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300mm fabs

SEMI spoke with Thomas Fries, founder and CEO of FRT GmbH, about how hybrid metrology is shaping multi-sensor metrology tools to enhance measurement precision as the industry moves away from a single-sensor approach.Fries offered his views ahead of the SEMI MEMS Imaging Sensors Summit, 25 to 27 September 2019 in Grenoble, France. Join us at the event to meet experts from FRT Metrology and many other MEMS, imaging and sensors companies. Registration is open. SEMI: Metrology in front-end used to be straightforward. But then, as the number of tasks to be implemented increased, we moved to a multi-sensors approach. What drove this transition?Fries: I believe it´s more about software than about sensors. But of course the basis is the hardware. So, most metrology tools were designed around a specific sensor, e.g. a white light interferometer.A rigid frame, wafer fixtures, scanning tables etc. were then added to develop a complete system. In manufacturing more machinery was added, like handling systems, cleanroom equipment and more sensors, mainly for additive functions such as reading IDs or measuring temperature. The center was still the one and only sensor, being pimped more and more by some hardware features and a lot of software.SEMI: How are sensors and software shaping the way metrology is applied today?Fries: Today a huge number of optical sensors are available to provide various measurement options. But sometimes there are only very slight differences from one sensor to the other. A tiny variation may determine whether we solve a problem or end up fishing in troubled waters.And of course using different machines with those sensors requires high budgets for capital investment, used floor space, measuring time, etc. A multi-sensor platform solves all these problems. But again, it is the software that makes the real difference.SEMI: What lead to those advancements in metrology? What problems did they set out to solve?Fries: Metrology has been evolving ever since the measurement standards were established. The first challenge was to create a flexible mechanical platform that was also reliable and stable. All components were designed to be integrated into one system, mechanically, electrically and of course in the software.This level of integration requires not only an appropriate user interface, but also data formats and evaluation algorithms that leverage multi-sensor hardware. Today every metrology tool in the fab is justified by the application, not by specific sensors or specs. Of course the application leads to a set of specs, but the solution for the metrology task is realized within the software.New developments in metrology combine expertise in system design, physical knowledge in metrology and materials, mechanical engineering and also mathematical and software skills.The last step was the implementation of hybrid metrology functionality into a multi-sensor system that opens totally new doors in metrology. Before multi-sensors development, quite a few hitches could not be properly solved. SEMI: This is especially true when we consider applications in advanced packaging and MEMS manufacturing. What is in your opinion the main challenge?Fries: Specifically, in MEMS and advanced packaging we face multiple metrology challenges, as various processes run in one step and conditions on the wafer may vary quite often. In this case, a high degree of flexibility, up to the option to upgrade the metrology tool at any time or place, is a priceless advantage. Besides, cost effects for footprint, throughput and investment play a key role.A central task for nearly every customer application is to combine global measurements (complete wafer) and local measurements (per die) within one recipe. This is a perfect case for a multi-sensor platform. Measuring step heights and film thickness in one take is also an everyday routine. Combining those characteristics to measure hidden structures (hybrid metrology) is unique.SEMI: How will hybrid metrology enhance measurement precision and where do you expect the multi-sensor approach to be more applicable?Fries: The first advantage is the ability to measure properties that you cannot access directly. On top of that, all the previously mentioned features such as facing multiple metrology tasks, the combination of complete wafer and per die measurement are playing key roles. The precision of specific measuring tasks can be optimized by calibrating sensors against each other or combining results to get rid of noise or artefacts.MEMS and advanced packaging are natural playgrounds for hybrid metrology. But already today we see applications in high volume manufacturing in the 300mm fabs. As structures on wafers shrink, wafers are getting thinner and the whole process is becoming more and more complex. The classic one-sensor metrology tool is running out of gas. SEMI: What are your expectations regarding the summit in Grenoble, and for the future of the MEMS Sensors technology?Fries: FRT has always been very strong in MEMS and sensors and we have attended and exhibited at the SEMI MEMS Imaging Sensors Summit from the very beginning. The summit is always a very good meeting point for the community, and a perfect training session that gives participants extended updates in all fields. And of course, it grows our network and gives us the opportunity to show our latest products and applications.If you really want to know how the future of MEMS and sensors will look like, join the summit and don´t miss the chance to pass by the exhibition to meet FRT and many other industry leaders.Dr. Thomas Fries lives with his family close to Cologne. He is engaged in a variety of activities: as technical advisor to various ministries, supervisory board of PlanOptik AG, board and advisory board of IVAM, board member of COPT.NRW e. V., just to name a few. FRT supports many social projects as well as kindergartens and schools. Motorcycles and cars are still a great passion alongside his family.Serena Brischetto is senior marketing and communications manager at SEMI Europe.
