Samsung

By Sowmyan Rajagopalan, Founder and CTO, Thalia Design Automation FD-SOI is receiving significant traction with analog designers, but analog IP reuse often equates to tough choices. Porting chips from bulk to FD-SOI or creating new chips on FD-SOI means making decisions on porting existing bulk IP or starting from scratch. To invest the time and resources in reusing an analog IP requires a judgement call on the potential returns from the market and the time it takes to get the IP to that market to generate revenue is key – if a competitor's project hits the market first, then the potential returns are greatly diminished. There is also a need to understand the differences in process technologies and the impact those differences have on the efficient reuse of analog IPs. All this means that the demands on resources and time are high. Decisions, decisions A typical decision fork faced by many companies is whether to design new IPs, or if they should instead build a portfolio of analog IPs. Given the opportunity cost, availability of resources, time and resources needed for each option means that doing both is a difficult option. Both have their advantages; designing new IPs allows companies to branch out and address new sectors or markets. New IPs often demand higher revenues and engages in-house designers as the work, by its nature, is more innovative and challenging. On the other hand, building a portfolio of analog IPs allows companies to expand in an existing market, bringing stabilisation and strengthening revenues from existing product sectors. But why should you have to choose when there’s a third option? Have your cake and eat it It is difficult for a company to drive both options internally – not least because there’s a paucity of good analog designers in the market, and the opportunity cost is simply too high. However, the good news is that firms like Thalia have the specialist expertise and toolsets required build a portfolio of analog IP, saving time and investment while in-house designers focus on new IP design. Looking back Over the last 18 months, there has been a rapid uptake of FD-SOI process technologies. With production at foundries such as GlobalFoundries and Samsung now in full swing, more and more analog designers are reaping the benefits of FD-SOI. At Thalia we’ve been at the forefront of some of these changes, having worked with multiple customers on projects that use FD-SOI technology. [bctt tweet="More more analog designers are reaping the benefits of #FDSOI. At Thalia we’ve been at the forefront of some of these changes, having worked with multiple customers on projects that use FD-SOI technology. - @Thalia_IP_Reuse CTO " username="soiconsortium"] Driving the shift to FD-SOI [caption id="attachment_34410" align="alignright" width="347"] (Courtesy: STMicroelectronics)[/caption] This figure contrasts the structures of traditional bulk planar and SOI type transistors. The main difference is the inclusion of a buried oxide layer that isolates the channel of the transistor from the bulk silicon of the substrate. This results in a very thin, controllable channel structure, with much lower leakage currents being ‘lost’ into the device substrate than traditional alternatives. This in turn improves two key figures of merit for the device. First, standby power consumption is dramatically reduced. Second, the threshold voltage is much more predictable and controllable – yields are improved, and power/performance tradeoffs via voltage scaling are more easily enabled. The penalty is that FD-SOI transistors are generally not so fast. But one other feature of the technology – particularly important for mixed signal and analog designs – allows smart designers to mitigate this effect. Biasing the body structure at a different voltage to the source enables the designer to trade speed for power: a reverse bias increases the threshold voltage of the device, making it slower, but reducing leakage current; conversely, forward biasing reduces the threshold voltage, increasing the speed of the device, at the cost of power. Design migration Thalia has worked on a number of projects that utilize SOI technologies. A recent RF front end for Bluetooth Low Energy (BLE), for example, used exactly the techniques I have outlined above. We migrated an entire subsystem design, composed of around 30 blocks (including ADCs, PLLs, mixers, amplifiers and power controllers), to a 28nm Samsung FD-SOI process. [caption id="attachment_34412" align="alignright" width="451"] Click on this slide to see a YouTube video of the full Thalia presentation given at the Design Reuse FDSOI Virtual Event in March 2020.[/caption] The circuit was verified for compliance with design specifications. Design changes were implemented to ‘nudge’ the design to meet the requirements. And we made full use of the body biasing techniques I have already outlined. We used reverse body biasing to keep leakage as low as possible in parts of the circuit in which speed was not a factor; and, where speed was a key requirement, implemented forward gate biasing to increase performance. We’re expecting increasing numbers of customers to start moving their analog and mixed signal designs to SOI technologies in the coming months and years. The process is not without its challenges: but with an intimate knowledge of circuit design and optimization, and of the subtleties of the processes themselves, there are substantial advantages to be reaped. Technology analyzer – identifying the root cause when circuits fail A large part of the effort involved with migrating an IP from one technology to another is involved with qualifying the IP in the target technology; if a block doesn’t meet the requirements of the target technology, it won’t function. Identifying the cause of this – the technology characteristics that cause it – and then addressing them is key to a successful outcome. Whenever a key specification is not being met in the target technology, we have to determine which process technology or circuit characteristic is causing this. By using our automated technology analyser, we can take a design-centric approach to analyse and compare base and target technologies to see where the process technologies are similar and where they differ the most. The technology analyser considers both first and second order effects including FT, gm/id, Vdsats among others. Using this technology, we can identify which characteristics differ between the origin and target technologies. With traditional methods, identifying differences in characteristics would be time consuming, but our technology analyzer gives a clear and rapid identification of the issues, allowing us to fix any mis-matched topologies and achieve a functioning result in the target technology. The reality? IP reuse is not a dream or a myth Our platform comprises three elements – Technology, Methodology and Design Expertise. Using this trifecta, we have been able to deliver IPs in different technologies, nodes and with improved characteristics. The AMALIA technology consists of four elements: a technology analyzer, schematic porting, design enabler and layout migration. Tech analyzer: Using a design-centric approach, the platform addresses key first and second order effects of process technologies and extracts and compares characteristics between base and target technologies to provide the user with clear inputs on how similar the technologies are. Automated schematic porting: Taking the inputs from the analyzer and generates a circuit in the target technology. This circuit can then be verified for response and characteristics. Design enabler: Once the circuit design for the target technology is correct, the design enabler and our team of experienced designers can nudge the circuit back into specification. Layout migration: The final stage is focussed on putting together the base layout framework which is then expanding on by our experienced layout designers. Who we are?We are Thalia Design Automation. I founded Thalia in 2011, with the aim of improving the efficiency and process cost of analog circuit design and to rollout an analog IP reuse platform. We’ve worked with vendors, numerous foundries and different nodes and have design centres in Germany and India with our headquarters in the UK. We have successfully rolled out an analog IP reuse platform that combines smart technology, a smart methodology and our smart and experienced resources to streamline the IP reuse process. In doing all this, Thalia regularly provides customers with a time saving of around 50% compared to a traditional circuit redesign. And as I stated at the beginning of this article, achieving a faster time to market is key to maximizing revenues from any IP.

