SCANLAB GmbH together with its sister companies Blackbird Robotersysteme GmbH and Holo/Or Ltd. is developing promising new system concepts for laser applications such as laser welding of bipolar plates and additive manufacturing (metal 3D printing). By integrating tailored beam shapers, the novel scan setup showed the potential to nearly double the productivity of welding bipolar plates for hydrogen fuel cells.

Fuel cell technology was considered a niche market for a long time. Due to the transition phase in energy generation and the search for alternative drives, the market demand might grow notably. For efficient mass production an increase of throughput in welding of metal bipolar plates, used to build the stacks in a fuel cell, is needed. High welding speeds require fast scan systems and high power lasers, both available. However, it’s the welding process itself which determines the maximum reachable speed. Weld seam failures such as humping effects and undercut occur when a certain speed limit is exceeded.

Blackbird Robotersysteme set up a test rig integrating the 2D scan head intelliSCAN from SCANLAB and HOLO/OR’s latest development the Flexishaper, a full range adjustable beam shaper. The necessary beam shape was determined based on welding process simulations. The layout of the utilized beam shaper is the result of a combined optical design, integrating both diffractive optical elements (DOE) and scan system. The processing tests demonstrated to shift the speed limit of failure free welding speed from 45 m/min up to 70 m/min.

Adopting processing experience with DOEs
Thin sheet welding of bipolar plates has similar requirements to laser powder bed fusion (LPBF) processes. Both require scan field sizes up to 500 x 500 mm² with a typical processing speed around 1m/s and below. Also in metal 3D printing the processing speed is not limited by the speed of the scanner or the available laser power, but it is mostly the process itself which limits the throughput. Thus, the encouraging laser welding results are the first step on the way to further optimize LPBF processes as well.

“Our joint company holding creates the trust that is necessary for such a close cooperation to explore innovative solutions. Only in a setup like this you can openly analyze the upcoming market requirements and transfer the outcome in an optical design” recounts Georg Hofner, CEO SCANLAB.

“Our sister companies provide a construction kit for us, which we can translate into tangible benefits for our markets and customers based on our specific experience and application knowledge” adds Karl Christian Messer, CEO Blackbird Robotersysteme.

“This is exactly the kind of cooperation that creates high value products by combining our unique beam shaping expertise with our sister companies market deep understanding” concludes Israel Grossinger, Owner and President of HOLO/OR.

The next steps will be to test the laser welding concept in a larger scale setup and to pursue different applications in parallel. As the fiberSYS meets requirements of both LPBF and laser welding processes, the integration of DOEs into this scan system, particularly suited for multi head laser machines, was included in the development road map.

• Read more about Scan Head with Beam Shaper Increases Throughput in Fuel Cell Production

At the end of 2021, there were 153 semiconductor fabs processing 300mm wafers for the fabrication of ICs, including CMOS image sensors, and non-IC products such as power discretes.

The 300mm wafer fab count increased by 14 in 2021, the most in one year since the same number opened in 2005. There are 10 fabs scheduled to open in 2022, followed by another 13 in 2023 and 10 in 2024. This puts the industry on pace to have more than 200 300mm fab lines in operation by 2026. These are projections made in Knometa’s new Global Wafer Capacity 2022 report.

An increasing number of 300mm fabs are being built to fabricate non-IC devices, and power transistors in particular. The manufacturing cost benefits of processing chips on the large wafers come into play for device types characterized by large die sizes and high volumes. Examples of integrated circuits with these characteristics include DRAMs, flash memory, image sensors, complex logic and microcomponent ICs, PMICs, baseband processors, audio CODECs, and display drivers. While large-size power transistors are still small compared to the die sizes of these ICs, they ship in high volumes and are big enough to keep a 300mm fab loaded at a cost-effective production level. According to IC Insights, unit demand for power transistors in 2021 reached 43.5 billion for power MOSFETs and 2.2 billion for IGBTs.

