Reprogrammable Photomask for Direct Writing Lithography
ABSTRACT
To develop a new MEMS or a sensor device, layout and process flow need to be developed in parallel. Each process development iteration could be lengthy, and each layout modification could increase development time. Direct writing lithography can reduce development time by allowing quick turnaround for each layout modification as well as allowing design flexibility for numerous experiment matrices. However, current laser-based lithography systems are lacking throughput and precision and are not suited for volume manufacturing. The reprogrammable photomask that is proposed by Digitho is a novel solution for direct writing lithography in standard stepper photolithography without system modification. Therefore, Digitho is proposing a solution for short development time and flexibility within the same equipment as for volume manufacturing. This can reduce time-to-market for new products and can bring flexibility within manufacturing.
BIOGRAPHY
24 years' experience in semiconductor industry as process scientist, process integrator, MEMS designer consultant, CTO and CEO. Entrepreneur bringing innovations in the semiconductor industry.