Nicole Saulnier is currently the manager of AI Materials and Process Integration at IBM Research in Albany, NY. She earned her Ph.D. in Electrical and Computer Engineering from Carnegie Mellon University where she studied computational modeling of single photon emitting devices. She joined IBM in 2011 as a member of the Advanced Patterning team and became an expert in lithography solutions including multi-patterning lithography, EUV lithography, OPC, and source mask optimization for 14nm technology and beyond. In 2017, Nicole became a manager in the Semiconductor Materials and Process Technology Research department with a focus on emerging technologies. With the launch of the AI Hardware Center, Nicole and her team now work solely on AI technologies.