Pioneering Lithographic Materials for the AI Era: Next Generation EUV materials and Path to Sustainable Patterning
Advancements in AI chip architecture demand unprecedented compute speed, power efficiency and area optimization, yet further breakthroughs are gated by the scaling limits of lithographic materials. This talk will provide a comprehensive perspective on material innovations driving next-generation photolithography, specifically for Extreme Ultraviolet (EUV) patterning applications. We will also examine the shift toward sustainable material substitutes, highlighting our holistic strategy to align the advanced node patterning performance with tightening global environmental regulations.
BIOGRAPHY
Mingqi Li is a technical fellow at semiconductor technology business of Qnity Electronics Inc., He received his BS and MS degrees from Tsinghua University, China, and a Ph.D. degree from Cornell University. His research interests include various spin on solutions for photolithographic materials, block copolymers, and liquid crystalline materials. He is an inventor of over 50 granted US patents, and an author of over 40 journal and technical papers. His achievements were recognized with the Asian American Engineering of the Year (AAEOY) Award in 2019, DuPont’s Pedersen medal in 2021, and ACS Heroes of Chemistry Award in 2025.