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Semiconductor Equipment

As we move through Q2 of 2021, it seems that the world is finally approaching normalcy. But I don’t believe our lives and businesses will ever be the same. Travel is unlikely to return to the same level as pre-COVID-19 for many years. I’m sure many companies will establish tighter travel policies and budgets as virtual conferencing has proven to be beneficial and cost-effective. Patients and doctors who were skeptical of telemedicine are embracing it, and although it’s not perfect, it has filled a needed gap. Online learning essentially happened over a weekend and will now be part of many curriculums and programs. All of these elements have spurred our semiconductor industry into a super cycle. Demand for chips is leading to an increased demand for semiconductor equipment. Semiconductor capital equipment expenditures in 2020 surpassed $63 billion and are forecast to top $70 billion in 2021. The secondary equipment market typically makes up about 5% to 10% of that. Our inquiries have definitely increased this year. With this in mind, I’d like to share some thoughts for the remainder of the year. Storage of Chipmaking Equipment Not New The semiconductor industry has been experiencing an equipment shortage for some time. It is difficult for original equipment manufacturers (OEMs) to support such a large variety of products and technologies. Some companies use equipment for manufacturing 150mm, 200mm and 300mm wafers. Fabs still run 30-year-old technology on 150mm wafers while the latest technology is manufactured on 300mm wafers. We’ve also seen new technologies like silicon carbide (SiC) being developed on these smaller wafer sizes. Unfortunately, some OEMs stopped making 150mm and 200mm some time ago and have only recently jumped back into the market. These OEMs have had to balance technological advances, pricing, and manufacturing capacity to meet this demand since their primary focus is on 300mm equipment. Third-party refurbished equipment suppliers have also experienced an increase in demand over the last several years. We see it increasing at all technology levels over the next three to five years. This translates to increased equipment pricing for both new and used equipment, as well as increased lead times. Growing Demand for Legacy Tools Many electronic products we use and are familiar with don't require state-of-the-art technology. For instance, cellphones, electric vehicles, wearables, monitors and industrial products still contain many chips manufactured on 200mm wafers using 200mm equipment. There are still approximately 200 200mm fabs worldwide and this makes up about 25% of all wafer capacity regardless of wafer size. These fabs manufacture analog devices, MEMS products, power management ICs, RF devices, discrete devices and sensors. We have also seen an increase in lead times for 200mm equipment. Typical lead times of three to six months have increased in some cases to one year or more. This situation has created a dramatic increase in chip making equipment prices and we do not expect much relief there. Many OEMs transitioned to 300mm equipment prior to 2010. Revenue and profit margins are much higher for them on 300mm equipment. 200mm manufacturing was supported by many third parties for a while. However, in 2016 we saw a resurgence in 200mm equipment, and at that time many OEMs began jump-starting their supply chains. It took some time for them to develop new supply chains, upgrade technology and in some cases hire newly trained engineers to support these new tool sets. All this costs money, which is why we will continue to see an increase in new legacy equipment pricing. Because manufacturers and products may not be able to support these prices, we expect the robust third-party ecosystem to continue. SurplusGLOBAL's Response to this Demand One of the advantages we bring to the secondary equipment market is our ability to recycle technology. We continuously search for opportunities to purchase large packages of tools from companies that are transitioning technology nodes, moving from 200mm to 300mm wafer size or changing product lines. We spend approximately $65 million to $100 million each year on purchasing equipment and in some cases storing it for the right customer. For instance, a memory company may be changing technology nodes and no longer needs its equipment. This use to happen on a predictable schedule. Instead of scrapping that equipment, SurplusGLOBAL purchases and stores it. Sometimes we only need to store it for one month before relocating it. However, in many cases, we store it for one year or more. We may power it on at a later date if it is in good condition. In some cases, we work with an OEM or third party to have it refurbished and ready for a new customer. In response to the need for more secondary market equipment, we have opened up additional offices in Japan and Singapore to stay close to and better support our customers in those regions. Finally, our biggest and most recent endeavor is building our Semiconductor Equipment Cluster, which opens in July 2021. Learn more about the SurplusGLOBAL Semiconductor Equipment Cluster. Emerald Greig is executive vice president Americas at SurplusGLOBAL.
