Chemical & Gas Manufacturers Group Webinar 2017: Advanced Patterning Challenges at 5nm

Darron Jurajda, Business Unit Leader at Brewer Science leads a presentation featuring three key speakers, including Greg MacIntyre, Advanced Patterning Department at IMEC, with “EUV Patterning Challenges and Solutions,” Rama Ayothi, R&D Manager at JSR Micro, Inc. with “Addressing the Patterning Challenges,” and Bart Pitcock, VP & GM, KMG Electronic Chemicals concludes with “Overview of the SEMI Chemical & Gas Manufacturers Group (CGMG)”. From SEMI CGMG Webinar in October 2017. Source power and availability, volume of wafers and tools, mask inspections, metrology settings, historical trends, stochastic failures, co-optimization, substrate optimization, and post-processing are discussed in relation to EUV. Materials enablement, 3D vertical NAND, chemically amplified resist (CAR), and planarization are also covered. Includes many graphs and charts.

CGMG’s Mission is to promote awareness of the technical, regulatory and business issues the chemical and gas industry encounters in meeting the expectations of our customers, plan and promote sponsoring seminars, SEMI exhibits, and other events relevant to the markets we serve, serve as a forum for discussing safety and environmental issues, and be a voice to legislation and lobbying efforts on issues our industry faces.

Keywords: Substrate, Fabrication, EUV, Defects, NAND, 3D NAND, Patterning, Power, Metrology, Trends, Optimization, Processing, Planarization