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Silicon carbide (SiC), with its wide band gap and high thermal conductivity, is increasingly favored for semiconductor power applications across several fast-growing industries. Its ability to operate at higher voltages and frequencies enables significant efficiency gains, particularly in e-mobility, where SiC offers key advantages in size, weight, and speed compared to traditional silicon-based power devices.However, as promising as SiC is, the industry still faces critical challenges in scaling to meet growing demand. Key barriers include cost, reliability, and manufacturing capacity, all of which must be addressed for SiC to fully mature.SEMI spoke with Entegris Senior Director - Advanced Technology Engagements, Office of the CTO Mark Puttock, Ph.D., to discuss the challenges of scaling SiC power chip manufacturing from a material supplier’s perspective. Puttock shared insights ahead of his presentation at the Entegris session, Cultivating a Thriving SiC Market: Tackling Key Challenges Across the Value Chain, taking place on November 14, 2024, at SEMICON Europa in Munich, Germany. Don’t miss the opportunity to engage with experts from Entegris and other industry leaders. Registration is now open. SEMI: Global megatrends like environmental crises and AI drive the necessity for SiC power semiconductors. What is the current status? Puttock: The increasing demand for efficient power electronics — fueled by global megatrends such as vehicle electrification, environmental de-carbonization, and the rise of power-hungry AI chips — drives the necessity of wide bandgap semiconductors. SiC offers advantages of weight, size, and speed over traditional silicon (Si) solutions, which are particularly vital in automotive applications 600V and above. However, SiC chip manufacturing has not reached the maturity of silicon-based processing. Greater maturity will help reduce costs, which will accelerate adoption in the market.SEMI: What are the main challenges in scaling SiC?Puttock: Challenges in scaling SiC power chip manufacturing to high volumes are not surprising. That’s because high volume producers have not been operating long enough to resolve early-stage issues. From a material perspective, SiC is more challenging to manage compared to Si. The challenges we identify include:Chemical Mechanical Planarization (CMP): SiC is nearly as hard as diamond and significantly harder than Si, making it challenging to achieve a high removal rate while maintaining both planarity and low defectivity. This step is crucial toward the end of the wafering process and before the epitaxial growth of device layers.Handling: SiC is more brittle than Si, making it more susceptible to damage or breakage.Implantation: SiC is more difficult to implant than Si, requiring higher temperatures and the use of aluminum instead of boron as a P-type implant species. Additionally, it is a significant challenge to achieve a reliable aluminum source with a long and stable lifetime.Thermal Processing for Wafer Growth and Epitaxy Processes: SiC processes run hotter than Si ( 2000° C for wafering, 1500° C for epitaxial growth), demanding resilient chamber parts to achieve good lifetimes.Sustainability: Because SiC is extremely hard, the CMP process requires significant amounts of slurry. Improving slurry recycling and wastewater management continues to be a challenge.On October 29, we will address these issues in our webinar, “Challenges in Scaling SiC Power Chip Manufacturing: A Material Supplier's Perspective” This session will provide valuable insights and considerations for advancing maturity in high-volume SiC power chip manufacturing. SEMI: Can you elaborate on the challenges associated with CMP for SiC wafers? Puttock: SiC wafers are challenging to process, requiring specialized materials and methods compared to traditional silicon. Defects in the SiC wafer crystal during non-optimized CMP processing can propagate into the device epitaxial layers. This leads to yield loss, increased electrical resistance, reduced performance, and wasted power.SiC wafers must be cut, ground, lapped, and polished to create the necessary surface properties before depositing active layers. As the demand for these devices grows, optimizing the CMP process is essential to ensure the desired surface quality and planarity required for device fabrication. For a deeper understanding of these challenges, we recommend downloading our latest white paper, “Solving CMP Challenges in High-Volume SiC Production,” which covers:Achieving maximum smoothness with high removal ratesReducing the total cost of ownership Optimizing CMP slurry and pads for the unique wafer chemistry and topology of SiC wafersSEMI: What do you mean by optimizing slurry for SiC CMP?Puttock: CMP slurry typically consists of abrasive nanoparticle powder dispersed in a chemically reactive solution. The objective is to achieve a smooth, defect-free surface (less than 1 A Ra) with