fab equipment

Policymakers are increasing semiconductor manufacturing capacity to strengthen supply chains and meet growing demand for semiconductors through robust incentive packages totaling hundreds of billions of dollars. This global effort hinges on semiconductor manufacturing equipment (SME).

China’s semiconductor sector has exploded to become one of the largest in the world and match the region’s prominence as the biggest consumer of chips. From 2015 to 2020 alone, revenue of China’s integrated circuit (IC) industry expanded at a rapid clip of 20% CAGR (RMB) to $128 billion.

On 21 September, SEMI and a coalition of 40 industry organisations sent a letter to European Commission President Ursula von der Leyen calling for decisive action to solve implementation issues within the European Union Waste Framework Directive, specifically the Substances of Concern in Products (SCIP) database.The signatories, who represent a very significant part of the European economy, are requesting urgent resolution of implementation issues for the SCIP database, which is designed to support the circular economy as defined in the European Green Deal. The database is required under Article 9.1 of the updated Waste Framework Directive.In the letter, the signatories ask President von der Leyen to take immediate action to: Postpone the SCIP notification deadline of 5 January 2021 to at least one year after finalization of the database; Conduct a study on the usefulness, feasibility, proportionality and impact of the database; Instruct the European Chemicals Agency (ECHA) to adapt the SCIP database according to the outcome of the proposed study. ECHA failed to complete development of the database by the January 2020 deadline required by the Waste Framework Directive, leaving companies insufficient time to develop, test and adapt their own systems to meet the January 2021 SCIP notification deadline.Over the last two years, the signatories have repeatedly shared their serious concerns regarding the viability, proportionality and value of the SCIP database with the European Commission and the ECHA, yet those concerns remain unresolved.Contrary to the EU Better Regulation principles that call for open and transparent decision making, Article 9.1 was added to the revised Waste Framework Directive during the final stage of the co-decision process without any prior stakeholder consultation or impact assessment. A proper impact study should help shape the way forward to deliver on the EU ambition of driving a circular European economy.Coalition PartnersEmir Demircan is director of Advocacy and Public Policy at SEMI Europe.

SCIS is a SEMI Technology Community that tackles critical component defectivity for the semiconductor manufacturing industry. The organization develops test methods for measuring defects in these critical components. Originally, this SEMI community was looking at challenges surrounding sub-10nm process nodes, but our constituents – Integrated Device Manufacturers (IDMs), capital equipment OEMs, and (sub)component suppliers – felt that the immediate need was for standards that would apply to process nodes that are already being used for volume semiconductor device manufacturing.IDMs need ways to tell their supply chain how defects attributable to these critical components factor into the overall process-node defect budgets and wafer-contamination limits. Chipmakers and IDMs needed to start with a baseline: How problematic are existing critical components in the overall fab systems and how do these contaminants contribute to defects and how do they affect overall process yields?These questions must be answered for every component in the fab’s process line including the drums that hold the fab chemistries, fluid delivery systems, and components used in the wafer-processing chamber. All of these critical fab-line components come into contact with each manufactured wafer, in one way or another, and each is a suspect with respect to contamination, defects, and yield problems. SCIS develops test methods for these fab-line critical components testing that are used to identify the defects caused by these components and for establishing baselines.SCIS has seven working groups dealing with various critical components. Each is developing various test methods for many critical fab-line components. There are many facets with respect to testing each of these critical components.Take something as simple as a seal, such as an FFKM (perfluoroelastomer, made from polymers) seal. These seals are ubiquitous in fab lines. In harsher environments, such as inside of a processing chamber, these seals are exposed to high temperatures and harsh chemistries. Different FFKM seals will have different characteristics such as thermal resistivity and chemical resistance, depending on customer specifications, and can also vary from one manufacturer to another. In addition, these characteristics can change depending on environmental conditions – or just the passage of time.SCIS looks at defect traits from the perspective of each component in the fab line and decides which of the components’ parameters contribute most to process defects. Initially, the SCIS Seals Valves Group collected a list of seal-related issues or parameters. The working group then cross-checked these parameters against different manufacturing processes used in the fab including ALD (atomic layer deposition) and CVD (chemical vapor deposition). Some processes are harder on seals than others. Then the working group prioritized these various parameters according to their contribution to the overall process defect budget. IDMs provided important input during these steps because they work with these seals on a daily basis. At this point, the SCIS working group had a prioritized list of parameters, vetted by various stakeholders in the semiconductor manufacturing industry. The group then set to develop standardized measurement methods for these critical parameters.Based