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The chip design ecosystem finally has the book it’s been clamoring for: The Fourth Terminal - Benefits of Body-Biasing Techniques for FDSOI Circuits and Systems. [bctt tweet="The FD-SOI Chip Design Book: Yes, It’s Finally Here!" username="@soiconsortium"] The editors (who have also contributed chapters) are Andreia Cathelin, Sylvain Clerc and Thierry DiGilio, all world experts from STMicroelectronics. As Cathelin and Clerc note in the introduction: “The aim of this book is to introduce to the design community the straightforward design solutions in any modern FD-SOI planar CMOS technologies, by taking full advantage of body biasing techniques to efficiently modulate on the fly SoC solutions from high performance operation to energy efficiency mode. All design techniques are based on the classical pillar of regular planar CMOS devices. As the first fully industrial solution has been the 28nm FD-SOI CMOS technology from STMicroelectronics, all the design examples in this book have been demonstrated within this process integration frame.” [bctt tweet="The Fourth Terminal...taking full advantage of (FDSOI) body biasing techniques to efficiently modulate on the fly SoC solutions from high performance operation to energy efficiency mode" username="@soiconsortium"] The folks at ST were really the first to get into FD-SOI in a big way – in fact they’ve been at it for over two decades (!) so you’d be hard pressed to find experts at a company with deeper expertise. [caption id="attachment_29610" align="alignnone" width="535"] The Fourth Terminal team friends sporting Tour de Fourth Terminal t-shirts at ISSCC 2020. From left to right: MIT Prof. (and Series Editor for Springer's Integrated Circuits and Systems) Anantha Chandrakasan; Charles Glaser, Springer Editorial Director; Laurent Le Pailleur, ST; Andreia Cathelin, ST Fellow; Sylvain Clerc, ST; Stanford Prof. Boris Murmann (Photo courtesy Springer STMicroelectronics)[/caption] The Fourth Terminal is structured to cover three major areas: a technology overview (including body biasing for digital, analog and SRAM); a selection of circuits that illustrate body biasing in various fields; body bias deployment in mixed-signal and digital SoCs. The initial response has been tremendous. Editor Andreia Cathelin reports that posts she's made about it on LinkedIn were quickly viewed 10k times and more. Then came the book review by the eminent Stanford Professor Boris Murmann, who heralded its tour de force status in a clever turn of phrase: “With the help of a renowned international team of experts from industry and academia, the editors have distilled everything you need to know about FD-SOI circuit design into a 16-chapter "tour de fourth terminal". (Read his complete review here).[bctt tweet="Stanford Professor Boris Murmann calls this book a #Tour_de_Fourth_Terminal. #FDSOI #lowpower #chipdesign" username="@soiconsortium"] EETimes journalist Junko Yoshida blogged about it as Body Bias Gets Its Own Book (read that here), which generated lively discussions on LinkedIn (and underscored just how necessary this book is!). The Fourth Terminal - Benefits of Body-Biasing Techniques for FDSOI Circuits and Systems is part of the Springer Integrated Circuits Systems Series -- considered by many to be the most prestigious in the industry. Weighing in at 431 pages, The Fourth Terminal is available in both e-book and hardcover versions. See the Springer website to order this must-have addition to your library.
