Dry Cleaning of CMOS Imagers in the Automotive Industry with CO2 Snow-Jet Technology
William (Bill) Mullee
Director Technology & Sales
acp systems AG
Abstract & Biography
Novel Analytical Method for Improving the Megasonic Extraction Efficiency of Etch Chamber Components Surfaces as Determined by Single Nanoparticle- Inductively Coupled Plasma-Mass Spectrometry (sNP-ICP-MS)
Lisa Mey-Ami
R&D Senior Specialist
Air Liquide Balaz
Abstract & Biography
Highly Selective SiOC Etch for Advanced Sub-3nm Applications
Chien-Pin Sherman Hsu
Technical Fellow
Avantor
Abstract & Biography
Semiconductor Equipment Part Coating Opportunities with Atomic Layer Deposition (ALD)
Alexander Perros, PhD
Director of Business Development
Beneq Oy
Abstract & Biography
Reducing CFET wet clean process defectivity with advanced liquid filtration solutions
Kusum Maharjan
Lead Engineer
Entegris
Abstract & Biography
Does Pressure Drop Correlate with Filter Lifetime of Sub-50NM Filtration Solutions?
Nicole Williams
Solutions Engineer
Entegris
Abstract & Biography
Challenges and Benefits of Using 2-in-1 Filtration Solutions for Contamination Control in Semiconductor Deionized Water (Diw) Applications
Juili Parab
Senior Engineer, Solutions Engineering
Entegris
Abstract & Biography
Use of Silicon-Based Additives and Their Mechanistic Role in Enhancing the Selectivity of Wet Etching Process on Sige over Si/Sio
Ka Cheong (Tim) Lau
Technical Marketing Manager
Evonik Corporation
Abstract & Biography
Jeff Nastoff
Regional Business Director, New Market & Product Development
Evonik
Abstract & Biography
Characterizing Polydisperse Nanoparticles in High-Purity Process Liquids via Multispectral Nanoparticle Tracking Analysis
Tim Holt
Applications Engineer
HORIBA Instruments
Abstract & Biography
NMP Free Positive Photo Resist Stripping with E-GRADE® MEOX
Jay Henderson
Global Market Manager
Huntsman
Abstract & Biography
Quantitative Analysis of Damage Depth in Highly Selective Etching and Cleaning Processes for Spacer Nitride Preservation
Chong‑Zan (Manny) Wu
Principal WET Process Engineer
Micron
Abstract & Biography
Enabling Novel innovation in Containers profile Sculpting for Cell Structure improvement
Shihui (Adara) Yang
Member of Technical Specialist
Micron
Abstract & Biography
Wafer-level Validation of Si Trimming Process by Wet Etching in 3D DRAM Applications
Naoko Kuwabara
Chemical Corporation Scientist
Mitsubishi
Abstract & Biography
Ultra-Pure, Cost-Efficient IPA Drying as an Integrated Surface Preparation Platform
Richard E Novak
Advisor
Modutek
Abstract & Biography
Douglas Wagner
President
Modutek
Abstract & Biography
Atmospheric Plasma–Based Surface Cleaning Solutions for Advanced Electronics Manufacturing
Terry Dunbar
Global Key Account Manager, Semiconductor
Plastmatreat USA
Abstract & Biography
Atmospheric Plasma-Based Surface Cleaning Solutions for Advanced Electronics Manufacturing
Harman Sangha
Applications Engineer
Plasmatreat
Abstract & Biography
Low Stiction PFR FFKM and Related Test Method
Emmanuel Anim-Danso
CTD Engineer
Syensqo
Abstract & Biography
Approaches to Further Enhance Cut Accuracy
Ryotaro Maeda
Engineer
Tokyo Electron Kyushu
Abstract & Biography
Development of Highly Sensitive Detection for Impurities and Nanoparticles in Liquid Chemicals Using Aerosol Technology
Huang-Di Lin
R&D Manager
Innovative Nanotech Taiwan
Abstract & Biography
WSDL: AI-Enabled Wafer Surface Defect Localization for Cleaning Process Optimization
Shih-Chih Lin
PhD Candidate
University of Washington
Abstract & Biography
The Critical Role of Pre-Saturated Cleanroom Wipers in Contamination Control for Advanced Semiconductor Manufacturing
Greg Heiland
Founder
Valutek
Abstract & Biography