on this work, the SCIS Seals Valves Group has already published two documents. The first is a standard that specifies methods for testing seal-induced impurities such as ashing (analysis of metals content of the ash) and TOC (total organic content).The second document published by the Seals Valves Group is a guide that documents BKMs (best known methods) for handling seals – from the moment they’re cured in an oven to packaging, shipping, handling in a fab, and installation – to reduce contamination problems during use. For example, some seals are sensitive to light. Some polymer seals degrade when they come into contact with IPA (isopropyl alcohol), which is often used for prepping. A degraded seal can emit contamination particles during processing, which will cause yields to fall. (This latter bit of information came directly from a major IDM, which demonstrates the invaluable role that users of these components can play in the development of testing standards.)The Seals Valves Group’s current work focuses on developing a standard for measuring seal leak rates. This standard will define test methods for evaluating a seal’s ability to maintain pressure under vacuum. Although there are well-established standard for testing seal CSR (compressive stress relaxation) in the aerospace industry, there’s no such standard for the semiconductor industry. So originally, the Seals Valves Group tried to tackle that challenge by developing a similar standard for SEMI’s constituents. However, a more practical and immediate parametric challenge turned out to be seal leakage rates.Installed seals are exposed to high temperatures and harsh chemistries in the semiconductor fabrication process. The Seals Valves Group decided to develop a test method that would determine how well seals perform over time with respect to leakage rates as the seals are exposed to cyclic harsh conditions. The goal is to simulate the working conditions for these seals, as closely as possible and in a repeatable manner.There are, of course, some challenges associated with this work. For example, IDMs and equipment OEMs don’t want to reveal their exact process conditions as they are proprietary. So the Seals Valves Group took a step back and focused on developing a test method based solely on exposure to elevated temperatures.Development of this thermal test requires the design of a standardized test jig to help ensure consistent, repeatable tests, shown in Figure 1. Figure 1: Elastomer seal test jig developed by the SCIS Seals Valves Group.The seal under test, shown in red in Figure 1, sits at the center of the jig. A second seal, shown in green, is used to seal the actual test environment. Two thermocouples in the jig’s top and bottom monitor of the temperature inside of the jig. There are gas and purge lines for controlling the ambient pressures on either side of the seal under test.Figure 2 illustrates how the jig is connected to the gas sources. Figure 2: The Seals Test Jig is connected to helium and nitrogen gas sources and to a calibrated leak (vacuum) line. The seals leak test is based on a helium leak test. Helium is one of the smallest atoms so it will leak through just about any small gap and, with time, permeate through the material as well. In addition, helium is inert, and testing for helium using a mass spectrometer is a well-established technique for leak testing. Helium leak testing can be one thousand to one million times more sensitive than using mechanical, pressure-decay test techniques. The jig’s nitrogen lines serve to purge the test chambers of helium between leak tests.Developing just a test jig is not sufficient. The Seals Valves Group also developed a test sequence for using the jig. There were no existing standard, so the group needed to use its knowledge of the seals’ composition and operating conditions to develop certain test parameters. For example, the group elected to use 200°C as the maximum temperature for the high-temperature portion of the test because FFKM seals start to degrade at 250°C.At this point, the Seals Valves Group has gone through several iterations of a proposed test sequence. There was some initial reluctance to provide detailed inputs, but after a few iterations of the proposed method (and an understanding that this would become an industry standard to hold suppliers accountable), inputs have become more forthcoming.This is an excellent example that demonstrates why it’s so important for SCIS working groups to get chipmakers, IDMs, component vendors, and even feedstock materials vendors to participate in these standardization efforts. Standards are far more useful if they’re based on real-world conditions.Currently, the SCIS Seals Valves Group is working towards finalizing the seals-leak test sequence. The jig has been designed in AutoCAD and a prototype will soon be manufactured. Although the test and jig have been developed with significant industry participation, the validity of the test has yet to be determined. The validity will be verified though Alpha testing before the jig design and test method are incorporated into a standard.However, SEMI is not a test house. It’s a facilitator. The testing will therefore be performed by a neutral third party capable of carrying out the test under fab-like conditions. SEMI’s role is to work with different testing entities such as SUNY Polytechnic Institute in Utica, New York or IMEC in Belgium.SEMI will solicit bids for this work through its SCIS Executive Advisory Committee, which consists of C-level executives from device makers, semiconductor capital equipment OEMs, and major critical component suppliers. This project has leveraged many of the relationships that SEMI has developed over the years and has broken new ground in standards making for SCIS and for SEMI.For those looking to learn more about SCIS or engage in ongoing efforts, please contact Paul Trio, senior manager of Strategic Initiatives at SEMI, at [email protected].

