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ST. PETERSBURG, Fla. Sept 9th, 2019 — Plasma-Therm LLC has introduced a new Quasar™ Ion Beam Etch System for advanced Ion Beam Etch (IBE) with enhanced capability.
The Quasar™ IBE system incorporates a unique feature of planetary scanning technology – the ability to sweep the wafer in an oscillatory manner across the ion beam.
Dr. Ming Mao, Engineering Director of Advanced Process Development at Western Digital Corp said, “With the introduction of Plasma-Therm's Quasar™ system, which incorporates the unique feature of planetary scanning technology, their innovative Marathon™ Ion Source and Fast Motion Control scanning, Plasma-Therm has produce a truly leading edge technology that provides long term etch uniformity, etch rate stability and process fulfilling the requirements of next generation of IBE technology.”
Hari Hedge, Plasma-Therm’s Business Unit Manager for Ion Beam technology said, “We are pleased to have completed the acceptance of the Quasar™ IBE system. This next generation IBE system provides a full order of magnitude improvement in etch uniformity and feature profile compared to typical broad-beam IBE technology”.
About Plasma-Therm
Plasma-Therm LLC is a manufacturer of leading plasma etch, deposition, and advanced packaging equipment for specialty semiconductor and nanotechnology markets. Plasma-Therm's plasma-processing and advanced-packaging solutions are used in research, pilot manufacturing, and volume production of wireless, photonics, solid state lighting, MEMS/NEMS, data storage and other devices. Learn more at