SJI-SEMICo.,Ltd.

主营设备包括金属溅射沉积,加强型等离子化学相沉积,等离子干法刻蚀三个领域,服务子为全球的功率器件,微机电系统,先进封装、化合物半导体、射频、集成电路客户、设备具备优异的重复性和稳定性.低故障率,长使用寿命.易操作维修.The main cquipment includes mestal sputtering doposition(PVD), enhanced plasma chemical vapor deposition (PECID),plasnadry etching (EiCH) three areas , serving the global power device (Powor Device). mioro-mahanical systemCMEMs5,advanged packaging （Advanced Packing）, compound somconductor (il1-V), radio frequency URF), intograted crouit(1c)-customers