Gas plasmas have become a fundamental building block in many semiconductor manufacturing processes. Plasma torches used to create these gas plasmas have three components: an induction coil, a plasma confinement tube, and a gas distributor or torch head that introduces multiple gases into the torch. RF generators supply the high-frequency electrical energy needed to transform the plasma-forming gases flowing through the torch, typically oxygen or a fluorine-bearing gas, into a plasma. The RF generators used for semiconductor manufacturing typically operate in the low megahertz or tens of megahertz frequency range and are expected to output high RF power at those frequencies for long periods. For example, ALD and CVD processes use RF generators with output powers on the order of a few kilowatts.About three years ago, a major semiconductor device maker experienced a recurring problem with its RF generators. The company found that more than half of the RF generators it deployed in its manufacturing lines were failing within the first two years of service. Further, the same model RF generators obtained from the same RF generator vendor simply were not behaving similarly when used for exactly the same processes under exactly the same conditions. Nor were these supposedly identical generators operating for consistent lengths of time before failing. Clearly there was variation from one generator to the next, even within the same model.A further complication occurred during procurement of these RF generators. Procurement people were acquiring generators using general specification requirements and these requirements were, at times, opaque to the intended process application. In some cases, equipment was being purchased in bulk quantities and then assigned to different processes on the semiconductor manufacturing lines. When these generators were deployed, they had not been designed or optimized for the specific task to which they were assigned, exacerbating the reliability problem.The RF generator suppliers felt that they would be able to supply more reliable generators if they could collaborate with their customers so that they could purpose-build their generators for the intended uses. However, the semiconductor makers preferred to keep the specifics of the manufacturing process applications for these generators proprietary, for obvious reasons. To make matters worse, customers did not always return failed units to RF generator vendors for analysis. Instead, the RF generators were sometimes sent out to be refurbished by third parties or repair depots, and then redeployed. As a result, failure analysis proved challenging to obtain.This is exactly the type of situation that SEMI’s Semiconductor Component, Instrument and Subsystem (SCIS) technical community exists to address. SCIS develops test methods aimed at measuring component defects for the greater semiconductor manufacturing community. SCIS tackled this RF generator problem and developed a standard test method for measuring specific RF generator characteristics. Using this test method, RF generator manufacturers can publish results for their generators in a standardized way that allows their customers to make fair, application-specific comparisons among models and vendors.Many aspects of an RF generator needed to be considered. A key aspect that interested integrated device makers (IDMs) and capital equipment OEMs was a transient-response test for RF generators.A transient-response test standard established by the SEMI-E135 standard did exist, but its tests were run only with 50-ohm RF output loads. SCIS decided to expand this transient-response test by adding high- and low-impedance load tests to the existing 50-ohm load test.The initial response to this plan was not enthusiastic. The semiconductor makers feared that this simple expansion of an existing test standard would not produce a test regimen that would help solve what they considered to be the real problem: RF generator reliability. However, a major semiconductor equipment OEM differed, and felt that the two additional load conditions would provide a much better understanding of an RF generator’s capabilities. A second major semiconductor equipment OEM also got involved by providing additional, valuable feedback on the developing RF generator testing standard.In the end, the general feeling in the community is that this newly revised standard levels the playing field and makes it easier for customers to compare RF generators from different generator vendors. Now that this revised SEMI-E135 standard with the additional output load resistances has been published, the SCIS technical community has gained broader support and is now digging into the creation of a reliability test standard for RF generators to meet the greater semiconductor manufacturing community’s strong need for such a standard.How SEMI Standards are MadeThis sequence of events illustrates how standards are developed at SEMI. The SCIS technical community (or some other technical community within SEMI) develops and incubates test methods until a document is ready for standardization. At that