BNSR

Sensor on Wafer (SOW) is designed to verify process conditions in etching, one of the most critical steps in semiconductor manufacturing. It is widely used for evaluating etching equipment performance and analyzing process stability across various applications. Our sensor wafer is engineered to match the size and weight of production wafers, enabling direct loading into processing equipment. It monitors ESC and chamber temperature as well as plasma conditions in real time. The measured data is digitized and visualized, allowing operators to intuitively assess process conditions and equipment performance. Designed to operate across a wide temperature range from high to cryogenic conditions, SOW provides stable test environments and highly accurate measurements that closely replicate actual production settings. As a result, SOW has become an essential diagnostic solution for etching process optimization and equipment qualification. Through collaboration with various equipment manufacturers, we continuously enhance technological performance and customer satisfaction. Furthermore, we are expanding our product portfolio to include high-temperature wafer solutions and process automation systems, evolving into a comprehensive provider of process diagnostics and control solution(more...)