Advanced Process Control 2
Chairs: Raymond Van Roijen, Agnes Roussy, Olaf Storbeck
The challenges of current and future semiconductor process technologies require an increased application of modelling, simulation, and optimization technologies. Utilization of cross industry best practices and automated decision-making and execution will enable improved factory efficiency. Presentations in this session will discuss solutions to improve automation and equipment in chip factories.
Wednesday, May 4, 2022
9:20 AM ET
8.1 Computational Overlay as Enabler for Enhanced On-Product Overlay Control.
Leon van Dijk, Kedir Adal, Reza Sahraeian, Sepideh Golmakaniyoon, Niyam Haque, Richard van Haren, ASML Netherlands B.V.; Auguste Lam, Bertrand Le-Gratiet, STMicroelectronics
9:45
8.2 Optimization of OC-SVM Engine Used for Out-Of-Control Detection in Semiconductor Industry.
Ilham Rabhi, Agnes Roussy, Mines Saint-Etienne; François Pasqualini, STMicroelectronics
10:10
8.3 A Metal Gate Height Variation Control Method by the Metal Gate Etch at the FinFET Technology.
Arthur Tu, SMIC Advanced Technology R&D; Tan Wang, Jing Qiu, Haiyang Zhang, Semiconductor Manufacturing International Corporation
10:35
8.4 CMP Process Control With iAPC Segmented Modeling to Achieve Desired With-in-Wafer Uniformity and Geometry Across Consumable Life.
Duraisamy Logamanya Rukmangathan, Gerry Dizon, Sreejith Ajithkumar, Yew Siew Chong, Globalfoundries