a high removal rate (greater than 7 µm/m).Traditionally, achieving high removal rates and smooth surfaces required two separate slurries. This approach sometimes forced SiC wafer manufacturers to choose a defect-free surface over a faster, more efficient CMP process, depending on their fab capabilities. Today, optimization allows SiC wafer manufacturers to achieve both high polishing capacity and good final surface quality using a single slurry.Additionally, while the slurry is the most critical part of the CMP process, the pad must be compatible with the application. This ensures the desired planarity while also preventing scratches or contamination of the SiC wafer surface. Research shows that optimized thermoplastic polyurethane CMP pads outperform traditional thermoset polyurethane pads. The optimized pads minimize surface damage and enhance removal rates due to their bulk hardness.SEMI: What are the future challenges for SiC devices? Puttock: SiC devices are increasingly favored for their superior energy efficiency and reduced environmental impact. However, the SiC manufacturing process presents challenges due to its high-temperature operations, which consumes significant amounts of energy and shortens the lifespan of chamber components. To address this, improving efficiency in these processes will be crucial in the coming years.Recycling is another important challenge. For example, CMP slurries present an opportunity for water recycling and conservation. At Entegris, we are committed to this issue and are actively collaborating with key industry players to enhance material circularity and prioritize sustainability in our new product development.SEMI: How is Entegris contributing to advancements in SiC technology, and what initiatives or partnerships do you have planned for the near future? Puttock: Entegris is an active member of the SEMI Global Automotive Advisory Council (GAAC) and participates in a working group focused on SiC with key industry leaders such as Volkswagen, BMW, Porsche Consulting, onsemi, Infineon, STMicroelectronics, and others. Our engagement spans the entire semiconductor supply chain, collaborating with integrated device manufacturers and original equipment manufacturers in fabs worldwide. Additionally, we recently announced our latest long-term agreement with onsemi, which underscores our commitment to advancing SiC technology.SEMI: What are your expectations regarding your participation at SEMICON Europa? Puttock: SEMICON Europa is a unique platform to connect with the semiconductor and automotive ecosystems. Last year, we organized a highly successful SiC session in collaboration with SEMI at both SEMICON West and SEMICON Europa, focusing on “Connecting the Automotive Ecosystem Towards More Mature SiC Manufacturing.”This year, we will continue the discussion with industry leaders during our session, “Cultivating a Thriving SiC Market: Tackling Key Challenges Across the Value Chain.” Our goal is to provide insights and propose solutions that will enable SiC power chips to achieve their anticipated role in future technology ecosystems.We will present alongside Porsche Consulting, and the talks will be followed by a panel discussion that will explore the current state and future prospects of SiC technology in power electronics. We invite visitors to join us at the Executive Forum on Thursday, November 14, from 1:40 – 3:00 p.m. and to visit us at Silicon Saxony booth 219 in Hall C1.About Mark PuttockMark Puttock, Ph.D., is the senior director of advanced technology engagements in the office of the CTO at Entegris. He has worked in the semiconductor industry for over 30 years with a background in physics and plasma processing. As a team member of the Entegris CTO office since 2014, Mark has followed technology trends and collaborated with Entegris’ global product development teams to develop timely and differentiated new materials, chemistries, and components for all the world’s semiconductor manufacturers. Maria Daniela Perez is Communications Manager at SEMI Europe.
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The pandemic unleashed by the coronavirus SARS-CoV-2 (which causes the disease COVID-19) has infected over 100 million and resulted in over 2.6 million deaths worldwide as of March 2021. It is well-established that this virus primarily spreads from person-to-person via respiratory droplets produced when an infected person coughs, sneezes or even breathes (see Ref. 1-3). Subsequently, the droplets meet the eyes, or enter nose or mouth of a nearby person, or transmit when a person touches an infected surface, then contacts their eyes, nose, or mouth. Since the virus is small, 0.06–0.14 microns in diameter, many copies can be contained in or attached to emitted respiratory droplets. Droplets as small as one micron can carry enough viral load to cause an infection. A particular concern is the interaction of droplets with ventilation systems, which potentially could enhance the propagation