VeriSilicon provides platform-based, all-round, one-stop custom silicon services and semiconductor IP. For two years running, they’ve been the #1 Chinese IP provider and well into the Top 10 worldwide (per IPnest 2020). They’re also an FD-SOI design powerhouse. Founded in 2001, VeriSilicon first began work on FD-SOI in 2013. Now they’re headed for listing on the Shanghai STAR exchange. SOI News talked to President CEO Dr. Wayne Wei-Ming Dai about his company’s innovative business model, and opportunities for FD-SOI.SOI News (SN): You call the VeriSilicon business model “SiPaaS”, for Silicon Platform as a Service. Can you tell us what that means? Is it particularly well-suited to designs based on FD-SOI? Dr. Wayne Wei-Ming Dai (WD): We see SiPaaS as the third transformation in the semiconductor industry. If you take a minute to look at the evolution, first was the IDM model of the 1960’s and 70’s, largely based in the US and Japan and driven first by the US military, then home appliances and consumer electronics. The second transformation was the foundry model, driven heavily by the PC and cellular communication, with a geographic center heavily based in Taiwan and Korea. That solved the CAPEX challenge. Now with the IoT, we solve the OPEX – operational expenses – challenge. Although 60% of our business comes from outside China, we do see particularly good opportunities for China. With AI and AIoT, there’s a lot of custom designs. You have a new model with the chip as a system, with lots of IP – but it also is much more expensive. The VeriSilicon SiPaaS model covers everything from IP to final tape-out, delivers packaged and tested parts, and that accelerates time to market and saves money. If you consider the share of R D expenses as a percentage of chip revenue, for leading fabless companies, they can be 20-30%, and you need to have a gross margin of 50% and higher. But if your gross margin is 40% or below, you might out of business. The VeriSilicon model seeks to transform the design-heavy model, where designers use their own IP, to the next wave, which is design-lite. When you’ve got a design-lite model for A/IoT, you don’t need such a big team. This is the third transformation. You first saw this starting in a major way in Israel, where going to design-lite enabled fabless companies to move very quickly. But you still need IPs, and for those working under a traditional model, we have those. In SiPaaS, we offer IP platforms. Chip design is kind of like building a house. If you want, we can just give you the kitchen – so that’s some specific IP. But we can also give you the entire house. The IPs form the solutions. For each type of application, there are similar IPs that need to be integrated. Sets of IPs form subsystems for IoT, automotive, medical, wearables, audio, video, etc. There are no boundaries on the platforms, but each have typical elements. In this industrial transformation, and now especially for AIoT, you’ll need many more chips in many different places. We have a lot of IP that we created organically, but we also made some major acquisitions over the years. For example, 13 years ago we bought a Dallas based DSP division from LSI Logic. Our design-lite platform approach plays particularly well in FD-SOI, where designers want to maximize the advantages of the technology. Remember that much of the original IP for FD-SOI comes from ST or Samsung. When Samsung first licensed 28nm FD-SOI from ST, we got a whole set of 28nm FD-SOI IP from ST with modification rights. So we started to play with them. Then that IP went to Synopsys. We have modified, optimized and customized it for customers. And with GlobalFoundries’ 22nm FD-SOI, when the IP comes out, we're the first ones invited to test it. So we focus on those IPs. We do benchmarks on ARM and others. And we’ve designed our own IPs for RF and more. We’ve done the body biasing circuits and software control, so we support design methodologies. People often ask us to show them how good FD-SOI is. So we do a lot of benchmarking. At 28 bulk, we can do apple-to-apple comparisons. And 28 bulk or 22 FD-SOI, it’s the same team, so we can do those comparisons, so they can compare the two nodes. And we’re partnering with more 3rd party IP companies – including smaller players – providing FD-SOI IP, which is great. [bctt tweet="Our design-lite platform approach plays particularly well in #FDSOI, where designers want to maximize the advantages of the technology - @VeriSilicon CEO Wayne Dai #IoT #edgeAI #wearables" username="SOIConsortium"] SN: You have been a very vocal champion of FD-SOI. Why? WD: We’re not against FinFET – that a really big part of our business and we’re very advanced in it. We were the first to do a tape-out on Samsung’s 7nm UV FinFET test chip and are working on 5nm. While overall we tape out over 30-50 chips a year, we are foundry neutral. But we recognize that FinFETs are not for everything: there are some things that FD-SOI does much better. Integrating RF, for example – it’s not impossible but it’s not natural in FinFET. Yes, if you’ve got a big digital chip running at high speed most of time, FinFET is better. But if you’re running high speed some of time, say around 20%, especially integrating RF, FD-SOI is better. And back biasing is impossible in FinFET. In the end, we “walk on two legs”. SN: What do designers need to know about FD-SOI? WD: Body biasing can sound complicated, but the thing is, you don't play with each transistor. In theory, you can control each transistor with body bias, but in reality, you do it region by region. With body biasing, you can dynamically make different parts of the chip behave differently. This is key. Some parts are reverse biased. Some parts are forward biased. You play with this block by block, and kick it in as-needed by software after the chip comes back. So in IoT, for example, where it's very serious low power, you may want to shut down certain parts when you're not using them, while other parts always need to be on. If you choose one of our platforms, we’ve taken care of that. There may be parts you only need to bring up and run at high-speed for certain tasks. So body biasing gives you all sorts of controls. With FinFETs you can't do that, you can just play with voltage scaling. You can drive up the speed – the dynamic power – when needed with forward biasing. During that time, you're not really worrying about leakage power because when the task is done you can completely shut down those parts again. It also changes tape out. Typically designers do worst case. But you might not need to design for the worst case: you leave too much on the table. With body biasing, if you solve for typical, when the chip comes back, you can tune and make adjustments post-silicon. So you can do an aggressive tape-out, which is much more effective than starting off with a worst case. True, if you sign off worst case, your chip can always run very fast, but sometimes you don't need that. And in order to solve for worst-case, you put in a lot of buffers or whatever for timing closure, which is unnecessary effort. What's more, for different applications, the worst case can be different: some applications may need some higher speeds and sometimes less. If you solve for typical, then depending on the application you can software-tune the device. In the past, you never had that kind of thing. With body biasing in FD-SOI, you can solve for typical, so you can save a lot of area and a lot of design cycle in terms of timing closure, in terms of use of buffers. If silicon comes back, and it's missing something – say you need it to go a little faster – I’ve done body biasing, so I adjust the timing. Most times it's probably ok, it's good enough. Of course, some applications you need some combination of fast and slow, and you can leverage the body-biasing post silicon to change what's fast and what's slow on the fly. Like in wearables, power is very critical – some parts are always on, and some parts are sometimes on. For the parts that are always on, you need to reduce the leakage, and you do that with reverse body biasing. For other parts, you bring them up and you run as fast as you can for a short period of time – in this case leakage isn't as important because most of the time it's shut down. But dynamic power is important. High performance is important. For that part you need forward biasing. With different parts of the chip, you can play with different things. Before, you had to do this before tape-out, and sometimes had to do worst-case, which should never happen: you leave too much margin on the table, because