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The SOI Consortium’s China 2019 event ran for two days, and it’s taken four (!) posts to cover all the presentations. In this final post we cover the afternoon RF-SOI sessions, which were dedicated to the China RF-SOI ecosystem and the RF value chain. In case you missed them, our previous posts recapped: 1. major keynotes from both the FD-SOI and RF-SOI days; 2. the FD-SOI presentations; 3. the morning sessions of the RF-SOI day; and 4. (this post) the RF-SOI day afternoon sessions. As we noted in Part 1 of our RF-SOI coverage, there were over 500 attendees for the RF-SOI day. And impressively, the room was still packed right through to the very end of the afternoon. Read on! SESSION 2: CHINA RF-SOI ECOSYSTEMSuzhou HunterSun Electronics: Super Opportunity for Integrated RFFE (“Jacky” Yujun Ding, COO)This talk had two parts. First, how is 5G changing the world, and second, what are the RFFE opportunities? He cited IHS data indicating that 5G will create tens of millions of jobs. New products include NB IoT, cellular V2X, as well as traditional PC/tablets and smart phones. But you still need to cover 2/3/4G with 5G. Major growth will happen in 2025-27. In terms of opportunities for RFFE, you've currently got 550mm2 going for $8; in 5G, you'll need 600mm2, but it will cost $16. You need RFSOI for filters and antenna switches, which are in high demand. Parts of the supply chain have no China players. Revenue for BAW is higher than SAW, but there's more SAW. He sees the industry moving heavily into integrated FEM (versus chip-on-board). He finished by itemizing different parts of the RFFE, indicating where the opportunities are (citing some data from Yole), with a special emphasis on integrated products for Chinese companies, with continued investor confidence. SmarterMicro: RF-SOI: Key Technology of Smart Connection (Yangyang Pen, Director) RF-SOI is an enabler of smart connections. However he sees GaAs as better for power, so SmarterMicro has a solution combining RF-SOI and GaAs. They've developed the world's first mMTC RFFE for high-performance upgrades on a single die and software reconfigurable. He notes that for IoT, lifetimes will be longer than 10 years, and that terminals are becoming more powerful. CanaanTek: Critical SOI CMOS Blocks in the 5G NR Sub-6GHz RF Front-End Architectures (Wayne Ni, CTO Board Chairman) CanaanTek is a fabless company working in consumer markets, with switches, tuners and LNAs in SOI-CMOS. He wants to capture 10% of the market with a focus on sub-6. The antenna/tuner is a must, and they've developed solutions for switches here. The figure of merit is RonCoff. He showed a product roadmap on SOI-CMOS. Xpeedic: Innovative EDA Solutions to Enable Differentiated RF-SOI Designs (Feng Ling, CEO)RF-SOI is growing, but there are still design challenges in process, models, filters and packaging. To design a good front end, you need better models and filters. People think passives are easy, but you need accurate models here. Xpeedic has developed design flows that include the effects of packaging early in design. Their products include IRIS, iModeler and Metis (for packaging). They've also introduced substrate modeling in partnership with CWS in France. The product is called SiPEX: it can address linearity in switch or PA designs. You need accurate substrate models to do this. Customers indicate they're seeing big improvements as well as reductions of 25% in chip area. IDP filters is another place they're working, to provide RF filters to fabless IC or module companies. No single filter technology can fit all the needs – IDP is one of them, so they have a broad portfolio of IDP filter technologies. He closed by saying that especially in China, the SOI ecosystem is really growing. SESSION 3: RF VALUE CHAINTowerJazz: Specialized RFSOI Foundry Technology to Support Rapid New Product Development (Paul Hurwitz, Director of RF Technology Development)This presentation gave a full overview of what TowerJazz offers in terms of RF-SOI foundry services with its fabs in Isreal, the US and Japan. What's new in 2019 is a diversifying of 200mm and 300mm. 200mm is best for power handling (for infrastructure/basestation antenna tuners and switch power handling, for example). 300mm is best for SW and LNA integration and higher digital densities. They've got new SOI models for the latest technology generations, and physics-based modeling of RF breakdown for accuracy. With more die being flipped, they needed new substrate modeling. For LNA and switch integration in 300mm, they invested in RF modeling. They also have an in-house MPW (multi-project wafer) program. He noted that customers in China are moving quickly in response to their customer requirements. Okmetic: Tailored Silicon Substrates for RF Applications (Atte Haapalinna, CTO)Okmetic Oy is a niche player in the substrate materials market, with specialties in sensors and MEMS, where they are the market leader. Now part of China’s NSIG group, they are expanding their manufacturing facility in Finland. In this presentation, their CTO talked about their current offerings as well as what they have under development. They do 150-200mm wafers, with a special emphasis on thick SOI. In terms of silicon substrates for RF, ultra-high resistivity is key. Their wafers are also used in IDP – integrated passive devices – for RF and acoustic filters. They are continually improving their high resistivity Magnetic Czochralski (MCz) silicon wafers, and are developing substrates for RF passives for automotive V2X. For RF beyond 6 GHz, they are looking at customized high resistivity silicon wafers for mmWave with researchers and customers. For sensors, they do SOI wafers with built-in cavities. Incize: RF SOI Ecosystem – History Challenges (Mostafa Emam, CEO)The world is exceeding expectations in terms of data usage. While the CAGR