At the end of 2021, there were 153 semiconductor fabs processing 300mm wafers for the fabrication of ICs, including CMOS image sensors, and non-IC products such as power discretes.

The 300mm wafer fab count increased by 14 in 2021, the most in one year since the same number opened in 2005. There are 10 fabs scheduled to open in 2022, followed by another 13 in 2023 and 10 in 2024. This puts the industry on pace to have more than 200 300mm fab lines in operation by 2026. These are projections made in Knometa’s new Global Wafer Capacity 2022 report.

An increasing number of 300mm fabs are being built to fabricate non-IC devices, and power transistors in particular. The manufacturing cost benefits of processing chips on the large wafers come into play for device types characterized by large die sizes and high volumes. Examples of integrated circuits with these characteristics include DRAMs, flash memory, image sensors, complex logic and microcomponent ICs, PMICs, baseband processors, audio CODECs, and display drivers. While large-size power transistors are still small compared to the die sizes of these ICs, they ship in high volumes and are big enough to keep a 300mm fab loaded at a cost-effective production level. According to IC Insights, unit demand for power transistors in 2021 reached 43.5 billion for power MOSFETs and 2.2 billion for IGBTs.

300mm Wafer Fabs Opening in 2022

• CR Micro (Runxin Microelectronics) fab in Chongqing, China, for power semiconductors
• Silan Microelectronics fab in Xiamen, Fujian, China for power discretes and sensors
• SK Hynix M15 Phase 2 fab in Cheongju, Korea, for 3D NAND flash
• SMIC fab in Shenzhen for foundry services
• ST/Tower joint venture fab in Agrate, Italy, for mixed-signal, power, and RF ICs and foundry services
• TI RFAB2 in Richardson, Texas, USA, for analog ICs
• TSMC Fab 18 Phase 4 in Tainan, Taiwan, for foundry services
• TSMC Fab 16 Phase 2 in Nanjing, Jiangsu, China, for foundry services
• TSMC Fab 18 Phase 5 in Tainan, Taiwan, for foundry services
  Winbond fab in Kaohsiung, Taiwan, for DRAMs

Of the 10 300mm wafer fabs scheduled to begin operations in 2022, two will be focused on the production of non-IC products. One is a CR Micro fab in Chongqing, China, and the other a fab in Xiamen, China, owned by Silan Microelectronics.

One-third of the new 300mm fabs opening this year are being built by TSMC. Responding to high demand for its foundry services, the company increased its capital spending 74% in 2021 to $30 billion. Much of that spending went toward equipping the Phase 4 and Phase 5 fabs at its Fab 18 campus in Tainan. TSMC is also finishing up a second fab at it Fab 16 site in Nanjing, China, to meet demand for mature technologies, especially 28nm CMOS.

Texas Instruments and STMicroelectronics (and its new fab partner Tower Semiconductor) are completing the construction of 300mm fabs targeted at analog and mixed-signal IC production. TI reported a huge increase in capital spending for 2021 with 279% more spent during the year than in 2020. Most of the money was used to buy new equipment for the company’s second fab in Richardson, Texas, and third 300mm fab overall. The RFAB2 facility will more than double wafer capacity at the Richardson site.

Only two of the new 300mm fabs scheduled to open in 2022 are for memory products. SK Hynix is expected to begin operations on a Phase 2 line for 3D NAND at its M15 fab site in Cheongju, Korea, while Winbond plans to start up a new DRAM fab in Kaohsiung, Taiwan.

View more information about Global Wafer Capacity 2022 at https://knometa.com/gwc

• Read more about Count of semiconductor fabs using 300mm wafers projected to exceed 200 by 2026

BENEQ, PRESS RELEASE, March 10, 2022, 14.00 EEST

Beneq, the home of Atomic Layer Deposition (ALD), has introduced BeneqCare, a new modular solution to offer support and maintenance services to organizations that own and operate Beneq ALD equipment.

Beneq leads the market with ALD products for R&D, semiconductor device fabrication, 3D and batch production, ultra-fast spatial ALD (C2R), and roll-to-roll ALD. Today, the company has launched BeneqCare to help customers in the EU, Asia and the USA maximize the value of their ALD tools throughout their equipment’s life cycles.

“We have been investing heavily in widening our service capabilities worldwide. Now, we offer service coverage in all regions. We have also established spare part hubs in every region at Beneq offices,” says Hans Fabritius, Vice President, Life Cycle Services at Beneq.

“BeneqCare simplifies ALD equipment ownership by helping our customers maximize uptime and gain access to the right support at every stage of their tool’s life cycle. We are ready to assist our customers in meeting their productivity requirements –from training personnel in using the equipment to meeting any unscheduled maintenance or spare parts needs,” asserts Fabritius.