of pathogens. This has implications on situation-specific safe distancing and the design of building filtration systems, air distribution, heating, air-conditioning and decontamination systems. A particular instance of this is the semiconductor manufacturing cleanroom, where systems and protocols are specifically designed to minimize contamination. The $440 billion global semiconductor industry depends on these cleanrooms for integrated circuits (chips), and in turn, these chips form the lifeblood of the multi-trillion-dollar global electronic systems industry. Electronic systems are now critical for just about every aspect of human life, including health, work, finances, entertainment, transportation, power grids and many others. Thus, it is critical to understand how cleanrooms can operate more safely to ensure the health of workers while maintaining productivity levels to meet increasing global demand for semiconductors. In the work described here, we analyzed particle and droplet transport via modeling, simulation [Refs 1-3], and experimentation [Ref. 4] to help guide the industry. Modeling and Simulation In this part of the work, mathematical models were developed to simulate the progressive time-evolution of the distribution of locations of particles produced by a cough. Analytical and numerical studies were undertaken. The models ascertain the range, distribution and settling time of the particles under the influence of gravity and drag from the surrounding air. Beyond qualitative trends that illustrate that large particles travel far and settle quickly – versus small particles that do not travel far and settle slowly (yet can be carried far by ambient flow) – the models provide quantitative results for distances travelled and settling times, which are needed for constructing social distancing policies and workplace protocols. Figure 1 shows examples of the results of the modeling and simulation work. Figure 1: Model of particle spreading from a person coughing, with and without a mask. (Ref. 1) Following are key insights from the modeling and simulation work (Ref. 1): Large particles travel far (launched “ballistically”) and settle quickly, while small particles do not travel far and settle slowly (when there are no ambient externally-driven flow fields). Small particles do not settle even by the end of the simulation time (4 seconds in Ref. 1). Accordingly, the simulations were also run for extremely long periods to ascertain that the “mist” of small particles remained airborne for several minutes (as predicted by the theory). For strong opposing headwind, small particles move backwards, yet still remain airborne for extended periods of time. This is by far the most dangerous case since this will encounter other persons at the torso level. Ratio of the general drag to gravity indicates that at high velocities, the dynamics are dominated by drag. For general cough conditions, there can be cases where the change in the surrounding fluid’s behavior, due to the motion of the particles and cough, may be important. One major implication of this work is that the challenge of infection must be addressed both spatially and temporally. In other words, it is necessary to maintain social distancing based on how far the virus travels, but it is also important to account for how long the virus stays at the location because of specific air patterns. On the positive side, understanding these spatio-temporal patterns accurately will enable companies to design (or re-design) ventilation and decontamination systems precisely to improve worker safety. Other aspects of this analysis entail contact tracing (Ref. 2) and decontamination (Ref. 3). Further details, including simulations, are available at https://msol.berkeley.edu/publications/. Experimentation The major vector of coronavirus spread is through respiratory droplets expelled when coughing, speaking, and breathing; and the efficacy of any safety measures depends on accurate characterization of the dispersal of these droplets. The term particle describes objects that begin their journey as a solid. The term droplet is reserved specifically for objects that are initially liquid, albeit it is important to note that droplets can evaporate and effectively transform into solid particles composed of non-evaporative material. A purpose-built room, the Cal Covid Cube, C3, was set up and utilized for this research [Thatcher et al. 4]. The C3 is a parallelepiped room that is 232 centimeters tall, 376 centimeters long and 284 centimeters wide on the inside. For experimental results to be meaningful and repeatable for scientific and practical purposes, it is essential that the experimental setup be carefully controlled and calibrated. The following precautions were taken to ensure this: Charge-free: When solid particles are released, it is critical to eliminate (or thoroughly know) static charge effects for obtaining accurate deposition patterns. Static charge effects can manifest through