for devices is 27%, for data it’s 46%. Therefore each device needs to be faster and more power efficient. Incize recognizes RF as an art, with each piece hand crafted. But artists need to see the whole picture: at Incize, they help 17 companies – including wafer suppliers, foundries and fabless – see that big picture, especially in measurement, characterization and modeling for RF. For wafer suppliers, they do very high-power and very precise on-wafer testing to determine things like intermodulation distortion and substrate interference. For foundries, their specialty is in RF switches, for whom they do harmonics testing and thermal noise management. With those insights, Incize foundry customers have drastically increased the performance of the RF chips they’re manufacturing on trap-rich, high-resistivity SOI wafers. Meanwhile, Incize is also preparing PDKs for future potential substrate generations including GaN-on-Silicon, silicon-on-porous, and new contactless testing techniques for piezoelectric-on-insulator (POI – used in filters in 4/5G). “There’s a really big business opportunity for RF-SOI,” concluded Emam, “and room for everyone.” Cadence: SOI Technology in Intelligent and IoT/Vision/AI Systems (Jonathan Smith, Senior Director)Cadence does SOI enablement at advanced nodes. Smith shared three recent success stories. First, there’s the Musca-S1 test chip they did with Arm, Samsung and Sondrel this past spring. Second, there’s the Tensilica DSP for automotive vision on GlobalFoundries’ 22FDX, which uses 1/10th of the power of existing solutions and was demonstrated at CES. And finally there’s the i.MX line from NXP. In recent news, there’s a new version (18.1) of Virtuoso RF. Though it’s been on the market for 30 years, they’ve added advanced methodologies so that system design and analysis are on the same platform. They’ve also announced National Instruments’ analysis solver, the Clarity 3D solver for next-gen 3D solutions, the integration of multiple electromagnetic (EM) solvers, and advance SiP options. Silvaco: Xena-IP Management Infrastructure for the SOI Ecosystem (Babak Taheri, CEO)Every multi-core SoC today has as many as 200 IPs, if not more. How do you manage that? Tracking and traceability of IP is complicated but important. For IP providers, how do they track where its being used? And for IP consumers, they need to know what they’ve used and where. What’s required is an IP management system to keep track of the different functions and different concerns. Today’s tracking systems don’t talk to each other. Silvaco’s Xena IP management solution organizes all IP data, accounts, products, contracts, devices, support, compliance and reporting. For compliance in particular, they do IP “fingerprinting” and “DNA analysis”, which they’ve patented. The fingerprint is a digital representation of the IP: it’s not just software. It is secure, and can’t be reverse engineered. It’s not a tag: a tag is inserted into the IP, whereas fingerprints are extracted. DNA analysis flags discrepancies and quickly identifies where they are and which files to look in. Xena works in the cloud, enterprise systems or hybrids. The SOI ecosystem will be hearing a lot more about this. ~~ Please note that the China event presentations are all available on our website to anyone whose company or organization is a member of the SOI Consortium.
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The SOI Industry Consortium awarded two luminaries of the semiconductor industry for pioneering advances in RF-SOI, a technology now found in all cellphones. Jim Cable (shown on the left in the photo above), Chairman and CTO of pSemi, a Murata Company, and Herb Huang, CEO and GM of Ninbo Semiconductor received the awards during a gala following the SOI Consortium's 2019 RF-SOI Workshop in Shanghai. "Thanks in large part to the innovation, dedication and perseverance of men like Jim Cable and Herb Huang, RF technology based on SOI is now ubiquitous," said Carlos Mazure (on the right in the photo), Chairman and Executive Director of the SOI Consortium. "Jim Cable drove the development of SOI and RF switches that are now in every cellphone, and Herb Huang has been a key contributor to SOI technology and a champion of the SOI foundry ecosystem in China. We are happy and honored to recognize the contributions they have made to advancing RF-SOI globally." Jim Cable joined pSemi (formerly Peregrine Semiconductor) in 1996 and held technical leadership roles before serving as CEO from 2002 to 2017. An early pioneer of SOI technology, Cable believed SOI would ultimately replace other technologies in the RF front end, and he pushed his team to innovate. Cable is a co-inventor on more than 70 semiconductor and technology patents, including breakthroughs in SOI-based processes for CMOS RF switch linearity and integration that are used by all smartphones today, and will become even more mission-critical in 5G and millimeter-wave markets. He received his B.S. in physics from UC Riverside and his master's degree and Ph.D. in electrical engineering from UCLA. Herb Huang is CEO of Ningbo Semiconductor International Corporation (NSI), which is based in Ningbo, China. A driver of the RF-SOI ecosystem in China, he spent much of his career at SMIC, the largest semiconductor foundry company in mainland China. In 2016, SMIC created NSI as a joint venture subsidiary with China IC Investment Fund, Ningbo Economic Development Zone Industrial Investment Company, Ltd. and other IC investment funds. Under Huang's leadership, NSI optimized the process and model of a 0.13um RF-SOI technology platform transferred from SMIC. Now in mass production, the RF-SOI technology platform supports customers in IC design and product development for new generations of radio communications. Huang holds both a Ph.D in Materials Science and Engineering and an MBA from the University of Minnesota.
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FD-SOI for RF and mmWave communications is a hot topic. In high-data rate communications like RF and millimeter-wave devices in particular, FD-SOI delivers high-performance with numerous unique advantages, making it most likely the fastest RF-CMOS technology on the market. If you’d like to take a deep dive and learn more about it, Soitec and Incize are sponsoring a free, full-day workshop in Grenoble on April 4th, 2019. Click here for registration information. The workshop follows the day after the IEEE/EDS EuroSOI-ULIS conference there (you can read about the full conference in a previous ASN post). This technical workshop will cover the FD-SOI technology platform with a focus on its compatibility with RF mmWave communications. Attendees will hear from notable FD-SOI leaders and experts from leading industry and research institutions presenting updates on key developments and building blocks across the semiconductor value chain. Topics will include circuit design, device fundamentals, simulation and characterization of RF devices, test, CMOS technology and substrate technologies enabling FD-SOI. In addition, the workshop will include an overview about how FD-SOI technology is benefiting current and future end user applications. Here’s the agenda: [caption id="attachment_15990" align="alignleft" width="945"] FD-SOI technology platform: new standards for emerging consumer electronics [Click to enlarge.][/caption]
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There were over 220 participants at the recent SOI Academy FD-SOI Training event organized in Shanghai. The event extended over two days, with the first day covering a basic introduction to the technology as well as the ecosystem worldwide and in China. The second day was hands-on professional training. Attendees got a comprehensive understanding of how to leverage the benefits and flexibility of FD-SOI design techniques for low-power chips including logic, mixed-signal/RF and analog blocks. They had a great line-up of experts from whom to learn – check out the agenda here. There was also a follow-up press release (in Chinese) from SITRI here. There will be more of these SOI Academy events in cities across China in the year to come – we'll keep you posted (and of course, keep checking back for news on the Consortium's Events page). [caption id="attachment_12981" align="aligncenter" width="1000"] SOI Academy '18 keynotes by: Dr. Mark Ding, CEO, SITRI; Dr. Carlos Mazure, EVP Soitec and Chairman/Executive Director SOI Consortium. Dr. Julien Arcamone, EVP Leti. (Images courtesy: SITRI). Lower right: the hands-on FD-SOI training.[/caption] The two-day seminar and hands-on FD-SOI design training was (superbly!) co-organized by SITRI and Leti, with the support of the SOI Industry Consortium at the Jiading SIMIT campus outside of Shanghai. Just to put this in perspective, SIMIT and SITRI are absolutely key players in China's chip ecosystem. SIMIT is the Shanghai Institute of Microsystem and Information Technology, one of the most venerable institutes in the Chinese Academy of Science (CAS) and one of the world's earliest pioneers in SOI. SITRI is the Shanghai Industrial μTechnology Research Institute, an international innovation center focused on globally accelerating innovation and commercialization of More-than-Moore for IoT. Both institutions are under the aegis of Dr. Xi Wang, Chairman of SITRI, Director General of SIMIT, Academician of CAS, and champion of all things SOI in China. At this Shanghai event, the participants came from industry (including big companies, SMEs and startups) and technical institutions. In fact as well as attendees from Shanghai people voyaged from other cities such as Shenzhen and Chengdu. The designers participating to the FD-SOI training day were all experienced in design and highly motivated in learning FD-SOI design, notes Carlos Mazure, Chairman Executive Director of the SOI Industry Consortium, and Executive VP of Soitec. “This made it possible to dive into the specificities of FD-SOI,” he said, adding that, “The focus on RF was very timely.” Day 1: Intro to FD-SOI The first afternoon opening keynotes were made by SITRI CEO Dr. Mark Ding and Leti EVP Dr. Julien Arcamone. These were followed by overview talks by execs from Soitec, Verisilicon and GlobalFoundries. After a lively networking break, three talks delved into FD-SOI technology. The first was by Professor Sorin Cristoloveanu, Laureate of the IEEE Andrew Grove Award and Director at the CNRS (the French National Center for Scientific Research – the largest governmental research organization in France and the largest fundamental science agency in Europe). He covered device physics and characterization techniques. This was followed by talks on the technology by Soitec Fellow Bich-Yen Nguygen, and by Dr. Christophe Tretz, IBM Sr. Engineer on product design methodology. The day ended with a dinner, where Professor Cristoloveanu says enthusiastic technical discussions continued unabated (and continued even further in follow-up emails), lots of business cards were exchanged, and opportunities for further education were explored. Day 2: Hands-on Training The second day, designers got hands-on training from Leti experts using FD-SOI PDKs, first in the morning on