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Session 6Advanced Process Control

Chairs: John Jensen, Lam Research; Agnes Roussy, École des Mines de Saint-Étienne; Raymond van Roijen, GLOBALFOUNDRIES

APC leverages the data collection capability of modern tools and infrastructure and uses advanced statistical techniques to predict product performance, detect excursions and enhance tool capability.
 

9:20am   

6.1   Towards Excursion Detection for Implant Layers Based on Virtual Overlay Metrology

Leon van Dijk, Kedir Adal, Maialen Larrañaga, Richard van Haren, ASML; Mathias Chastan, Laboratoire Jean Kuntzmann; Auguste Lam, STMicroelectronics
 

9:45

6.2   Advanced Process Control (APC) for Selective EPI Process in 300mm Fab

Hongying Peng, Dinesh Balasubra Manian, Shiladitya Chakravorty, Ryan Mickelson, Jensen Tay, Stephen Cabral, Glyn Braithwaite, Dali Shao and Wei Hua Tong, GLOBALFOUNDRIES
 

10:10

6.3 Novel Overlay Correction by Synchronizing Scan Speed to Intra-die Fingerprint on Lithography Scanner

Masakazu Hamasaki, Yoshinori Hagio, Kentaro Kasa, Yoshimitsu Kato, Manabu Takakuwa, KIOXIA Corporation; Tsutomu Obata, Shunichi Nakao, Manabu Miyake, Katsuya Kato, Yosuke Takahata, Akihiro Nakae, Western Digital Corporation
 

10:35

6.4 A Data Mining for Real Time Process Monitoring with Mass Spectrometry

Soyeon Park, Sungbin Lee, Eunsun Hong, Bumsik Kim, Jihye Yi, Gyeom Kim, Jinho Kim, Jungdae Park, Samsung Electronics
 

11:00

6.5   A Framework for Semi-Automated Fault Detection Configuration with Automated Feature Extraction and Limits Setting

Jianshe Feng, Jimmy Iskandar, Haoshu Cai, Jay Lee, University of Cincinnati; Michael Armacost, James Moyne, Fei Li, Applied Materials
 

11:30

Boxed Lunch
  

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