Electronic Specialty Gases & Systems Conference—ESGS

Advanced Metrology Workshop

Thursday, November 6, 2025 | 1:00pm-5:30pm

Advanced metrology (on wafer and off wafer) is a critical enabler for advanced semiconductor manufacturing. As the industry advances toward 2030 defect analysis will continue to be further challenged by the shift towards 3D Advanced Logic and DRAM devices. Huge Gaps Exist Across the Entire Eco-System. They include:

• More advanced Analytical Metrology for detecting and measuring impurities and defects.

• The need for suppliers to access the infrastructure and capabilities for developing and performing “Cost Effective and Proactive” defect detection and characterization that can be employed at the fab level.

• Approaches that enable Faster Innovation à Cost Effective R&D Turn around for HVM. Can AI be leveraged to accelerate measurement science?

• Measurements in all media employed in semi manufacturing: In liquid, on wafer and Gas/AMC - holistic wafer environment quality control (ETE)

Enabling next generation HVM solutions to address key challenges around wafer inspection, defect detection and identifying other metrology gaps will be critical for the industry to continue its progression. Collaboration between key industry stakeholders including: Semiconductor producers, OEMS, Metrology suppliers, Academia-NIST-NASA-NSTC, that more rapidly drives R&D and Technology Readiness can be a key determinant of future success. The goal of the workshop will be to identify key industry challenges around these gaps and develop a call for action on how to collaborate on closing these gaps.

Click here to see the full speaker line-up.

The Advanced Metrology Workshop is included in the 3-day ESGS Conference Pass. If you would like to attend ONLY the Advanced Metrology Workshop, please register below: