BIOGRAPHY
Rebecca Routson is the Principal Director for CHIPS Metrology at the CHIPS for America R&D Office at the National Institute of Standards and Technology. She previously served as a Program Manager in CHIPS R&D Metrology, overseeing the CHIPS R&D Metrology portfolios for modeling and simulating materials and designs, as well as modeling and simulating manufacturing processes. She brings wide-ranging private sector industry experience to the CHIPS R&D Metrology Program. Prior to joining NIST, she worked in technology development at Intel in both lithography and yield analysis, developing and refining the manufacturing processes used to create the next generation of semiconductors.