KLA-Tencor

U.S.-China Trade War Heats UpThe U.S. Trade Representative (USTR) yesterday released a 25 percent tariff on $16 billion in imports from China, including 29 tariff lines that represent the heart of the semiconductor industry. These tariff lines include semiconductor products such as machines and spare parts used to make, wafers, flat panel displays, masks and chips, and will cost SEMI’s 400 U.S. members an estimated more than $500 million annually in additional duties.SEMI, along with hundreds of companies, including Lam Research and KLA-Tencor, submitted written comments, requesting the removal of tariff lines from the proposed list. SEMI also testified on behalf of the semiconductor industry, joining more than 80 other companies, including Applied Materials, in opposing the duties before an U.S. government interagency panel in late July.This trade action is on top of the already imposed $34 billion U.S. tariff list, which will cost SEMI’s U.S. members tens of millions of dollars annually. In the coming days, USTR will publish details on how U.S. companies can request the exclusion of products from the $16 billion tariff list, much as it did for the first round of $34 billion.In a swift retaliation, China announced a 25 percent tariff on $16 billion in U.S. exports, including products vital to semiconductor manufacturing such as chemicals, test equipment and other parts. Both U.S. and China tariffs will take effect on August 23.The new tariffs come as China considers tariffs on $60 billion of U.S. imports, and the U.S. weighs additional duties on $200 billion of Chinese imports – a wave that would inflict even deeper damage on the U.S. semiconductor industry. This latest round of U.S. tariffs would cover goods used in microelectronics manufacturing, including chemicals, glass products and spare parts. SEMI will testify against the $200 billion tariff list later this month. If your company expects to be impacted by the proposed tariffs on $200 billion worth of goods, please contact SEMI staff.SEMI stands firm in its belief that none of the tariffs address U.S. concerns over China’s trade practices. Instead, they harm companies in the semiconductor supply chain by increasing business costs, introducing uncertainty and stifling innovation. SEMI will continue to engage with policymakers as both the U.S. and China $16 billion tariff lists are implemented. We will also be evaluating the products covered by the $200 billion U.S. list and the $60 billion Chinese list as both are further considered. We encourage members to review these lists to determine impact on their companies. For more information, please contact Jay Chittooran, Public Policy Manager at SEMI, at [email protected].

The Advanced Lithography TechXPOT at this year’s SEMICON West will explore progress in extreme ultraviolet lithography (EUVL), its economic viability for high-volume manufacturing (HVM) and other lithography solutions that will address the march to 5nm and onward to 3nm.As a prelude to the event, SEMI asked Neeraj Khanna, Global Head of the Patterning Customer Engagement Team at KLA-Tencor, a speaker at the TechXPOT, for insights about the readiness of inspection and metrology tools for EUVL applications at 5nm and 3nm. For a full list of speakers and program agenda, visit http://www.semiconwest.org/programs-catalog/lithography-5nm-and-below.Neeraj Khanna, Global Head of the Patterning Customer Engagement Team at KLA-TencorSEMI: In general, how would you characterize the readiness of inspection and metrology tools intended for EUVL applications at 5nm and 3nm? In particular, what are some of the remaining research and development challenges that need to be addressed for each of these nodes?Neeraj Khanna: KLA-Tencor is working closely with its customers to qualify and ramp EUV. Our suite of inspection, metrology and data analytic solutions are being implemented to enable EUV infrastructure readiness including, for example, new reticle and resist qualification, scanner qualification, and EUV ramp preparation. These EUV integration activities require process control systems that support a wide range of applications, including hotspot discovery, lithography modeling, focus/dose process window qualification, reticle print check, mask blank inspection, and process and tool monitoring.As with any major technology inflection, it is critical to understand sources of process variation to enable ramp at optimal yield. For example, stochastics result in random pattern variations, which have a major impact on EUV yield. To manage stochastics, IC manufacturers are deploying process control solutions that support fast modeling of stochastic variations coupled with high-sensitivity, high-coverage wafer defect inspection. Another example is a methodology called hybrid scanner utilization whereby, when EUV scanners are implemented in production, they will only be used for a few layers, while all other layers will be patterned with 193i scanners. This technique requires tighter control and monitoring of overlay budgets.SEMI: How are you able to achieve this tighter control and monitoring?NK: To understand why hybrid scanner utilization requires tighter control and monitoring of overlay budgets, it’s important to outline how this differs from current scanner implementation. For critical layers in current process flows using 193i lithography, pattern layers for a given wafer are printed using the same stage/chuck on the same scanner. The overlay performance achieved using this lithography strategy is called dedicated chuck overlay (DCO). Use of a dedicated scanner and chuck for lithography reduces inter-scanner and inter-chuck distortion effects, resulting in DCO overlay error of less than 1nm. When EUVL is first implemented in production, it will be used for a few layers – likely, cut masks and contacts with eventual migration to metal 1 layers. All other layers will be patterned with 193i scanners. This hybrid scanner operation eliminates any possibility of using a dedicated scanner and dedicated chuck to support tight overlay performance specifications. Instead, fabs will be forced to optimize mix-and-match overlay (MMO), with the overlay performance obtained using different scanners for printing different layers on a given wafer.With overlay specifications for advanced DRAM and logic at ~2.5nm, fabs will need to implement strict 193i-to-EUV scanner matching strategies or risk consuming 60 to100 percent of the overlay budget on just MMO. To achieve tighter overlay control and monitoring required for MMO, fabs need to implement dense, in-field overlay error measurements that feed into scanner fleet management systems. KLA-Tencor’s ATL™ overlay metrology system supports a high measurement speed and the use of small in-die targets, enabling dense in-field overlay measurements with high accuracy. Our 5D Analyzer® data analytic and management system includes scanner fleet management capability that enables automatic product-based corrections to minimize MMO error, helping fabs reduce the risk to yield loss associated with a 193i-EUV mixed scanner implementation. SEMI: What other challenges do you see coming to the fore at 5nm and 3nm?NK: Overall, the 5nm and beyond design nodes will face challenges associated with new lithography technology, potential new device structures and smaller pattern pitches. IC manufacturers will require process control solutions that not only identify process windows, but also monitor patterning parameters and defectivity at multiple points to identify process shifts. To monitor dynamic processes at these advanced nodes, inspection and metrology tools will need to have both sensitivity to critical parameters/defects and robustness to process variation in order to provide IC engineers with smart feedback for efficient control of their processes.SEMI: Could you elaborate on what will be required to monitor patterning parameters and defectivity at multiple points? How different will the techniques be at 5nm/3nm vs. at say, 7nm or 10nm?NK: As an example of monitoring at multiple points, consider the transition to EUV lithography. With EUV, the cost per scan goes up dramatically. Thus, IC manufacturers will monitor parameters at multiple points to maximize yield and minimize risk: EUV reticle qualification requires inspection and metrology throughout the entire flow from mask blank manufacturing, to the mask shop, to the IC fab. For the advanced design nodes associated with EUV, wafer qualification requires monitoring and control of wafer defectivity, shape and geometry throughout the wafer manufacturing process. It also requires control of fab incoming wafer qualification while ensuring that fab-wide processes are meeting defect and shape standards necessary for printing smaller feature sizes. EUV resist characterization and qualification requires comprehensive lithography simulation, wafer defect inspection, and film thickness and uniformity measurements to help reduce development time and prepare the litho stacks for production ramp. As EUV scanners are ramping, fabs are faced with finding any unknown particle sources within the new scanner chambers. This situation is driving the need for tighter and more frequent PWP (particles per wafer pass) chamber monitors to ensure scanner cleanliness. In addition, EUV scanner qualification requires reticle front and backside particle checks, and hotspot discovery and process window qualification using optical wafer defect inspection and e-beam review. EUV process monitoring encompasses overlay error monitoring, focus/dose monitoring, critical dimension (CD) and 3D device shape monitoring, and continuous process window monitoring. EUV inline defect monitoring and tool monitoring is important for reducing baseline defectivity in the litho cell for faster ramp, and for early identification of litho excursions in production. A critical part of this monitoring strategy is inline after develop inspection (ADI) monitoring, which is defect inspection on patterned wafers after printing and development of the resist ADI. Inline ADI innovations that find yield-critical defects allow fabs to reduce process issues, prevent at-risk wafers early in the process, and enable rework when excursions are found in production. As with past technology transitions, the implementation of multiple monitoring steps as part of a comprehensive process control strategy will be critical for a fab’s successful ramp of EUV.Debra Vogler, SEMI

The fast-growing automotive semiconductor market means big change for the IC supply chain. Beyond the obvious demands for reliability and traceability, the sector is moving towards simpler and lower-cost solutions while facing the daunting challenge of automating driving in a complex world. The need for simpler and cheaper automotive intelligence will likely drive acquisitions to build complete platform solutions that are easier to integrate. This demand has already spawned a market for pre-configured test cars to save developers time and money, and is driving LiDAR (Light Detection And RADAR) towards lower-cost, solid state solutions. “The growth of the automotive electronics market provides a great opportunity for the IC supply chain to differentiate on specialty processes and quality for the high-volume automotive business with its long design cycles,” says Scott Jones, principal, strategy, at KPMG, who will speak in the automotive program at SEMICON West. “This differentiation is a chance to reduce chip suppliers’ dependence on scaling volume for the mobile phone world with its short-cycle volatility of winning and losing sockets.” He notes that increasing demand for automotive ICs is also reinvigorating the eight-inch supply chain and spurring opportunity for specialty products such as compound semiconductor devices for power efficiency. Supplying the automotive market also means addressing automotive reliability requirements, which can be 10 times more stringent than for consumer devices. At the same time, the industry must sustain fast-paced development cycles required for the volume and diversity of low-cost IoT devices, manage the segmented supply chain for both those markets, and still spread development costs. Another big challenge for the supply chain will be to automate testing and update vast amounts of embedded software in these automotive devices. “The more complete solution a company can put together, the more the automakers will gravitate to it. They want simplicity,” Jones suggests. Smaller players will need to differentiate with IP and acquire other IP provider to build a broader platform, or be acquired and folded into an all-in-one solution.AutonomouStuff helps accelerate and simplify development of autonomous driving solutionsAutonomouStuff is helping to speed development of these platforms. The company has grown from a sensor distributor into a supplier in the emerging niche of vehicles preconfigured with key interfaces for sensors and controls. These interfaces can then be customized by integrating different components for developers to test their applications. AutonomouStuff offers developers a lineup of vehicle models pre-configured with the interfaces needed to add desired chips, sensors and software to develop their autonomous vehicle systems. Source: AutonomouStuff.“Whether they’re major chipmakers or AI software startups, they don’t have a year to build their own vehicle platforms themselves for developing autonomous vehicle systems,” says Wolfgang Juchmann, VP sales and business development at AutonomouStuff. Juchmann, a SEMICON West speaker, will bring a demonstration vehicle to the show. “In four to six weeks we can prepare a custom test car with selected sensors, enabling users to start testing their computer platforms and software. It’s faster and more cost-effective for us to supply the car with the needed interfaces.” He notes that developers are using some 300 AutonomouStuff vehicles in the field. AutonomouStuff customers are starting to transition from testing on a single car or two to testing on mini-fleets with 50 to 100 vehicles. Beyond sensors and pre-configured vehicles, the next step will be to add more data intelligence services to help with capabilities like tagging the data for training, Juchmann says. AutonomouStuff already offers hardware to support Baidu’s Apollo open-source software stack and data set. The company was recently acquired by the Swedish holding company Hexagon to help support expansion.CMOS silicon LiDAR nears automotive qualificationInnovations in the hyper-competitive LiDAR market, where burgeoning demand is driving the race to develop various types of solid-state devices, may also help reduce the cost of autonomous vehicles. Among the roughly 40 LiDAR suppliers, at least one – Quanergy – is taking advantage of 45nm and 32nm foundry CMOS volume production. The company uses voltage through the semiconductor stack to change the refractive index, controlling the phases of optical beams and the resulting interference patterns of light exiting the chip to quickly steer the laser beam without the need for moving parts, much like the phased array radar its team developed earlier. Solid state LiDAR image with object recognition software. Source: QuanergySo far, most of the small LiDAR units have shipped to the security, industrial automation, drone, robots and 3D mapping markets. However, Quanergy CEO Louay Eldada, another SEMICON speaker, says the company is also winning automotive designs and expects automotive shipments to take off early next year, once automotive certification testing is completed. “We can get design wins because standard CMOS production at TSMC makes us a known entity,” says Eldada. To prevent component misalignment, the company produces its own specialized packaging to secure the laser, phase control ASIC, optical phased-array emitter, detector array, and receiver readout ASIC at its plant in Silicon Valley or the facility of its automotive partner Sensata. Through its software business, Quanergy offers an artificial intelligence (AI) perception program for object recognition and LiDAR tracking. The solution uses the people-tracker software the company acquired from Raytheon.SEMICON West this year expands to three full days of automotive electronics programming and features a Smart Transportation Pavilion. Other companies with experts who will speak as part of the program include XPT/NIO, Infineon, McKinsey, Voyage, GM Cruise, Bosch, Deepen AI, Airbus A3, Nvidia, Excelfore, Byton, Macronix, SK Hynix, SAP, Xilinx, Achronics, California Fuel Cell Partnership, Velodyne, Lam Research, KLA-Tencor, SCREEN, Rockwell, Versum Materials, TechSearch International, Entegris, ASE, Amazon, Continental and Wind River. www.semiconwest.orgPaul Doe, SEMI