Press Release: Kurt J. Lesker Company Announces Groundbreaking Report in an ALD first!
Jefferson Hills, PA – January 8th, 2024 – Kurt J. Lesker Company is proud to announce the successful publication of our latest Atomic Layer Deposition (ALD) technology in JVSTA. This groundbreaking innovation, featuring our patented Precursor Focusing Technique (PFT) and Ultra-High Purity (UHP) process capability, marks a significant milestone in our commitment to advancing next-generation applications.
The new ALD research and development (R&D) represents the first successful demonstration of scandium nitride (ScN) deposition using plasma-enhanced atomic layer deposition (PEALD) on silicon, sapphire, and magnesium oxide substrates under UHP conditions. This innovative process utilizes a new scandium precursor, bis(ethylcyclopentadienyl)scandium-chloride [ClSc(EtCp)2], combined with N2-H2 plasma species, allowing for the deposition of conformal, high-quality ScN films at relatively low temperatures (200−300°C).
"We are thrilled by the prospects of this breakthrough, which underscores our dedication to innovation and excellence in the field of ALD," said Kurt Lesker IV. "This achievement is a testament to the hard work and expertise of our team, and we look forward to leveraging this technology to drive sustainable business growth."
The ScN films produced by this process exhibit high crystalline quality and excellent electrical properties, with high mobility and low resistivity. This makes them suitable for advanced electronic applications, including thermoelectric applications and as an interlayer for epitaxial gallium nitride (GaN) growth. The ability to conformally coat high aspect ratio (HAR) structures is particularly valuable for applications in 3D embedded memory and piezoelectric microelectromechanical systems (piezoMEMS).
The new ALD breakthrough positions Kurt J. Lesker Company as a leader in the ALD market, providing a significant competitive edge. KJLC’s unique UHP technology equips researchers to meet the challenges of next generation 3D nanotechnology.
The new ALD publication, in JVSTA, will be featured on www.lesker.com and stay tuned for more updates as we continue to push the boundaries of ALD technology.
For more information, please visit our website or contact our marketing team.