point, a SEMI Standards task force is created. Companies within SCIS work with the task force (or become the task force) to ready the document for standardization. For the SEMI-E135 revision, the list of participating companies encompassed the entire semiconductor manufacturing community including RF generator suppliers, semiconductor capital equipment OEMs, and IDMs. All stakeholders participate.Figure 1 illustrates the sequence of events that occurred during the revision of the SEMI-E135 standard, after the test methods had been developed by SCIS as discussed above. Figure 1: Timeline for SEMI-E135 RF generator test standard revision after SCIS had developed the new load tests. Balloting, as illustrated in Figure 1, is the main way that SEMI obtains global consensus in the standards-making process. To achieve this, SEMI sends out the standard ballot proposal, or in this case a major revision of an existing standard. The changes to SEMI-E135 were sufficiently extensive that it was treated as a complete rewrite to this standard.On first ballot, the revised SEMI-E135 standard received several rejection votes, which also included suggested modifications that would remove the objections. These ballot rejections caused the proposed standard to be further revised, with both technical as well as editorial changes, triggering a SEMI Standards process called a Ratification Ballot. This approach takes less time than starting the balloting process over again. The final revised standard was published in September 2018.Having all stakeholders participate in the early development of the revised standard helped move the standard through the balloting process immensely, but customer participation was especially important. In the end, the semiconductor device makers and equipment OEMs are the ultimate beneficiaries of a standard like SEMI-E135. When end customers help to drive a standard’s development, there’s added pressure to move the standard along in the standardization process and the standard is far more likely to be useful for their purposes.And that’s a very good thing.For those looking to learn more about SCIS or engage in ongoing efforts, please contact Paul Trio, senior manager of Strategic Initiatives at SEMI, at [email protected].

Orders for critical subsystems evaporated in the second half of 2018 after a very strong start to the year. Subsystems suppliers have been left with depleted order books after OEMs accumulated large inventories as the market for wafer fab equipment cooled off. Although overall critical subsystems revenue growth for 2018 is forecast to come in at +5% YoY, this year has been a tale of two halves with a bumpy ride for the critical subsystems supply chain along the way.The year started very strongly with overstretched OEMs switching from a “just in time” ordering strategy to panic buying and over ordering critical subsystems “just in case” as they battled to keep up with equipment demand from chipmakers. However, falling memory prices and technology push outs from major chipmakers in Q2 saw a sharp reduction in capex and demand for equipment. The whiplash effect through the supply chain has been severe and critical subsystems suppliers running at full capacity were unable to stop fast enough.Comparing inventories of vacuum processing OEMs (major consumers of advanced critical subsystems) and critical subsystems suppliers, warning signs for subsystems suppliers were apparent after the Q2 quarterly earnings reports. After OEM inventories surged in Q2, critical subsystems supplier inventories spiked in Q3. The overproduction of subsystems leading to this spike suggests that the OEMs had been promising orders to subsystems suppliers but turned off the buying as they too struggled to shift their own products earlier in the year. Suppliers of highly customised subsystems such as vacuum valves and power supplies were particularly badly hit. Whereas other subsystems such as vacuum pumps, which can generally be repurposed on other tools or applications, have fared better as the oversupply can be consumed by a wider variety of applications.The bad news does not appear to be finished for subsystems suppliers as Q3 OEM inventories as a percentage of revenue remained at historically high levels, which is a concern in the short term. Nevertheless, the underlying drivers for the industry remain strong and there is light at the end of the tunnel as major fab building projects in Asia appear to be continuing without delay – a promising sign that chipmakers are still intending to increase capacity. There will be a lot of empty fab shells and upgraded clean rooms ready for equipment installations at short notice if required, ensuring that orders for equipment and subsystems will pick up again soon. Although 2018 will appear in the historical data as a flat, if not slightly positive year, it does not quite reflect the bumpy ride that has been experienced by the supply chain along the way.For more information about VLSI Research and Critical Subsystems, visit www.vlsiresearch.com/public/csubs/. Julian West is a technical and market analyst at VLSI Research Europe.

