Keynote: IDM Perspectives on Next Generation Metrology Requirement
ABSTRACT
As foundry manufacturers advance to newer and smaller nodes, defect metrology becomes more important to protect wafers and improve yields. Critical defects can come from raw materials, chemical suppliers, facilities chemical handling equipment, and the process tools. Measuring, characterizing, and resolving the sources of these defects to prevent yield loss will take the effort of IDMs working hand in hand with chemical suppliers and metrology partners to enable cost competitive manufacturing.
BIOGRAPHY
Stephen Hermens is a Facilities Bulk Chemical Technologist, with nearly a 10 year career at Intel. His experience covers wastewater for substrate and assembly/test and operations and construction in bulk chemical distribution. At the Ocotillo site, Stephen has helped to design and build the latest generation chemical facilities for logic fabrication, and apply the best chemical metrology solutions to Intel's latest processes. His work has helped to innovate and integrate the industry's newest solutions into the IDM foundry.
Stephen holds a both an M.S. and B.S.E. in Chemical Engineering from Arizona State University.