parts per billion) level, representing 10-100x improvement over competing technologies. The FT-450WT is a high-end model that maintains its fast response time while prioritizing integration into equipment, and the separation of the sensor unit and main body allows for greater layout flexibility in fab retrofits and new tool installations. 

Ball Wave's technology platform extends beyond moisture analysis to a broader range of chemical sensing applications, creating multiple revenue streams and cross-selling opportunities within semiconductor fabs and adjacent industries, including pharmaceuticals, aerospace, and industrial gases. 

Market Opportunity and Strategic Position: Ball Wave has established relationships with leading semiconductor manufacturers in Taiwan, with active discussions underway in South Korea, Japan, and the United States 

• The company's technology addresses a growing market as advanced node production (5nm and below) requires increasingly stringent contamination control
• Ball Wave holds key patents in ball SAW sensor technology with additional applications pending in major semiconductor manufacturing regions
• The company's university origins provide access to cutting-edge MEMS research and ongoing innovation pipeline

About Ball Wave Inc.: Ball Wave Inc. is a technology company specializing in advanced chemical sensing solutions for critical industrial applications. Founded as a spin-out from Tohoku University, a global center of excellence in MEMS technology, Ball Wave leverages proprietary ball SAW sensor technology to deliver breakthrough performance in trace contamination detection. The company serves semiconductor manufacturers, industrial gas suppliers, and other industries requiring ultra-precise gas analysis. Ball Wave is headquartered in Sendai, Japan.

For inquiries regarding this matter, please contact: Ball Wave Inc., Corporate Strategy Division, Yusuke Tsukahara 

[email protected] 

Telephone: +81-3-5979-2357 

https://www.ballwave.jp/ 

1. https://www.semi.org/en/semi-press-release/global-semiconductor-equipment-sales-projected-to-reach-a-record-of-156-billion-dollars-in-2027-semi-reports 

2. https://www.mckinsey.com/industries/semiconductors/our-insights/need-to-boost-semiconductor-fab-efficiency-look-to-maintenance

• Read more about Ball Wave Receives Certification from Taiwan's Leading Semiconductor Manufacturer for Revolutionary PPB-rated, Real-time, In-situ, Trace Moisture Analyzer

Gütenbach, Germany – December 16, 2025 – RENA Technologies is proud to be a key industrial partner in a new 1.3 million Euro Government-funded project led by the National Physical Laboratory (NPL) and supported by the Department for Science, Innovation and Technology (DSIT). The initiative will establish critical new metrology capabilities to strengthen the UK’s semiconductor innovation infrastructure and accelerate the development and adoption of next-generation semiconductor materials and processes.

This strategic investment underlines the UK’s commitment to maintaining global competitiveness in semiconductors, helping to attract private investment, strengthen supply chains, and support long-term economic growth. As advanced semiconductor materials become central to technologies such as electric vehicles, renewable energy, 5G communications and advanced electronics, robust measurement, verification and standards are increasingly essential.

The project brings together a broad consortium spanning industry and academia. Together, the partners cover the full innovation landscape, from materials research and process development to device fabrication and performance verification.

“At RENA, we develop advanced wet processing and surface treatment solutions that are critical in manufacturing of compound semiconductors and emerging materials. Through this collaboration, RENA will contribute industrial insight and process expertise to ensure that new measurement and testing capabilities are closely aligned with real manufacturing challenges.” States Peter Schneidewind, CEO of RENA Technologies.

While silicon remains the foundation of much of today’s semiconductor industry, many high-growth applications increasingly depend on advanced materials such as gallium arsenide (GaAs), gallium nitride (GaN), silicon carbide (SiC), and indium phosphide (InP). These materials offer superior performance in high-power, high-frequency and optoelectronic applications, but they also introduce new complexities in processing, characterization and quality assurance. Reliable standards and independent measurement methods are therefore essential to derisk innovation and support scale-up.

Through this project, consortium partners will work with NPL to:
• Develop new UK measurement and test capabilities for advanced semiconductor materials by combining academic research excellence with world-leading metrology expertise.
• Apply these capabilities to critical industry challenges, including assessing material integrity, verifying RF performance, and testing device reliability under demanding operating conditions.
• Share the resulting capabilities openly with industry, helping to build national consensus and strengthen the UK’s influence in international standards development for novel semiconductor technologies.

