downloadGroupGroupnoun_press release_995423_000000 copyGroupnoun_Feed_96767_000000Group 19noun_pictures_1817522_000000Member company iconResource item iconStore item iconGroup 19Group 19noun_Photo_2085192_000000 Copynoun_presentation_2096081_000000Group 19Group Copy 7noun_webinar_692730_000000Path
Skip to main content

BIOGRAPHY 

Berc Kalanyan is a Staff Research Chemical Engineer in the Chemical Sciences Division of the National Institute of Standards and Technology (NIST) in Gaithersburg, Maryland. He received his Ph.D. in chemical engineering from North Carolina State University in 2015. He has expertise in the chemistry and characterization of vapor phase processes such as atomic layer deposition (ALD) and chemical vapor deposition (CVD) for various materials and applications. His research focuses on the development and application of in situ optical measurements to investigate gas phase and surface processes that drive thin film growth. A particular focus of this work is on high-sensitivity and high-speed diagnostics suitable for use in semiconductor R&D and manufacturing.