after silicon you couldn’t do anything. But now with body biasing in FD-SOI, you have the capability – you don't need to do worst case – if needed you can always adjust. And for different applications in the chip, you might need a different kind of operating frequency, right? So you can create different chips from the same chip. With body biasing, you can always tune to whatever you want. If I’m short of something, I can do some body biasing bring up the speed. Now that's different from voltage scaling. You cannot dynamically achieve voltage scaling. You might have two voltages – one's high, one's low. But you cannot continuously change. In FD-SOI the same die maybe has different applications with different performance requirements, so we don't need to do worst case design. They can come up with different performance chips in the same silicon. SN: What do you see as the drivers? WD: IoT, AIoT and automotive. Also RF, mmWave and connectivity. And at the edge, where you need very low power. FinFET and FD-SOI both solve the leakage problem. But if you need sleep mode most of the time and high performance 20% of the time, it is more energy efficient to use FD-SOI. There are a lot of applications in this category. In 12nm FD-SOI, you’ll reach almost the same performance as 7nm FinFET at 14nm cost. [bctt tweet="#FinFET #FDSOI both solve the leakage problem. But if you need sleep mode most of the time and high performance 20% of the time, it is more energy efficient to use FD-SOI /@VeriSilicon CEO #edgecomputing" username="soiconsortium"] You’ve seen some stagnation of IoT at the 40/55nm process nodes because at those nodes the performance was not as good as expected. You needed two AA batteries. The value of the IoT data was not generated, collected or analyzed. What you need is AI at the edge to pre-process the raw data so you lower network capacity requirements. AI at the edge is a great opportunity for FD-SOI. SN: How do you see the role of the SOI Consortium? WD: We work with the consortium for these big forums; in particular VeriSilicon co-founded and has now co-sponsored the Shanghai FD-SOI Forum for seven years. They’re the most visible and high quality. The consortium knows the people that need to know each other. There are a lot of meetings during these events, and a lot of deals are sealed; one signature event is the river dinner cruise where “everyone is on the same boat”. ~ ~ ~ Related VeriSilicon press releases: VeriSilicon Releases Most Advanced FD-SOI Design IP Platform on GlobalFoundries 22FDX for Edge AI and IoT Applications (2019-10-24). The VeriSilicon 22FDX IP Platform includes over 30 low-power, low-leakage and high-density memory compiler IPs and various key mixed signal IPs. VeriSilicon provides a one-stop silicon design service to customers designing for AIoT with mature IPs to shorten custom design cycles and reduce their R D costs. FD-SOI Body-Bias technology allows the user to adjust device threshold even after silicon is manufactured: it can enable dynamic tuning between High-Performance and Low-Power, and enhance the design flexibility without extra cost. Advanced ATSC 3.0 Chip Launched for Mobile and Broadcast Applications (2019-01-08). The demodulator SoC was designed and developed by Saankhya Labs with ASIC turnkey design and manufacturing services from VeriSilicon, using Samsung Foundry’s state of the art 28FDS (its Fully Depleted SOI process technology), chosen for its unique low power capabilities offered by the back bias option. (See more in-depth coverage on this announcement from SOI News here.) VeriSilicon Announces Ultra Low Power BLE 5.0 RF IP based on GLOBALFOUNDRIES 22FDX FD-SOI Process for IoT Applications (2018-11-01). The IP includes a transceiver that is compliant with the BLE 5.0 specification and supports GFSK modulation and demodulation. The silicon measurement shows that the sensitivity can be tested up to -98dBm with less than 7mW power dissipation in typical conditions. It largely improves battery life for low power IoT applications. In addition, the RF transceiver saves 40% area compared to a similar implementation on 55nm bulk CMOS. Besides the RF transceiver, this IP integrates on-chip balun, TX/RX switch and 32K RC OSC driver to save the BOM. Moreover, high efficiency DC/DC and LDOs are also available for power management. “Wearable and IoT markets especially the wireless earplug market are growing rapidly, and it will surge through consumer use, hearing aids, personal care and other industrial applications.” said Dr. Wayne Dai, Founder, Chairman, President and CEO of VeriSilicon. “By taking advantage of integrated RF capabilities of FD-SOI, in particular GF’s 22FDX, our BLE 5.0 RF IP will significantly reduce the system cost and greatly boost the growth momentum of wearable products such as wireless earplugs.” GlobalFoundries and VeriSilicon to Enable Single-Chip Solution for Next-Gen IoT Networks (2017-07-13). The integrated solution leverages GF's 22FDX technology to decrease power, area, and cost for NB-IoT and LTE-M applications. VeriSilicon's Artificial Intelligence Engine Delivers Multi-Sensory Experiences in NXP's i.MX 8 Flagship Applications Processor. (2017-06-08).

Here is our second post about the SOI Consortium’s Japan Symposium this past fall. This will provide summaries of eight very informative presentations on SOI in IoT and automotive by NXP, Dolphin Design, Leti, Silvaco, Arm, I-fuse and Secure-IC. There’s a lot of content to summarize, so this post is about twice as long as those we usually do. But you’ll want to read right to the end, for sure! In case you missed our previous post on the 5G/RF-SOI presentations given at the Japan event, you can read it here. Our next and final post on the Japan event will cover photonics presentations by Cisco/Luxtera, TowerJazz, GlobalFoundries, Leti, Cadence and Soitec. By way of reminder, the Japan SOI Symposium was a great success, with both days well attended. If your company is a member of the SOI Consortium, you can now access most of these presentations on our website. You can also click on the illustrations in this post to see them in enlarged versions. [caption id="attachment_28106" align="alignleft" width="366"] (Courtesy: NXP SOI Consortium)[/caption] The IoT World Enabled Through SOI - Jon Cheek, NXP Sr. Director, Front-End Innovation For NXP, FD-SOI introduced the ability to easily add different functionalities to the technology node like ULP, eNVM, support for high-voltage and embedding RF. For them, said Cheek, it’s about the range, and with adaptive back bias, you can “get crazy”, so you can really achieve amazing things. In fact, they think they now have the lowest leakage SRAM in the industry, thanks to body biasing. The i.MX 7ULP is finding significant success in wearables. Their “crossover” chips are the latest beneficiaries of FD-SOI with body biasing. The “new normal”, they offer huge improvements for real-time operating systems – which is of course key for edge computing. (As you can imagine, the audience was intently taking notes throughout -- this was a really excellent talk!) It also is great for machine learning, as it is designed to unlock the potential of voice-assisted end nodes. The IP they needed is now available from multiple vendors, noted Cheek, such as Tensilica and VeriSilicon. Another key play will be in visuals for industrial computing. He concluded by observing that the automobile is the ultimate IoT machine, with 10x the amount of code now found in leading edge airplanes. That’s where the i.MX8 and 8X come in. [caption id="attachment_28104" align="alignright" width="323"] (Courtesy: NXP SOI Consortium)[/caption] High-Voltage SOI – Enabling Automotive- NXP Jon Cheek gave this presentation on the second day of the Japan event. Long-time followers of SOI will know that NXP has been excelling in high-voltage (HV) SOI for well over two decades now (including the pioneering work done by Philips, now part of NXP: their EZ-HV SOI patent dates back to 1993). It’s probably safe to say that NXP's SOI-based automotive chips are used by virtually every carmaker on the planet. HV follows well behind the leading edge – it’s currently mostly around 130nm (the limits are related to metalization). Reason #1 it’s on SOI? SOI-based technologies are incredibly reliable, especially in the automotive culture targeting the three zeros (0 emissions, 0 accidents and 0 time wasted). Today’s car manufacturer’s are going to a distributed environment, and SOI still provides a huge advantage, making parts that are smaller, lower power and more reliable – so it drives a lower BOM for