Fan-Out Panel Level Packaging

Post-Conference Report: SEMI Heterogeneous Integration SummitDemand for high-performance computing (HPC) chips is exploding. These super-speedy chips are critical for data centers and cloud computing infrastructures to support new performance-hungry technologies such as artificial intelligence (AI) and 5G. The challenge is for the devices and their multi-core architectures to couple high bandwidth density with low latency and high energy efficiency. Heterogenous integration offers a potential answer as an advanced packaging technology designed to meet these skyrocketing performance demands on HPC chips and open the door to a whole new world of 3D integrated circuits (ICs).So important are 3D ICs that Intel and TSMC representatives speaking at the recent Heterogeneous Integration Summit hosted by SEMI Taiwan in Taipei declared that the packaging technology will all but dictate the future of the industry. All told, 12 speakers from government, academia and a broad range of leading international companies from sectors including advanced packaging, design, manufacturing, silicon photonics, equipment and materials shared forward-looking strategies, the latest technologies and potential heterogeneous integration market opportunities. Koushik Banerjee, vice president, TMG, Assembly, and Test Technology Integration, at Intel pointed out that using heterogeneous integration for a single SiP (system-in-package) will deliver what the industry has long wanted by enabling multiple process nodes, more diverse silicon IP (intellectual property) and chip functionality, and chips that pair low energy with high frequency. Intel plans to announce its first Forveros 3D packaging product combining a 10nm HPC chiplet with a low-energy 22nm base die and stacked with memory on top. When asked about the future of advanced packaging technology, Banerjee said it will be very much about the combination of Foveros and its very own Embedded Multi-Die Interconnect Bridge (EMIB).For its part, TSMC, will continue to upgrade its CoWoS (Chip-on-Wafer-on-Substrate), InFO (Integrated Fan-out) and other 2.5D IC production solutions while developing 3D chip stacking technology such as SoIC and WoW (wafer-on-wafer). TSMC is ushering in a new age of 3D IC packaging, said Marvin Liao, Vice President, Backend Technology and Service Division, at TSMC. The company’s SoIC is based on Chip-on-Wafer concept, with the flexibility to support one-to-many or different process nodes, whereas its WoW integrates two wafers with solid yields that could be used for products of the same size or manufactured with mature process technology.Speakers also included representatives from ATOTECH, Lam Research, SPIL, Sigurd, Cadence, Grand Process Technology, ITRI (Industrial Technology Research Institute), Industrial Development Bureau, and Lee San-Liang, Distinguished Professor, Department of Electronic and Computer Engineering at National Taiwan University of Science and Technology all shared their perspectives on equipment, materials, and testing and how different industry value chains might contribute to the development of heterogeneous integration technology.Expected to be a key driver of the next wave of semiconductors, heterogeneous integration and related technologies – including 3D IC, FOWLP (Fan-out wafer-level packaging) / FOPLP (Fan-out panel-level packaging), silicon photonics, Micro LED, compound semiconductor, automated optical inspection and SLT (system level testing) – will be a key focus at SEMICON Taiwan 2019, September 18 to 20 in Taipei. The Heterogeneous Integration Innovation Zone – along with featured international programs such as SiP Global Summit, Strategic Materials Conference, the Smart Data Summit and the Smart Automotive Summit – will gather key industry players to reveal the latest technology breakthroughs and market trends.Emmy Yi is a senior marketing specialist at SEMI Taiwan.

The arrival of Fan-Out Panel Level Packaging (FO-PLP) appears to be at a perfect time: This technology will leverage processes developed for Three Dimensional Stacked Integrated Circuits (3DS-IC) as well as panel processing technologies developed for industries such as solar panels and large-screen TVs. In this combination, FO-PLP promised the improved performance of 3DS-IC, without the expense. There was just one problem…That problem is the size of the panels to be processed. As different companies developed FO-PLP processes, they chose panels sized to meet certain technical or business goals, or chose a size based on familiarity. So, processes were being developed for more than ten sizes, each of which had one or more companies championing them. For people in the wider semiconductor industry, the development of many processes, each with a unique panel size brought a feeling of déjà vu, reminding them of the 1970s, when each device manufacturer created their own specification for wafer size, forcing them to manufacture their own wafer processing equipment since no external manufacturer was willing to produce tools usable only by a single customer.SEMI responded by developing an industry consensus silicon wafer standard – which described basic parameters, including diameter and thickness – to resolve the issue. Almost overnight the landscape changed, and new tool manufacturers sprung up, enabling the incredible growth that has persisted over more than 40 years.Recently, Cristina Chu (TEL NEXX) presented the state of FO-PLP to the North America Chapter of the SEMI Three-Dimensional Packaging and Integration (3DP I) Technical Committee, suggesting that the Committee develop a single standard dimension that would enable the technology to move into high-volume manufacturing.The Committee began by surveying the industry to determine the interest level in such a standard as well as its contents. A key finding came in response to the question “Would you support a standardized panel size?” Overwhelmingly, over 70 percent of the respondents supporting the idea for the standard, with less than 2 percent opposed. The survey also asked if other parameters should be standardized and, if so, which parameters. Majority responses pointed to edge profile, flatness, and warp, prompting the 3DP I Committee to immediately form the FO-PLP Panel Task Force (TF) to develop such a standard. Chu and Richard Allen (NIST) agreed to chair the TF and respondents to the survey were asked to participate as TF members.The TF initially decided to follow the model of SEMI M1, Specification for Polished Single Crystal Silicon Wafers, and write the document as a purchase specification. The purchase specification would indicate a limited number of mandatory parameters, identified as those that serve as bottlenecks to the development of a FO-PLP ecosystem. Parameters that were not perceived as bottlenecks but might be useful for implementing a FO-PLP process would be included as optional.Working under the SEMI Standards umbrella allowed the TF to take advantage of work done in the development of other standards, without having to recreate it from scratch. In particular, Flatness and Shape were repurposed from SEMI M1, ensuring consistent definitions of these parameters.The TF could not come to consensus on how the other parameters should be categorized, so the decision was made to move the ordering table to a new Appendix as optional.The TF will be balloting its first specification for panel substrate in the upcoming cycle, which opens September 5, 2018 (Cycle 7). The voting is open to all industry experts. Based on the feedback, the task force will continue to refine and otherwise improve the specification by incorporating other parameters that are critical to making FO-PLP a reality.SEMI Standards development activities take place throughout the year in all major manufacturing regions. To get involved, join the SEMI International Standards Program at: www.semi.org/standardsmembership.For more information regarding FO-PLP Panel Task Force activities, please contact Laura Nguyen at [email protected] Allen is a physicist in the Nanoscale Metrology Group in the Engineering Physics Division of the Physical Measurement Laboratory (PML) at the National Institute of Standards and Technology (NIST).