DuPont Wins Jeffrey Byers Best Poster Award at 2025 SPIE Advanced Lithography + Patterning Conference
Recognized for Innovative Research in More Sustainable Lithography Solutions
WILMINGTON, Del., Feb. 26, 2025 – DuPont today announced that it has been awarded the Jeffrey Byers Best Poster Award in Patterning Materials and Processes at the 2025 SPIE Advanced Lithography + Patterning conference. Presented during the conference’s opening session on Monday, Feb. 24, the award recognizes DuPont’s research on more sustainable material design for lithography.
The award-winning presentation, titled “Disruptive Non-Fluorinated Photoacid Generators Using Computational Chemistry and Library Design,” introduces a novel class of non-fluorine photoacid generators (PAGs) that can serve as a foundation for product development in sustainable lithography materials. Developed through computational chemistry and synthetic organic methods, these PAGs deliver competitive performance across multiple lithographic technologies, including i-line, KrF, ArF, and extreme ultraviolet (EUV) lithography. The research also addresses environmental and regulatory challenges associated with per- and polyfluoroalkyl substances (PFAS) – substances of concern.
Building on these findings, DuPont recently launched the DuPont™ UV™ 26GNF photoresist, the Company’s first commercial photoresist which substitutes traditional fluorine-containing PAGs with a non-fluorine alternative.
“This recognition is a testament to DuPont’s technical leadership in advancing more sustainable lithography materials,” said Ben Xie, Global R&D Director, Lithography Technologies at DuPont Electronics & Industrial. “Our team’s pioneering work in non-fluorine PAGs demonstrates our commitment to providing innovative solutions that meet the industry’s high performance standards and also help semiconductor fabricators advance their sustainability efforts by reducing substances of concern.”
The Jeffrey Byers Best Poster Award in Patterning Materials and Processes was named in memory of Dr. Jeffrey A. Byers, an award-winning researcher in sustainable chemistry. It recognizes the most outstanding poster presented at the previous year’s conference, selected on criteria including technical originality, relevance, quality of presentation, and quality of the associated paper.
Throughout the 2025 SPIE Advanced Lithography + Patterning conference, Feb. 24–28 in San Jose, California, DuPont is showcasing its latest advancements in sustainable lithography solutions as well as innovation in materials for EUV lithography. For more information about DuPont’s solutions for lithography, please visit the DuPont Electronics & Industrial website.
Caption: DuPont is awarded the Jeffrey Byers Best Poster Award in Patterning Materials and Processes at the 2025 SPIE Advanced Lithography + Patterning conference on Monday, Feb. 24, 2025. Pictured from left: Douglas Guerrero, Conference Chair for Patterning Materials and Processes, and Paul LaBeaume, Technical Manager, DuPont Electronics & Industrial and co-author of the awarded paper.
About DuPont
DuPont (NYSE: DD) is a global innovation leader with technology-based materials and solutions that help transform industries and everyday life. Our employees apply diverse science and expertise to help customers advance their best ideas and deliver essential innovations in key markets including electronics, transportation, construction, water, healthcare and worker safety. More information can be found at www.dupont.com. Investors can access information included on the Investor Relations section of the website at investors.dupont.com.