automakers.In conclusion, said Cheek, NXP’s leadership through SOI innovation enables scalable solutions, high voltage analog integration, sensor integration, and reliable safe passenger experience. [caption id="attachment_28101" align="alignleft" width="432"] (Courtesy: Dolphin Design SOI Consortium)[/caption] Improving SoC Energy-Efficiency with Dolphin Design Platforms – Nicolaus Gaude, BizDev Product Marketing, Dolphin Design Dolphin has a series of platforms, techniques and IP for increasing speed and drastically improving energy efficiency in SoC design. Gaude introduced their Speed Platforms, which include a Power Management Platform and a Processing platform, both of which make dramatic improvements in energy efficiency. The Power Management Platform keeps control of power management from architecture to design, resulting in a 10x improvement in energy efficiency. The Processing Platform comprises configurable RTL clusters for best-in-class (100x) energy-efficiency. Gaude then turned to the Dolphin’s Adaptive-Body Bias (ABB) IP for breakthrough energy-efficiency with FD-SOI. This is real-time, “on-the-fly” body biasing: the IP does it all. It is silicon-proven on GlobalFoundries’ 22FDX with Arm cores and Invecus standards cells SRAM, with breakthrough energy efficiency. [caption id="attachment_28108" align="alignright" width="363"] (Courtesy: Silvaco SOI Consortium)[/caption] Platform Infrastructure for SOI-IP Ecosystem – Thomas Blaesi, VP of Global Marketing, Silvaco The massive use of IP is both an advantage and a challenge, began Blaesi. There are solutions out there, but they are disconnected. Typically SoC/IP designers, IP librarians and support folks use various systems, while procurement, finance and legal use others. This is a problem for both the providers and the consumers of IP. Silvaco has a new system called Xena that centrally organizes all IP data: it’s an IP repository for tracking accounts, products, contracts, devices, support, compliance and reporting. One of the first beneficiaries of Xena will be the SOI ecosystem, as providers of SOI IP are already signing on. Beyond the organizational advantages, Xena has patented “finger printing” and “DNA analysis”, so there is a digital representation of each IP on an SoC that can’t be reverse engineered. Each fingerprint contains list of unique signatures of each file in an IP or SoC. A file’s unique signature is created from the entire file content, and that signature is guaranteed to be unique to that content. It enhances support for all versions of common design files: hard IP, soft IP, and embedded software. Because it’s cloud or enterprise based, it will be particularly useful for large organizations. Fingerprinting and DNA analysis are vendor agnostic, universal, and easy-to-use tools and methodologies for IP lifecycle management, he concluded. [caption id="attachment_28103" align="alignleft" width="463"] (Courtesy: Leti SOI Consortium)[/caption] Ultra-low power, FD-SOI based IP, in the space of IoT, Health Care, Smart Connectivity 5G – Michael Tchagaspanian, EVP Industrial Partnerships, CEA-Leti This presentation began with a review of the explosion in devices with IoT and related investments, then connected all the ways in which innovations powerhouse Leti is contributing – from the SOI wafer level to the chip level – which is to say practically everywhere! Especially hot topics in FD-SOI included: the roadmap to sub-10nm; CoolCube monolithic 3D; new embedded memories; power amplifiers; Ultra-Wide Range DSP; smart sensing local processing (including haptics, imaging, infrared advanced processing); local processing with edge AI; and spike coding for deep neural networks. He showed information on two always-on/on-demand transmission 28nm FD-SOI IoT test chips that taped out in mid-2019: the Warrior and the Samurai. And finally, he covered silicon-proven IP that Leti has for FD-SOI including power management blocks, lots of RF IP (including low-power RF wake-up), sensor interfaces, clockless network-on-chip and new SRAM technologies. These and more will be covered at the next Leti Innovation Days in Grenoble (June 2020) – during which in parallel, btw, there will also be a European SOI Summit hosted by the SOI Consortium. [caption id="attachment_28099" align="alignright" width="475"] (Courtesy: Arm SOI Consortium)[/caption] FDSOI Enablement for a Total Compute Future – Manuj Rahor, Director Emerging Technologies Product Marketing, Arm Subtitled A perspective on system optimization with Arm FDSOI IP, this presentation reviewed how Arm is enabling system gains through optimization across IP boundaries. This is work happening in the Arm Artisan Physical Design Group (PDG), which provides logic, memory and POP (processor optimization package) IP as well as various products to help ease implementation challenges for advanced nodes. In this case the focus is on Total Compute enablers on Samsung 28nm FD-SOI (called 28FDS) – specifically three building blocks recently launched on FD-SOI. The first is the 128Mb Wide Capacity embedded MRAM (an eNVM to replace eFlash) compiler for storage delivered to Samsung in July `19. It was demonstrated in silicon in the Musca-S1 Smart IoT Device Demonstrator on 28FDS, an energy efficient IoT device with eMRAM secure boot on-chip storage. [Read our coverage from March 2019 here.] The second is a novel design developed with Spin Memory. It recently taped out on 28FDS and is slated for delivery in 2020. Adding an “Endurance Engine to the eMRAM that was delivered in 2019, the ARM-Spin innovation delivers RAM-like performance with increased speed and endurance. What’s at issue here is a change in use cases. Use cases served by eFlash were not written to that often; now with sensors (as in IoT) that continually gather and write data, eFlash endurance is not sufficient. The third is billed as an SRAM replacement compiler. Its MRAM as RAM in A-class systems, with significant energy and performance gains. Again, this is a use-case issue: retention is lower (this is for weeks months, whereas the other solutions are for 10 years). But you can get more RAM than SRAM into the same footprint, so you get a 60% reduction in DRAM traffic and increased performance. Delivery for this is marked as 2020+. [caption id="attachment_28100" align="alignleft" width="294"] (Courtesy: Attopsemi SOI Consortium)[/caption] I-fuse™: A Disruptive OTP Technology – Dr. Shine Chung, Chairman, Attopsemi I-fuse is a disruptive OTP (One-Time Programmable) technology without disrupting a fuse. The goal was a 100x increase in reliability at 1/100th of the cell size and 1/10th the power. It has now been demonstrated in GlobalFoundries’ 22FDX FD-SOI technology for energy harvesting applications. In the OTP IP technologies, explained Dr. Chung, they defied the conventional wisdom of breaking a fuse to maintain a permanent programmed state forever: Attopsemi’s I-fuse™ is actually a “non-breaking” fuse. “I don’t mind to break a fuse, but I do care about breaking a fuse by explosion”, said Dr. Chung. “The I-V curve of programming a fuse beyond the break point actually shows more like an explosion. The anti-fuse OTP also ruptures gate oxide by explosion. On the contrary, I-fuse™ is a disruptive OTP technology without disrupting a fuse.” He concluded, “By using MOS as switches to enable discharging two capacitors, through cell and reference cell respectively, and compare the discharge rates, the resistance in the cell can be determined higher or lower than the reference resistance so as to convert into logic data. The read energy consumed is only 1/100 of the conventional sensing, which is good for energy harvest IoT applications. Eventually most IoT devices will be battery-less.” [caption id="attachment_28107" align="alignright" width="398"] (Courtesy: Secure-IC SOI Consortium)[/caption] AIoT Embedded Security Using FD-SOI – Yan-Taro Clochard, Japan Sales Director, Secure-IC In addition to opportunities, the impact of AI on IoT (aka AIoT) adds new threats to edge devices. Design for security and in-depth security is required, down to the physical layer. For example in automotive, sensors gather data and AI analyzes it – but the enabler is security. The challenge of AI is the increase in data and connectivity with unsecured devices. FD-SOI is a key for Secure-IC’s Securyzer security module: it leveragesFD-SOI properties to secure the AIoT world. It is flexible, and tuned for each customer. Here, FD-SOI enables the creation of physically secure systems, with secure boot and firmware updates, cryptographic services, key management and secure storage.

