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August 18, 2020

SEMI Standards PV and PV Materials China Joint TC Chapter Spring Meeting 2020

This course will describe how machine learning and AI-based approaches to research, development, and production brings advantages to cleanroom processes.  AI-based identification of time-varying equipment performance, and the effects of the previous recipe used on the outcome of the current desired methods, are just some of the ways AI can be used to reduce the process variability.

Time

10:00 am - 12:00 pm

Add to Calendar 2020-08-18 10:00:00 2020-08-18 12:00:00 Flexible Electronics Master Class#2: AI in Mfg This course will describe how machine learning and AI-based approaches to research, development, and production brings advantages to cleanroom processes.  AI-based identification of time-varying equipment performance, and the effects of the previous recipe used on the outcome of the current desired methods, are just some of the ways AI can be used to reduce the process variability. Virtual, United States SEMI.org contact@semi.org America/Vancouver public
Location

Virtual,
United States

SEMI Standards PV and PV Materials China Joint TC Chapter Spring Meeting 2020

This course will describe how machine learning and AI-based approaches to research, development, and production brings advantages to cleanroom processes.  AI-based identification of time-varying equipment performance, and the effects of the previous recipe used on the outcome of the current desired methods, are just some of the ways AI can be used to reduce the process variability.

At Cornell, we have applied AI approaches to optimize lithography and etching processes involved in the development of an RF wake-up NEMS (Nano ElectroMechnical system) switch that needs a well-controlled gap between a moving shuttle and a contact. We report on a decision tree based AI model for predicting lithography outcomes.

This work is being applied to plasma etching and the combined prediction of lithography and thin-film etching, using CD-SEM imagery for feature extraction and modeling process variables. Additional approaches to train process-modeling CAD tools to result in better process development experience are developed.
 

Featured Speakers

Amit Lal
Amit Lal
Cornell University
Chris Ober
Chris Ober
Cornell University
Peter Doerschuk
Peter Doerschuk
Cornell University
Benyamin Davaji
Benyamin Davaji
Cornell University
Barry Bordonaro
Garry Bordonaro
Cornell NanoScale Facility
Jeremy Clark
Jeremy Clark
Cornell NanoScale Facility

Registration Includes: 

  • Live access to one webinar (register separately for each in series)
  • Post-webinar access to recording

Member Price:  $25

Non-Member Price:  $49

Non-Member Price for Government, Military, and Academia Non-Members:  $35

To receive this price, contact Michelle Fabiano at mfabiano@semi.org for discount code.  Must have a valid .gov, .mil or .edu email address

Students:  $0 

To receive this price, contact Gity Samadi at gsamadi@semi.org for discount code.  Must have a valid student ID card.