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With each transition to a new technology node, fab requirements for metal and particle contamination become more stringent, posing challenges for existing coating methods such as anodization or plasma spray that may not provide complete protection against contamination especially on critical chamber components with complex geometry. SEMI spoke with Beneq business executive Sami Sneck about common metal and particle contamination issues with critical chamber components, coating methods to protect against corrosion, and properties to look for when selecting the optimal protective coating solution. Sneck discussed the unique benefits of atomic layer deposition (ALD)anti-corrosion coatings with Aluminiumoxide (Al2O3) and Yttrium Oxide (Y2O3) and offered recommendations on how to work with original equipment manufacturer (OEM) partners to design, test and implement an ALD coating solution for semiconductor equipment. To learn more, visit Beneq at its digital booth at SEMI Technology Unites Global Summit, available on-demand until March 26, 2021. Registration is open. SEMI: How does ALD compare with other coating methods such as anodization and plasma spray? Sneck: ALD enables conformal dense and pinhole-free coatings on complex shapes. We can deposit various ALD coating materials on parts made of various materials. All other coating techniques have limitations. For instance, anodization is conformal, but porous and is suitable for Al2O3 used for aluminum parts. Plasma Spray is a line-of-sight method and not conformal on complex shapes, such as holes in showerhead parts. SEMI: Which substrate materials work for ALD coatings? Sneck: In general, parts made of common metal materials, such as aluminum, stainless steel or titanium, all work well with ALD coatings. Commonly used ceramic materials work well with ALD too. Plastic materials need to be coated generally at a lower temperature, which limits the coating material selection, but materials such as Al2O3 can be applied as well. SEMI: What is the maximum coating thickness you can reach with ALD? Does this depend on the material? Sneck: Yes, indeed. The maximum coating thickness does depend on the material of the part that we are coating. Polymer materials for example, have a very large coefficient of thermal expansion, which limits the practical coating thickness to the 100-nanometer level. On metal and ceramic parts, coatings of several micrometers are possible too. Typically, ALD coating thickness on chamber components range from a few hundred nanometers to one micrometer. SEMI: Which aspect ratio can you coat with ALD? Sneck: Basically, ALD can coat aspect ratios of 1000:1, but this would be extremely slow. In practice, some of the most complex parts are showerhead parts with small holes. Typically, these have an aspect ratio of around 100:1, which is perfectly commercially feasible for ALD. An extreme example would be gas lines: In this case, the aspect ratio may be also around 100:1, but the physical distance from one end to the middle may be half a meter. In this respect, it is not practical to wait for gas diffusion to reach such a depth level. Instead, the gas lines can be coated by forcing the ALD precursor gas flow into the gas line parts. This works well but needs part-specific manifolds to guide the gases. SEMI: What is the lifetime of ALD coating compared to other coatings? Sneck: ALD coatings differ from other coatings a couple of ways. First of all, ALD coatings generate less particle contamination since they are non-porous. Secondly, and most importantly, ALD coatings can cover areas that other coatings cannot. What is considered the lifetime of a certain part depends on various factors. Ultimately, the lifetime needs to be confirmed by testing parts in actual process chambers by running a lot of wafers through the chamber and monitoring critical parameters such as particle level and yield. SEMI: If you have multiple shelves with parts in the reaction chamber, how does the shelf position affect the coating uniformity? Is center shelf better than top and bottom shelf? Sneck: Uniformity depends on many parameters, including the part geometry, part holder geometry, batch size and coating material. When the shelves supporting the parts are optimally designed and the gas flow is well-distributed to all shelves, all shelves from top to bottom show similar uniformity. SEMI: Is there any risk of cross-contamination? Sneck: Cross-contamination could potentially be caused by the parts themselves or by different coating materials. The batch setup is fixed in production use, which means the parts are the same in every batch. The only variation is that the batch may not be full in some cases, but then we do not fill the empty part of the batch with other parts that could cause contamination in order to prevent contamination from one part type to another. Cross-contamination from one coating material to another is not a usual concern but can be prevented by using dedicated reaction chambers for different coating materials. This is very easy to do with Beneq P800. Sami Sneck manages Beneq’s semiconductor part coating business. He joined Beneq in 2005 and since then has held various professional and management positions including product manager, application manager, director of ALD group, head of sales, and head of Asia. He earned his MSc degree in Chemical Engineering in 2001 from Helsinki University of Technology. Sneck has special expertise in Atomic Layer Deposition technology and business development. He has played a vital role in introducing various ALD production concepts and solutions to several industries ranging from jewelry to photovoltaics, electronics and semiconductors. Access the free webinar recording and discover the latest anti-corrosion coating solutions and the unique benefits of ALD (atomic layer deposition). This webinar is particularly helpful for process engineers, equipment engineers and others responsible for contamination control and equipment yield. Serena Brischetto is senior manager of Marketing and Digital Engagement at SEMI Europe.
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