The industry continues rewarding luminaries of the SOI ecosystem. Recently recognized are Jean-Pierre Raskin for RF-SOI, Lattice Semi and NXP for FD-SOI products, and Bich-Yen Nguyen for her work in SOI. The SOI Consortium extends hearty congratulations to all the winners and their teams. Professor Jean-Pierre Raskin was awarded by the prestigious Médaille Ampère 2019 for the originality of his scientific work in the field of RF-SOI technologies for wireless communication. The international award was delivered by Mr. François Gérin, president of the SEE - Société de l'électricité, de l'électronique et des technologies de l'information et de la communication, on December 3rd, 2019, in Paris, France. We’ve long covered the work of Professor Raskin and his UCLouvain team – which is largely responsible for why SOI is in every smartphone on the planet. It’s a great story (read it here) and it goes on! In his Ampère acceptance speech, Professor Raskin said, “...significant industrial research and development is being performed toward fully integrated SOI front-end-modules. Notably, the 45nm PD-SOI [RF-SOI] and 28nm and 22nm FD-SOI nodes are being extensively designed with to develop 5G mm-wave low-noise amplifiers (LNA), power amplifiers (PA) and switches, in particular at 28 GHz. […] Overall, SOI is expected to be a big contender as a technological platform to enable mass production of millimeter wave 5G and ultra-low power RF IoT devices and products in the near future.” [caption id="attachment_27119" align="alignleft" width="294"] Lattice CEO Jim Anderson (left) and Mark Lipacis (right), Managing Director of Jefferies (Courtesy: GSA Lattice Semi)[/caption] Lattice Semiconductor was the recipient of the Global Semiconductor Alliance’s (GSA) 2019 Analyst Favorite Semiconductor Company award based on technology and financial performance. The GSA awards recognize the achievements of top performing semiconductor companies and the 2019 winners were announced at the annual GSA Awards Ceremony held on December 5, 2019. In thanking his team, Lattice CEO Jim Anderson, added, "We are even more excited about the solid execution of our product roadmap, specifically, the accelerated product rollouts of both CrosslinkPlus and our next generation FPGA platform based on FDSOI technology, which will be key catalysts to our achieving sustained long-term revenue and profitability growth.” [caption id="attachment_27120" align="alignright" width="71"] (Courtesy: NXP)[/caption] NXP was a recipient of a Best-in-Show Award at the 2019 Arm TechCon this fall. As was noted by Brandon Lewis, Editor-in-Chief of Embedded Computing Design, “The i.MX RT1170 crossover MCU marks a technology breakthrough in MCUs, running up to 1GHz while maintaining low-power efficiency. It is architected to deliver a record-setting performance, with a 6468 CoreMark score and 2974 DMIPS while executing from on-chip memory. The solution uses advanced 28nm FD-SOI [note: fabbed by Samsung Foundry] technology, making NXP the first company to build MCUs in this advanced technology node. This new MCU family is redefining the "edge" and MCU landscape, bringing unprecedented performance and high levels of integration to propel industrial, IoT, and automotive applications.” And finally, Soitec Senior Fellow Bich-Yen Nguyen was elevated to the status of IEEE Fellow in the Class of 2020 “for contributions to silicon on insulator technology”. As previously noted in her IEEE bio, “Her honors and awards include the Dan Noble Fellow, the highest technical award at Motorola; the Master of Innovation Award; and the first national Women in Technology Lifetime Achievement Award. She holds over 200 worldwide patents and has authored more than 180 technical papers on integrated circuit technologies.”

The first day of the SOI Consortium’s recent China event – the 7th Shanghai FD-SOI Forum – was full to bursting in every way: the room, the networking, the level of expertise, the in-depth presentations and the overall energy. We covered the Samsung and GlobalFoundry keynotes in our previous post (if you missed it, read it here).This post will recap the rest of the presentations given during the day. (If your company or institution is a member of the SOI Consortium, you’ll be able to access the full presentations online.)International Business Strategies (IBS) – Impact of AI on Automotive and IoT, and Opportunities in China (Handel Jones, CEO) When it comes to deep insights on China + tech + analytics, and especially with a thorough understanding of FD-SOI markets, Handel Jones is arguably the world’s leading expert. Here are some of the observations he shared. Though the chip industry will see declines across the board in 2019 (he sees 13.5%), he sees a return to growth in 2020. By 2030, he sees it as a trillion dollar market, of which China will have half. AI is a key driver – and will become more prevalent at the edge. Major drivers will include preventative medicine, gaming, NB-IoT and 5G. At the chip level, FD-SOI has a lower cost/chip compared to bulk – you’ve got small chips and high yields. Sensors – especially image sensors – are a key area, and this is another place where FD-SOI is better than bulk. He sees chip shortages in the 2022-24 time frame (as opposed to the current oversupply), so now is the time that China should be establishing large FD-SOI capacity.NXP – Automotive, Industrial and IoT Solutions Leveraging FD-SOI (Ron Martino, VP GM) In terms of power consumption, computing is easy but data transmission is hard, Ron Martino reminded the audience at the onset. That’s why you need the edge. This is where FD-SOI comes in, and if you want to have leadership, you should be leveraging body biasing, he said. In terms of machine learning, a lot can happen at the edge on the smallest devices. NXP is now shipping a very wide range of products based on FD-SOI, including the i.Mx7 and 8 families and the new RT crossovers. The latest announcement is the i.Mx RT 1100 MCUs, a very low-cost processor solution for high volumes. The i.MX7 ULP is in mass production for wearables, with record low leakage and high performance. The i.Mx8 and 8x are going into a broad range of applications – from retail solutions for automated checkout to pasta makers, and automotive applications for full cockpits with vision detection, as well as things like parking, V2X and in-vehicle monitoring.Sony Semi – Low Power IoT Products with FD-SOI eMRAM Technology (Kenichi Nakano, GM) Chips built on FD-SOI with eMRAM are in production, said Kenichi Nakano. In GNSS/GPS, Sony is the #1 in lowest power consumption worldwide, thanks to FD-SOI, he continued. They’ve had 70 remarkable design wins, giving them over 50% market share in the sports and health watch markets, he said with a tip of the hat to the FD-SOI ecosystem and SOI Consortium. In GNSS, performance is very important – and now they can do it in water, which is huge. Development cycles are shorter than ever – for the latest chip it started in February 2018 and was in production by the spring of 2019, achieving decreases of 20% in power, 30% in area and 10% in cost. Integrating eMRAM was easy in terms of the design flow and manufacturing, with production yield of 97-100%. So with the GXD5605GF they’ve got the first GNSS chip with FD-SOI/eMRAM/RF in the world and it’s on 28FDS/eMRAM technology. It’s very reliable and very good, he concluded.Rockchip – Challenges of AIoT Chip (Feng Chen, SVP) At the beginning of this year Rockchip announced the launch of their RK1808, a low-power AIoT solution with built-in high performance (3TOPS) NPU fabbed in GlobalFoundries 22FDX, said Feng Chen. Their clients were very happy that Rockchip delivered