300mm Wafer Fabs Opening in 2022

• CR Micro (Runxin Microelectronics) fab in Chongqing, China, for power semiconductors
• Silan Microelectronics fab in Xiamen, Fujian, China for power discretes and sensors
• SK Hynix M15 Phase 2 fab in Cheongju, Korea, for 3D NAND flash
• SMIC fab in Shenzhen for foundry services
• ST/Tower joint venture fab in Agrate, Italy, for mixed-signal, power, and RF ICs and foundry services
• TI RFAB2 in Richardson, Texas, USA, for analog ICs
• TSMC Fab 18 Phase 4 in Tainan, Taiwan, for foundry services
• TSMC Fab 16 Phase 2 in Nanjing, Jiangsu, China, for foundry services
• TSMC Fab 18 Phase 5 in Tainan, Taiwan, for foundry services
  Winbond fab in Kaohsiung, Taiwan, for DRAMs

Of the 10 300mm wafer fabs scheduled to begin operations in 2022, two will be focused on the production of non-IC products. One is a CR Micro fab in Chongqing, China, and the other a fab in Xiamen, China, owned by Silan Microelectronics.

One-third of the new 300mm fabs opening this year are being built by TSMC. Responding to high demand for its foundry services, the company increased its capital spending 74% in 2021 to $30 billion. Much of that spending went toward equipping the Phase 4 and Phase 5 fabs at its Fab 18 campus in Tainan. TSMC is also finishing up a second fab at it Fab 16 site in Nanjing, China, to meet demand for mature technologies, especially 28nm CMOS.

Texas Instruments and STMicroelectronics (and its new fab partner Tower Semiconductor) are completing the construction of 300mm fabs targeted at analog and mixed-signal IC production. TI reported a huge increase in capital spending for 2021 with 279% more spent during the year than in 2020. Most of the money was used to buy new equipment for the company’s second fab in Richardson, Texas, and third 300mm fab overall. The RFAB2 facility will more than double wafer capacity at the Richardson site.

Only two of the new 300mm fabs scheduled to open in 2022 are for memory products. SK Hynix is expected to begin operations on a Phase 2 line for 3D NAND at its M15 fab site in Cheongju, Korea, while Winbond plans to start up a new DRAM fab in Kaohsiung, Taiwan.

View more information about Global Wafer Capacity 2022 at https://knometa.com/gwc

• Read more about Count of semiconductor fabs using 300mm wafers projected to exceed 200 by 2026

BENEQ, PRESS RELEASE, March 10, 2022, 14.00 EEST

Beneq, the home of Atomic Layer Deposition (ALD), has introduced BeneqCare, a new modular solution to offer support and maintenance services to organizations that own and operate Beneq ALD equipment.

Beneq leads the market with ALD products for R&D, semiconductor device fabrication, 3D and batch production, ultra-fast spatial ALD (C2R), and roll-to-roll ALD. Today, the company has launched BeneqCare to help customers in the EU, Asia and the USA maximize the value of their ALD tools throughout their equipment’s life cycles.

“We have been investing heavily in widening our service capabilities worldwide. Now, we offer service coverage in all regions. We have also established spare part hubs in every region at Beneq offices,” says Hans Fabritius, Vice President, Life Cycle Services at Beneq.

“BeneqCare simplifies ALD equipment ownership by helping our customers maximize uptime and gain access to the right support at every stage of their tool’s life cycle. We are ready to assist our customers in meeting their productivity requirements –from training personnel in using the equipment to meeting any unscheduled maintenance or spare parts needs,” asserts Fabritius.

BeneqCare provides Beneq customers who operate in the industrial and research sectors with a wide range of service modules to suit their operations, from extended warranty and training services to remote or onsite support.

“Our customers have high expectations for the performance of their Beneq ALD tools. BeneqCare brings them versatile support and service plans that grow with their businesses,” says Fabritius.

Companies and research facilities that have commissioned Beneq ALD equipment can avail of a variety of BeneqCare service modules to suit their unique requirements. Among the BeneqCare modules are technical support services, including remote support via Augmented Reality (AR); spare part services; extended warranties; preventive as well as unscheduled maintenance services; and training.

Learn more about BeneqCare: www.beneq.com/beneqcare/

Further information
Lie Luo, Head of Marketing, [email protected]

About Beneq
Beneq is the home of atomic layer deposition. In 1984, we established the world’s first industrial production using ALD. Today, we lead the market with products for R&D (TFS 200, TFS 500, R2), semiconductor device fabrication (Transform®), 3D and batch production (P400A, P800, P1500), ultra-fast spatial ALD (C2R), and roll-to-roll ALD (Genesis).

Beneq’s unique Development Service simplifies customer adoption and proof-of-concept for new ALD processes, while our Coating Service cuts down time to market by outsourcing state of the art ALD production. Our team of engineers and experts is dedicated to making ALD tools accessible for researchers.