BeneqCare provides Beneq customers who operate in the industrial and research sectors with a wide range of service modules to suit their operations, from extended warranty and training services to remote or onsite support.

“Our customers have high expectations for the performance of their Beneq ALD tools. BeneqCare brings them versatile support and service plans that grow with their businesses,” says Fabritius.

Companies and research facilities that have commissioned Beneq ALD equipment can avail of a variety of BeneqCare service modules to suit their unique requirements. Among the BeneqCare modules are technical support services, including remote support via Augmented Reality (AR); spare part services; extended warranties; preventive as well as unscheduled maintenance services; and training.

Learn more about BeneqCare: www.beneq.com/beneqcare/

Further information
Lie Luo, Head of Marketing, [email protected]

About Beneq
Beneq is the home of atomic layer deposition. In 1984, we established the world’s first industrial production using ALD. Today, we lead the market with products for R&D (TFS 200, TFS 500, R2), semiconductor device fabrication (Transform®), 3D and batch production (P400A, P800, P1500), ultra-fast spatial ALD (C2R), and roll-to-roll ALD (Genesis).

Beneq’s unique Development Service simplifies customer adoption and proof-of-concept for new ALD processes, while our Coating Service cuts down time to market by outsourcing state of the art ALD production. Our team of engineers and experts is dedicated to making ALD tools accessible for researchers.

• Read more about Beneq fulfills customer demand for tailored ALD equipment services and support with BeneqCare (TM)

Samco, a leading manufacturer of etching, deposition and surface treatment processing equipment for the semiconductor and related industries and academic facilities, has opened the new Research Center for Nano Thin Films & Materials for ALD and mist CVD process and system development in Kyoto, Japan.

In recent years, the demand for ALD systems has been expanding for semiconductor and electronic device applications, and new markets are emerging in medical and healthcare fields such as coating technology for containers and medical devices. To meet growing market needs and with the aim of entering new markets in the future, Samco Inc. reorganized its former Basic Technology Research Center and established the Research Center for Nano Thin Films & Materials (Here in after Research Center). It has a building area of 413.90 m2 and is equipped with deposition systems for demonstrations and various measurement tools for evaluation.

“The Research Center focuses on the development of thin film deposition systems and process technologies, as well as basic research on thin film properties and physical properties evaluation,” said Osamu Tsuji, the founder and CEO of Samco Inc. “We already have an extensive track record with ALD equipment, which we began selling in 2015 in the fields of semiconductor and electronic devices. Our next plan is to develop new ALD systems for medical and healthcare applications such as barrier films, coating films, medical materials, and coating of implant materials.”
Samco plans to increase its number of researchers at the Research Center from the current 8 to 20 in the next 3 years and to expand its annual ALD systems sales to 3 billion yen in five years.

About Samco Inc.
Samco Inc. (TSE: 6387) stands for Semiconductor And Materials Company, and is a leading manufacturer of processing equipment for the semiconductor and related industries founded by Mr. Osamu Tsuji in Kyoto, Japan in 1979. Over the past forty-three years, more than 4,300 Samco systems have been installed and used in 35 different countries. Samco’s equipment and thin film technology are widely adopted in the fabrication of semiconductor devices, including high-frequency filters, SiC/GaN power devices, GaAs VCSELs, micro-OLED/LED, CMOS image sensors, MEMS, TSVs, advanced packaging, and so on. Learn more at https://www.samco.co.jp/en/

Company Contacts:
TSUCHIHASHI, Atsushi
Public Relations
Phone: 81-75-621-7841
E-mail: [email protected]

• Read more about Samco Opens Research Center for Nano Thin Films & Materials to accelerate ALD Development

Breker Verification Systems used the opening of DVCon U.S. today to unveil SystemUVM™, a framework designed to simplify specification model composition for test content synthesis with a UVM/SystemVerilog syntactic and semantic approach familiar to universal verification methodology (UVM) engineers.

Developed in partnership with leading semiconductor companies, Breker’s SystemUVM’s UVM-style specification model drives test content synthesis, leveraging artificial intelligence (AI) planning algorithms for deep sequential bug hunting in existing UVM environments.

A coverage-driven approach simplifies test composition and employs up-front randomization for efficient simulation and accelerated emulation. It enhances test content reuse through configurable scenario libraries and portability for system-on-chip (SoC) integration verification and beyond.