particle-particle interactions (affecting particle motion in flight) or particle-surface interaction (affecting deposition pattern). Two methods for the elimination of charge effects on the deposition surface were found to be effective: (1) ionized non-conductive adhesive sampling strips, and (2) grounded aluminum backed carbon sampling strips. Isothermal: The room is a converted walk-in freezer with 10.5-13 centimeter thermal insulation and located in the middle of a building, at least 5 meters away from all building walls. Temperature uniformity was checked and the C3 room temperatures were found to be isothermal within uncertainty of measurements. Quiescent: It was ensured that the room did not create uncontrolled thermal convection due to isothermal nature. Quiescence was verified with both hot-wire measurements and with free-falling particle drift observations. Isopotential: The outer and inner surfaces, including the door of the C3 were conductive aluminum and stainless steel, and copper tape were used to ensure reliable electrical connection of door, interior and exterior panels. Electric fields were surveyed and found to be negligible within precision of instruments. Other design elements: All interior surfaces were coated with black matte paint to reduce scattered light and provide uniform background for imaging measurements. The facility was located on ground floor to limit vibrations. Repeatable Launch: To emulate the release from a true cough or sneeze, and to better understand droplet motion in a canonical turbulent jet versus a cough type release, we studied different layers of complexity for the release geometry: (i) Straight round pipe (ii) Smooth 90-degree curved pipe, with a changing radius along the length of the pipe (iii) Intubation trainer doll, with realistic airways and mouth/tongue structure Figure 2 shows the experimental setup with the intubation doll in C3, with the particle/droplet release being measured after deposition on the sampling strips that appear green. Figure 2: Experimental Setup in C3 with both charge neutralized (white appearing green) and conductive (black) sampling strips placed on a conductive and grounded alignment grid [Ref. 4] We utilized both liquid droplets and solid particles. For droplets, we explored and found promise in a method of deposition analysis based on fluorescence. For particles, we explored many ways in which the smallest of thermal gradients or electrostatic charge issues can affect the data and developed practical methods to address these issues. For accurate measurement free of static charge effects even in environments where high ambient flow velocities may cause a nonconductive surface to rapidly acquire charge (e.g., clean room environment), we developed carbon-tape-based sampling strips that are cleanroom-compatible, conductive, and grounded. For analysis, we developed a cost-effective method utilizing a commercial photo negative scanner followed by image enhancement by blind deconvolution. Figure 3 shows sample results for particle deposition location along our centerline for particles in the ballistic, intermediate and aerosol regime. Figure 3: Experimental Results [Thatcher et al. 4] Following are key insights from experimental work: Significance of both static charge effects and thermal gradients in rooms for validation tests are more than usually appreciated. For modelling, accounting for the non-uniform initial particle velocity matters for the ballistic particles. For all sizes of particles, simulating the transient versus steady state significantly impacts predicted particle spread. Thermal plumes alone from humans along particle flight path can transport 50 micron particles across the room. In some situations, this was observed up to ~6 meters. There is a significant effect of Relative Humidity (RH) and temperature on droplet evaporation. The practical consequence is that, in low RH, particles spread further, with all other things being equal. (The reason is that particles shrunk more and entered the aerosol regime.) In summary, a systematic analysis of particle and droplet transport was conducted by simulation, modeling, and experimentation. We were able to develop robust, rigorous, and repeatable methodologies and draw meaningful insights that will support safer operation and productivity of semiconductor cleanrooms globally. Further, these studies will help with the design (or re-design) of ventilation and de-contamination systems that help protect both the health of humans and the economy from current and future pandemics. This article provides a high-level overview of the work, and further details will be available through a series of scientific papers that are in various phases of publication. We gratefully acknowledge the following support: Gift of the Lam Research Corporation Gifts coordinated through SEMI and provided by Advanced Energy Industries, Applied Materials, ASM, Entegris, JSR, KLA, TEL, and Wonik The 2020 Seed Fund Award from the