Micron, one of the top three memory semiconductor companies, reported solid results for the fourth quarter of fiscal 2018 (June to August) to extend a multi-quarter string of strong growth. However, the company’s mediocre guidance for the current quarter has raised concerns that memory demand will start to slow.To shed light on this super memory cycle, which began in the second half of 2016, this article examines correlations among the top three memory suppliers’ sales revenue, quarterly inventory levels, World Semiconductor Trade Statistics (WSTS) market data, and memory fab equipment investments reported by SEMI.The Memory Inventory Cycle Index, which is based on financial data reported by Samsung, SK Hynix and Micron, is the difference between the year-over-year growth rates of sales (or shipments) and inventories. The index explains business cycle fluctuations such as expansions and contractions, trending up in expansions and declining in contractions. Figure 1 shows both historical Micron sales (blue dotted line) and the quarterly Memory Inventory Cycle Index (black solid line). To minimize seasonal fluctuations, both were calculated based on a four-quarter moving average of sales and inventories. Figure 1. Memory Inventory Cycle Index Compared to Memory Sales* Remarks1) Memory Inventory Cycle Index = YoY growth rate of memory sales revenues - YoY growth rate of memory total inventoris value on a four quarters moving average.2) Calculated memory sales and inventoris are based on Samsung, SK Hynix, and Micron public announcements.3) South Korea Won were converted to US$ based on the quaterly average value released by FRED.4) Companies’ sales data were calculated based on 4-quarter moving average.5) Company data complied by SEMI. As shown in Figure 1, the Memory Inventory Cycle Index has been declining since peaking in the fourth quarter of 2017, mirroring the previous two contractions – in 2010 and 2014 – in which memory sales slowed or stagnated after four quarters of the index decline. Accordingly, if this relationship holds between the Memory Inventory Cycle Index and sales, Micron’s sales will slow in the coming quarters and is consistent with Micron’s guidance for the current quarter. Moreover, the index suggests that the sum of three companies’ sales (the solid red line) will exhibit a similar trend of decreased growth in the coming quarters, which will impact the annual growth rate of global memory sales.WSTS recently increased its 2018 forecast for memory sales to 30.5%, up from 26.5% projected in June of this year. However, the 3-month moving average of memory sales shows that memory sales already increased by 48% YoY in the first half of the year, which means growth is expected to be lower in the second half of the year. Other signs pointing to a weaker end to the year include front-end equipment investments by the top three memory suppliers. SEMI is modeling an annual increase of only one percent for the year for these suppliers, with spending down 23% in the second half relative to the first half of the year.Figure 2 shows the historical trend of the Memory Inventory Cycle Index, the YoY growth rate of memory sales, and YoY memory fab equipment investments. The Memory Inventory Cycle Index increased faster than memory sales and fab equipment investments in the past two cycles. In the most recent memory cycle, these three indexes are moving in tandem, each peaking in the fourth quarter of 2017. Figure 2. Memory Inventory Cycle Index, Memory Sales and Memory Fab Equipment Investments* Remarks1) Both sales and memory fab equipment investments data were calculated based on 4-quarter moving average to minimize seasonal fluctuation.2) All data are from SEMI, except memory sales (WSTS) While overall memory sales continue to be strong this year, memory ASPs have shown signs of weakening right after the inventory index peak. NAND flash ASPs have been trending downward since the first quarter of 2018. With the recent inventory correction and short-term CPU shortage, DRAM ASPs are expected to soften in the fourth quarter of 2018. The looming memory market slowdown has memory makers adjusting their capacity expansion plans for the rest of this year. Some new capacity additions, especially for DRAM, have been pushed out to 2019. The memory inventory cycle index has to some extent foretold the slowdown of the memory market. In the second and final part of this article, we will discuss the correlation between the Memory Inventory Cycle Index and China’s semiconductor sales and Purchasing Managers Index. We will also look at the increasing level of memory inventory in the past few quarters and its composition including Work-in-Progress and Finished goods. Clark Tseng is director and Sungho Yoon is senior market research analyst in Industry Research and Statistics at SEMI. SEMI World Fab ForecastFor the latest worldwide memory fabs forecast including company details, please see the SEMI World Fab Forecast. The report includes quarter-to-quarter fab data from planning to production for both DRAM and NAND Flash companies.