the real power and performance numbers they’d promised. Because of the power/performance it delivers, FD-SOI (both 22 and 28nm) is very well suited for AIoT chips, he said. It’s very cost-effective in terms of NRE and die, and there’s room for further savings. While the ecosystem needs a unified push, FD-SOI is good for the market in China, and China has the volumes FD-SOI needs. Rockchip sees particular potential in retail and smartphones.Panel – Verticals Driving FD-SOI VeriSilicon CEO Wayne Dai moderated the first panel, asking first why China should adopt FD-SOI. Soitec CEO Paul Boudre said because it is a big, dynamic market (noting that Sony’s first FD-SOI GPS win was in China). Handel Jones said that at the wafer level, there was cost parity, but with FD-SOI chips are smaller and higher yield. The main reason it’s taken so long to get going was IP, but that’s changing now, he added. Dai’s next question was about the top application fields the panelists predicted for 2020. Sony’s Kenichi Nakano said wearables with connectivity, low power consumption, small size and high levels of integration; Rockchip’s Feng Chen agreed. NXP’s Ron Martino said FD-SOI for automotive, machine learning and edge computing was shipping now, with wearables ramping.VeriSilicon – Low Power IoT Connectivity IP Design Based on FD-SOI (Yi Zeng, Director, IoT Connectivity Platform) The “value” of IoT data is not yet being generated, noted Yi Zeng but AI can help here. The IoT industry needs innovation for both chips and networking. SiPaaS – which stands for Silicon Platform as a Service – as offered by VeriSilicon can help lower the barrier to entry. [In the SiPaaS model, VeriSilicon has its own IP-based core. Based on the company's advanced chip design capabilities and mass production service experience, it has created a variety of silicon-proven chip design platforms that can significantly reduce the customer's chip design cycle.] They have FD-SOI IP for NB-IoT, BLE, GNSS and sub-1 GHz. The BLE (Bluetooth) RF IP is a complete offering optimized for low power on GlobalFoundry’s 22FDX. The NB-IoT IP is also optimized on their 22FDX ZSPNano, an energy efficient general purpose MCU+DSP core on 22FDX. And they’ll have results of test chips for GNSS RF IP on 22FDX by the end of this year.Secure-IC – AIoT Embedded Security Using FD-SOI (Hassan Triqui, CEO) While AI enables products and services, it’s important to plan for security early in the design cycle, said Hassan Triqui. Software is not enough to protect edge-to-cloud. Secure-IC’s hardware security module, Securyzr, is an IP block that can be embedded into every device to answer security functionalities such as root-of-trust and key management. In sleep-mode/tunable cryptography, FD-SOI allows the creation of physically secure systems. (Note that designers are leveraging FD-SOI’s unique body biasing for ultra-low-power deep-sleep modes.) Because safety and privacy require a combined solution, Securyzer is particularly well-suited to IoT chips built on FD-SOI, he concluded, so that IoT adds value to AI, and not just the other way around.Soitec: FD-SOI – The 5th Gear for mm-Wave Radio (Michael Reiha, GM FD-SOI Business Unit) There are four key areas to 5G, explained Michael Reiha: coverage, number of antennas, frequency and traffic density. 5G mmW access architectures are currently inefficient in terms of power and performance, but FD-SOI is ready for 5G access as both an analog and hybrid beamformer. For MU-mMIMO (massive MIMO), the RF front-end modules (FEMs) and transceiver will fully exploit FD-SOI. Sensing, calibration and control enabling hybrid beamforming and multiple users is easy in FD-SOI. The adaptive body biasing on the horizon will reduce power of FEM mixed-signal circuitry, and be a disruptive technology.STMicroelectronics – Automotive MCUs in 28nm FD-SOI for ePCM NVM (Shan-Lin Liu, Automotive Marketing Manager) As a leader in the automotive market, ST has seen that increased data flows in automotive are driving demand for higher performance and bigger memory in automotive MCUs, said Shan-Lin Liu. ST has taken a unique approach to NVM with embedded PCM (phase change memory) on 28nm FD-SOI. This gives them energy-efficient, high-performance cores with larger NVM memories, and it’s already qualified up to auto grade-0. PCM (vs MRAM) is BEOL. It uses two cells, so it’s more reliable and is good at high temperatures, he said. With FD-SOI, they can go up to 165o, and it’s soldering compliant. The preliminary results of the first MCU chip are excellent. It’s now running in a car, replacing the previous generation 40nm eFlash product.Leti – Advanced FD-SOI for Edge AI (Emmanuel Sabonnadiere, CEO) To fully run artificial intelligence on the edge, research powerhouse Leti is working on an unsupervised learning neural network using advanced FD-SOI and a mix of other technologies. These include embedded non-volatile memory (NVM), 3D integration, and new design tools. Sabonnadière said this new approach is expected to exceed the performance levels of current digital deep learning with neural networks that are capable of handling time-domain signals, sound and speech—and may produce a first "killer app" for advanced SOI. AI will require compact and power-efficient circuits for the inference phase, when neural networks infer things based on new data they receive, close to the end user. The combination of FD-SOI, 3D integration, and NVM opens a path towards dedicated circuits with major performance improvement within the limited power budgets of distributed electronics. In Europe, he noted, privacy concerns are driving the move from the cloud to the edge. On the Leti roadmap, they’ve broken through the 10nm limit for FD-SOI, using strain and body biasing to compensate for transistor mismatch. Also of note: since 2016 Leti has had an ongoing collaboration with SITRI, the Shanghai Industrial μTechnology Research Institute, an international innovation center focused on globally accelerating the innovation and commercialization of More than Moore technologies to power IoT.GlobalFoundries – GF Fab 1 Dresden: Delivering Differentiation with FDX for the Future of Automotive (Thomas Morgenstern, SVP GM Fab 1) Dresden Fab 1, Thomas Morgenstern reminded the audience, is the biggest in Europe, where it is part of the Saxony ecosystem. GF is moving advanced mask-making to Dresden, which is the lead site and Center of Competence for FD-SOI. With the “pivot”, GF is providing platforms. Fab 1 is automotive certified for 22FDX (GF’s 22nm FD-SOI technology), with automotive tapeouts in 2019. “Automotive is a journey,” he said, of continuous improvement, and a mindset: it’s a zero defects culture. The ramp to volume production is well underway, with 26 tapeouts of 22FDX products this year – almost double that of last year. He showed high yield data of about a dozen products, adding that since the beginning of the year every tapeout was first-time right with decreased cycle time. The key specifications for 22FDX with eMRAM for Auto Grade-1 have all been demonstrated, and customer feedback has been excellent.Next: Shanghai International RF-SOI Workshop recap As you can see, it was a packed day for the FD-SOI part of the SOI Consortium’s Shanghai event. In fact the room was still packed at the very end of the day. Several hundred VIPs then headed out for the ever-popular and festive evening riverboat dinner cruise, where the non-stop networking continued.A big shout-out to our sponsors and supporters: VeriSilicon, Simgui, SIMIT, Soitec, Samsung, IBS Ion Implant, ShinEtsu, GlobalFoundries and NXP.The next day of the event was devoted to RF-SOI. That will be the subject of our next post.