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Semiconductor fabs have been getting smarter and smarter over the past 30 years. It’s a natural evolution – the direct outcome of numerous continuous-improvement efforts. The really important difference on the road to smarter fabs, the one change that’s enabling the Industry 4.0 revolution, is the concept of a cyber-physical system or digital twin. If you don’t have a thorough, detailed, high-fidelity digital twin of your entire fab operation, then you cannot have “Smart Manufacturing.” That’s really the definition of a smart site. A digital twin is simply a requirement for all smart factories of the future. One caveat: No matter what you build today from a smart perspective, your digital twin’s fidelity will improve over the next 20 years. A factory’s digital twin has two facets: the operational aspect and the yield aspect. Each of these two facets places different requirements on a database including the types of data, the frequency of data generated, the retention of data, and even the AI/ML techniques used to analyze the data. A combination of these data requirements are needed to create a digital twin – the virtual representation of your entire factory operation, whether it’s on the wafer-fab front end or the assembly and test back end. What’s most important here is that facility-wide data sets and databases must be able to communicate with each other using refined summary statistics to create a practical digital twin. For example, a lot of information is collected on the yield side to feed the deep-learning models needed to manage processes. However, the factory scheduler, driven largely by the smart operational database, needs only summary statistics from the yield database to be able to act in the next moment or over the next 24 hours. Figure 1 illustrates the needs of and the interaction between a smart operational and a yield database. Figure 1: The Operational and Yield databases in a Smart Factory need to exchange summary statistics. Today, we find that although these databases generally speak to each other in smart factories, they’re still not sufficiently connected to permit the use and analysis of data needed to realize the full potential of a smart factory. That level of interconnectedness is still in the future. Some solution providers have created what is essentially a “smart learning warehouse” (“database” has become too limited a term here). This warehouse collects, analyzes and learns from the extensive amount of information that a fab generates. Game-changing, more holistic applications become possible when this information can be combined in new and informative ways. As it turns out, a data source is just a data source, but users in different factory areas need to extract different information from these common data sources. They need different applications and portals – in other words “views” – that are adapted and adjusted for each area’s needs. Aren’t we smart enough? Some people think that 300mm fabs are already smart. That’s true. They are. But, they could be a lot smarter. No 300mm fab in use today has attained the full, utopian vision of what a smart factory can deliver over the next 10 years. When you finally integrate all of the disparate databases in a fab – when you’re able to use all of those different data sources as one common data source – that’s when your Smart Factory will have the ability to self-optimize its future actions and react quickly to real-time events. The largest semiconductor manufacturers tend to develop these smart factory applications on their own. The remaining semiconductor fabs need to work together with other fabs and their solution providers to develop these smart factory applications. Why now? Why is everyone talking about “Smart” now? It’s because the semiconductor industry has helped to create all of the enabling technology: the compute power, the networking and networking standards, and even the industry’s maturation into a multi-tiered organization of solution providers. We’ve reached the point where we can collect data from a widespread sensor network along with tool-health data and we can then warehouse this data so that it can be applied to more intelligent decision-making. While there may be one or two sensors on a tool today, in the future there will be many such sensors connected over an IoT network or networks that provide mountains of data to the warehouse. All of this data will feed into the digital-twin version of the fab. One of the biggest changes on the horizon made possible by all of this accessible data is advanced scheduling. Despite all of the automation advancements made over the past 25 years, including robotic handling, it’s still hard to decide “where, what, and when?” for every single lot in the factory. Today, no factory in the world is more complex than a semiconductor fab. Optimizing a semiconductor manufacturing process is the most complex manufacturing-optimization task in the world. Do it for ROI ROI is the chief reason for having a digital twin. Once you can make a truly smart, holistic schedule of the fabs operations — not a dispatch or rule-based dispatch list — then you can create an operationally smart factory. Rule-based dispatching systems primarily focus on tools and tool-centric views. Although they incorporate knowledge from current WIP and tool conditions to make decisions better than simple dispatch systems, smart factories are not just about tools and the current WIP at them. Smart factories use the status of every tool and lot in the factory to make fab-centric optimizations instead of tool-specific optimizations. Once you have a digital twin, you’re optimizing for global functions such as line linearity and on-time delivery. These functions are not just about the moment. The transition to a smart factory thus represents a huge philosophical change. When you know exactly what’s going to happen in a factory over the next 12 hours for every single lot, every single wafer carrier, and every single entrance port of every tool in the factory, then you suddenly have control over the factory’s idle time. You know when you can optimally perform PM (preventive maintenance). You know how to best redirect material or labor resources to maximize output. You can create a smart schedule for every maintenance person in the factory that comprehends each person’s skill set and tool downtime so that there’s no negative impact on the factory’s productivity. You can only do all of this when you know the future. Figure 2 illustrates the opportunity. Imagine that a factory contains 1,500 tools. Use of these tools is scheduled for the next twelve hours. The information depicted in Figure 2 encompasses process changes from one chemistry to another, implant changes, reticle changes, and the status of every single consumable for all 1,500 tools. The white spaces that appear between processes in Figure 2 represent opportunities to intelligently schedule events such as maintenance to maximize factory productivity. Figure 2: Smart scheduling permits factory-wide optimization to maximize productivity. Once you have a schedule, you need to translate that schedule into actions or movement. It’s not easy to do this and most material-control systems today make overly simplistic decisions based on modeled assumptions and typical cases rather than the actual time each lot needs to be at a precise location, which can only come from a schedule. Once the data from all of the tools is connected, a smart scheduling system can use the digital twin to make far better process decisions. The larger the factory (or more complex the factory), the more important it is to make smarter decisions. Note: SEMI has a Smart Manufacturing Technology Community. For more information or to get involved, click here. If you would like to discuss Smart Manufacturing more with John directly, he can be contacted at [email protected]. John Behnke is general manager of the Final Phase Systems product line at INFICON.
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