• Read more about Beneq fulfills customer demand for tailored ALD equipment services and support with BeneqCare (TM)

ESPOO, Finland, 17th of February 2022 – Fraunhofer Institute for Silicon Technology (ISIT) has taken PICOSUN® P-300B ALD system into use as their powder MEMS technology platform.

Fraunhofer ISIT PowderMEMS is a new innovative technology for creating three-dimensional microstructures from a multitude of materials on wafer level. The technology is based on bonding together µm-sized powder particles in a cavity with Atomic Layer Deposition (ALD). It has many advantages compared to other manufacturing techniques as it allows using much lower process temperatures compared to a traditional sintering process. The bonded porous structures are thermally and chemically resistant thus enabling their extensive post-processing in a clean room.

"The technology can be used for various applications, such as microelectronics, MEMS sensors, MEMS actuators and microfluidics. For example, it enables the integration of porous and magnetic 3D microstructures on wafer level", explains Dr. Björn Gojdka, Group Leader at Fraunhofer ISIT.

“We were looking for a solution for conformal high surface area coating of powder located in trenches. Picosun solution is a perfect fit for this need as we are also looking into scaling up the technology. We are especially happy about the tool’s hot wall reactor, versatile precursor sources and its easy maintenance”, states Dr. Thomas Lisec, Chief Scientist at Fraunhofer ISIT.

“We are excited over this new technology coming to life and all the opportunities it will bring. I am especially impressed by the potential applications for the Fraunhofer ISIT PowderMEMS as they are exceptionally diverse. I’m looking forward to continuing working closely with Fraunhofer ISIT on bringing the technology up to industrial production”, says Dr. Christoph Hossbach, General Manager of Picosun Europe GmbH.

More information:
Dr. Christoph Hossbach, General Manager, Picosun Europe GmbH
Tel. +49 1522 449 49 11
Email: [email protected]
Web: www.picosun.com

About Picosun
Picosun provides the most advanced ALD (Atomic Layer Deposition) thin film coating solutions for global industries. Picosun’s ALD solutions enable technological leap into the future, with turn-key production processes and unmatched, pioneering expertise in the field – dating back to the invention of the technology itself. Today, PICOSUN® ALD equipment are in daily manufacturing use in numerous leading industries around the world. Picosun is based in Finland, with subsidiaries in Germany, USA, Singapore, Japan, South Korea, China mainland and Taiwan, offices in India and France, and a world-wide sales and support network. Visit www.picosun.com.

About Fraunhofer ISIT
Fraunhofer ISIT in Itzehoe is one of Europe's most modern research facilities for microelectronics and microsystems technology. At the heart of the institute are the clean room facilities, large enough not only to conduct research but also to manufacture the developed microchips on an industrial scale. In close cooperation with partners from industry, 160 scientists at ISIT develop power electronics components and microsystems with fine moving structures for sensor technology and actuator technology, including the necessary packaging technology. www.isit.fraunhofer.de

• Read more about Picosun delivers powder MEMS technology platform to Fraunhofer ISIT

BENEQ, PRESS RELEASE, December 6, 2021

Beneq revolutionized ALD cluster tools for More-than-Moore device makers with the highly successful Beneq Transform® family of products. Today, Beneq broadens its product portfolio further with two new distinct solutions: the Transform® 300 and ProdigyTM.

The Beneq Transform 300 and Prodigy were each created in response to specific technology requirements in the semiconductor manufacturing sector.

“The Transform 300 is designed to meet the growing demand of emerging semiconductor applications at 300 mm for devices such as CMOS image sensors, Power Devices, Micro-OLED/LED, and Advanced Packaging, which call for a high degree of versatility,” explains Patrick Rabinzohn, Vice President, Semiconductor ALD at Beneq.

“We created Prodigy to address those market segments that need a simple solution supported by high-end technology. It inherits the ALD design and processing knowhow we at Beneq have developed over the last 15 years, packing advanced features in a simpler, targeted industrial form factor,” continues Rabinzohn.

Beneq Transform® 300
Beneq Transform 300 is the only 300 mm ALD cluster tool that combines thermal ALD (batch) and plasma ALD (single wafer) technologies to provide a highly versatile platform for IDMs and foundries. It is dedicated to advanced thin-film applications in CIS, Power, Micro-OLED/LED, Advanced Packaging and other MtM applications.

Beneq Transform 300 is a highly configurable platform that caters to multiple advanced thin-film applications ranging from gate dielectric including in high aspect ratio trenches, to anti-reflection coating, final passivation or encapsulation, Chip-Scale-Packaging and beyond.