Following extensive consultation the consortium has identified three priority application areas where the UK can have the greatest global impact: power electronics, RF-communications, and optoelectronics. These areas align closely with RENA’s customer base and technology roadmap, particularly in power and compound semiconductor manufacturing.
By participating in this program, RENA reinforces its commitment to supporting the UK semiconductor ecosystem with industrially relevant innovation, enabling customers to adopt advanced materials with confidence, and helping position the UK as a global leader in next-generation semiconductor technologies.

About NPL
The National Physical Laboratory (NPL) is the UK's National Metrology Institute (NMI), developing and maintaining the national primary measurement standards, as well as collaborating with other NMIs to maintain the international system of measurement. As a public sector research establishment, it delivers extraordinary impact by providing the measurement capability that underpins the UK's prosperity and quality of life. NPL develops the metrology required to ensure the timely and successful deployment of new technologies and work with organizations as they develop and test new products and processes.

About RENA Technologies GmbH
RENA Technologies is a leading global supplier of production machines for wet chemical surface preparation. RENA products are used in path-breaking application fields such as semiconductors, MedTech, renewable energies, and the glass industry. RENA equipment is used to treat or modify surfaces of, for example, semiconductor wafers, solar cells, glass, optical substrates or other high-tech products using wet chemical processes. RENA offers proven standard machines as well as customer-specific solutions and process support.

• Read more about RENA joins UK Government-funded consortium to strengthen national semiconductor metrology capabilities

Tirana, November 2025 – Atronix Sh.p.k., Albania’s pioneering Electronics Manufacturing Services company, officially inaugurated in November its new production facility at Tirana Industrial Park. The event marks a historic moment for Albania’s industrial landscape, establishing the country’s first advanced EMS factory with capacity to serve European and North American markets.

Equipped with the latest generation of JUKI SMT Production line with advanced AOI/X-ray inspection ERSA selective and wave soldering, and fully integrated traceability systems, Atronix introduces advanced technological capabilities. 

The inauguration ceremony brought together distinguished guests, including leading figures from the European electronics industry Mr. Dieter Weiss, EBRD representatives. Ms. Ekaterina Solovova, Ms. Egla Ballta, JUKI Europe Mr. Kenji Hirohata, Mr. Rui Vidal and Mr. Davor Jakulin international and national business partners, representatives from the Albanian Government, Academia and Universities, etc. 

“Our vision from the beginning was clear: to build a factory that stands at the same level with Europe’s most advanced EMS providers,” said Ms. Enkeleda Kuka, Founder & CEO of Atronix. “Today, we are proud to show that Albania can compete in high-precision electronics manufacturing.” During the ceremony, Atronix extended appreciation to its international collaborators, including JUKI Europe, Kurtz-Ersa, and several global clients and advisors who have contributed to the company’s rapid development. 

“In this challenging business climate, it is very good to see a new EMS company being opened in Albania. Eastern Europe will see a strong growth of electronic production in the future and Atronix will participate in this development.” said Mr. Dieter G. Weiss, European EMS industry expert and longstanding supporter of the project. 

This factory sets a new standard for high-value manufacturing in the country and demonstrates how it can transform Albania's industrial landscape. EBRD has supported Atronix through our Advice for Small Business program and looks forward to the future successes of Atronix" said Ms Ekaterina Solovova, Head of Albania, EBRD.

With its inaugural production lines now operational, Atronix is preparing for a strong expansion phase, targeting new partnerships in Electronic Manufacturing and broader industrial integration across Europe and North America. 

“Atronix symbolizes what the next chapter of Albanian industry can look like,” added Ms. Kuka. “We are committed not only to manufacturing high-quality electronics, but also to building trust, reliability, and long-term value for every client who chooses Albania as their production base. 

www.atronix.al; [email protected]; Tirana Industrial Park 48, Kashar, Tirana,  Albania

• Read more about Atronix Inaugurates Albania’s First Advanced Electronics Manufacturing Factory

Validation underscores DAS EE’s 35 years of leadership in advanced and sustainable abatement solutions
Dresden, Germany, November 28, 2025 — As the semiconductor industry intensifies its efforts to reach net-zero emissions, the recently published SEMI SCC Whitepaper “Overview of F-GHG and Nitrous Oxide Semiconductor Abatement Technologies” (2024) establishes new industry performance benchmarks for greenhouse gas abatement. The report defines a minimum Destruction and Removal Efficiency (DRE) for CF₄ of >95% and a maximum goal of >99% for process gas abatement systems.