digital, then in the afternoon on RF. Everyone loved the lively discussion and in-depth exchanges between the experts and the designers. They agreed that FD-SOI has important applications and differentiated competitive advantages for IoT, 5G, automotive, AI and other fields. At the end of the training, Leti and SITRI jointly issued SOI Academy certificates of completion to the designers. Feedback from participants was very good. Some asked for further education and for hands-on testimonials from companies that are already designing and manufacturing products on FD-SOI. “The participants were focused, motivated, involved, with good knowledge, which helped make the three hours of Digital training effective,” said Dr. Alexandre Valentian, Leti Sr. Expert, Digital Design. “The IT team was very helpful in setting up the training, the students accounts and the hardware infrastructure.” “The training on Basics of FD-SOI RF circuit was a great success thanks to the efficiency of our Chinese partners and also thanks to the enthusiasm and the good level of our trainees. As senior Expert of CEA Leti I was really impressed by the professionalism of the organization team. For all these reasons, I’m very glad to have had the opportunity to contribute to the 2018 SOI Academy,” said Dr. Baudouin Martineau, Leti Sr. Expert, RFIC Design Technologies. “The professionalism, efficiency and enthusiasm of our Chinese partners and the level and technical relevance of all trainees made the training on Basics of FD-SOI RF circuit a great success and fruitful experience,” added Frédéric Hameau, Sr. RF Research Engineer, Leti Project Leader, Architecture, IC Design Embedded Software Division, RF Architectures and ICs Laboratory. “It was a pleasure to get the opportunity to be part of this first edition of SOI academy 2018.” The organizers would like to thank the sponsors, including: the SOI Consortium and its members Soitec, VeriSilicon, GlobalFoundries, Simgui and Cadence, as well as Mentor, ProPlus and other companies and institutions in China and worldwide. Dr. Mazure notes that special recognition must go to Dr. Julien Arcamone, EVP, Leti-CEA and to Qing Wang-Bousquet, SITRI representative, for the perfect and smooth organization, and to the Leti instructors, who are international experts and highly committed. “As one of the main initiators and organizers of the 2018 SOI Academy, I wanted to personally thank all of you for your respective contribution to this first edition of the SOI Academy,” concludes Dr. Arcamone. “Undoubtedly, it was a great success, very well organized and fluid and we can be proud of that.”
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Since about a third of all IoT devices are expected to be connected by Bluetooth, chip designers need IP solutions that will help reduce system cost and greatly improve battery life. And that's just what VeriSilicon has announced for GlobalFoundries' 22FDX® (FD-SOI) process. “By taking advantage of integrated RF capabilities of FD-SOI, in particular GF’s 22FDX, our BLE 5.0 RF IP will significantly reduce the system cost and greatly boost the growth momentum of wearable products such as wireless earplugs,” said Dr. Wayne Dai, Founder, Chairman, President and CEO of VeriSilicon. 22FDX enables efficient single-chip integration of RF, transceiver, baseband, processor, and power management components. GF and VeriSilicon are working on an SoC using VeriSilicon's BLE 5.0 RF IP in GF’s 22FDX process. The latest iteration of Bluetooth is 5, which (like its predecessor 4) has a Low Energy (LE) RF option – but with big improvements. According to the Bluetooth website, “With 4x range, 2x speed and 8x broadcasting message capacity, the enhancements of Bluetooth 5 focus on increasing the functionality of Bluetooth for the IoT.” BLE 5.0 was designed for very low power operation and is optimized for the sorts of short burst data transmissions you'll get with IoT. On the strength of VeriSilicon’s innovative RF architecture and by leveraging GF’s 22FDX technology, VeriSilicon says the new IP product achieves significant improvements in power, area, and cost compared to current offerings, so it will better serve the emerging and increasing wearable devices and IoT applications space. "VeriSilicon's BLE IP complements GF's 22FDX FD-SOI capabilities and is well positioned to support the explosive growth of low-power IoT and connected devices," said Mark Ireland, vice president of ecosystem partnerships at GF. "Together, we broaden our IP and services to further enable our mutual clients to provide power and cost efficient solutions." VeriSilicon BLE 5.0 RF IP includes a transceiver that is compliant with the BLE 5.0 specification and supports GFSK modulation and demodulation. The silicon measurement shows that the sensitivity can be tested up to -98dBm with less than 7mW power dissipation in typical conditions. It largely improves battery life for low power IoT applications. In addition, the RF transceiver saves 40% area compared to a similar implementation on 55nm bulk CMOS. Besides the RF transceiver, this IP integrates on-chip balun, TX/RX switch and 32K RC OSC driver to save the BOM. Moreover, high efficiency DC/DC and LDOs are also available for power management. You can read the full press release in Chinese here and in English here.
