Advanced Process Control 1
Session Chairs: Shubhodeep Goswami, Jeff Ye
This session discusses process control schemes utilizing advanced data analytics, computational algorithms and statistical methods to improve wafer process steps, yield and cost.
Tuesday, May 14, 2024
3:25 PM ET
7.1 Feed-Forward Run-to-Run Process Control Based on Device Array Density for LPCVD Furnace Processes
P. Bharatan, F. Sellidj, Micron Technology
7.2 RLIF-Net: Fault Detection of Water Sensors Based on Representation Learning and Isolation Forest
H. Qiu, H. Jiang, Semitronix
7.3 Real-Time Etching Process Monitoring and End-Point Detection with a Time-of-Flight Mass Spectrometer
S. Gasc, F. Binda, P. Das Kanungo, L. Hofer, M. Rothenberger, Spacetek Technology