These new reference points represent a significant step beyond the legacy assumptions used in many ESG reports and supplier requirements, which have historically relied on conservative default values for greenhouse gas abatement performance. However, even the upper range of the SEMI SCC targets does not yet represent the full potential of modern technology.

DAS Environmental Expert GmbH demonstrates with its TILIA abatement system that destruction efficiencies exceeding 99.9% for CF₄ and other F-GHGs are both technically feasible and economically advantageous. These systems outperform the benchmarks set forth by the SEMI SCC whitepaper and contribute directly to the industry's carbon reduction goals.

“Systems like TILIA prove that it is not only possible but also economically rational to exceed the current industry benchmarks,” says Stephan Raithel, Chief Operating Officer Gas Treatment at DAS Environmental Expert GmbH. “With rising carbon taxes and tightening sustainability targets, investing in high-efficiency abatement translates directly into operational and financial benefits.”

The global semiconductor industry emits thousands of tons of CF₄ annually, a gas with a Global Warming Potential (GWP) of 7,390. Even a few tons of unmitigated emissions correspond to millions of tons of CO₂ equivalents. While current industry practice aims to meet the SCC-recommended minimum DREs, only systems operating consistently above 99.9% will enable the industry to meet its net-zero commitments.

The SEMI SCC Whitepaper emphasizes that achieving these higher efficiencies is crucial for the industry’s sustainability roadmap and requires broad adoption of next-generation abatement technologies. DAS Environmental Experts’ proven TILIA platform exemplifies this transition – setting a new benchmark for “Best in Class” abatement performance in the semiconductor industry.

About the Company
DAS Environmental Experts Group (DAS Group), headquartered in Dresden, Germany, was founded in 1991 and is now a global organization with subsidiaries on three continents and more than 950 employees worldwide. Over the past three decades, DAS Group has become one of the leading technology and equipment providers for waste gas abatement solutions with a focus on semiconductor industry.
In addition, DAS Group develops advanced process and system solutions for industrial water treatment, with extensive expertise in the recycling and reuse of wastewater from the semiconductor industry.
DAS solutions are engineered to meet the stringent purity requirements of semiconductor manufacturing, helping clients comply with global environmental standards.

• Read more about Best in Class Abatement System: DAS Environmental Experts Exceeds Efficiency Benchmarks in Semiconductor Greenhouse Gas Treatment

Second-generation platform delivers advanced control, in-cycle annealing, and high-throughput performance for Wide Bandgap power and RF device manufacturing

Espoo, Finland, November 24, 2025 – Beneq introduces the Beneq Transform® XP, a second-generation ALD platform developed to meet the performance demands of Wide Bandgap (WBG) power and RF device technology development and manufacturing. Building on the proven Beneq Transform® platform, the new system adds advanced ALD control, faster cycle times, and greater process capabilities in a high-throughput format.

The Beneq Transform® XP features a second-generation, flow-optimized 25-wafer mini-batch thermal ALD reactor that achieves breakthrough deposition rates with single-digit-second cycle times for common ALD oxides and nitrides. Refined flow and pressure dynamics ensure exceptional within-wafer and wafer-to-wafer uniformity – even at a few nm film thicknesses – while precise dwell-time control delivers excellent conformality on high-aspect-ratio structures.

Transform® XP also introduces advanced PEALD process control to precisely manage low-energy ions. This enables optimized plasma pre-cleaning and deposition, resulting in improved interface quality, tunable passivation, and enhanced device performance and reliability. The system integrates in-cycle annealing, a proprietary step that densifies and purifies films to achieve stoichiometric, low-impurity materials and crystalline alignment, such as AlN lattice orientation.

“Transform® XP is our response to the next wave of device challenges in power and RF manufacturing,” said Dr. Mikko Söderlund, Head of Sales, Semiconductor ALD at Beneq. “Customers value the original Transform® for its versatility and reliability. With XP, we introduce capabilities they specifically asked for – improved ion control, faster cycles, and in-cycle film densification – all in a versatile platform.”

