Session 6—Advanced Process Control
Chairs: John Jensen, Lam Research; Agnes Roussy, École des Mines de Saint-Étienne; Raymond van Roijen, GLOBALFOUNDRIES
APC leverages the data collection capability of modern tools and infrastructure and uses advanced statistical techniques to predict product performance, detect excursions and enhance tool capability.
9:20am
6.1 Towards Excursion Detection for Implant Layers Based on Virtual Overlay Metrology
Leon van Dijk, Kedir Adal, Maialen Larrañaga, Richard van Haren, ASML; Mathias Chastan, Laboratoire Jean Kuntzmann; Auguste Lam, STMicroelectronics
9:45
6.2 Advanced Process Control (APC) for Selective EPI Process in 300mm Fab
Hongying Peng, Dinesh Balasubra Manian, Shiladitya Chakravorty, Ryan Mickelson, Jensen Tay, Stephen Cabral, Glyn Braithwaite, Dali Shao and Wei Hua Tong, GLOBALFOUNDRIES
10:10
6.3 Novel Overlay Correction by Synchronizing Scan Speed to Intra-die Fingerprint on Lithography Scanner
Masakazu Hamasaki, Yoshinori Hagio, Kentaro Kasa, Yoshimitsu Kato, Manabu Takakuwa, KIOXIA Corporation; Tsutomu Obata, Shunichi Nakao, Manabu Miyake, Katsuya Kato, Yosuke Takahata, Akihiro Nakae, Western Digital Corporation
10:35
6.4 A Data Mining for Real Time Process Monitoring with Mass Spectrometry
Soyeon Park, Sungbin Lee, Eunsun Hong, Bumsik Kim, Jihye Yi, Gyeom Kim, Jinho Kim, Jungdae Park, Samsung Electronics
11:00
6.5 A Framework for Semi-Automated Fault Detection Configuration with Automated Feature Extraction and Limits Setting
Jianshe Feng, Jimmy Iskandar, Haoshu Cai, Jay Lee, University of Cincinnati; Michael Armacost, James Moyne, Fei Li, Applied Materials
11:30
Boxed Lunch