Advanced Process Control
Session Chairs: Raymond van Rojien, Agnes Roussy, Samira Bagheri
Modern Fabs require advances in process control to improve yield and lower cost. In this session computational methods are applied to improve processes such as CMP, epitaxy and Lithography.
Tuesday, May 2, 2023
1:15 PM ET
4.1 Random Forest Based R2R Control: Application to Chemical Mechanical Planarization Process
Lucile Terras, Agnès Roussy, Mines Saint-Etienne; Cyril Alegret, François Pasqualini, STMicroelectronics
1:40
4.2 Adaptive Online Time-Series Prediction for Virtual Metrology in Semiconductor Manufacturing
Simon Zabrocki, Pilsung Jo, Chan Park, Dongkyun Yim, Sunghee Yun, Byung-Jun Lee, GaussLabs
2:05
4.3 Identification of Predictive Anomolous Signals in the Noise of Epitaxy Process Control
Wes Smith, Galaxy Semiconductor; François Bergeret, Ippon Innovation; Daniele Pagano, ST Microelectronics
2:30
4.4 Development of Outlier Detection Algorithms for Sensors with Time-Varying Characteristics
Changho Lee, Jungmin Lee, Bobae Lee, Jaeseok Park, Jiyeon Park, Younghoon Kim, Jaeyong Park, Samsung Electronics
2:55
4.5 Automated CMP multi-slurry ratio tuning for Defect Reduction
Russell McCabe, Abbas Arab, Mike Jeppson, Kevin Ward, David Berry, Subhadeep Mukherjee, Yi Yang, Micron Technology