October 18, 2021
New challenges and opportunities in process and design continue to emerge in parallel to ever shrinking semiconductor device geometries. While Moore’s law and beyond are driving scale reduction, the industry is facing increased process sensitivity and complexity, and is redefining on-wafer defect tolerance in terms of size and complexity.
Join us for this webinar-like session to discuss best-known methods from industry leaders
Time
7:30 am - 10:00 am PDT
Location
Virtual
United States
Do you sometimes feel like you are operating in the dark when dealing with the new challenges and opportunities in process and design? These continue to emerge in parallel to ever shrinking semiconductor device geometries.
While Moore’s law and beyond are driving scale reduction, the industry is facing increased process sensitivity and complexity, and is redefining on-wafer defect tolerance in terms of size and complexity.
To detect, identify, understand the source and eliminate yield limiter defectivity are key for total wafer environment contamination characterization and control and are essential for yield enhancement to ensure the success of the latest technology nodes.
It is more imperative than ever that the semiconductor industry works together to enable improved defect detection, speciation/characterization metrology, and as needed, hybrid analytical technology for upcoming HVM readiness.
Join us for this session for speakers and discussion on tackling some of these industry challenges.
Agenda
Welcome
IDM Perspective of Defectivity with regard to Next-Gen Metrology and Analysis Tools
Introduction to the Presentations
Contamination Control for PFA
Metrology: (Ideally) Enabling the What, When, How, and Where of Unknown Contamination Detection and Control
Challenges in detecting nanoparticle, NVR, native oxide, and trace metals for 5 nm and beyond processes
HMW Organic Contaminants: What, Where, How?
Advance Metrology for Particle Sizing and Identification in Ultrapure Liquids
On-wafer detection and characterization of organic defects with Unisers
Open Discussion
Registration
Registration is free for SEMI Members. Use your company email when registering for the system to recognize you as a member.
Non-Member fee = $49
Contact Paul Trio at [email protected] with any questions.