GlobalFoundries Has Quietly Become A Player In Silicon Photonics Manufacturing - 31 March 2020 by Patrick Moorhead, Forbes. Blog: Body Bias Gets Its Own Book - 13 February 2020, Junko Yoshida, EETimes Asia. The authors of The Fourth Terminal: Benefits of Body Biasing Techniques for FD-SOI Circuits and Systems make the case for body biasing, describing it as “a new and efficient tuning knob.” Three design experts at STMicroelectronics, including Fellow Andreia Cathelin, have co-edited and written chapters for The Fourth Terminal. NXP's i.MX RT1170 Crossover MCUs (on Samsung's 28nm FD-SOI) - the industry's first GHz MCU - wins Best In Show Arm - TechCon2019 in the Microprocessors, Microcontrollers and IP category! (Embedded Computing Design, 9 Oct. '19)

The 45th (yes!) IEEE SOI Conference takes place 14-17 October 2019 in San Jose. Now called S3S –since it also covers 3D and subthreshold – it’s a networking event par excellence: a unique opportunity to meet firsthand the movers and shakers in the SOI ecosystem and the giants of R D. As always, it has a strong technical program you won’t want to miss. Plus this year there’s a full-day short course dedicated to FD-SOI design, and half-day tutorial on RF design. Get all the details and registration info at http://s3sconference.org/.The SOI Consortium’s own Executive Co-director Jon Cheek of NXP is one of the keynoters. In fact the consortium membership is extremely present at this event, with over half our member organizations having a hand in it. There’s a plenary talk by GF’s CTO/VP Subramani Kengeri, keynotes by ST Fellow Andreia Cathelin and NXP Fellow Rob Cosaro, and invited talks from Arm, Samsung and Dolphin Design, for example. And this year’s General Chair is Incize CEO Mostafa Emam. Focus Sessions #12 and 13 are all about FDSOI Platforms and Products, with invited speakers from Renesas, NXP, ST, ARM, GF, Huali and Dolphin Design, while focus Session #2 is all about RF-SOI. Here’s the agenda for the FD-SOI Design short course (which takes place on Thursday, 17 October):Short Course Opening and Welcome Philippe Flatresse, Business Development Marketing Director, Dolphin DesignGLOBALFOUNDRIES 22FDXTM Technology and Body Bias Compensation to Enable New Design Optimization Strategies Joerg Winkler, Fellow Design Engineer, GLOBALFOUNDRIESEmbedded Flash Memory Technologies and Applications in Advanced Nodes Memories Koji Nii, Vice President, Global Marketing Sales, Floadia CorporationEnabling the Adaptive Body Bias in Modern IoT Applications Vincent Huard, CTO, Dolphin DesignSoC Design Realization with Adaptive Body Bias Kripa Venkatachalam, IC Design Practice Director, Mentor Graphics Didier Roland, Application Engineers Manager, Mentor GraphicsAnalog Design Techniques for Microprocessors in FD-SOI: Power-Management, PVT Monitoring and Data Conversion Edevaldo Pereira Da Silva Junior, Senior Principal Engineer, NXP Semiconductors MPU/MCU R DLow Power Solutions for SoC Architectures Antonio Pullini, Senior Hardware Designer, GreenWaves TechnologiesSOI to RF Sidina Wane, CEO, eV-technologiesIf you know the way to San Jose, you'll want to be at S3S 2019, for sure!

The recent SOI Consortium’s FD-SOI and RF-SOI events (Shanghai, September 2019) were record-breakers, with attendance approaching 1000 over the two days. The event was extensively covered in the China tech press, which often cited the opportunities SOI-based technologies offer for technology leadership. Indeed, as SOI Consortium Executive Co-Director Carlos Mazure noted in a follow-up press conference, the SOI technology drivers dovetail perfectly with the semiconductor industry’s top growth drivers*: IoT, 5G/smartphones, AI/ML and automotive. Here are the takeaways he cited from the China events:SOI for AIoT, consumer and automotive: the FD-SOI ecosystem is in place (substrate supply, foundry offering, EDA and design IP). The 1st wave of adoption is ramping at NXP, STMicroelectronics, Sony, Rockchip, Synaptics, Renesas and more Fast followers are lining up, with the number of tape-outs increasing at Samsung and GlobalFoundries SOI for 5G: development is driven by the need for low cost, low latency and high data throughput the SOI ecosystem for 4G/5G technologies is in place with a strong market pull RF-SOI, the reference FEM 4G technology, will extend its benefits to sub-6Ghz: low power consumption, high linearity, low insertion loss, co-integration of RF components. 5G mmWave requirements are addressed by multiple SOI platforms (RF-SOI, PD-SOI and FD-SOI) enabling integrated analog mixed signal solutions at low power consumption. Two RF-SOI luminaries were honored at a post-event dinner sponsored by China wafer purveyor, Simgui. Jim Cable, Chairman and CTO of pSemi, a Murata Company, and Herb Huang, CEO and GM of Ninbo Semiconductor received awards for their contributions to the advancement of RF-SOI (more on this later). There’s an enormous amount to tell you about from the conferences, so this will be the first round-up post of several.Gitae Jeong, SVP, Samsung Electronics (Courtesy: VeriSilicon live.photoplus.cn) But briefly, in his talk entitled, "IoT Platform with FDSOI", the main points made by Gitae Jeong, SVP, Samsung Electronics were: 28FDS is fully mature. It has the same design rules as bulk, has an integrated security key, a wide range of packaging options for IoT, and a design guide that makes back biasing easier and simpler with complete IP solutions. 18FDS development is on track for this year, with 14nm BEOL and a 35% increase in performance, a 55% decrease in power (!) and a 35% decrease in area compared to 28nm. 1st products are now shipping with eMRAM on 28FDS with yields over 90%, operating temperatures have been extended to 125C for automotive, and a 1Gb version has been demo’d. 1st 5G products mmWave products on 28FDS are now available Americo Lemos, SVP, GlobalFoundries (Courtesy: VeriSilicon live.photoplus.cn)In his talk, "Leading Industry Innovation by Differentiated SOI-based Solutions", key takeaways made by Americo Lemos, SVP, GlobalFoundries included:They have leadership in RF-SOI, with over 50 billion chips shipped 22FDX (FD-SOI) is in production. Last year they had 14 tape-outs, this year they had 26 – half of which are for companies in China. By the end of this year they’ll have shipped 100 million good dies to customers, marking the full transition from ramp to volume. In the ecosystem, they’ve got 285 IP titles from providers worldwide, with more announcements coming soon. Work continues on 12FDX – more to come on this. Edge AI is the next growth engine for IoT, combining vision + voice + audio, with China coming in strongly with ultra-low-power design for home connectivity, industrial, personal and medical applications. The RF-SOI day was lead off by the reading a letter from Dr. Xi Wang. The leading proponent of SOI in China for over a decade as head of the Shanghai Academy of Sciences, he’s now the country’s Vice-Minister of Science Technology. Until this year, he’s always had the first keynote at the SOI Consortium events in China, but this time he was in a meeting with the VP of Russia. However, his warm letter confirmed his support for the SOI ecosystem, especially the role of SOI-based technologies for China in the 5G era. Danni Song, China Mobile Project Leader. (Courtesy: Simgui live.photoplus.cn) This was followed by a talk by the ever popular and insightful Project Leader Danni Song of China Mobile, the largest of the operators there. China issued 5G licenses in May 2019 as the country gears up for 5G commerce. By next year, 5G will be deployed in all cities above the prefecture level. For now, it’s all about sub-6GHz. The challenge, she noted, is in power consumption, which is 2-3x that of 4G in base stations and devices. They see two development spaces: one for consumer and one for verticals, and have teamed up with Sprint on a 5GS (S being for Superior) module. They released a basic modem chip and dongle in June, and a smart chip is coming. She suggests people consult the China Mobile white paper on 5GS for more info. We’ll cover the many other presentations over the next few weeks – so stay tuned! --------*as cited in a 2019 CEO survey by KPMG/GSA.