Center for Information Technology Research in the Interest of Society (CITRIS) and the Banatao Institute at the University of California Vision Research for providing a v2640 camera to help quantify the particle velocities Graduate students Eric Thacher and Tvetene Carlson who conducted the experiments in C3 Valuable discussions with Brett Singer, Thomas Kirchstetter, Michael Sohn, Chelsea Preble of Lawrence Berkeley National Laboratory regarding droplet transport and COVID, and Keith Hansen on particle sampling and charge neutralization DOE Office of Science through the National Virtual Biotechnology Laboratory, a consortium of DOE national laboratories focused on response to COVID-19, with funding provided by the Coronavirus CARES Act Steven Ruzin and the Biological Imaging Facility for their assistance in obtaining the high-quality fluorescence microscopy scans to validate the particle counting methodology. References Zohdi, T.I. (2020) Modeling and simulation of the infection zone from a cough, Computational Mechanics. https://doi.org/10.1007/s00466-020-01875-5 Zohdi, T.I. (2020). An agent-based computational framework for simulation of global pandemic and social response on planet X, Computational Mechanics. https://doi.org/10.1007/s00466-020-01886-2 Zohdi, T.I. (2020) Rapid simulation of viral decontamination efficacy with UV irradiation. Computer Methods Appl. Mech. Eng. https://doi.org/10.1016/j.cma.2020.113216 Thatcher, E., Carlson, J., Castellini, J., Sohn, M.D., Variano, E. and Makiharju S.A. (2021) Droplet and Particle Methods to Investigate Turbulent Particle Laden Jets (in preparation) Authors Evan A. Variano, Professor, Environmental Engineering, UC Berkeley Simo Mäkiharju, Assistant Professor of Mechanical Engineering, UC Berkeley Tarek I. Zohdi, Will C. Hall Endowed Chair of the UCB Computational Data Science Engineering Program, Professor of Mechanical Engineering, UC Berkeley Pushkar P. Apte, Director of Strategic Initiatives, Center for Information Technology Research in the Interest of Society (CITRIS) and the Banatao Institute, UC Berkeley; and Strategic Technology Advisor, SEMI
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Solving challenges in semiconductor manufacturing requires an ongoing collaborative effort by customers, device makers, equipment and materials suppliers, and academia. ASMC 2021 will continue efforts to help the industry overcome these hurdles. To that end, we are now soliciting abstracts from industry experts across all areas of semiconductor manufacturing for presentations at the event, May 3-6, 2021 at the Saratoga Hilton/Saratoga Springs City Center in Saratoga Springs, New York.The conference provides an unparalleled platform for semiconductor professionals to network and learn the latest information in the practical application of advanced manufacturing strategies and methodologies. ASMC 2021 will be co-chaired by Ishtiaq Ahsan, Ph.D. of IBM Research and Alexa Greer of KLA.We’re looking for presentations in topic areas including the following: Advanced Metrology Advanced Equipment Processes and Materials Contamination Free Manufacturing Big Data Management and Mining Defect Inspection and Reduction Equipment Optimization Factory Automation Industrial Engineering Smart Manufacturing Yield Methodologies Click here to submit an abstract for a technical presentation. Provide an extended abstract of no more than two pages (max. of 1000 words, MS Word or PDF) with supporting data, charts, figures embedded in the last page. See author kit for details. Summarize the topic and theme in as much detail as allowed by the word count limitation. Include title, author(s), company affiliation(s), contact information, topic and five key words describing the work. The final technical manuscript must show a complete set of data to support initial abstract. Here are key deadlines and dates for industry experts to keep in mind: Abstracts Due: October 30, 2020 Author Notification: December 15, 2020 Manuscripts Due: February 9, 2021 Final Manuscripts Due: April 6, 2021 Presentations Due: April 20, 2021 Conference Dates: May 3-6, 2021 ASMC 2021 could be held as a virtual event depending on progress in containing COVID-19. Whether the event is on-site or virtual, all abstracts accepted for presentation will be published by IEEE. Speakers should be prepared to present live or online.Speakers also may be invited to publish their papers in a special section of ASMC 2021, which will be featured in IEEE Transactions on Semiconductor Manufacturing. All technical presentations will be considered for the ASMC Best Paper Award sponsored by Entegris. Students presenting an oral paper or poster will be considered for the ASMC Best Student Paper Award sponsored by GLOBALFOUNDRIES.For a complete overview of topics and other information, please visit the ASMC 2021 Call for Papers web page.Margaret Kindling is senior manager of Programs for SEMI Americas.
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