For more information go to: www.brekersystems.com/SystemUVM

The Breker Approach
“UVM is an effective standard for block-level verification,” remarks David Kelf, Breker’s CEO. “As blocks and subsystems get larger and more complicated, composing test content for the UVM environment becomes more difficult and harder to scale. By leveraging synthesis for test content generation, a 5X improvement for larger components and multi-IP subsystems is common in composition time combined with significant coverage increases. SystemUVM makes this easily accessible for verification specialists with a minimal learning curve, dramatically changing the nature of functional verification.”

Breker’s SystemUVM layers UVM class libraries on to Accellera’s Portable Stimulus Standard (PSS) to provide the look and feel of SystemVerilog/UVM and its procedural use model. Models can be composed rapidly, efficiently reused and easily understood and maintained through UVM’s register access level (RAL), a library of common verification functions and abstract “path constraints.”

SystemUVM code offers an alternative to generic PSS while still being built on the industry standard specifically targeting the needs of UVM engineers and recognizable to them, unleashing the power of PSS Test Content Synthesis tools, such as Breker’s TrekUVM™ and TrekSoC™ products.

SystemUVM-based Test Suite Synthesis allows the simplified generation of self-checking test content from a single abstract model complete with high-level path constraints for manageable code. Synthesis AI planning algorithms allow for specification state-space exploration, uncovering complex corner-cases that lead to potential complex bugs.

The coverage-driven nature of the process eliminates the need for coverage models and post-execution coverage analysis that results in test respins. With test randomization performed before execution, simulation is accelerated, and emulation can be used without an integrated testbench simulator, which increases its performance. The tests can also be reused in system verification via the Synthesizable VerificationOS layer without any change or disruption to the UVM testbench.

Availability and Pricing
SystemUVM is available today and is included in Breker’s Test Suite Synthesis product line.
Pricing is available upon request.
For more information, visit the Breker website or email [email protected].

Breker at DVCon U.S.
DVCon’s tutorial “PSS In The Real World” opens this year’s virtual conference at 9 a.m. P.S.T., showcasing the power and flexibility of Accellera’s Portable Stimulus Standard by highlighting several real-world examples. Adnan Hamid, Breker’s executive president and CTO, is a speaker.

“In-emulator UVM++ Randomized Testbenches for High Performance Functional Verification,” a Breker-sponsored workshop also Monday at 11:30 a.m. P.S.T., attendees will learn proven, practical methods to verify complex blocks, SoCs and sub-systems with a high degree of quality.

“The Meeting of the SoC Verification Hidden Dragons,” a panel organized by Breker and featuring Hamid will address the gap in semiconductor verification between block functional verification and system SoC validation. The panel will be held Wednesday, March 2, at 8:30 a.m. P.S.T.

About Breker Verification Systems
Breker Verification Systems is a leading provider of verification synthesis solutions that leverage SystemUVM, C++ and Portable Stimulus, a standard means to specify reusable verification intent. It is the first company to introduce graph-based verification and the synthesis of high-coverage test sets based on AI planning algorithms. Breker’s Test Suite Synthesis and TrekApp library allows the automated generation of high-coverage, powerful test cases for deployment into a variety of UVM, SoC and Post-Silicon verification environments. Case studies that feature Altera (now Intel), Analog Devices, Broadcom, IBM, Huawei and other companies leveraging Breker’s solutions are available on the Breker website. Breker is privately held and works with leading semiconductor companies worldwide.

Engage with Breker at:
Website: www.brekersystems.com
Twitter: @BrekerSystems
LinkedIn: https://www.linkedin.com/company/breker-verification-systems/
Facebook: https://www.facebook.com/BrekerSystems/

• Read more about Breker Verification Systems Unleashes the SystemUVM Initiative to Empower UVM Engineering

ESPOO, Finland, 17th of February 2022 – Fraunhofer Institute for Silicon Technology (ISIT) has taken PICOSUN® P-300B ALD system into use as their powder MEMS technology platform.

Fraunhofer ISIT PowderMEMS is a new innovative technology for creating three-dimensional microstructures from a multitude of materials on wafer level. The technology is based on bonding together µm-sized powder particles in a cavity with Atomic Layer Deposition (ALD). It has many advantages compared to other manufacturing techniques as it allows using much lower process temperatures compared to a traditional sintering process. The bonded porous structures are thermally and chemically resistant thus enabling their extensive post-processing in a clean room.

"The technology can be used for various applications, such as microelectronics, MEMS sensors, MEMS actuators and microfluidics. For example, it enables the integration of porous and magnetic 3D microstructures on wafer level", explains Dr. Björn Gojdka, Group Leader at Fraunhofer ISIT.

“We were looking for a solution for conformal high surface area coating of powder located in trenches. Picosun solution is a perfect fit for this need as we are also looking into scaling up the technology. We are especially happy about the tool’s hot wall reactor, versatile precursor sources and its easy maintenance”, states Dr. Thomas Lisec, Chief Scientist at Fraunhofer ISIT.

