Advanced Metrology 3
Session Chairs: Padraig Timoney, Delphine Le Cunff
Thursday, May 16, 2024
9:10AM ET
20.1 Scatterometry Critical Dimension Solution for Gate All around Sheet-Specific Metrology
H. Chouaib, KLA Corporation
20.2 Advanced Metrology of Thick Silicon Nitride Films at 300 MM Scale for Next Generation High-Q Photonic Devices
S. Kar, K. Morgan, L. Carpenter, N. Fahrenkopf, C. Baiocco, American Institute for Manufacturing Integrated Photonics (AIM Photonics); N. Gangi, Rensselaer Polytechnic Institute
20.3 Thickness Description of Thick GaN Film Stack and Measurement of Al Percentage in AlGaN Alloy with the KLA SpectraShapeTM 10K
G. Baldi, F. De Paola, KLA Corporation; A. Severino, I. Mongiatti, STMicroelectronics
20.4 Optimization of Scatterometry Measurements by Enhancing with Machine Learning
S. Srichandan, F. Heider, G. Ehrentraut, S. Lilje, C. Putzi, S. Radosavljevic, Infi neon Technologies; E. Sakalauskas, Nova Measuring Instrument