October 14, 2026
SEMI Standards
Liquid Chemicals Analytical Forum
Time
8:30 am - 12:15 pm PDT
Add to Calendar
2026-10-14 08:30:00
2026-10-14 12:15:00
SEMI Liquid Chemicals Analytical Forum
SEMI StandardsLiquid Chemicals Analytical Forum
Moscone Center South Building, 300 Level, Room 314 San Francisco, CA United States
SEMI.org
[email protected]
America/Los_Angeles
public
Location
Moscone Center
South Building, 300 Level, Room 314
San Francisco, CA
United States
Overview
The workshop will focus on recent advances in analytical methods and instrumentation that address near-term particle metrology challenges identified in the 2024 IRDS Roadmap.
Near-Term Metrology Challenges
| Challenge | Description |
|---|---|
| #5 — Slurry Particle Characterization | Insufficient metrology capability and other impurity monitoring. |
| #7 — Liquid Chemicals: Particles > Critical Size (#/ml) | Need reliable monitoring of particles < 10nm. |
| #8 — CMP Slurries: Large Particles > MPS (#/ml) | Need reliable LPC metrology that can measure targeted particle sizes and concentrations that ignore MPS sizes and do not require sample dilution to obtain the measurement. |
| #9 — Post-CMP (pCMP) Cleans Particles | Some pCMP cleans have volatile or highly reactive ingredients that form bubbles, requiring new metrology to differentiate bubbles from real particles. Cleans containing surfactants form micelle particles that must be distinguished from foreign particles. |
| #16 — Particle Precursor Metrology < 10nm | Need better understanding of particle precursors and critical concentrations to form particles, and the relationship between species/concentration and particle size. |
Agenda
8:35 am
Juan Atkinson Mora
Carl ZEISS
New Developments in Metrologies to Characterize Particle Size Distribution in CMP Slurries
8:55 am
Tyler Roberts
Shimadzu Scientific Instruments
Dynamic Image Analysis and Machine Learning for Large Particle Metrology in CMP Slurries
9:15 am
Lisa Mey-Ami
Air Liquide Balazs
Analytical Advances in Sub-10 nm Nanoparticle Characterization for Next-Generation Semiconductor Manufacturing
9:35 am
Hwan Kim
Principal Scientist
Elemental Scientific
Advances in Analytical Technology – Online Measurement of 5nm Metallic Nanoparticles in Liquid Chemicals
9:55 am
Jikku Thomas
Kanomax FMT
Aerosolization-based Metrology for sub-10 nm Particles & Precursors in Liquid Chemicals
10:15 am
Moderator
Suhas Ketkar
Elemental Scientific
Q&A Discussion (First half of presentations)
10:35 am
Networking Break
10:50 am
Dr. Marie Tripp
VP, North America and Explorer Product Manager
UNISERS AG
Bridging the Gap Between Liquid Contamination and On-Wafer Defectivity
11:10 am
Haruka Nishikawa
Rorze Automation Inc.
Direct Nanoparticle Analysis on 300 mm Silicon Wafers Using LA-GED-MSAG-ICP-MS
11:30 am
Derrick Quarles
Elemental Scientific
Exploring the Capabilities of LA-ICPMS and LIBS for Surface, Spatial, and Depth Detection of Nanoparticles and Contaminants in Si and SiC Wafers
11:55 am
Moderator
Suhas Ketkar
Elemental Scientific
Q&A Discussion (Second half of presentations)
12:10 pm
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12:15 pm
Suhas Ketkar
Elemental Scientific
Closing Remarks
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Contact
For any questions about the event, please contact:
Laura Nguyen
Sr. Coordinator, International Standards
Sponsors