Beneq Prodigy
Beneq Prodigy is the deal manufacturing solution for compound semiconductor including RF IC’s (GaAs/GaN/InP), LED, VCSEL, Light Detectors and for MEMS manufacturers and foundries looking to enhance device performance and reliability through an affordable stand-alone ALD batch tool. Beneq Prodigy provides best-of-breed passivation and encapsulation films across multiple wafer types and sizes.

To learn more, visit:

Beneq Transform 300:  https://beneq.com/en/products/semiconductors/transform300/

Beneq Prodigy: https://beneq.com/en/products/semiconductors/prodigy/

Further information:
Lie Luo, Head of Marketing, [email protected]

About Beneq
Beneq is the home of atomic layer deposition. In 1984, we established the world’s first industrial production using ALD. Today, we lead the market with products for R&D (TFS 200, TFS 500, R2), semiconductor device fabrication (Transform®), 3D and batch production (P400A, P800, P1500), ultra-fast spatial ALD (C2R), and roll-to-roll ALD (Genesis).  Beneq’s unique Development Service simplifies customer adoption and proof-of-concept for new ALD processes, while our Coating Service cuts down time to market by outsourcing state of the art ALD production. Our team of engineers and experts is dedicated to making ALD tools accessible for researchers. 

• Read more about Beneq unveils two new ALD products for 300mm and compound semiconductor device fabrication respectively

FREMONT, Calif. - YES (Yield Engineering Systems, Inc.), a leading manufacturer of process equipment for semiconductor advanced packaging, life sciences and “More-than-Moore” applications, today announced that it has set up Engineering Centers of Excellence at two locations in India: Coimbatore and Bangalore. A sales office will also be located in the Bangalore area.

“It is no secret that high-caliber engineering expertise is in high demand in Silicon Valley,” said Ramakanth Alapati, Chairman and CEO of YES. “Our company’s rapid growth has inspired us to widen our technical recruitment efforts to include global engineering talent powerhouses like India. In addition, we feel there is a strong market for reliable, cost-effective YES systems within India’s domestic semiconductor industry.”

Leading YES’s efforts in India will be Dr. Ankineedu Velaga, a high-tech engineering executive with more than 35 years of experience spanning engineering and fab operations, customer interaction and retention, and business development support in the US and Asia.

“Ankineedu’s experience in driving teams to improve processes will be a great resource for YES as we scale to meet the challenges of worldwide growth. We will be looking to him to draw upon his impressive track record of building organizations to develop complex semiconductor capital equipment as well as leading organizations to achieve better process development, yields, process control, cycle time, cost, and product quality,” said Rezwan Lateef, President of YES.

Dr. Velaga has held leadership roles with BRIDG, imec, SilTerra, Applied Materials, Avago, and Lucent (among others), and his global management experience extends from the US and the European Union to Malaysia and Singapore. His educational background includes a Ph.D. in Chemical Engineering from the University of Arkansas, an M.S. in Chemical Engineering from the Indian Institute of Technology in Madras, and a B.S in Chemical Engineering from the Regional Engineering College in Warangal, India.

“I am pleased and honored to be embarking on this exciting endeavor with YES,” commented Velaga. “We expect to build our India team quickly, and I look forward to talking with high-potential candidates. To see our current job postings for YES India, please visit Careers at yieldengineering.com and scroll down to the ‘YES India’ heading. If you don’t see a job there at the moment that aligns with your skills and interests, but you are a qualified candidate with a technical background and semiconductor experience, I encourage you to submit your resumé to [email protected] and include ‘YES India’ in the subject line.”

About YES
YES (Yield Engineering Systems, Inc.) is a preferred provider of high-tech, cost-effective equipment for transforming surfaces, materials, and interfaces. The company’s product lines include thermal processing systems, chemical vapor deposition (CVD) systems, plasma etching tools, and wet process equipment used for the precise surface modification of semiconductor substrates, semiconductor and MEMS devices, and biodevices. With YES, customers ranging from startups to Fortune 100 companies can create and volume-produce products in a wide range of markets, including Advanced Packaging, MEMS, Augmented Reality/Virtual Reality and Life Sciences. YES is headquartered in Fremont, California, with a growing global presence. For more information, please visit www.yieldengineering.com.

• Read more about YES Establishes Engineering, Design and Sales Presence in India; Ankineedu Velaga to Lead YES India as Country Head and Managing Director