With over a dozen Beneq Transform® clusters installed globally for WBG pilot and production use, and more than 100 process modules shipped, Beneq continues to support leading IDMs, foundries, and RTOs advancing More-than-Moore technologies.

About Beneq

Beneq pioneered industrial production of Atomic Layer Deposition (ALD) with the introduction of the first commercial ALD equipment in 1984. Today, Beneq advances ALD adoption and validation with a portfolio that includes the Beneq Transform®, Transform XP, Transform 300, Transmute™, and Prodigy™ for specialty semiconductor device fabrication; TFS 200 and TFS 500 for R&D; the P400A, P800, and P1500 batch systems for coating critical semiconductor chamber components and complex part geometries; and spatial ALD platforms such as the C2R™ and Genesis for roll-to-roll processing. Headquartered in Espoo, Finland, Beneq enables ALD integration from lab to fab for semiconductors, optics, and functional coatings.

Press Contact
Charlotte Bärlund
Event and Communications Lead
[email protected]

• Read more about Beneq Launches Beneq Transform® XP – Redefining Atomic Control in ALD

New platform delivers ALD film quality at production throughput for Wide Bandgap and other specialty device manufacturing

Espoo, Finland, November 19, 2025 – Beneq, a global leader in Atomic Layer Deposition (ALD) equipment and solutions, today announced Beneq Transmute™, a next-generation ALD platform designed for high-volume semiconductor manufacturing. Engineered for high volume production of Wide Bandgap (WBG) power electronics, advanced RF devices, μLED and other specialty devices, Beneq Transmute™ combines performance, scalability, and cost efficiency in one system.

Atomic precision at manufacturing speed

Beneq Transmute™ extends the performance of the Beneq Transform® XP platform into production environments with Beneq’s proprietary 3-step ALD architecture. By combining plasma pre-treatment, plasma-enhanced ALD (PEALD), and thermal batch ALD, the platform delivers conformal, high-performance dielectric stacks with atomic-level interface control – now at high throughput.

Its flow-uniform 25-wafer chambers, paired with advanced precursor dosing technology, enable rapid cycle times, optimized wafer coverage, and reduced precursor waste – resulting in a low cost of ownership across a broad range of semiconductor applications.

“Beneq Transmute™ represents a major leap forward in making ALD a truly high-volume manufacturing solution,” said Lucas Monteiro, Head of Product at Beneq. “By combining the precision of ALD with throughput and scalability that match production demands, we are giving our customers the ability to produce next-generation Wide Bandgap and RF devices at high throughput and low cost of ownership – with the uncompromised film quality that Beneq is known for.”

Designed for dedicated production requirements

Beneq Transmute™ supports both thermal and plasma-enhanced ALD within a modular cluster architecture that enables dedicated configurations. With up to two transfer chambers and eleven process module slots – including PEALD, Thermal, Buffer, and Preheater – each system can be tailored to match specific customer applications and fab roadmaps while ensuring long-term scalability.

Enabling the next wave of electronics

Beneq Transmute™ directly supports key semiconductor market trends – including the electrification of transport, adoption of renewable energy, 5G and RF communications, data centers and next-generation displays. Its combination of atomic precision and production throughput positions Beneq as a technology enabler for a more efficient, connected, and sustainable future.

About Beneq

Beneq pioneered industrial Atomic Layer Deposition (ALD) with the introduction of the first commercial ALD equipment in 1984. Today, Beneq advances ALD technology adoption and validation with a portfolio that includes Transform®, Transform® 300, and Prodigy™ for specialty semiconductor device fabrication; TFS 200 and TFS 500 for R&D; and innovative spatial ALD platforms such as the C2R™ and Genesis for rolltoroll processing. Beneq’s systems support process innovation from lab to fab, enabling integration of ALD in advanced manufacturing. Headquartered in Espoo, Finland, Beneq operates globally to help customers scale ALD solutions for the future of semiconductors, optics, and functional coatings.

Press Contact:
Charlotte Bärlund
Event and Communications Lead
[email protected]

• Read more about Beneq Unveils Beneq Transmute™ – High-Throughput ALD for Power, RF, and μLED Device Production