Contamination Free Manufacturing 2
Chairs: Jennifer Braggin, Chris Long, Chris Ebert, Bradley Wood, Vijayalakshmi Seshachalam
Contamination in the form of particulates, surface impurities and volatile organic compounds can have a significant impact on semiconductor wafer fab yield and reliability. This session will feature papers focused on new methods for contamination detection, identification, and control strategies.
Wednesday, May 4, 2022
3:50 PM ET
13.1 Nano Filtration Using Polysulfone Membrane.
Jian Tan, Rob Shick, Joe Peri, I-fan Wang, Amarnauth Singh, Pall Corporation
4:15
13.2 Visualization of Particle Retention Profiles in Advanced Filtration Media with Confocal Fluorescence Microscopy for Semiconductor Applications.
Yu Cai, Pall Corporation