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Specialty foundry TowerJazz is ramping a 65nm version of its RF-SOI process on 300mm wafers at Fab 7 in Uozu, Japan. To support the ramp, the company has signed a contract with long-term partner, Soitec, guaranteeing a supply of tens of thousands of 300mm SOI silicon wafers, securing wafer prices for the next years and ensuring supply to its customers, despite a tight SOI wafer market. [caption id="attachment_12108" align="alignright" width="300"] The 300mm 65nm RF-SOI process will be offered at the Uozu, Japan fab, which is operated by the TowerJazz Panasonic Semiconductor Company (TPSCo). (Photo courtesy: TowerJazz)[/caption] Five of TJ's seven fabs do RF-SOI. LNA (low-noise amplifers) are a big market driver, and with RF-SOI they can integrate the LNA with the switch, CEO Russell Ellwanter said in his lead keynote at the SOI Consortium’s 5th International RF-SOI Workshop in Shanghai (spring, 2018). BTW, that was in fact a very inspirational talk about Value Creation, and the importance of treating your suppliers with respect. He credited his company’s close relationship with RF-SOI wafer-supplier Soitec for TJ’s claim to the world’s best linearity. “We are delighted to see the strong adoption of 300mm RF SOI through this large capacity and supply agreement with TowerJazz to augment our already significant 200mm RF-SOI partnership,” said Soitec CEO Paul Boudre. “TowerJazz was the first foundry to ramp our RFeSI products to high volume production in 200mm and continues as one of the industry leaders in innovation in this exciting RF market with advanced and differentiated offerings.” According to the TJ press release (you can read it here), with its best in class metrics the TowerJazz 65nm RF-SOI process enables the combination of low insertion loss and high power handling RF switches with options for high-performance low-noise amplifiers as well as digital integration. The process can reduce losses in an RF switch improving battery life and boosting data rates in handsets and IoT terminals. It's a high-growth market, to be sure. Market researchers Mobile Experts predict that the mobile RF front-end market will reach $22 billion in 2022 from an estimated $16 billion in 2018. TowerJazz says its breakthrough RF SOI technology continues to support this high-growth market and is well-poised to take advantage of next-generation 5G standards, which will boost data rates and provide further content growth opportunities in the coming years. Customers are already getting into position. For example, Maxscend (WuXi, China), a provider of RF components and IoT integrated circuits, is ramping in this new technology. “We chose TowerJazz for its advanced technology capabilities and its ability to deliver in high volume while continuously innovating with a strong roadmap. We specifically selected its 300mm 65nm RF SOI platform for our next-generation product line due to its superior performance, enabling low insertion loss and high power handling,” said Maxscend CEO Zhihan Xu. As longtime ASN readers will know, we've been covering the evolutions of TJ's RF-SOI platforms since the beginning of the decade. It's worth noting, too, that beyond RF, TowerJazz also offers foundry customers other SOI-based processes, such as the new 0.18μm BCD SOI, a 200V SOI technology platform (announced in 2017, press release here) for motor drivers, industrial tools, electric vehicles and more. The previous generation 0.18μm SOI for automotive power management also offers exceptional area savings and is well-suited for high temperature operation. Back in 2014, here at ASN we did a great interview with TJ SVP Dr. Marco Racanelli about when and why they use SOI – and while processes have advanced, the basic drivers are still there, so it's a still a good read. And finally, designers will want to know that the TJ Multi-Project Wafer (MPW) Shuttle Program offers the 65nm RF-SOI process, as well as other SOI-based processes. See the website for scheduling and details.
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