“We are excited over this new technology coming to life and all the opportunities it will bring. I am especially impressed by the potential applications for the Fraunhofer ISIT PowderMEMS as they are exceptionally diverse. I’m looking forward to continuing working closely with Fraunhofer ISIT on bringing the technology up to industrial production”, says Dr. Christoph Hossbach, General Manager of Picosun Europe GmbH.

More information:
Dr. Christoph Hossbach, General Manager, Picosun Europe GmbH
Tel. +49 1522 449 49 11
Email: [email protected]
Web: www.picosun.com

About Picosun
Picosun provides the most advanced ALD (Atomic Layer Deposition) thin film coating solutions for global industries. Picosun’s ALD solutions enable technological leap into the future, with turn-key production processes and unmatched, pioneering expertise in the field – dating back to the invention of the technology itself. Today, PICOSUN® ALD equipment are in daily manufacturing use in numerous leading industries around the world. Picosun is based in Finland, with subsidiaries in Germany, USA, Singapore, Japan, South Korea, China mainland and Taiwan, offices in India and France, and a world-wide sales and support network. Visit www.picosun.com.

About Fraunhofer ISIT
Fraunhofer ISIT in Itzehoe is one of Europe's most modern research facilities for microelectronics and microsystems technology. At the heart of the institute are the clean room facilities, large enough not only to conduct research but also to manufacture the developed microchips on an industrial scale. In close cooperation with partners from industry, 160 scientists at ISIT develop power electronics components and microsystems with fine moving structures for sensor technology and actuator technology, including the necessary packaging technology. www.isit.fraunhofer.de

• Read more about Picosun delivers powder MEMS technology platform to Fraunhofer ISIT

BENEQ, PRESS RELEASE, December 6, 2021

Beneq revolutionized ALD cluster tools for More-than-Moore device makers with the highly successful Beneq Transform® family of products. Today, Beneq broadens its product portfolio further with two new distinct solutions: the Transform® 300 and ProdigyTM.

The Beneq Transform 300 and Prodigy were each created in response to specific technology requirements in the semiconductor manufacturing sector.

“The Transform 300 is designed to meet the growing demand of emerging semiconductor applications at 300 mm for devices such as CMOS image sensors, Power Devices, Micro-OLED/LED, and Advanced Packaging, which call for a high degree of versatility,” explains Patrick Rabinzohn, Vice President, Semiconductor ALD at Beneq.

“We created Prodigy to address those market segments that need a simple solution supported by high-end technology. It inherits the ALD design and processing knowhow we at Beneq have developed over the last 15 years, packing advanced features in a simpler, targeted industrial form factor,” continues Rabinzohn.

Beneq Transform® 300
Beneq Transform 300 is the only 300 mm ALD cluster tool that combines thermal ALD (batch) and plasma ALD (single wafer) technologies to provide a highly versatile platform for IDMs and foundries. It is dedicated to advanced thin-film applications in CIS, Power, Micro-OLED/LED, Advanced Packaging and other MtM applications.

Beneq Transform 300 is a highly configurable platform that caters to multiple advanced thin-film applications ranging from gate dielectric including in high aspect ratio trenches, to anti-reflection coating, final passivation or encapsulation, Chip-Scale-Packaging and beyond.

Beneq Prodigy
Beneq Prodigy is the deal manufacturing solution for compound semiconductor including RF IC’s (GaAs/GaN/InP), LED, VCSEL, Light Detectors and for MEMS manufacturers and foundries looking to enhance device performance and reliability through an affordable stand-alone ALD batch tool. Beneq Prodigy provides best-of-breed passivation and encapsulation films across multiple wafer types and sizes.

To learn more, visit:

Beneq Transform 300:  https://beneq.com/en/products/semiconductors/transform300/

Beneq Prodigy: https://beneq.com/en/products/semiconductors/prodigy/

Further information:
Lie Luo, Head of Marketing, [email protected]

About Beneq
Beneq is the home of atomic layer deposition. In 1984, we established the world’s first industrial production using ALD. Today, we lead the market with products for R&D (TFS 200, TFS 500, R2), semiconductor device fabrication (Transform®), 3D and batch production (P400A, P800, P1500), ultra-fast spatial ALD (C2R), and roll-to-roll ALD (Genesis).  Beneq’s unique Development Service simplifies customer adoption and proof-of-concept for new ALD processes, while our Coating Service cuts down time to market by outsourcing state of the art ALD production. Our team of engineers and experts is dedicated to making ALD tools accessible for researchers. 

• Read more about Beneq unveils two new ALD products for 300mm and compound semiconductor device fabrication respectively