Advanced Process Control
Chairs: John Jensen, Lam Research; Agnes Roussy, École des Mines de Saint-Étienne; Raymond van Roijen, GLOBALFOUNDRIES
Session 6
6.1 Towards Excursion Detection for Implant Layers Based on Virtual Overlay Metrology
Leon van Dijk, Kedir Adal, Maialen Larrañaga, Richard van Haren, ASML; Mathias Chastan, Laboratoire Jean Kuntzmann; Auguste Lam, STMicroelectronics
6.2 Advanced Process Control (APC) for Selective EPI Process in 300mm Fab
Hongying Peng, Dinesh Balasubra Manian, Shiladitya Chakravorty, Ryan Mickelson, Jensen Tay, Stephen Cabral, Glyn Braithwaite, Dali Shao, Jonathan Caruso, Judson Hold, Churamani Gaire, Wei Hua Tong, GLOBALFOUNDRIES
6.3 Novel Overlay Correction by Synchronizing Scan Speed to Intra-die Fingerprint on Lithography Scanner
Masakazu Hamasaki, Yoshinori Hagio, Kentaro Kasa, Yoshimitsu Kato, Manabu Takakuwa, KIOXIA Corporation; Tsutomu Obata, Shunichi Nakao, Manabu Miyake, Katsuya Kato, Yosuke Takahata, Akihiro Nakae, Western Digital Corporation
6.4 A Data Mining for Real Time Process Monitoring with Mass Spectrometry
Soyeon Park, Sungbin Lee, Eunsun Hong, Bumsik Kim, Jihye Yi, Gyeom Kim, Jinho Kim, Jungdae Park, Samsung Electronics
6.5 A Framework for Semi-Automated Fault Detection Configuration with Automated Feature Extraction and Limits Setting
Jianshe Feng, Haoshu Cai, Jay Lee, University of Cincinnati; Michael Armacost, James Moyne, Fei Li, Jimmy Iskandar, Applied Materials
Session 5 - Poster
5.7 Effect of Sparse or Asymmetric Sampling on the Estimation of Photolithography Overlay Regression Parameters
Tim Conway, Ronak Kamat, SkyWater Technology
5.11 Estimation of Process Time Delay between Chamber Measurements and Optical Emission Spectrum
Taikang Ning, Trinity College; CH Huang, J. A. Jensen, V. Wong and H. Chan, Lam Research
5.22 Repeatability of Nanoimprint Lithography Followed Through Line Roughness Extraction
Hubert Teyssedre, Jérôme Reche, University Grenoble Alpes, CEA, LETI; Florian Delachat, Intitek for Industry; Manuela Stirner, Jonas Khan, Peter Ledel, EV Group (Student)