downloadGroupGroupnoun_press release_995423_000000 copyGroupnoun_Feed_96767_000000Group 19noun_pictures_1817522_000000Member company iconResource item iconStore item iconGroup 19Group 19noun_Photo_2085192_000000 Copynoun_presentation_2096081_000000Group 19Group Copy 7noun_webinar_692730_000000Path
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Enabling the Molybdenum HVM Ecosystem

 

ABSTRACT

In the rapidly evolving semiconductor industry, the relentless demand for smaller dimensions and heightened device performance is driving adoption of new metals in advanced logic and memory. As the industry evaluates lowerresistance and barrierless material alternatives, molybdenum is poised to become the new standard for stateoftheart device production replacing tungsten in multiple areas, most notably for word lines in 3D NAND devices. The leading precursor candidates for Mo deposition are solid halide based, corrosive materials that must be delivered to the tools in gas phase and adhere to process specifications in line with traditional vapor phase delivery. The challenges to provide ultrapure Mo solid precursors from factory to fab to tool are numerous and require a broad range of innovative solutions across chemistry, analytical, container and bulk delivery systems. We will address the various barriers to high volume adoption that the industry faces to enable these new Mo precursors and meet the technical and economic requirements for the next generation of devices.


BIOGRAPHY 

Joseph Rivers

Joseph Rivers PhD is a Senior Director at Entegris where he leads the Advanced Deposition Precursor business. Based in Austin, Texas, his organization is responsible for precursor chemistry and bulk delivery systems for solid and liquid precursors. After finishing his doctoral work at the University of Texas at Austin in Inorganic Chemistry, he started his career with ATMI where he focused on R&D scale up and manufacturing of organometallic and silane precursors. He has held multiple roles within Entegris over the last 15 years managing portfolios for post-etch and post-CMP cleans, CMP consumables, and now returning to his original interest in CVD/ALD precursors.