Since the beginning of the year, there’s been a steady stream of excellent news around Samsung Foundry’s 28FDS, their highly successful 28nm FD-SOI offering. Let’s take a look at what’s been happening, as things do seem to be accelerating. By way of reminder, they announced the industry’s first eMRAM (embedded MagnetoResistive RAM) testchip tape-out milestone on 28FDS in September 2017 (you can read the press release here) - which was just a year after they had announced mass production of 28FDS process technology.At the end of 2018, Arm announced the industry’s first Embedded MRAM (eMRAM) compiler IP built on Samsung Foundry’s 28FDS process technology. Follow that with this announcement at the beginning of 2019: Soitec Expands Collaboration with Samsung Foundry on FD-SOI Wafer Supply. The two companies announced that Samsung had secured a high-volume supply of FD-SOI technology to meet industry's current and future demands especially in consumer, IoT and automotive applications. In March came two more big announcements. First: Samsung Electronics Starts Commercial Shipment of eMRAM Product Based on 28nm FD-SOI Process. As they noted in the PR, “Samsung’s 28FDS-based eMRAM solution offers unprecedented power and speed advantages with lower cost. Since eMRAM does not require an erase cycle before writing data, its writing speed is approximately a thousand times faster than eFlash. Also, eMRAM uses lower voltages than eFlash, and does not consume electric power when in power-off mode, resulting in great power efficiency.”Hard on the heals of that came the news that Arm and Samsung Announce IP Platform including eMRAM for 18nm FD-SOI. At the SOI Consortium’s Silicon Valley Symposium in April, Tim Dry (he’s Samsung’s Director of Foundry Marketing for Edge and End Point), gave a terrific presentation. Entitled Samsung’s FDS with MRAM: Enabling Today’s Innovative Low Power Endpoint Products, it details the company’s FDSOI roadmap for the IoT Endpoint Platform (and yes, you can download in its entirety). Then in May at the big Samsung Foundry Forum in Silicon Valley, Arm, in collaboration with Samsung Foundry, Cadence, and Sondrel, demonstrated the first 28nm FD-SOI eMRAM IoT test chip and development board. The Musca-S1 test chip demonstrates a new choice in SoC design for IoT solutions, said Arm. (Sondrel, btw, is Europe's largest independent IC design consultancy.)In parallel, Cadence announced: Cadence Custom/AMS Flow Certified for Samsung 28nm FD-SOI Process Technology. Especially aimed at digitally-assisted analog designs, what’s new here is that the Cadence custom and analog/mixed-signal IC design flow is now Samsung Foundry certified for 28FDS. Samsung’s 28FDS PDK techfile is Mixed-Signal OpenAccess ready, enabling customers to deploy OpenAccess-integrated, fully interoperable Virtuoso-Innovus implementation flows. For its part, at its Foundry Forum, Samsung unveiled extensions of the company’s FD-SOI (FDS) process and eMRAM together with an expanded set of state-of-the-art package solutions. They indicated that the development of the successor to the 28FDS process, 18FDS, and eMRAM with 1Gb capacity will be finished this year.And finally, companies like NXP are shipping exciting new products fabbed on Samsung’s 28FDS. Ron Martino, VP GM of NXP’s i.MX Application Processor Product Line covered key products in his presentation at the SOI Consortium’s Silicon Valley Symposium (see our coverage here). Among them: the i.MX7ULP for long battery life with 2D 3D graphics for wearables and portables in consumer and industrial applications; the i.MX 8 and 8X subsystems for automotive and industrial applications; and the i.MX RT series of “cross-over” processors. The i.MX RT ULP (real-time, ultra-low-power) series, which Martino says is the “new normal”, deals with a high number of sensor inputs. The i.MX RT 1100 MCUs, which have been qualified for automotive and industrial applications, are breaking the gigahertz performance barrier.In July, linuxgizmos.com reported that, “In June, NXP began volume shipments of its super power-efficient i.MX7 ULP, which it announced in 2017. The SoC is billed as the most power-efficient processor on the market that also includes a 3D GPU. […] the ULP version includes a 3D graphics capable Vivante GC7000.” (Vivante, btw, is a VeriSilicon company, which is an SOI Consortium member and a leading proponent of FD-SOI design and IP in China and worldwide.) This is leading to some really nice wins for NXP. For example, they’ve got Amazon's Alexa Voice Service (AVS) leveraging the i.MX RT crossover processor, enabling developers to quickly and easily add Alexa voice assistant capabilities to their products. The RT series has rapidly been expanded, with versions for voice-controlled devices and offline face and expression recognition capabilities for smart home, commercial and industrial devices.Also announced this summer: NXP and Microsoft Bring Microsoft Azure Sphere Security to the Intelligent Edge with a New Energy-Efficient Processor. That collaboration includes development of a new crossover applications processor in NXP’s i.MX 8 series integrating Microsoft’s Azure Sphere security architecture and Pluton Security Subsystem. Their customers “will be able to harness the high-performance and energy efficiency of NXP’s i.MX 8 applications processors combined with Microsoft’s unequaled security and assurance provided by Azure Sphere certified chips”. As Martino concluded in his presentation, “The future of embedded processing [is] enabled by FD-SOI.” And Samsung Foundry’s FD-SOI offerings are clearly a massive enabler of that future.