Advanced Process Control 1
Chairs: Raymond Van Roijen, Agnes Roussy, Olaf Storbeck, Deepak Patil
This session is focused on optical metrology methods and includes advancements in their productivity and their use in novel ways. The topics relate to scatterometry, machine learning, overlay, photoluminescence, and materials characterization.
Tuesday, May 3, 2022
9:50 AM ET
2.1 Feature Selection for Virtual Metrology Modeling: An application to Chemical Mechanical Polishing.
Oussama Djedidi, Rebecca Clain, Valeria Borodin, Agnes Roussy, Mines Saint-Etienne; Ikram Azzizi, STMicroelectronics
10:15
2.2 Transfer Learning for Virtual Metrology in Semiconductor Manufacturing.
Rebecca Clain, Valeria Borrodin, Agnes Roussy, Oussama Djedidi, Mines Saint-Etienne; Ikram Azzizi, STMicroelectronics
10:40
2.3 A Customizable Simulator for Artificial Intelligence Research to Schedule Semiconductor Fabrication Plants.
Benjamin Kovacs, Pierre Tassel, Martin Gebser, Ramsha Ali, Mohammed El-Kholany, University of Klagenfurt; Georg Seidel, Infineon Technologies Austria AG
11:05
2.4 Introduction of Equipment Level FDC System For Semiconductor Wet-Cleaning Equipment Optimization And Real-Time Fault Detection.
NamJin Kim, Global ZEUS Co,.LTD
11:30
2.5 Implementation of an OES System to Detect Silane Bursting During HDP SiN Film Deposition.
Isabel Azevedo, Matthew Hurley, David Mosher, Globalfoundries