SEMI Releases latest update to World Fab Forecast with adjusted semiconductor revenue consensus for second-half 2018 and 2019 Global semiconductor revenue in 2018 is now expected to reach $473.8 billion and clock a growth rate of 15 percent, a significant upward revision from the 7.5 percent expansion (to $442.9 billion) forecast at the start of the year by six research and investment forecasts tracked by SEMI Industry Research and Statistics (SEMI IR S). Data center growth will remain robust in the coming quarters, fueling demand for memory devices. In addition, cloud computing will continue to spur strong CPU, GPU, networking, ASIC, and DRAM and NAND demand through 2019, driving a consensus 3.63 percent year-to-year growth to reach the semiconductor revenue of $491 billion in 2019. Fab equipment spending (new and used) for 2018 is expected to increase by 14 percent to a record high of $63 billion, according to the last data from the SEMI World Fab Forecast, published by SEMI IR S. For 2019, fab equipment spending (new and used) is expected to increase 8 percent to another record of just under $68 billion. Memory continues to be the biggest swing factor in fab spending in 2018 and is expected to lead growth into 2020. 3D NAND will see the most capacity added in 2018 and 2019 with growth of 41 percent in 2018 and 27 percent in 2019, according to the SEMI World Fab Forecast. DRAM investment will see even stronger growth in 2018 and 2019 driven by new capacity addition as well as the continued technology shrink towards 1y/1z nm. For the first half of 2018, global spending for semiconductor fab equipment continues its growth momentum from 2017. Though we expect some softness in the second half of 2018, the outlook for 2019 remains robust with a fourth consecutive year of growth – the first such run since the 1990s. This prolonged growth cycle has been propelled by memory and will be extended by significant investment in China in 2019. Although a potential slowdown in 2020 is a concern, the overall outlook for semiconductor demand remains solid due to broad-based growth trends in data center, artificial intelligence (AI)/machine learning (ML), automotive, and industrial segments. Following are other SEMI forecasts for fab spending. Installed Capacity 3D NAND will see the most capacity added in both 2018 and 2019 with growth of 41 percent in 2018 and 27 percent in 2019. Foundry capacity growth is steady at 3 percent in 2018 and 6 percent in 2019, driven by both leading-edge and trailing-edge capacity buildup. 200mm fab capacity will increase 4 percent in 2018 and 3 percent in 2019, fueled by demand for MCU, sensors, PMIC, MOSFET and Driver IC. New Facilities / Construction Spending In 2018, there are 72 construction projects with investments totaling $15 billion, a year-over-year increase of 23 percent. Construction spending will reach all-time highs with China continuing its lead at US$7 billion in 2018, shattering its own record of $6.3 billion investment in 2017. Most construction spending in 2018 will be for Memory (just under $9 billion), primarily for 3D NAND followed by DRAM. Foundry will log second place in construction spending at just under $5 billion. Fab Equipment Spending Fab equipment spending (new and used) for 2018 is expected to jump 14 percent to a record high of US$63 billion, flat from the forecast issued in June 2018. Equipment spending (new and used) for 2019 is expected to increase 8 percent to another record of just under US$68 billion, a downward adjustment from +9 percent published in June 2018. We believe equipment spending will remain healthy, driven by solid, broad-based demand and predictable technology investments on top of constructive SEMICAP equipment fundamentals. Activity Report The August report features 1,265 records including about 300 Opto- and LED-related facilities. We have made 223 changes related to 216 fabs/lines. The modifications include the addition of new records, changes to existing records, the deletion of records since the February 2018 World Fab Forecast report. We are tracking 103 future facilities/lines with various probabilities that will start volume production in 2018 or later. Download a sample report Not a subscriber? Please review SEMI fab databases listed below. Our databases deliver the latest forecast and a complete analysis of front-end fabs and foundries worldwide. They are ideal resources to empower your market research. Eugenia Liu is a Senior Product Marketing Manager at SEMI.