Dr. Nelson Felix joined IBM in 2008 and is currently the Director of Process Technology at IBM Research in Albany, NY. In this role, Nelson is responsible for the demonstration and enablement of new tooling, processes, materials, and metrology to support IBM’s leading-edge CMOS device and AI hardware roadmap. Nelson received his B.S. from the University of Massachusetts, Amherst (2002) and his Ph.D. from Cornell University (2007), both in chemical engineering, and his doctoral work centered on the characterization of novel photoresist materials for EUV. Dr. Felix is an SPIE Fellow, and he is co-inventor on over 50 patents and co-author on over 100 publications.